Abstract: An intraocular pressure inspection device includes an intraocular pressure detection unit, a high-precision positioning system and a wide-area positioning system, wherein according to the position of the intraocular pressure detection unit, a set of high-precision coordinates output by the high-precision positioning system and a set of wide-area coordinates output by the wide-area positioning system are integrated in appropriate weights to obtain a set of more precise integrated coordinate. The above-mentioned intraocular pressure inspection device can prevent the intraocular pressure detection unit from failing to operate once it is not in the working area of the high-precision positioning system.

Abstract: A photolithography method includes dispensing a first liquid toward a target layer through a nozzle at a first distance from the target layer; moving the nozzle such that the nozzle is at a second distance from the target layer, wherein the second distance is different from the first distance; dispensing a second liquid toward the target layer through the nozzle at the second distance from the target layer; and patterning the target layer after dispensing the first liquid and the second liquid.

Abstract: A touchpad device includes a substrate and a touch panel. The substrate includes a main plate, a first limiting plate, and a first flexible member. The main plate has a long side and a short side. The first limiting plate has a first stopping portion, the first flexible member is integrally connected between the long side and the first limiting plate, and the first limiting plate is adjacent to the short side. The touch panel is disposed above the substrate. The touch panel has a bottom surface, a pivot side of the bottom surface is disposed on the main plate, the first limiting plate of the substrate is fixed on the bottom surface and adjacent to a first side of the bottom surface, and the first stopping portion of the first limiting plate protrudes from an edge portion of the first side.

Abstract: The present disclosure is a substrate-processing chamber with a shielding mechanism, which includes a reaction chamber, a substrate carrier, a storage chamber and a shielding mechanism. The reaction chamber is connected to the storage chamber, the substrate carrier is within the reaction chamber. The shielding mechanism includes at least one guide unit, at least one connecting seat, a shield and at least one drive arm. The drive arm is connected to the shield for driving the shield to move between the storage chamber and the reaction chamber. During a deposition process, the drive arm drives the shield to move into the storage space. During a cleaning process, the drive arm moves the shield to move into the reaction chamber for prevent pollution to the substrate carrier.

Abstract: The present disclosure is a substrate-processing chamber with a shielding mechanism with the same, which includes a reaction chamber, a substrate carrier, a storage chamber and a shielding mechanism. The reaction chamber is connected to the storage chamber, the substrate carrier is within the reaction chamber. The shielding mechanism includes at least one driving shaft, at least one connecting seat and a shield, wherein the driving shaft extends from the storage chamber to the reaction chamber. The connecting seat is connected to the shield and the driving shaft, wherein the driving shaft drives the shield to move between the storage chamber and the reaction chamber, via the connecting seat.

Abstract: The present disclosure provides a wafer-holding device, which mainly includes a wafer carrier, a first lid ring and a second lid ring, wherein the wafer carrier includes a carrying surface for carrying a wafer. The second lid ring is connected to the first-lid ring and placed on a radial-inner side of the first lid ring, wherein the first lid ring has a circumference larger than that of the second lid ring, for carrying the second lid ring. When the wafer carrier moves toward the first lid ring and the second lid ring, the second lid ring contacts the wafer on the wafer carrier, to fasten the wafer on the carrying surface of the wafer carrier, for performing a thin-film deposition to the wafer.

Abstract: A wafer fixing mechanism as disclosed includes a fixing ring, a plurality of fixing members and a plurality of elastic units, wherein each fixing member is respectively connected to the fixing ring through a connecting shaft. The fixing ring includes a containing area for containing a wafer, and the wafer in the containing area is fixed by the fixing members. The two ends of the elastic unit are respectively connected to the fixing ring and the fixing member. When the wafer pushes the fixing members, the fixing members will swing relative to the fixing ring to prevent the fixing members from damaging the wafer. In addition, when the fixing member swings relative to the fixing ring, the elastic unit is deformed, so that the restoring force of the elastic unit is applied to the wafer via the fixing member, thereby fixing the wafer on a support pedestal.

Abstract: One or more methods are described for extracting boron. The one or more methods include combining a combination comprising an alcohol, an organic solvent and boron, with an aqueous solution comprising an alkali hydroxide so as to form an organic layer and an aqueous layer. The aqueous layer may be separated from the organic layer.

Abstract: A keyboard device includes a substrate and keycaps disposed on the substrate. The substrate includes a long slit and an elastic bridge member. The long slit divides the substrate into a first plate having a first side edge and a second plate having a second side edge opposite to the first side edge. A gap is between the first side edge and the second side edge. The elastic bridge member is connected between the first side edge and the second side edge. The first plate is movable relative to the second plate. The first side edge includes a first bridge seat. The second side edge includes a second bridge seat. The elastic bridge member is connected between the first bridge seat and the second bridge seat. The elastic bridge member includes a wedge portion connected to an inner corner between the elastic bridge member and the first bridge seat.

Abstract: A keyboard device includes a substrate and keycaps disposed on the substrate. The substrate includes a long slit and an elastic bridge component. The long slit divides the substrate into a first plate having a first side edge and a second plate having a second side edge opposite to the first side edge. A gap is between the first side edge and the second side edge. The elastic bridge component is connected between the first side edge and the second side edge. The first plate is movable relative to the second plate. The first side edge includes two first bridge connections. The second side edge includes two second bridge connections. The elastic bridge component includes a first elastic bar connected between the first bridge connections, a second elastic bar connected between the second bridge connections, and a connecting member connected between the first elastic bar and the second elastic bar.

Abstract: A key structure includes a keycap, a guiding structure, a connection member and a base plate. The guiding structure is located below the keycap and includes at least one pivot shaft. The connection member includes a connection groove, and the at least one pivot shaft is connected to the connection groove. The base plate includes at least one fixing member. The connection member envelops the at least one fixing member such that the connection member is fixed to the base plate.

Abstract: A keyboard includes a substrate, a limit connecting member, a keycap, and a liftable connecting member. The assembly area of the substrate includes a through hole and a curved side wall standingly disposed on the substrate. The bottom edge of the curved side wall is adjacently connected to a periphery portion of the through hole. One side of the curved side wall facing the through hole includes a recessed groove. The limit connecting member is disposed on the assembly area and includes an inner fixing portion received in the through hole and an outer fixing portion enclosing the curved side wall and fixing with the inner fixing portion. The inner fixing portion has a protruding portion received in the recessed groove. The keycap is disposed on the assembly area. The liftable connecting member is connected between the keycap and the assembly area and is assembled with the limit connecting member.

Abstract: A key structure includes a keycap, a guiding structure, a connection member and a base plate. The guiding structure is located below the keycap and includes at least one pivot shaft. The connection member includes a connection groove, and the at least one pivot shaft is connected to the connection groove. The base plate includes at least one fixing member. The connection member envelops the at least one fixing member such that the connection member is fixed to the base plate.

Abstract: A keyboard device includes a substrate and keycaps disposed on the substrate. The substrate includes a long slit and an elastic bridge member. The long slit divides the substrate into a first plate having a first side edge and a second plate having a second side edge opposite to the first side edge. A gap is between the first side edge and the second side edge. The elastic bridge member is connected between the first side edge and the second side edge. The first plate is movable relative to the second plate. The first side edge includes a first bridge seat. The second side edge includes a second bridge seat. The elastic bridge member is connected between the first bridge seat and the second bridge seat. The elastic bridge member includes a wedge portion connected to an inner corner between the elastic bridge member and the first bridge seat.

Abstract: A keyboard device includes a substrate and keycaps disposed on the substrate. The substrate includes a long slit and an elastic bridge component. The long slit divides the substrate into a first plate having a first side edge and a second plate having a second side edge opposite to the first side edge. A gap is between the first side edge and the second side edge. The elastic bridge component is connected between the first side edge and the second side edge. The first plate is movable relative to the second plate. The first side edge includes two first bridge connections. The second side edge includes two second bridge connections. The elastic bridge component includes a first elastic bar connected between the first bridge connections, a second elastic bar connected between the second bridge connections, and a connecting member connected between the first elastic bar and the second elastic bar.

