Patents by Inventor Cheng-Sung Huang
Cheng-Sung Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11935871Abstract: A semiconductor package including a first semiconductor die, a second semiconductor die, a first insulating encapsulation, a dielectric layer structure, a conductor structure and a second insulating encapsulation is provided. The first semiconductor die includes a first semiconductor substrate and a through silicon via (TSV) extending from a first side to a second side of the semiconductor substrate. The second semiconductor die is disposed on the first side of the semiconductor substrate. The first insulating encapsulation on the second semiconductor die encapsulates the first semiconductor die. A terminal of the TSV is coplanar with a surface of the first insulating encapsulation. The dielectric layer structure covers the first semiconductor die and the first insulating encapsulation. The conductor structure extends through the dielectric layer structure and contacts with the through silicon via.Type: GrantFiled: August 30, 2021Date of Patent: March 19, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hao-Yi Tsai, Cheng-Chieh Hsieh, Tsung-Hsien Chiang, Hui-Chun Chiang, Tzu-Sung Huang, Ming-Hung Tseng, Kris Lipu Chuang, Chung-Ming Weng, Tsung-Yuan Yu, Tzuan-Horng Liu
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Patent number: 11718696Abstract: A process for making down a powder is provided. The process comprises making down a powder comprising one or more acrylamide-based polymer(s) to form a made down powder solution, comprising blending a mixture of the powder and a solvent for no more than about 15 minutes to yield the made down powder solution, wherein the powder comprises particles having been dry-cut to a median particle size of from about 200 microns to about 10,000 microns.Type: GrantFiled: July 31, 2018Date of Patent: August 8, 2023Assignee: ECOLAB USA INC.Inventors: Heqing Huang, Cheng Sung Huang, Weiguo Cheng
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Publication number: 20230021418Abstract: Systems and techniques can be used to invert an emulsion polymer under ultra-high shear. In some examples, a method for inverting an emulsion involves introducing the emulsion into a process liquid to form a dilute emulsion. The emulsion may be defined by a continuous phase and a discontinuous phase containing a polymer, with the polymer being soluble in the process liquid but the continuous phase being immiscible in the process liquid. A fluid pressurization device can pressurize the dilute emulsion to form a pressurized dilute emulsion. Thereafter, the pressurized dilute emulsion can be passed through a multi-channel flow restrictor, such as a capillary bundle, thereby generating a shear force for dispersing and inverting the emulsion in the process liquid.Type: ApplicationFiled: July 7, 2022Publication date: January 26, 2023Inventors: Kerry Charles Brinkman, Cheng-Sung Huang, Anoop Veedu Chengara
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Patent number: 11439962Abstract: A system for continuously making-down a dry powder material is provided. The system may include a liquid supply system, a material feed system, a vessel, a filter, and an agitator. The vessel may receive a continuous supply of liquid from the liquid supply system and a continuous supply of dry powder from the material feed system. The liquid and material may be discharged continuously from the vessel. A filter may sealingly extend across the outlet to filter the solution exiting the vessel. The filter may include an upstream surface in contact with the inner volume of the vessel. The agitator may be disposed within the vessel and may be configured to agitate the contents of the vessel. The agitator may include a wiping member configured to contact the upstream surface of the filter while agitating the contents.Type: GrantFiled: March 6, 2020Date of Patent: September 13, 2022Assignee: Ecolab USA Inc.Inventors: Cheng-Sung Huang, Shahin Zarghamin, Larry G. Triplett, Heqing Huang
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Publication number: 20200282367Abstract: A system for continuously making-down a dry powder material is provided. The system may include a liquid supply system, a material feed system, a vessel, a filter, and an agitator. The vessel may receive a continuous supply of liquid from the liquid supply system and a continuous supply of dry powder from the material feed system. The liquid and material may be discharged continuously from the vessel. A filter may sealingly extend across the outlet to filter the solution exiting the vessel. The filter may include an upstream surface in contact with the inner volume of the vessel. The agitator may be disposed within the vessel and may be configured to agitate the contents of the vessel. The agitator may include a wiping member configured to contact the upstream surface of the filter while agitating the contents.Type: ApplicationFiled: March 6, 2020Publication date: September 10, 2020Applicant: Ecolab USA Inc.Inventors: Cheng-Sung Huang, Shahin Zarghamin, Larry G. Triplett, Heqing Huang
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Publication number: 20200255569Abstract: A process for making down a powder is provided. The process comprises making down a powder comprising one or more acrylamide-based polymer(s) to form a made down powder solution, comprising blending a mixture of the powder and a solvent for no more than about 15 minutes to yield the made down powder solution, wherein the powder comprises particles having been dry-cut to a median particle size of from about 200 microns to about 10,000 microns.Type: ApplicationFiled: July 31, 2018Publication date: August 13, 2020Applicant: ECOLAB USA INC.Inventors: Heqing Huang, Cheng Sung Huang, Weiguo Cheng
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Patent number: 10549440Abstract: An apparatus for cutting polymer includes a rotor having a base with a first side and a second side opposite the first side. The rotor includes an outer annular wall extending from the first side and defining a number of slots, an inner annular wall defining a number of slots and extending from the first side and surrounded by, and spaced apart from, the outer annular wall. The rotor also includes blades extending from the first side and positioned within the inner annular wall. A circular-shaped stator also defines a number of slots. At least a portion of the stator is positioned in a space between the outer annular wall and the inner annular wall of the rotor.Type: GrantFiled: March 13, 2017Date of Patent: February 4, 2020Assignee: Ecolab USA Inc.Inventors: Richard Lee Binks, Zachary Wilson Logan, Cheng-Sung Huang, Camdon J. DePaolo
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Publication number: 20170259443Abstract: An apparatus for cutting polymer includes a rotor having a base with a first side and a second side opposite the first side. The rotor includes an outer annular wall extending from the first side and defining a number of slots, an inner annular wall defining a number of slots and extending from the first side and surrounded by, and spaced apart from, the outer annular wall. The rotor also includes blades extending from the first side and positioned within the inner annular wall. A circular-shaped stator also defines a number of slots. At least a portion of the stator is positioned in a space between the outer annular wall and the inner annular wall of the rotor.Type: ApplicationFiled: March 13, 2017Publication date: September 14, 2017Inventors: Richard Lee Binks, Zachary Wilson Logan, Cheng-Sung Huang, Camdon J. DePaolo
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Publication number: 20120228346Abstract: A handheld accessory for tablet computers is disclosed, which comprises: a retaining component, configured with an accommodation space, that is formed inside the retaining component, and at least two claws, that are to be used for fixedly holding on to the periphery of a tablet computer; a rotary component, disposed inside the accommodation space of the retaining component while allowing the same to rotation clockwisely and counterclockwisely inside the accommodation space; and two movable brackets, mounted on the rotary component by the use of a plurality of fixing elements while allowing the two movable brackets to sway in a vertical direction and in a horizontal direction on the rotary component.Type: ApplicationFiled: March 10, 2011Publication date: September 13, 2012Applicant: YU KUEN TECHNOLOGY LTD., CO.Inventor: Cheng-Sung Huang
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Patent number: 8247597Abstract: The invention provides a method of continuously producing high quality quaternized N,N-dialkylaminoethyl (meth)acrylates (DMAEA.MCQ) that has a long shelf life and which is stable in water. The method involves placing starting materials into a continuously stirred tank reactor in the presence of less than 6% water. This low amount of water causes two liquid phases to form and prevents unwanted side reactions. The denser liquid phase contains DMAEA.MCQ and the lighter phase contains the starting materials. Liquid from the denser phase is removed from a position where little of the lighter phase has been mixed in. The removed liquid then has any last traces of the starting materials reacted into DMAEA.MCQ and strips away any starting materials with a gas flow. The resulting liquid is high purity DMAEA.MCQ. Water can then safely be added to ease in the transport and use of the produced DMAEA.MCQ.Type: GrantFiled: January 21, 2010Date of Patent: August 21, 2012Assignee: Nalco CompanyInventors: Barbara E. Fair, Peter E. Reed, Leonard M. Ver Vers, Larry E. Brammer, Jr., Charles J. Holada, Cheng-Sung Huang, Kailas B. Sawant
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Publication number: 20110178327Abstract: The invention provides a method of continuously producing high quality quaternized N,N-dialkylaminoethyl (meth)acrylates (DMAEA.MCQ) that has a long shelf life and which is stable in water. The method involves placing starting materials into a continuously stirred tank reactor in the presence of less than 6% water. This low amount of water causes two liquid phases to form and prevents unwanted side reactions. The denser liquid phase contains DMAEA.MCQ and the lighter phase contains the starting materials. Liquid from the denser phase is removed from a position where little of the lighter phase has been mixed in. The removed liquid then has any last traces of the starting materials reacted into DMAEA.MCQ and strips away any starting materials with a gas flow. The resulting liquid is high purity DMAEA.MCQ. Water can then safely be added to ease in the transport and use of the produced DMAEA.MCQ.Type: ApplicationFiled: January 21, 2010Publication date: July 21, 2011Inventors: Barbara E. Fair, Peter E. Reed, Leonard M. Ver Vers, Larry E. Brammer, JR., Charles J. Holada, Cheng-Sung Huang, Kailas B. Sawant
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Publication number: 20100298594Abstract: A method and apparatus for preparing a N,N-dialkylaminoalkyl acrytate in a continuous transesterification reaction. The reaction involves adding alkyl acrylates such as methacrylate or ethacrylate to a reboiler mechanism and efficiently removing alcohol co-products. Because the reaction is continuous, the alkyl acrylates can be added as needed to increase output, decrease output, or fine-tune the reaction dynamics. An entrainer is used to form a volatile azeotrope which contains both alcohol and entrainer and which is easily removed from the reboiler mechanism. This method reduces the amount of entrainer needed per unit of alkyl acrylate used and eliminates any need to purify the end product from entrainer contamination of the resulting N,N-dialkylaminoalkyl acrylate product.Type: ApplicationFiled: May 19, 2009Publication date: November 25, 2010Inventors: Larry E. Brammer, JR., Barbara E. Fair, Cheng-Sung Huang, Linh Quach, Peter E. Reed, Leonard M. Ver Vers
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Patent number: 7829738Abstract: A method and apparatus for preparing a N,N-dialkylaminoalkyl acrylate in a continuous transesterification reaction. The reaction involves adding alkyl acrylates such as methacrylate or ethacrylate to a reboiler mechanism and efficiently removing alcohol co-products. Because the reaction is continuous, the alkyl acrylates can be added as needed to increase output, decrease output, or fine-tune the reaction dynamics. An entrainer is used to form a volatile azeotrope which contains both alcohol and entrainer and which is easily removed from the reboiler mechanism. This method reduces the amount of entrainer needed per unit of alkyl acrylate used and eliminates any need to purify the end product from entrainer contamination of the resulting N,N-dialkylaminoalkyl acrylate product.Type: GrantFiled: May 19, 2009Date of Patent: November 9, 2010Assignee: Nalco CompanyInventors: Larry E. Brammer, Jr., Barbara E. Fair, Cheng-Sung Huang, Linh Quach, Peter E. Reed, Leonard M. Ver Vers
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Publication number: 20030065041Abstract: A stable aquasol comprising colloidal silica having a surface area of from about 700 m2/g to about 1100 m2/g, and an S- value of from about 20 to about 50; wherein said colloidal silica is not surface treated; wherein the molar ratio of SiO2/Na2O in said colloidal silica is greater than about 13.0:1 and is less than about 17.0:1; and wherein said aquasols have a percent by weight SiO2 solids level of from about 7.00 percent to about 16.80 percent is described and claimed.Type: ApplicationFiled: September 23, 2002Publication date: April 3, 2003Inventors: Bruce A. Keiser, Maureen B. Nunn, Cheng-Sung Huang, Dennis L. MacDonald
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Patent number: 6486216Abstract: A stable aquasol containing colloidal silica having a surface area of from about 700 m2/g to about 1100 m2/g, and an S-value of from about 20 to about 50; wherein the colloidal silica is not surface treated; wherein the molar ratio of SiO2/Na2O in the colloidal silica is greater than about 13.0:1 and is less than about 17.0:1; and wherein the aquasols have a percent by weight SiO2 solids level of from about 7.00 percent to about 16.80 percent is described and claimed.Type: GrantFiled: June 27, 2000Date of Patent: November 26, 2002Assignee: Ondeo Nalco CompanyInventors: Bruce A. Keiser, Maureen B. Nunn, Cheng-Sung Huang, Dennis L. MacDonald
