Patents by Inventor Charles Jesse Taft
Charles Jesse Taft has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9177822Abstract: An etching method. The method includes etching a first plurality of silicon wafers in a first enchant, each silicon wafer having SiO2 and Si3N4 deposited thereon, where the etching includes dissolving a quantity of the SiO2 and a quantity of the Si3N4 in the first etchant. A quantity of insoluble SiO2 precipitates. A ratio of a first etch rate of Si3N4 to a first etch rate of SiO2 is determined to be less than a predetermined threshold. A portion of the first etchant is combined with a second etchant to form a conditioned etchant. A second plurality of silicon wafers is etched in the conditioned etchant. A ratio of a second etch rate of Si3N4 to a second etch rate of SiO2 in the conditioned etchant is greater than the threshold. A method for exchanging an etching bath solution and a method for forming a selective etchant are also disclosed.Type: GrantFiled: September 14, 2012Date of Patent: November 3, 2015Assignee: GLOBALFOUNDRIES INC.Inventors: Russell Herbert Arndt, Paul F. Findeis, Charles Jesse Taft
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Publication number: 20130167883Abstract: The present disclosure relates to semiconductor device manufacturing and, more particularly, to removing a mask material, especially an ion implanted and patterned photo resist, using an aqueous cerium-containing solution. The present invention relates to a method and apparatus for cleaning the chemical materials utilized for cleaning semiconductor wafers. The invention utilizes a centrifugal filter to eliminate heavy materials from the cleaning solution.Type: ApplicationFiled: January 3, 2012Publication date: July 4, 2013Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: JOHN A. FITZSIMMONS, CHARLES JESSE TAFT, JENNIFER V. MUNCY
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Publication number: 20130011936Abstract: An etching method. The method includes etching a first plurality of silicon wafers in a first enchant, each silicon wafer having SiO2 and Si3N4 deposited thereon, where the etching includes dissolving a quantity of the SiO2 and a quantity of the Si3N4 in the first etchant. A quantity of insoluble SiO2 precipitates. A ratio of a first etch rate of Si3N4 to a first etch rate of SiO2 is determined to be less than a predetermined threshold. A portion of the first etchant is combined with a second etchant to form a conditioned etchant. A second plurality of silicon wafers is etched in the conditioned etchant. A ratio of a second etch rate of Si3N4 to a second etch rate of SiO2 in the conditioned etchant is greater than the threshold. A method for exchanging an etching bath solution and a method for forming a selective etchant are also disclosed.Type: ApplicationFiled: September 14, 2012Publication date: January 10, 2013Applicant: International Business Machines CorporationInventors: Russell Herbert Arndt, Paul F. Findeis, Charles Jesse Taft
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Patent number: 8298435Abstract: An etching method. The method includes etching a first plurality of silicon wafers in a first enchant, each silicon wafer having SiO2 and Si3N4 deposited thereon, where the etching includes dissolving a quantity of the SiO2 and a quantity of the Si3N4 in the first echant. A quantity of insoluble SiO2 precipitates. A ratio of a first etch rate of Si3N4 to a first etch rate of SiO2 is determined to be less than a predetermined threshold. A portion of the first etchant is combined with a second etchant to form a conditioned etchant. A second plurality of silicon wafers is etched in the conditioned etchant. A ratio of a second etch rate of Si3N4 to a second etch rate of SiO2 in the conditioned etchant is greater than the threshold. A method for exchanging an etching bath solution and a method for forming a selective etchant are also disclosed.Type: GrantFiled: October 19, 2007Date of Patent: October 30, 2012Assignee: International Business Machines CorporationInventors: Russell Herbert Arndt, Paul F. Findeis, Charles Jesse Taft
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Patent number: 7890202Abstract: A method of batching substrates in an automated processing tool, the automated process tool and a system for batching substrates in the automated process tool. The method includes selecting a first container containing a first group of substrates; simultaneously transferring each substrate of the first group of substrates into a batching station of the automated processing tool; selecting a second container containing a second group of substrates; selecting less than all substrates of the second group of substrates; and transferring each substrate of the less than all substrates of the second group of substrates to the batching station to form a third group of substrates.Type: GrantFiled: October 16, 2007Date of Patent: February 15, 2011Assignee: International Business Machines CorporationInventors: Russell Herbert Arndt, Michael Robert Biagetti, Robert J. MacHugh, Charles Jesse Taft
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Publication number: 20090101626Abstract: An etching method. The method includes etching a first plurality of silicon wafers in a first enchant, each silicon wafer having SiO2 and Si3N4 deposited thereon, where the etching includes dissolving a quantity of the SiO2 and a quantity of the Si3N4 in the first echant. A quantity of insoluble SiO2 precipitates. A ratio of a first etch rate of Si3N4 to a first etch rate of SiO2 is determined to be less than a predetermined threshold. A portion of the first etchant is combined with a second etchant to form a conditioned etchant. A second plurality of silicon wafers is etched in the conditioned etchant. A ratio of a second etch rate of Si3N4 to a second etch rate of SiO2 in the conditioned etchant is greater than the threshold. A method for exchanging an etching bath solution and a method for forming a selective etchant are also disclosed.Type: ApplicationFiled: October 19, 2007Publication date: April 23, 2009Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Russell Herbert Arndt, Paul F. Findeis, Charles Jesse Taft
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Publication number: 20090099681Abstract: A method of batching substrates in an automated processing tool, the automated process tool and a system for batching substrates in the automated process tool. The method includes selecting a first container containing a first group of substrates; simultaneously transferring each substrate of the first group of substrates into a batching station of the automated processing tool; selecting a second container containing a second group of substrates; selecting less than all substrates of the second group of substrates; and transferring each substrate of the less than all substrates of the second group of substrates to the batching station to form a third group of substrates.Type: ApplicationFiled: October 16, 2007Publication date: April 16, 2009Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Russell Herbert Arndt, Michael Robert Biagetti, Robert J. MacHugh, Charles Jesse Taft
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Patent number: 6953042Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.Type: GrantFiled: November 15, 2002Date of Patent: October 11, 2005Assignee: International Business Machines CorporationInventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
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Patent number: 6892741Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.Type: GrantFiled: January 21, 2004Date of Patent: May 17, 2005Assignee: International Business Machines CorporationInventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
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Publication number: 20040149317Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.Type: ApplicationFiled: January 21, 2004Publication date: August 5, 2004Applicant: International Business Machines CorporationInventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
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Patent number: 6558475Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus includes means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media includes means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.Type: GrantFiled: April 10, 2000Date of Patent: May 6, 2003Assignee: International Business Machines CorporationInventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
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Publication number: 20030066544Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.Type: ApplicationFiled: November 15, 2002Publication date: April 10, 2003Applicant: International Business Machines CorporationInventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft