Patents by Inventor Charles Jesse Taft

Charles Jesse Taft has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9177822
    Abstract: An etching method. The method includes etching a first plurality of silicon wafers in a first enchant, each silicon wafer having SiO2 and Si3N4 deposited thereon, where the etching includes dissolving a quantity of the SiO2 and a quantity of the Si3N4 in the first etchant. A quantity of insoluble SiO2 precipitates. A ratio of a first etch rate of Si3N4 to a first etch rate of SiO2 is determined to be less than a predetermined threshold. A portion of the first etchant is combined with a second etchant to form a conditioned etchant. A second plurality of silicon wafers is etched in the conditioned etchant. A ratio of a second etch rate of Si3N4 to a second etch rate of SiO2 in the conditioned etchant is greater than the threshold. A method for exchanging an etching bath solution and a method for forming a selective etchant are also disclosed.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: November 3, 2015
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Russell Herbert Arndt, Paul F. Findeis, Charles Jesse Taft
  • Publication number: 20130167883
    Abstract: The present disclosure relates to semiconductor device manufacturing and, more particularly, to removing a mask material, especially an ion implanted and patterned photo resist, using an aqueous cerium-containing solution. The present invention relates to a method and apparatus for cleaning the chemical materials utilized for cleaning semiconductor wafers. The invention utilizes a centrifugal filter to eliminate heavy materials from the cleaning solution.
    Type: Application
    Filed: January 3, 2012
    Publication date: July 4, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: JOHN A. FITZSIMMONS, CHARLES JESSE TAFT, JENNIFER V. MUNCY
  • Publication number: 20130011936
    Abstract: An etching method. The method includes etching a first plurality of silicon wafers in a first enchant, each silicon wafer having SiO2 and Si3N4 deposited thereon, where the etching includes dissolving a quantity of the SiO2 and a quantity of the Si3N4 in the first etchant. A quantity of insoluble SiO2 precipitates. A ratio of a first etch rate of Si3N4 to a first etch rate of SiO2 is determined to be less than a predetermined threshold. A portion of the first etchant is combined with a second etchant to form a conditioned etchant. A second plurality of silicon wafers is etched in the conditioned etchant. A ratio of a second etch rate of Si3N4 to a second etch rate of SiO2 in the conditioned etchant is greater than the threshold. A method for exchanging an etching bath solution and a method for forming a selective etchant are also disclosed.
    Type: Application
    Filed: September 14, 2012
    Publication date: January 10, 2013
    Applicant: International Business Machines Corporation
    Inventors: Russell Herbert Arndt, Paul F. Findeis, Charles Jesse Taft
  • Patent number: 8298435
    Abstract: An etching method. The method includes etching a first plurality of silicon wafers in a first enchant, each silicon wafer having SiO2 and Si3N4 deposited thereon, where the etching includes dissolving a quantity of the SiO2 and a quantity of the Si3N4 in the first echant. A quantity of insoluble SiO2 precipitates. A ratio of a first etch rate of Si3N4 to a first etch rate of SiO2 is determined to be less than a predetermined threshold. A portion of the first etchant is combined with a second etchant to form a conditioned etchant. A second plurality of silicon wafers is etched in the conditioned etchant. A ratio of a second etch rate of Si3N4 to a second etch rate of SiO2 in the conditioned etchant is greater than the threshold. A method for exchanging an etching bath solution and a method for forming a selective etchant are also disclosed.
    Type: Grant
    Filed: October 19, 2007
    Date of Patent: October 30, 2012
    Assignee: International Business Machines Corporation
    Inventors: Russell Herbert Arndt, Paul F. Findeis, Charles Jesse Taft
  • Patent number: 7890202
    Abstract: A method of batching substrates in an automated processing tool, the automated process tool and a system for batching substrates in the automated process tool. The method includes selecting a first container containing a first group of substrates; simultaneously transferring each substrate of the first group of substrates into a batching station of the automated processing tool; selecting a second container containing a second group of substrates; selecting less than all substrates of the second group of substrates; and transferring each substrate of the less than all substrates of the second group of substrates to the batching station to form a third group of substrates.
    Type: Grant
    Filed: October 16, 2007
    Date of Patent: February 15, 2011
    Assignee: International Business Machines Corporation
    Inventors: Russell Herbert Arndt, Michael Robert Biagetti, Robert J. MacHugh, Charles Jesse Taft
  • Publication number: 20090101626
    Abstract: An etching method. The method includes etching a first plurality of silicon wafers in a first enchant, each silicon wafer having SiO2 and Si3N4 deposited thereon, where the etching includes dissolving a quantity of the SiO2 and a quantity of the Si3N4 in the first echant. A quantity of insoluble SiO2 precipitates. A ratio of a first etch rate of Si3N4 to a first etch rate of SiO2 is determined to be less than a predetermined threshold. A portion of the first etchant is combined with a second etchant to form a conditioned etchant. A second plurality of silicon wafers is etched in the conditioned etchant. A ratio of a second etch rate of Si3N4 to a second etch rate of SiO2 in the conditioned etchant is greater than the threshold. A method for exchanging an etching bath solution and a method for forming a selective etchant are also disclosed.
    Type: Application
    Filed: October 19, 2007
    Publication date: April 23, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Russell Herbert Arndt, Paul F. Findeis, Charles Jesse Taft
  • Publication number: 20090099681
    Abstract: A method of batching substrates in an automated processing tool, the automated process tool and a system for batching substrates in the automated process tool. The method includes selecting a first container containing a first group of substrates; simultaneously transferring each substrate of the first group of substrates into a batching station of the automated processing tool; selecting a second container containing a second group of substrates; selecting less than all substrates of the second group of substrates; and transferring each substrate of the less than all substrates of the second group of substrates to the batching station to form a third group of substrates.
    Type: Application
    Filed: October 16, 2007
    Publication date: April 16, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Russell Herbert Arndt, Michael Robert Biagetti, Robert J. MacHugh, Charles Jesse Taft
  • Patent number: 6953042
    Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.
    Type: Grant
    Filed: November 15, 2002
    Date of Patent: October 11, 2005
    Assignee: International Business Machines Corporation
    Inventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
  • Patent number: 6892741
    Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.
    Type: Grant
    Filed: January 21, 2004
    Date of Patent: May 17, 2005
    Assignee: International Business Machines Corporation
    Inventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
  • Publication number: 20040149317
    Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.
    Type: Application
    Filed: January 21, 2004
    Publication date: August 5, 2004
    Applicant: International Business Machines Corporation
    Inventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
  • Patent number: 6558475
    Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus includes means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media includes means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.
    Type: Grant
    Filed: April 10, 2000
    Date of Patent: May 6, 2003
    Assignee: International Business Machines Corporation
    Inventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
  • Publication number: 20030066544
    Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.
    Type: Application
    Filed: November 15, 2002
    Publication date: April 10, 2003
    Applicant: International Business Machines Corporation
    Inventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft