Patents by Inventor Chih-Lun Lu

Chih-Lun Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10868353
    Abstract: An electronic device and a manufacturing method thereof are provided. The electronic device includes a chip package, an antenna pattern, and an insulating layer. The chip package includes a semiconductor die and an insulating encapsulation enclosing the semiconductor die. The antenna pattern is electrically coupled to the chip package, where a material of the antenna pattern comprises a conductive powder having fused metal particles. The insulating layer disposed between the chip package and the antenna pattern, where the antenna pattern includes a first surface in contact with the insulating layer, and a second surface opposite to the first surface, and a surface roughness of the second surface is greater than a surface roughness of the first surface.
    Type: Grant
    Filed: April 18, 2019
    Date of Patent: December 15, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Lin Lu, Hsiu-Jen Lin, Hsuan-Ting Kuo, Kai-Chiang Wu, Ming-Che Ho, Wei-Yu Chen, Yu-Peng Tsai, Chia-Lun Chang, Chia-Shen Cheng, Chih-Chiang Tsao, Tzu-Chun Tang, Ching-Hua Hsieh, Tuan-Yu Hung, Cheng-Shiuan Wong
  • Publication number: 20200303255
    Abstract: A method for forming semiconductor device structure is provided. The method includes forming a gate stack over a semiconductor substrate and forming a spacer element over a sidewall of the gate stack. The method also includes forming a dielectric layer over the semiconductor substrate to surround the gate stack and the spacer element and replacing the gate stack with a metal gate stack. The method further includes forming a protection element over the metal gate stack and forming a conductive contact partially surrounded by the dielectric layer. A portion of the conductive contact is formed directly above a portion of the protection element.
    Type: Application
    Filed: June 3, 2020
    Publication date: September 24, 2020
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hua-Li HUNG, Chih-Lun LU, Hsu-Yu HUANG, Tsung-Fan YIN, Ying-Ting HSIA, Yi-Wei CHIU, Li-Te HSU
  • Publication number: 20200303441
    Abstract: A semiconductor device is provided. The semiconductor device includes a substrate and a light-collimating layer. The substrate has a plurality of pixels. The light-collimating layer is disposed on the substrate, and the light-collimating layer includes a transparent material layer, a first light-shielding layer, a second light-shielding layer and a plurality of transparent pillars. The transparent material layer covers the pixels. The first light-shielding layer is disposed on the substrate and the first light-shielding layer has a plurality of holes corresponding to the pixels. The second light-shielding layer is disposed on the first light-shielding layer. The transparent pillars are disposed in the second light-shielding layer.
    Type: Application
    Filed: March 22, 2019
    Publication date: September 24, 2020
    Applicant: Vanguard International Semiconductor Corporation
    Inventors: Chung-Ren LAO, Chih-Cherng LIAO, Shih-Hao LIU, Wu-Hsi LU, Ming-Cheng LO, Wei-Lun CHUNG, Chih-Wei LIN
  • Publication number: 20200264503
    Abstract: The present disclosure provides an embodiment of a reflective mask that includes a substrate; a reflective multilayer disposed on the substrate; an anti-oxidation barrier layer disposed on the reflective multilayer and the anti-oxidation barrier layer is in amorphous structure with an average interatomic distance less than an oxygen diameter; and an absorber layer disposed on the anti-oxidation barrier layer and patterned according to an integrated circuit layout.
    Type: Application
    Filed: May 4, 2020
    Publication date: August 20, 2020
    Inventors: Chia-Hao Yu, Chi-Lun Lu, Chih-Tsung Shih, Ching-Wei Shen, Jeng-Horng Chen
  • Patent number: 10692762
    Abstract: A semiconductor device is provided. The semiconductor device includes a gate stack over a semiconductor substrate and a spacer element over a sidewall of the gate stack. The spacer element has a lower portion and an upper portion, the lower portion has a substantially uniform width. The upper portion becomes wider along a direction from a top of the spacer element towards the lower portion, and a bottom of the upper portion is higher than a top of the gate stack. The semiconductor device also includes a dielectric layer surrounding the gate stack and the spacer element. The semiconductor device further includes a conductive contact penetrating through the dielectric layer and electrically connected to a conductive feature over the semiconductor substrate.
    Type: Grant
    Filed: September 10, 2018
    Date of Patent: June 23, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hua-Li Hung, Chih-Lun Lu, Hsu-Yu Huang, Tsung-Fan Yin, Ying-Ting Hsia, Yi-Wei Chiu, Li-Te Hsu
  • Patent number: 10642148
    Abstract: The present disclosure provides an embodiment of a reflective mask that includes a substrate; a reflective multilayer disposed on the substrate; an anti-oxidation barrier layer disposed on the reflective multilayer and the anti-oxidation barrier layer is in amorphous structure with an average interatomic distance less than an oxygen diameter; and an absorber layer disposed on the anti-oxidation barrier layer and patterned according to an integrated circuit layout.
    Type: Grant
    Filed: August 27, 2018
    Date of Patent: May 5, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chia-Hao Yu, Chi-Lun Lu, Chih-Tsung Shih, Ching-Wei Shen, Jeng-Horng Chen
  • Publication number: 20200106156
    Abstract: An electronic device and a manufacturing method thereof are provided. The electronic device includes a chip package, an antenna pattern, and an insulating layer. The chip package includes a semiconductor die and an insulating encapsulation enclosing the semiconductor die. The antenna pattern is electrically coupled to the chip package, where a material of the antenna pattern comprises a conductive powder having fused metal particles. The insulating layer disposed between the chip package and the antenna pattern, where the antenna pattern includes a first surface in contact with the insulating layer, and a second surface opposite to the first surface, and a surface roughness of the second surface is greater than a surface roughness of the first surface.
    Type: Application
    Filed: April 18, 2019
    Publication date: April 2, 2020
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chun-Lin Lu, Hsiu-Jen Lin, Hsuan-Ting Kuo, Kai-Chiang Wu, Ming-Che Ho, Wei-Yu Chen, Yu-Peng Tsai, Chia-Lun Chang, Chia-Shen Cheng, Chih-Chiang Tsao, Tzu-Chun Tang, Ching-Hua Hsieh, Tuan-Yu Hung, Cheng-Shiuan Wong
  • Publication number: 20200044116
    Abstract: A light-emitting device includes a substrate including a top surface, a first side surface and a second side surface, wherein the first side surface and the second side surface of the substrate are respectively connected to two opposite sides of the top surface of the substrate; a semiconductor stack formed on the top surface of the substrate, the semiconductor stack including a first semiconductor layer, a second semiconductor layer, and an active layer formed between the first semiconductor layer and the second semiconductor layer; a first electrode pad formed adjacent to a first edge of the light-emitting device; and a second electrode pad formed adjacent to a second edge of the light-emitting device, wherein in a top view of the light-emitting device, the first edge and the second edge are formed on different sides or opposite sides of the light-emitting device, the first semiconductor layer adjacent to the first edge includes a first sidewall directly connected to the first side surface of the substrate,
    Type: Application
    Filed: August 1, 2019
    Publication date: February 6, 2020
    Inventors: Chao-Hsing CHEN, Cheng-Lin LU, Chih-Hao CHEN, Chi-Shiang HSU, I-Lun MA, Meng-Hsiang HONG, Hsin-Ying WANG, Kuo-Ching HUNG, Yi-Hung LIN
  • Publication number: 20190231782
    Abstract: A topical formulation comprising (a) a therapeutically effective amount of tofacitinib; (b) at least one solvent; and (c) optionally one or more other pharmaceutically acceptable excipients is provided. Also provided is a method for treating and/or preventing autoimmune diseases in a subject administering said topical formulation.
    Type: Application
    Filed: January 22, 2019
    Publication date: August 1, 2019
    Inventors: Chih-Ming Chen, Guang-Wei Lu, Ling-Ying Liaw, Fan-Lun Liu, Shih-Fen Liao, Chou-Hsiung Chen, Yu-Han Kao, Yu-Yin Chen
  • Publication number: 20190019727
    Abstract: A semiconductor device is provided. The semiconductor device includes a gate stack over a semiconductor substrate and a spacer element over a sidewall of the gate stack. The spacer element has a lower portion and an upper portion, the lower portion has a substantially uniform width. The upper portion becomes wider along a direction from a top of the spacer element towards the lower portion, and a bottom of the upper portion is higher than a top of the gate stack. The semiconductor device also includes a dielectric layer surrounding the gate stack and the spacer element. The semiconductor device further includes a conductive contact penetrating through the dielectric layer and electrically connected to a conductive feature over the semiconductor substrate.
    Type: Application
    Filed: September 10, 2018
    Publication date: January 17, 2019
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hua-Li HUNG, Chih-Lun LU, Hsu-Yu HUANG, Tsung-Fan YIN, Ying-Ting HSIA, Yi-Wei CHIU, Li-Te HSU
  • Patent number: 10074563
    Abstract: Structures and formation methods of a semiconductor device structure are provided. The semiconductor device structure includes a gate stack over a semiconductor substrate and a spacer element over a sidewall of the gate stack. The spacer element is substantially free of oxygen. The semiconductor device structure also includes a dielectric layer over the semiconductor substrate, and the dielectric layer surrounds the gate stack and the spacer element. The semiconductor device structure further includes a conductive contact penetrating through the dielectric layer and electrically connected to a conductive feature over the semiconductor substrate. An angle between a sidewall of the conductive contact and a top surface of the spacer element is in a range from about 90 degrees to about 120 degrees, and the conductive contact covers a portion of the spacer element.
    Type: Grant
    Filed: July 29, 2016
    Date of Patent: September 11, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hua-Li Hung, Chih-Lun Lu, Hsu-Yu Huang, Tsung-Fan Yin, Ying-Ting Hsia, Yi-Wei Chiu, Li-Te Hsu
  • Publication number: 20180033693
    Abstract: Structures and formation methods of a semiconductor device structure are provided. The semiconductor device structure includes a gate stack over a semiconductor substrate and a spacer element over a sidewall of the gate stack. The spacer element is substantially free of oxygen. The semiconductor device structure also includes a dielectric layer over the semiconductor substrate, and the dielectric layer surrounds the gate stack and the spacer element. The semiconductor device structure further includes a conductive contact penetrating through the dielectric layer and electrically connected to a conductive feature over the semiconductor substrate. An angle between a sidewall of the conductive contact and a top surface of the spacer element is in a range from about 90 degrees to about 120 degrees, and the conductive contact covers a portion of the spacer element.
    Type: Application
    Filed: July 29, 2016
    Publication date: February 1, 2018
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hua-Li HUNG, Chih-Lun LU, Hsu-Yu HUANG, Tsung-Fan YIN, Ying-Ting HSIA, Yi-Wei CHIU, Li-Te HSU
  • Patent number: 9748152
    Abstract: Forming a semiconductor arrangement includes non-destructively determining a first spacer height of a first sidewall spacer adjacent a dummy gate and a second spacer height of a second sidewall spacer adjacent the dummy gate based upon a height of a photoresist as measured using optical critical dimension (OCD) spectroscopy. When the photoresist is sufficiently uniform, a hard mask etch is performed to remove a hard mask from the dummy gate and to remove portions of sidewall spacers of the dummy gate. A gate electrode is formed between the first sidewall spacer and the second sidewall spacer to form a substantially uniform gate. Controlling gate formation based upon photoresist height as measured by OCD spectroscopy provides a non-destructive manner of promoting uniformity.
    Type: Grant
    Filed: July 7, 2016
    Date of Patent: August 29, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Chih-Lun Lu, Tzu-Chung Wang
  • Publication number: 20160322268
    Abstract: Forming a semiconductor arrangement includes non-destructively determining a first spacer height of a first sidewall spacer adjacent a dummy gate and a second spacer height of a second sidewall spacer adjacent the dummy gate based upon a height of a photoresist as measured using optical critical dimension (OCD) spectroscopy. When the photoresist is sufficiently uniform, a hard mask etch is performed to remove a hard mask from the dummy gate and to remove portions of sidewall spacers of the dummy gate. A gate electrode is formed between the first sidewall spacer and the second sidewall spacer to form a substantially uniform gate. Controlling gate formation based upon photoresist height as measured by OCD spectroscopy provides a non-destructive manner of promoting uniformity.
    Type: Application
    Filed: July 7, 2016
    Publication date: November 3, 2016
    Inventors: Chih-Lun Lu, Tzu-Chung Wang
  • Patent number: 9390985
    Abstract: Forming a semiconductor arrangement includes non-destructively determining a first spacer height of a first sidewall spacer adjacent a dummy gate and a second spacer height of a second sidewall spacer adjacent the dummy gate based upon a height of a photoresist as measured using optical critical dimension (OCD) spectroscopy. When the photoresist is sufficiently uniform, a hard mask etch is performed to remove a hard mask from the dummy gate and to remove portions of sidewall spacers of the dummy gate. A gate electrode is formed between the first sidewall spacer and the second sidewall spacer to form a substantially uniform gate. Controlling gate formation based upon photoresist height as measured by OCD spectroscopy provides a non-destructive manner of promoting uniformity.
    Type: Grant
    Filed: February 4, 2015
    Date of Patent: July 12, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Chih-Lun Lu, Tzu-Chung Wang
  • Publication number: 20160064293
    Abstract: Forming a semiconductor arrangement includes non-destructively determining a first spacer height of a first sidewall spacer adjacent a dummy gate and a second spacer height of a second sidewall spacer adjacent the dummy gate based upon a height of a photoresist as measured using optical critical dimension (OCD) spectroscopy. When the photoresist is sufficiently uniform, a hard mask etch is performed to remove a hard mask from the dummy gate and to remove portions of sidewall spacers of the dummy gate. A gate electrode is formed between the first sidewall spacer and the second sidewall spacer to form a substantially uniform gate. Controlling gate formation based upon photoresist height as measured by OCD spectroscopy provides a non-destructive manner of promoting uniformity.
    Type: Application
    Filed: February 4, 2015
    Publication date: March 3, 2016
    Inventors: Chih-Lun Lu, Tzu-Chung Wang