Patents by Inventor Chien-Nan Hsiao

Chien-Nan Hsiao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9901917
    Abstract: The present invention provides methods and designs of enclosed-channel reactor system for manufacturing catalysts or supports. Both of the configuration designs force the gaseous precursors and purge gas flow through the channel surface of reactor. The precursors will transform to thin film or particle catalysts or supports under adequate reaction temperature, working pressure and gas concentration. The reactor body is either sealed or enclosed for isolation from atmosphere. Another method using super ALD cycles is also proposed to grow alloy catalysts or supports with controllable concentration. The catalysts prepared by the method and system in the present invention are noble metals, such as platinum, palladium, rhodium, ruthenium, iridium and osmium, or transition metals such as iron, silver, cobalt, nickel and tin, while supports are silicon oxide, aluminum oxide, zirconium oxide, cerium oxide or magnesium oxide, or refractory metals, which can be chromium, molybdenum, tungsten or tantalum.
    Type: Grant
    Filed: May 17, 2016
    Date of Patent: February 27, 2018
    Assignee: NATIONAL APPLIED RESEARCH LABORATORIES
    Inventors: Chi-Chung Kei, Bo-Heng Liu, Chien-Pao Lin, Chien-Nan Hsiao, Yang-Chih Hsueh, Tsong-Pyng Perng
  • Patent number: 9861975
    Abstract: A visible light response photocatalyst structure and a process for manufacturing the same are disclosed, where the structure is manufactured by the GRR for two times, so that the structure has a large surface area, high surface activity, being apt to get integrated with a silicon substrate and endurable to the environment, and further has the rapid and simple manufacturing characteristics without any additional energy required and has a high reproductively.
    Type: Grant
    Filed: December 3, 2014
    Date of Patent: January 9, 2018
    Assignee: NATIONAL APPLIED RESEARCH LABORATORIES
    Inventors: Chun-Ting Lin, Ming-Hua Shiao, Mao-Nan Chang, Nien-Nan Chu, Chien-Nan Hsiao, Fan-Gang Tseng
  • Publication number: 20160256863
    Abstract: The present invention provides methods and designs of enclosed-channel reactor system for manufacturing catalysts or supports. Both of the configuration designs force the gaseous precursors and purge gas flow through the channel surface of reactor. The precursors will transform to thin film or particle catalysts or supports under adequate reaction temperature, working pressure and gas concentration. The reactor body is either sealed or enclosed for isolation from atmosphere. Another method using super ALD cycles is also proposed to grow alloy catalysts or supports with controllable concentration. The catalysts prepared by the method and system in the present invention are noble metals, such as platinum, palladium, rhodium, ruthenium, iridium and osmium, or transition metals such as iron, silver, cobalt, nickel and tin, while supports are silicon oxide, aluminum oxide, zirconium oxide, cerium oxide or magnesium oxide, or refractory metals, which can be chromium, molybdenum, tungsten or tantalum.
    Type: Application
    Filed: May 17, 2016
    Publication date: September 8, 2016
    Inventors: Chi-Chung Kei, Bo-Heng Liu, Chien-Pao Lin, Chien-Nan Hsiao, Yang-Chih Hsueh, Tsong-Pyng Perng
  • Patent number: 9404181
    Abstract: A plasma enhanced atomic layer deposition (PEALD) system used to form thin films on substrates includes a plasma chamber, a processing chamber, two or more ring units and a control piece. The plasma chamber includes an outer and an inner quartz tubular units, whose central axes are aligned with each other. Therefore, plasma is held and concentrated in an annular space formed between the outer and outer quartz tubular units. Due to the first and second through holes, the plasma flow may be more evenly distributed on most of the surface of the substrate to form evenly distributed thin films and nano particles on the substrate. In addition, due to the alignment and misalignment between the first and second through holes, the plasma generated in the plasma chamber may be swiftly allowed or disallowed to enter to the processing chamber to prevent the precursor from forming a CVD.
    Type: Grant
    Filed: March 6, 2012
    Date of Patent: August 2, 2016
    Assignee: NATIONAL APPLIED RESEARCH LABORATORIES
    Inventors: Bo-Heng Liu, Chi-Chung Kei, Meng-Yen Tsai, Wen-Hao Cho, Chih-Chieh Yu, Chien-Nan Hsiao, Da-Ren Liu
  • Publication number: 20160195656
    Abstract: A structure of an ultraviolet light polarization component and a manufacturing process thereof, where a multi-layer thin film structure set is plated on a transparent falt substrate, and the multi-layer structure setis composed of a low refractive index thin film layer stacked for N times and a high refractive index thin film layer. The violet light is polarized into two polarization lights through the ultraviolet light polarization component, in which the two violet lights have a polarization ratio of larger than 10, so that the technical efficacy of realization of a small volume optical component and a large incident angle of the ultraviolet light.
    Type: Application
    Filed: January 7, 2015
    Publication date: July 7, 2016
    Inventors: Po-Kai CHIU, Chih-Hao ZENG, Don-Yau CHIANG, Chien-Yue CHEN, Chien-Nan HSIAO, Fong-Zhi CHEN
  • Patent number: 9381509
    Abstract: The present invention provides methods and designs of enclosed-channel reactor system for manufacturing catalysts or supports. Both of the configuration designs force the gaseous precursors and purge gas flow through the channel surface of reactor. The precursors will transform to thin film or particle catalysts or supports under adequate reaction temperature, working pressure and gas concentration. The reactor body is either sealed or enclosed for isolation from atmosphere. Another method using super ALD cycles is also proposed to grow alloy catalysts or supports with controllable concentration. The catalysts prepared by the method and system in the present invention are noble metals, such as platinum, palladium, rhodium, ruthenium, iridium and osmium, or transition metals such as iron, silver, cobalt, nickel and tin, while supports are silicon oxide, aluminum oxide, zirconium oxide, cerium oxide or magnesium oxide, or refractory metals, which can be chromium, molybdenum, tungsten or tantalum.
    Type: Grant
    Filed: July 23, 2013
    Date of Patent: July 5, 2016
    Assignee: NATIONAL APPLIED RESEARCH LABORATORIES
    Inventors: Chi-Chung Kei, Bo-Heng Liu, Chien-Pao Lin, Chien-Nan Hsiao, Yang-Chih Hsueh, Tsong-Pyng Perng
  • Publication number: 20160158740
    Abstract: A visible light response photocatalyst structure and a process for manufacturing the same are disclosed, where the structure is manufactured by the GRR for two times, so that the structure has a large surface area, high surface activity, being apt to get integrated with a silicon substrate and endurable to the environment, and further has the rapid and simple manufacturing characteristics without any additional energy required and has a high reproductively.
    Type: Application
    Filed: December 3, 2014
    Publication date: June 9, 2016
    Inventors: Chun-Ting LIN, Ming-Hua SHIAO, Mao-Nan CHANG, Nien-Nan CHU, Chien-Nan HSIAO, Fan-Gang TSENG
  • Publication number: 20160025871
    Abstract: A magnetron sputtering gun device used in vacuum for sputtering to form a thin film, which comprises a magnet copper seat, a magnetic element, a conductive element, a sputtering target, a target fixation assembly, a cylinder-shape protection mask, and a sputtering inclination assembly. By enhancing the magnet copper seat, the magnetron sputtering gun device is equipped with capability of increased film coating speed and increased compound ability between the thin film and the reaction gas. A ferromagnetic material may be coated. The magnet copper seat may be designed so that the sputtering target and strong magnets therewithin may be conveniently detached. In this structure, a cooling water tubing and the strong magnets are separated, lengthening a lifetime of the strong magnets and protecting the strong magnets from demagnetization. The sputtering inclination assembly may further increase a uniformity of the thin film thickness.
    Type: Application
    Filed: July 28, 2014
    Publication date: January 28, 2016
    Inventors: Bo-Huei Liao, Chien-Nan Hsiao
  • Publication number: 20140140904
    Abstract: The present invention provides methods and designs of enclosed-channel reactor system for manufacturing catalysts or supports. Both of the configuration designs force the gaseous precursors and purge gas flow through the channel surface of reactor. The precursors will transform to thin film or particle catalysts or supports under adequate reaction temperature, working pressure and gas concentration. The reactor body is either sealed or enclosed for isolation from atmosphere. Another method using super ALD cycles is also proposed to grow alloy catalysts or supports with controllable concentration. The catalysts prepared by the method and system in the present invention are noble metals, such as platinum, palladium, rhodium, ruthenium, iridium and osmium, or transition metals such as iron, silver, cobalt, nickel and tin, while supports are silicon oxide, aluminum oxide, zirconium oxide, cerium oxide or magnesium oxide, or refractory metals, which can be chromium, molybdenum, tungsten or tantalum.
    Type: Application
    Filed: July 23, 2013
    Publication date: May 22, 2014
    Applicant: National Applied Research Laboratories
    Inventors: Chi-Chung Kei, Bo-Heng Liu, Chien-Pao Lin, Chien-Nan Hsiao, Yang-Chih Hsueh, Tsong-Pyng Perng
  • Publication number: 20130256262
    Abstract: An in situ manufacturing process monitoring system of extreme smooth thin film and method thereof, comprising a coating device for coating a thin film on at least one substrate during a coating process, an ion figuring device for processing a surface polishing process on the thin film, a control device electrically coupled to the coating device and the ion figuring device respectively for controlling the coating device and the ion figuring device processing the coating process and surface polishing process by adjusting at least one device parameter of the coating device and the ion figuring device, and an in situ monitoring device electrically coupled to the control device for in situ monitoring at least one optical parameter of the thin film.
    Type: Application
    Filed: October 29, 2012
    Publication date: October 3, 2013
    Applicant: National Applied Research Laboratories
    Inventors: Chien-Nan Hsiao, Po-Kai Chiu, Da-Ren Liu, James Su, Fong-Zhi Chen
  • Publication number: 20130146134
    Abstract: The present invention discloses a solar cell with a nanolaminated transparent electrode and a method of manufacturing the same. The solar cell comprises a substrate, a first electrode layer deposited on the substrate, a photovoltaic layer deposited on the first electrode layer, and a second electrode layer deposited on the photovoltaic layer. Wherein, at least one of the first and second electrode layers is a nanolaminated transparent electrode prepared by using atomic layer deposition (ALD). The nanolaminated transparent electrode may serve as both of the transparent electrode and the anti-reflective layer and is able to maintain good transmittance in infrared wavelength.
    Type: Application
    Filed: February 22, 2012
    Publication date: June 13, 2013
    Applicant: National Applied Research Laboratories
    Inventors: CHIEN-NAN HSIAO, Chih-Chieh Yu, Po-Kai Chiu, Chi-Chung Kei, Don-Yau Chiang
  • Publication number: 20130125815
    Abstract: A plasma enhanced atomic layer deposition (PEALD) system used to form thin films on substrates includes a plasma chamber, a processing chamber, two or more ring units and a control piece. The plasma chamber includes an outer and an inner quartz tubular units, whose central axes are aligned with each other. Therefore, plasma is held and concentrated in a cylindrical space formed between the outer and outer quartz tubular units. Due to the first and second through holes, the plasma flow may be more evenly distributed on most of the surface of the substrate to form evenly distributed thin films and nano particles on the substrate. In addition, due to the alignment and misalignment between the first and second through holes, the plasma generated in the plasma chamber may be swiftly allowed or disallowed to enter to the processing chamber to prevent the precursor from forming a CVD.
    Type: Application
    Filed: March 6, 2012
    Publication date: May 23, 2013
    Inventors: Bo-Heng Liu, Chi-Chung Kei, Meng-Yen Tsai, Wen-Hao Cho, Chih-Chieh Yu, Chien-Nan Hsiao, Da-Ren Liu
  • Publication number: 20130045374
    Abstract: The present invention discloses a nano-laminated film with transparent conductive property and water-vapor resistance function and method thereof. The nano-laminated film comprises a plurality of first metal oxide layers and a plurality of second metal oxide layers. Wherein, the first metal layers and the second metal layers are made of different materials, and there is a spinel phase formed between the first metal layers and the second metal layers.
    Type: Application
    Filed: April 27, 2012
    Publication date: February 21, 2013
    Applicant: NATIONAL APPLIED RESEARCH LABORATORIES
    Inventors: CHIH-CHIEH YU, MENG-YEN TSAI, CHI-CHUNG KEI, BO-HENG LIU, CHIEN-NAN HSIAO
  • Patent number: 8236433
    Abstract: An antireflection structure is provided. The antireflection structure includes a substrate layer having a substrate refractive index; a first inorganic layer disposed on the substrate layer and having a first refractive index different from the substrate refractive index, where a thickness of the first inorganic layer is in a range of 1 to 40 nm; and a second inorganic layer disposed on the first inorganic layer and having a second refractive index different from the first refractive index.
    Type: Grant
    Filed: September 26, 2008
    Date of Patent: August 7, 2012
    Assignee: National Applied Research Laboratories
    Inventors: Po-Kai Chiu, Wen-Hao Cho, Hung-Ping Chen, Han-Chang Pan, Chien-Nan Hsiao
  • Publication number: 20110250414
    Abstract: A novel TCO coating and its manufacturing method are disclosed. The TCO coating of the present invention consists of titanium oxide, silicon oxide and metal. The TCO coating is manufactured according to electromagnetic field simulation software basing on the Maxwell Equations. Because the manufacturing method (including steam plating and sputter plating) of the present invention may be carried out under the room temperature, base boards that are made of polymer and that can not withstand high temperatures may be used and hence base boards may have wider applications. Also, less time is needed in the production, production cost is lowered and mass-production may be achieved.
    Type: Application
    Filed: April 7, 2011
    Publication date: October 13, 2011
    Applicant: INSTRUMENT TECHNOLOGY RESEARCH CENTER, NATIONAL APPLIED RESEARCH LABORATORY
    Inventors: Po-Kai Chiu, Shu-Te Ho, Bo-Heng Liou, Chien-Nan Hsiao, Wen-Hao Cho, Hung-Pin Chen, Din-Ping Tsai
  • Publication number: 20090246514
    Abstract: An antireflection structure is provided. The antireflection structure includes a substrate layer having a substrate refractive index; a first inorganic layer disposed on the substrate layer and having a first refractive index different from the substrate refractive index, where a thickness of the first inorganic layer is in a range of 1 to 40 nm; and a second inorganic layer disposed on the first inorganic layer and having a second refractive index different from the first refractive index.
    Type: Application
    Filed: September 26, 2008
    Publication date: October 1, 2009
    Applicant: National Applied Research Laboratories
    Inventors: Po-Kai Chiu, Wen-Hao Cho, Hung-Ping Chen, Han-Chang Pan, Chien-Nan Hsiao
  • Publication number: 20090246553
    Abstract: A reflective film is provided. The reflective film includes a substrate; a middle layer disposed on the substrate and mainly having a crystallized transition metal; and a metal layer disposed on the middle layer.
    Type: Application
    Filed: November 14, 2008
    Publication date: October 1, 2009
    Applicant: NATIONAL APPLIED RESEARCH LABORATORIES
    Inventors: Po-Kai Chiu, Wen-Hao Cho, Hung-Ping Chen, Han-Chang Pan, Chien-Nan Hsiao