Patents by Inventor Chi H. Ching

Chi H. Ching has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reactive cleaning of substrate support
    Patent number: 11772137
    Abstract: Methods of cleaning a substrate support comprise: introducing a cleaning gas into a processing chamber containing the substrate support; applying a radio frequency (RF) power to a remote plasma source that is in fluid communication with the processing chamber to establish a reactive etching plasma from the cleaning gas in the processing chamber; reacting deposits on the substrate support with the reactive etching plasma to form a by-products phase; and evacuating the by-products phase from the processing chamber.
    Type: Grant
    Filed: July 23, 2021
    Date of Patent: October 3, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Xi Chen, Shreesha Yogish Rao, Sheng Guo, Chi H. Ching, Thomas Blasius Brezoczky, Cheng-Hsiung Tsai
  • REACTIVE CLEANING OF SUBSTRATE SUPPORT
    Publication number: 20230029265
    Abstract: Methods of cleaning a substrate support comprise: introducing a cleaning gas into a processing chamber containing the substrate support; applying a radio frequency (RF) power to a remote plasma source that is in fluid communication with the processing chamber to establish a reactive etching plasma from the cleaning gas in the processing chamber; reacting deposits on the substrate support with the reactive etching plasma to form a by-products phase; and evacuating the by-products phase from the processing chamber.
    Type: Application
    Filed: July 23, 2021
    Publication date: January 26, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Xi Chen, Shreesha Yogish Rao, Sheng Guo, Chi H. Ching, Thomas Blasius Brezoczky, Cheng-Hsiung Tsai