Abstract: A semiconductor memory device includes first and second memory units, and first and second staircase vias. The first memory unit includes two first source/bit line portions separated from each other, a first word line surrounding the first source/bit line portions, a first memory film surrounding the first word line, and a first channel region between the first memory film and the first source/bit line portions. The second memory unit is disposed over the first memory unit, and includes two second source/bit line portions separated from each other, a second word line surrounding the second source/bit line portions, a second memory film surrounding the second word line, and a second channel region between the second memory film and the second source/bit line portions. The first and second staircase vias respectively penetrate the first and second memory films, and are respectively and electrically connected to the first and second word lines.

Abstract: A method of operating a memory circuit includes turning on a first programming device and turning on a first selection device thereby causing a first current to flow through a first fuse element. The first fuse element is coupled between the first selection device and the first programming device. The method further includes turning off a second programming device and turning off a second selection device, and blocking the first current from flowing through a second fuse element that is coupled between the second selection device and the first programming device.

Abstract: A method for operating a memory device is provided. A first address is decoded to select a bit line of a memory device. A second address is decoded to select a word line of the memory device. A word line voltage is applied to the selected word line. A bit line voltage is applied to the selected bit line. A first bias voltage is applied to each of a plurality of unselected word lines connected to a plurality of memory cells connected to the selected bit line san a memory cell connected to both the selected bit line and the selected word line.

Abstract: A method of making a semiconductor die includes forming, over a substrate, a stack including insulating layers and sacrificial layers alternatively on top of each other; replacing a portion of first sacrificial layers located in a first portion of the stack to form first gate layers; forming first channel layers extending in a first direction in the first portion; forming first memory layers extending in the first direction in the first portion; replacing a portion of second sacrificial layers located in a second portion of the stack to form second gate layers; forming second channel layers extending in the first direction in the second portion; and forming second memory layers extending in the first direction in the second portion.

Abstract: A device includes a memory cell that randomly presents either a first logic state or a second logic state. The memory cell includes: a plurality of first nanostructures extending along a first lateral direction; a plurality of second nanostructures extending along the first lateral direction and disposed at a first side of the plurality of first nanostructures; a plurality of third nanostructures extending along the first lateral direction and disposed at a second side of the plurality of first nanostructures; a dielectric fin structure disposed immediately next to the plurality of first nanostructures along a second lateral direction, wherein a first sidewall of each of the plurality of first nanostructures facing toward or away from the second lateral direction is in contact with the dielectric fin structure; and a first gate structure wrapping around each of the plurality of first nanostructures except for the first sidewall.

Abstract: A memory circuit includes a substrate with a front side and a back side opposite the front side. An interconnect structure is situated on or over the substrate and has first and second metal layers and a via electrically connecting the first and second metal layers. A word line driver circuit is configured to output a word line enable signal to a word line of a memory array. The word line driver circuit has an inverter circuit configured to receive a word line signal, and an enable transistor electrically connected to an output of the inverter circuit by a metal line that includes the first metal layer, the second metal layer, and the via.

Abstract: A system includes a high bandwidth memory (HBM) arranged into portions including memory cells, the HBM further including a differentiated dynamic voltage and frequency scaling (DDVFS) device to perform the following: for a first set of one or more of the memory cells in a first one of the portions, the first set including a first one of the memory cells, controlling a temperature of the first set based on one or more first environmental signals corresponding to at least a first transistor in the first memory cell; and for a second set of one or more of the memory cells in a second one of the portions, the second set including a second one of memory cells, controlling a temperature of the second set based on one or more second environmental signals corresponding to at least a second transistor in the second memory cell.

Abstract: A memory device comprises a memory array, a plurality of access word lines, and a first tracking word line. The memory array may include a plurality of bit cells arranged over a plurality of rows and a plurality of columns. The plurality of access word lines may extend along a lateral direction. The plurality of rows may operatively correspond to the plurality of access word lines, respectively. The first tracking word line may also extend along the lateral direction and have a first portion extending from an edge of the memory array to a middle of the memory array and a second portion extending from the middle of the memory array to the edge of the memory array. The first combination can be different from the second combination.

Abstract: A memory device including a substrate, a sense amplifier that includes first gate-all-around transistors that have first drain/source regions that extend into the substrate, and bit cells that include fuse memory elements and second gate-all-around transistors. Each of the bit cells includes a fuse memory element having a first terminal connected to an input of the sense amplifier and a second terminal connected to a second gate-all-around transistor that includes second drain/source regions and a bottom dielectric isolation layer under the second drain/source regions.

Abstract: A multi-fuse memory cell is disclosed. The circuit includes: a first fuse element electrically coupled to a first transistor, a gate of the first transistor is electrically coupled to a first selection signal; a second fuse element electrically coupled to a second transistor, a gate of the second transistor is electrically coupled to a second selection signal, both the first transistor and the second transistor are grounded; and a programming transistor electrically coupled to the first fuse element and the second fuse element, wherein a gate of the programming transistor is electrically coupled to a programming signal.

Abstract: A memory cell is disclosed. The memory cell includes a first transistor. The first transistor includes a first conduction channel collectively constituted by one or more first nanostructures spaced apart from one another along a vertical direction. The memory cell includes a second transistor electrically coupled to the first transistor in series. The second transistor includes a second conduction channel collectively constituted by one or more second nanostructures spaced apart from one another along the vertical direction. At least one of the one or more first nanostructures is applied with first stress by a first metal structure extending, along the vertical direction, into a first drain/source region of the first transistor.

Abstract: A memory circuit includes a first memory cell on a first layer, a second memory cell on a second layer different from the first layer, a first select transistor on a third layer different from the first layer and the second layer, and a first bit line extending in a first direction, and being coupled to the first memory cell and the second memory cell. The memory circuit further includes a first source line extending in the first direction, being coupled to the first memory cell, the second memory cell and the first select transistor, and being separated from the first bit line in a second direction different from the first direction. memory circuit includes a second source line extending in the first direction, and being coupled to the first select transistor.

Abstract: A memory device includes a substrate; a plurality of metallization layers disposed over the substrate; a plurality of memory cells, each of the plurality of memory cells including a transistor and a capacitor; and a bit line coupled to a corresponding set of the plurality of memory cells. The bit line comprises at least a first conductor structure and a second conductor structure that extend along a first lateral direction and are disposed in a first one of the plurality of metallization layers. The first conductor structure and the second conductor structure are physically spaced from each other, but are electrically coupled to each other through conductor structures disposed in one or more of the plurality of metallization layers.

Abstract: A memory device includes an array having a plurality of one-time-programmable (OTP) memory cells formed over a side of a substrate, a plurality of word lines (WLs), a plurality of bit lines (BLs), and a plurality of control gate (CG) lines. Each of the OTP memory cells includes a first fuse resistor, a second fuse resistor, a first transistor, and a second transistor. The first and the second fuse resistors are connected to a corresponding one of the BLs, while the first and the second transistors are respectively gated by a first one and a second one of the CG lines. The first transistor, the second transistor, the first fuse resistor, and the second fuse resistor are respectively formed in a first one, a second one, a third one, and a fourth one of a plurality of metallization layers disposed on the side of the substrate.

Abstract: A semiconductor device includes a substrate including, in a first area, a first semiconductor channel coupled to a portion of a first memory layer, and first, second, and third conductive structures. The first and third conductive structures are coupled to end portions of a sidewall of the first semiconductor channel, with the second conductive structure coupled to a middle portion of the sidewall. The semiconductor device includes, in a second area, a second semiconductor channel coupled to a first portion of a second memory layer, and fourth and fifth conductive structures. The fourth and fifth conductive structures are coupled to end portions of a sidewall of the second semiconductor channel, with no vertically extending conductive structure interposed between the fourth and fifth conductive structures.

Abstract: A memory device is provided. The memory device includes a plurality of memory cells arranged in a matrix of a plurality of rows and a plurality of columns. A first column of the plurality of columns of the matrix includes a first plurality of memory cells of the plurality of memory cells, a first pair of bit lines connected to each of the first plurality of bit cells, and a second pair of bit lines connectable to the first pair of bit lines through a plurality of switches.

Abstract: A semiconductor memory device includes pairs of metal lines and memory arrays. Each of the memory arrays includes first and second sets of thin film transistors (TFTs), a first switch transistor, and a second switch transistor. The TFTs in the first and second sets are electrically connected to each other in parallel. The first switch transistor is electrically connected in series to one of the TFTs in the first set and one of the metal lines in a corresponding one of the pairs of the metal lines. The second switch transistor is electrically connected in series to one of the TFTs in the second set and the other one of the metal lines in the corresponding one of the pairs of the metal lines.

Abstract: A memory device is disclosed. The memory device includes a plurality of memory cells, each of the memory cells including an access transistor and a resistor coupled to each other in series. The resistors of the memory cells are each formed as one of a plurality of interconnect structures disposed over a substrate. The access transistors of the memory cells are disposed opposite a first metallization layer containing the plurality of interconnect structures from the substrate.

Abstract: A memory device includes a first layer, wherein the first layer includes a first memory array, a first row decoder circuit, and a first column sensing circuit. The memory device includes a second layer disposed with respect to the first layer in a vertical direction. The second layer includes a first peripheral circuit operatively coupled to the first memory array, the first row decoder circuit, and the first column sensing circuit. The memory device includes a plurality of interconnect structures extending along the vertical direction. At least a first one of the plurality of interconnect structures operatively couples the second layer to the first layer.

Abstract: An integrated circuit includes a sense amplifier connected to a bit line and a bit line bar, a first memory cell configured to store a data signal and selectively output the data signal on at least one of the bit line and the bit line bar in response to a word line signal, a first circuit connected between a first voltage terminal configured to receive a first external voltage and the bit line and having a first enable terminal configured to receive a first enable signal, wherein the first external voltage is different than the data signal, and a second circuit connected between a second voltage terminal configured to receive a second external voltage and the bit line bar and having a second enable terminal configured to receive a second enable signal, wherein the second external voltage is different than the data signal and the first external voltage.