Abstract: A keyboard device includes a substrate and several keycaps disposed on the substrate. The substrate includes a long slit and an elastic bridge connecting member. The long slit divides the substrate into a first plate having a first side edge and a second plate having a second side edge opposite to the first side edge. A gap is between the first side edge and the second side edge. The elastic bridge connecting member is connected between the first side edge and the second side edge. The first plate is movable relative to the second plate. The first side edge includes a first stopping member, the second side edge includes a second stopping member, and a certain interval is between the first stopping member and the second stopping member.

Abstract: Producing high purity lithium solution from a lithium source containing dissolved Na+, Ca2+, and Mg2+, by: passing the source into and out of a bed of sorbent composed of hydrated alumina intercalated with LiX, preferably LiCl, to extract lithium from the lithium source into the sorbent; washing the bed of sorbent with dilute aqueous LiCl to remove lithium from the sorbent to obtain a lithium eluent of increased Li+ concentration; subjecting this eluent to nanofiltration to produce a lithium permeate from which Ca2+, Mg2+, and other nanofilterable components are concurrently removed, yielding a permeate solution with 25% or less, and a retentate solution with 75% or more Ca2+ and Mg2+, as compared to the eluent from washing; and subjecting the permeate solution to a particular forward osmosis yielding a solution having 13,000-25,000 ppm dissolved lithium. Specified optional steps and new features can be used to increase lithium concentrations and purity.

Abstract: A process for removing at least Ca2+ and Mg2+ from a lithium-containing brine. The process comprises (i) providing an aqueous lithium-containing brine feed comprising dissolved Ca2+ and Mg2+ impurities in a weight ratio of Li+:Ca2+ of about 4:1 to 50:1 wt/wt and in a weight ratio of Li+:Mg2+ of about 4:1 to 50:1; (ii) subjecting said brine feed to nanofiltration to produce a lithium-containing permeate from which Ca2+ and Mg2+ components are being removed concurrently; and (iii) conducting the nanofiltration so that a separation occurs and a retentate solution is formed with a total amount of Ca2+ and Mg2+ of at least 75% of the total amount of Ca2+ and Mg2+ in the original aqueous lithium-containing brine feed and forming an aqueous lithium-containing permeate solution in which the total content of dissolved Ca2+ and Mg2+ is decreased to 25% or less as compared to the original aqueous lithium-containing brine feed.

Abstract: Producing high purity lithium solution from a lithium source containing dissolved Na+, Ca2+, and Mg2+, by: passing the source into and out of a bed of sorbent composed of hydrated alumina intercalated with LiX, preferably LiCl, to extract lithium from the lithium source into the sorbent; washing the bed of sorbent with dilute aqueous LiCl to remove lithium from the sorbent to obtain a lithium eluent of increased Li+ concentration; subjecting this eluent to nanofiltration to produce a lithium permeate from which Ca2+, Mg2+, and other nanofilterable components are concurrently removed, yielding a permeate solution with 25% or less, and a retentate solution with 75% or more Ca2+ and Mg2+, as compared to the eluent from washing; and subjecting the permeate solution to a particular forward osmosis yielding a solution having 13,000-25,000 ppm dissolved lithium. Specified optional steps and new features can be used to increase lithium concentrations and purity.

Abstract: A forward osmosis process for concentration of lithium-containing salt solutions is described. A difference in osmotic pressure between a lithium-containing salt solution and a second salt solution of higher osmotic pressure is used as a driving force to pass water through a semi-permeable forward osmosis membrane from said lithium-containing salt solution of lower osmotic pressure to the salt solution of higher osmotic pressure. Also, a two-part operation is described wherein reverse osmosis process technology and forward osmosis process technology are used in tandem to concentrate lithium-containing salt solutions and to recover water that can be recycled to the process. The forward osmosis process is conducted without requiring (i) use of superatmospheric pressure or (ii) use of subatmospheric pressure or (iii) use of both such pressures, or (iv) use of one or more additives to assist in causing the flow of water through a forward osmosis membrane.