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Patent number: 6410428Abstract: A method of forming a non-oxidized WSix layer on a semiconductor wafer, including the following steps. A semiconductor wafer having a silicon substrate is provided within a CVD tool. A WSix layer is formed over the silicon substrate. An SiN layer is formed upon the WSix layer in absence of O2; whereby the WSix layer is non-oxidized.Type: GrantFiled: October 3, 2000Date of Patent: June 25, 2002Assignee: ProMos Technologies, Inc.Inventors: Wen-Hou Chiang, Cheng-Sung Huang
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Patent number: 6372089Abstract: Disclosed are stable, aqueous colloidal silicas having surface area of greater than 700 m2/g and S-values of from 20-50. These colloidal silicas do not require treatment with surface treatment agents such as aluminum to achieve stability. These colloidal silica aquasols can be produced and stored at concentrations of greater than 7 percent by weight SiO2 solids, and even as high as 15 percent by weight solids or higher, and remain stable at room temperature for at least 30 days compared to art-known silica aquasols. These colloidal silica sols demonstrate advantageously improved performance over art-known colloidal silica sols in applications such as in drainage and retention in papermaking processes. Also disclosed are processes for making aqueous colloidal silicas of the invention and the use of such colloidal silicas in papermaking processes.Type: GrantFiled: February 14, 2000Date of Patent: April 16, 2002Assignee: Nalco Chemical CompanyInventors: Bruce A. Keiser, Maureen B. Nunn, Cheng-Sung Huang, Dennis I. MacDonald
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Patent number: 6372806Abstract: Disclosed are stable, aqueous colloidal silicas having surface area of greater than 700 m2/g and S-values of from 20-50. These colloidal silicas do not require treatment with surface treatment agents such as aluminum to achieve stability. These colloidal silica aquasols can be produced and stored at concentrations of greater than 7 percent by weight SiO2 solids, and even as high as 15 percent by weight solids or higher, and remain stable at room temperature for at least 30 days compared to art-known silica aquasols. These colloidal silica sols demonstrate advantageously improved performance over art-known colloidal silica sots in applications such as in drainage and retention in papermaking processes. Also disclosed are processes for making aqueous colloidal silicas of the invention and the use of such colloidal silicas in papermaking processes.Type: GrantFiled: February 14, 2000Date of Patent: April 16, 2002Assignee: Nalco Chemical CompanyInventors: Bruce A. Keiser, Maureen B. Nunn, Cheng-Sung Huang, Dennis L. MacDonald
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Patent number: 6153116Abstract: A method of monitoring the state of chemical-mechanical polishing that can be applied to the polishing of a metallic layer over a substrate. The method includes performing a series of scanning operations while a wafer is being polished to generate multiple reflectance line spectra in each polishing period. The degree of dispersion of the reflectance spectra is then utilized as a polishing index. In this invention, the standard deviation of the reflectance spectra in each period is used as a monitoring index, and the peak value of the standard deviation is used to determine the polishing end point. Surface uniformity is monitored by using the time interval between two time nodes at half the peak standard deviation values. When the distance of separation between the two time nodes is large, it means that the polished surface is not sufficiently flat.Type: GrantFiled: October 30, 1998Date of Patent: November 28, 2000Assignee: United Microelectronics Corp.Inventors: Ming-Cheng Yang, Feng-Yeu Shau, Cheng-Sung Huang, Champion Yi
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Patent number: 6103839Abstract: A continuous free radical polymerization process for the preparation of water-soluble copolymers from water-soluble monomers for further processing to dry polymers is disclosed. The process allows efficient polymerization of the monomers in aqueous solution in the presence of a free radical catalyst through backmixing. Water-soluble polymers with molecular weights of from about 3,000-30,000,000 and preferably from about 500,000-10,000,000 are obtained utilizing this process.Type: GrantFiled: May 11, 1998Date of Patent: August 15, 2000Assignee: Nalco Chemical CompanyInventors: Mayur Patel, Cheng-Sung Huang, Robert W. Reese, Jr., Jeffrey R. Cramm, Paul J. Harris