Patents by Inventor Chia-Cheng Chang

Chia-Cheng Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150082265
    Abstract: One embodiment relates to a method of achieving an circuit dimension which is greater than a size of an exposure field of an illumination tool. A first area of a first reticle field and a second area of a second reticle field are defined. An extension zone is created as a region outside the first area, and includes a first layout shape formed on a first design level. A corresponding forbidden zone is created for the second reticle field as a region inside the second area where no layout shape on the first design level is permitted. A second layout shape is formed on a second design level within the forbidden zone. The first and second areas are then abutted. Upon abutment of the first and second areas, the second layout shape overlaps the first layout shape to form a connection between circuitry of the first and second reticle fields.
    Type: Application
    Filed: September 18, 2013
    Publication date: March 19, 2015
    Inventors: Chin-Min Huang, Chia-Cheng Chang, Cherng-Shyan Tsay, Chien-Wen Lai, Kong-Beng Thei, Hua-Tai Lin, Hung-Chang Hsieh
  • Patent number: 8972912
    Abstract: One embodiment relates to a method of achieving an circuit dimension which is greater than a size of an exposure field of an illumination tool. A first area of a first reticle field and a second area of a second reticle field are defined. An extension zone is created as a region outside the first area, and includes a first layout shape formed on a first design level. A corresponding forbidden zone is created for the second reticle field as a region inside the second area where no layout shape on the first design level is permitted. A second layout shape is formed on a second design level within the forbidden zone. The first and second areas are then abutted. Upon abutment of the first and second areas, the second layout shape overlaps the first layout shape to form a connection between circuitry of the first and second reticle fields.
    Type: Grant
    Filed: September 18, 2013
    Date of Patent: March 3, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chin-Min Huang, Chia-Cheng Chang, Cherng-Shyan Tsay, Chien-Wen Lai, Kong-Beng Thei, Hua-Tai Lin, Hung-Chang Hsieh
  • Patent number: 8972909
    Abstract: The present disclosure relates to a method of performing an optical proximity correction (OPC) procedure that provides for a high degree of freedom by using an approximation design layer. In some embodiments, the method is performed by forming an integrated chip (IC) design having an original design layer with one or more original design shapes. An approximation design layer, which is different from the original design layer, is generated from the original design layer. The approximation design layer is a design layer that has been adjusted to remove features that may cause optical proximity correction (OPC) problems. An optical proximity correction (OPC) procedure is then performed on the approximation design layer. By performing the OPC procedure on the approximation design layer rather than on the original design layer, characteristics of the OPC procedure can be improved.
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: March 3, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chia-Cheng Chang, Jau-Shian Liang, Wen-Chen Lu, Chin-Min Huang, Ming-Hui Chih, Cherng-Shyan Tsay, Chien-Wen Lai, Hua-Tai Lin
  • Patent number: 8952329
    Abstract: A method for characterizing a three-dimensional surface profile of a semiconductor workpiece is provided. In this method, the three-dimensional surface profile is imaged from a normal angle to measure widths of various surfaces in a first image. The three-dimensional surface is also imaged from a first oblique angle to re-measure the widths of the various surfaces in a second image. Based on differences in widths of corresponding surfaces for first and second images, a feature height and sidewall angle are determined for the three-dimensional profile.
    Type: Grant
    Filed: October 3, 2013
    Date of Patent: February 10, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: I-Chang Shih, Yi-Jie Chen, Chia-Cheng Chang, Feng-Yuan Chiu, Ying-Chou Cheng, Chiu Hsiu Chen, Bing-Syun Yeh, Ru-Gun Liu
  • Publication number: 20150040081
    Abstract: Provided is an integrated circuit (IC) design method. The method includes receiving a design layout of the IC, the design layout having a first main feature, and adding a negative assist feature to the design layout, wherein the negative assist feature has a first width, the negative assist feature divides the first main feature into a second main feature and a third main feature by the first width, and the first width is sub-resolution in a photolithography process.
    Type: Application
    Filed: August 1, 2013
    Publication date: February 5, 2015
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chin-Min Huang, Bo-Han Chen, Lun-Wen Yeh, Shun-Shing Yang, Chia-Cheng Chang, Chern-Shyan Tsay, Chien Wen Lai, Hua-Tai Lin
  • Publication number: 20150017571
    Abstract: Provided is an integrated circuit (IC) photo mask. The IC photo mask includes a main feature of the IC, the main feature having a plurality of sides, and a plurality of assist features, the assist features being spaced from each other and spaced from the main feature, wherein each one of the assist features is adjacent to one of the sides, each one of the assist features has an elongated shape along a direction, whereby extending the shape in the direction would intersect at least another one of the assist features and the assist features are sub-resolution correction features for correcting for optical proximity effect in a photolithography process.
    Type: Application
    Filed: July 12, 2013
    Publication date: January 15, 2015
    Inventors: Chia-Cheng CHANG, Wei-Kuan Yu, Yen-Hsu Chu, Tsai-Ming Huang, Chin-Min Huang, Cherng-Shyan Tsay, Chien Wen Lai, Hua-Tai Lin
  • Patent number: 8895674
    Abstract: A method disclosed for making a side-chain dendrimer vesicle. The method includes the steps of: At first, there is provided a random copolymer with a narrow distribution of molecular weights by active polymerization and chemical modification. Then, chemical modification is executed to graft various generations of dendrimers to the random copolymer to provide a side-chain dendritic random copolymer with various generations. Two steps of emulsification are taken to induce macromolecular self-assembling of the side-chain dendritic random copolymer solution to form the macromolecular vesicle. The side-chain dendrimer includes C10˜C18 hydrophobic alkyl chains.
    Type: Grant
    Filed: January 23, 2014
    Date of Patent: November 25, 2014
    Assignee: Chung-Shan Institute of Science and Technology, Armaments, Bureau, Ministry of National Defense
    Inventors: Wen-Chiung Su, Wei-Ho Ting, Mao-Syong Lin, Chia-Cheng Chang, Hsin-Cheng Chiu, Sheng-hong Dai, Ru-Jong Jeng
  • Publication number: 20140135451
    Abstract: A method disclosed for making a side-chain dendrimer vesicle. The method includes the steps of: At first, there is provided a random copolymer with a narrow distribution of molecular weights by active polymerization and chemical modification. Then, chemical modification is executed to graft various generations of dendrimers to the random copolymer to provide a side-chain dendritic random copolymer with various generations. Two steps of emulsification are taken to induce macromolecular self-assembling of the side-chain dendritic random copolymer solution to form the macromolecular vesicle. The side-chain dendrimer includes C10˜C18 hydrophobic alkyl chains.
    Type: Application
    Filed: January 23, 2014
    Publication date: May 15, 2014
    Applicant: Chung-Shan Institute of Science and Technology, Armaments, Bureau, Ministry of National Defense
    Inventors: Wen-Chiung Su, Wei-Ho Ting, Mao-Syong Lin, Chia-Cheng Chang, Hsin-Cheng Chiu, Sheng-hong Dai, Ru-Jong Jeng
  • Patent number: 8589830
    Abstract: Provided is an integrated circuit (IC) design method. The method includes receiving an IC design layout having a feature with an outer boundary, performing a dissection on the feature to divide the outer boundary into a plurality of segments, and performing, using the segments, an optical proximity correction (OPC) on the feature to generate a modified outer boundary. The method also includes simulating a photolithography exposure of the feature with the modified outer boundary to create a contour and performing an OPC evaluation to determine if the contour is within a threshold. Additionally, the method includes repeating the performing a dissection, the performing an optical proximity correction, and the simulating if the contour does not meet the threshold, wherein each repeated dissection and each repeated optical proximity correction is performed on the modified outer boundary generated by the previously performed optical proximity correction.
    Type: Grant
    Filed: March 7, 2012
    Date of Patent: November 19, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Cheng Chang, Chin-Min Huang, Wei-Kuan Yu, Cherng-Shyan Tsay, Lai Chien Wen, Hua-Tai Lin
  • Publication number: 20130239071
    Abstract: Provided is an integrated circuit (IC) design method. The method includes receiving an IC design layout having a feature with an outer boundary, performing a dissection on the feature to divide the outer boundary into a plurality of segments, and performing, using the segments, an optical proximity correction (OPC) on the feature to generate a modified outer boundary. The method also includes simulating a photolithography exposure of the feature with the modified outer boundary to create a contour and performing an OPC evaluation to determine if the contour is within a threshold. Additionally, the method includes repeating the performing a dissection, the performing an optical proximity correction, and the simulating if the contour does not meet the threshold, wherein each repeated dissection and each repeated optical proximity correction is performed on the modified outer boundary generated by the previously performed optical proximity correction.
    Type: Application
    Filed: March 7, 2012
    Publication date: September 12, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chia-Cheng Chang, Chin-Min Huang, Wei-Kuan Yu, Cherng-Shyan Tsay, Lai Chien Wen, Hua-Tai Lin
  • Publication number: 20120174792
    Abstract: A portable air treatment apparatus includes a housing formed with an air intake, a cool air vent, a warm air vent, and a compartment. The compartment is separated into a temperature modification chamber and a containment chamber for containing ionized water. The portable air treatment apparatus further includes a temperature modification device for heating and cooling that is disposed in the temperature modification chamber, and that includes a cool air duct in fluid communication with the cool air vent, and a warm air duct in fluid communication with the warm air vent. The portable air treatment apparatus also includes an anion generator that includes a fogger disposed in the containment chamber. The anion generator further includes a venting pipe in fluid communication with the cool air duct and the warm air duct.
    Type: Application
    Filed: January 7, 2011
    Publication date: July 12, 2012
    Inventor: Chia-Cheng Chang
  • Patent number: 8186851
    Abstract: A full angle LED (light-emitting diode) illumination device comprises at least three copper base plates, a plurality of LED chips, and a flexible circuit layer. Each copper base plate is electroplated with a layer of silver thereon and the copper base plates are arranged in a crisscross pattern to form the backbone of a three-dimensional globe. Each LED chip is provided on the external surface of the three-dimensional globe at a site where any two copper base plates are crisscrossed. The flexible circuit layer is provided on the peripheries of the copper base plates and electrically connected with the LED chips for controlling the LED chips. Accordingly, it is able to provide full angle illumination range and to improve the thermal conductivity and heat dissipation capability in order to prolong effectively the lifetime of the LED chips in use.
    Type: Grant
    Filed: December 1, 2009
    Date of Patent: May 29, 2012
    Inventors: Chia-Cheng Chang, Rong-Ming Chang
  • Publication number: 20120130022
    Abstract: A method for making a side-chain dendrimer vesicle includes the following steps. At first, there is provided a random copolymer with a narrow distribution of molecular weights by active polymerization and chemical modification. Then, chemical modification is executed to graft various generations of dendrimers to the random copolymer to provide a side-chain dendritic random copolymer with various generations. Two steps of emulsification are taken to induce macromolecular self-assembling of the side-chain dendritic random copolymer solution to form the macromolecular vesicle. The side-chain dendrimer includes C10˜C18 hydrophobic alkyl chains.
    Type: Application
    Filed: May 7, 2011
    Publication date: May 24, 2012
    Inventors: Wen-Chiung Su, Wei-Ho Ting, Mao-Syong Lin, Chia-Cheng Chang, Hsin-Cheng Chiu, Sheng-hong Dai, Ru-Jong Jeng
  • Patent number: 8173760
    Abstract: Methods for producing dendrons of different generations with hydrophobic functional end-groups, and for producing polyurethanes with the side-chain dendrons are disclosed step-by-step. The dendron with hydrophobic functional end-groups in the polyurethane systems, and the honeycomb-like structure thin films are obtained by a breath-figure process. The structures of dendrons and dendritic side-chain polyurethanes are respectively expressed in the following and the end-groups (R) of the dendron are long alkyl chains or perfluoroalkyl derivatives.
    Type: Grant
    Filed: February 28, 2010
    Date of Patent: May 8, 2012
    Assignee: Chung-Shan Institute of Science and Technology, Armaments Bureau, Ministry of National Defense
    Inventors: Wen-Chiung Su, Wei-Ho Ting, Chun-Ming Yeh, Chia-Cheng Chang, Sheng-Hong Dai, Ru-Jong Jeng
  • Publication number: 20120020010
    Abstract: A notebook computer housing structure is described. The notebook computer housing structure includes a body, which is made of one of plastic, aluminum, and an aluminum magnesium alloy. A circuit board installed with electronic elements such as a CPU and an interface card is placed inside the body. The improvement lies in that a plurality of holes is disposed on the body to form a convection effect inside the body after cold air enters the body through the holes.
    Type: Application
    Filed: July 22, 2010
    Publication date: January 26, 2012
    Inventor: Chia-Cheng CHANG
  • Publication number: 20110213114
    Abstract: A dendron with hydrophobic functional of end group, a polyurethane with the dendron, and producing methods thereof are disclosed. The dendron with hydrophobic functional of end group in the polyurethane systems, and the honeycomb-like structure thin films were obtained by a breath-figure process. The structures of dendron and dendritic side-chain polyurethanes are respectively expressed in the following. Therein, the end-groups (R) of the dendron are long alkyl chains or perfluoroalkyl derivatives.
    Type: Application
    Filed: February 28, 2010
    Publication date: September 1, 2011
    Inventors: WEN-CHIUNG SU, Wei-Ho Ting, Chun-Ming Yeh, Chia-Cheng Chang, Sheng-Hong Dai, Ru-Jong Jeng
  • Publication number: 20110128735
    Abstract: A full angle LED (light-emitting diode) illumination device comprises at least three copper base plates, a plurality of LED chips, and a flexible circuit layer. Each copper base plate is electroplated with a layer of silver thereon and the copper base plates are arranged in a crisscross pattern to form the backbone of a three-dimensional globe. Each LED chip is provided on the external surface of the three-dimensional globe at a site where any two copper base plates are crisscrossed. The flexible circuit layer is provided on the peripheries of the copper base plates and electrically connected with the LED chips for controlling the LED chips. Accordingly, it is able to provide full angle illumination range and to improve the thermal conductivity and heat dissipation capability in order to prolong effectively the lifetime of the LED chips in use.
    Type: Application
    Filed: December 1, 2009
    Publication date: June 2, 2011
    Inventors: Chia-Cheng CHANG, Rong-Ming CHANG
  • Publication number: 20110108261
    Abstract: A three-layered cold/hot controller comprises a semiconductor plate, a first metal plate, and a second metal plate. The semiconductor plate has a top and a bottom contact surface and connected with a power source. When the semiconductor plate is electrified, the top contact surface of the semiconductor plate forms a contact surface for decreasing temperature while the bottom contact surface of the semiconductor plate forms a contact surface for elevating temperature. The first metal plate is combined to the top contact surface of the semiconductor plate for conducting the heat between the first metal plate and the top contact surface. The second metal plate is combined to the bottom contact surface of the semiconductor plate for conducting the heat between the second metal plate and the bottom contact surface.
    Type: Application
    Filed: November 9, 2009
    Publication date: May 12, 2011
    Inventors: Chia-Cheng Chang, Rong-Ming Chang
  • Publication number: 20110110089
    Abstract: A 360-degree angle LED (light-emitting diode) illumination device comprises a copper base plate, a plurality of LED chips, and a flexible PCB circuit layer. The copper base plate is electroplated with a layer of silver thereon. The plurality of LED chips is provided on the peripheries of the copper base plate. The flexible PCB circuit layer is provided on the peripheries of the copper base plate and electrically connected with the LED chips for controlling the LED chips. Accordingly, it is able to provide 360-degree angle illumination range and to improve the thermal conductivity and heat dissipation capability in order to prolong effectively the lifetime of the LED chips in use.
    Type: Application
    Filed: November 9, 2009
    Publication date: May 12, 2011
    Inventors: Chia-Cheng CHANG, Rong-Ming CHANG
  • Publication number: 20100302788
    Abstract: An LED lamp-set includes a lamp, which is a round-shape cap and an interior of which contains an LED holding slot to emplace an LED. A bottom of the lamp is connected and fixed with a lamp holder which can be made by a metallic material to dissipate heat generated by the LED. The lamp holder is provided with locking holes to lock the lamp and the LED on the lamp holder through locking elements. An outer rim of the lamp holder can be provided with lamp holder fixing holes to fix the lamp-set in a usage condition. A top end or an outer rim of the lamp can be provided additionally with a lamp shade to further improve versatility of application.
    Type: Application
    Filed: May 28, 2009
    Publication date: December 2, 2010
    Inventor: Chia-Cheng CHANG