Abstract: A package structure, including a circuit board, multiple circuit structure layers, at least one bridge structure, and at least one supporting structure, is provided. The circuit structure layer is disposed on the circuit board. The bridge structure is connected between the two adjacent circuit structure layers. The supporting structure is located between the two adjacent circuit structure layers, and the supporting structure has a first end and a second end opposite to each other and respectively connecting the bridge structure and the circuit board.

Abstract: Method and apparatus for constrained de-blocking filter are disclosed. One method receives input data related to a current block in a current picture at a video encoder side or a video bitstream corresponding to compressed data including the current block in the current picture at a video decoder side, and determines a first boundary associated with the current block, wherein the first boundary corresponds to one vertical boundary or one horizontal boundary of the current block. The method then applies de-blocking process to a reconstructed current block corresponding to the current block to result in a filtered-reconstructed current block, using a plurality of first reference samples at a same side of the first boundary, and replaces a first set of the first reference samples by one or more padding values. The method then generates a filtered decoded picture including the filtered-reconstructed current block.

Abstract: Disclosed are calibration techniques that can be implemented by a device that conducts biological tests. In certain embodiments, the device for testing a biological specimen includes a receiving mechanism to receive a carrier, a camera module arranged to capture imagery of the carrier, and a processor. Some examples of the processor can detect a calibration mode trigger. In calibration mode, the processor can divide the captured imagery into segments and selectively perform one or more calibration procedures for each segment. Then, the processor records a calibration result for each segment.

Abstract: A method and apparatus of Inter prediction for video coding using Multi-hypothesis (MH) are disclosed. If an MH mode is used for the current block: at least one MH candidate is derived using reduced reference data by adjusting at least one coding-control setting; an Inter candidate list is generated, where the Inter candidate list comprises said at least one MH candidate; and current motion information associated with the current block is encoded using the Inter candidate list at the video encoder side or the current motion information associated with the current block is decoded at the video decoder side using the Merge candidate list. The coding control setting may correspond to prediction direction setting, filter tap setting, block size of reference block to be fetched, reference picture setting or motion limitation setting.

Abstract: A ride-on vehicle, such as for a child, includes a vehicle body and one or more wheels that support the vehicle body relative to a surface. At least one of the wheels includes a hub motor arrangement that provides a drive torque for propelling the vehicle. The hub motor arrangement includes a housing defining an interior space. An axle or other mounting element(s) define an axis of rotation of the housing. Preferably, the axle or other mounting element(s) do not pass completely through the housing. A motor drives the housing through a transmission. Preferably, the motor is a standard, compact motor that is positioned on the axis of rotation and can be laterally offset from a central plane of the housing. In some embodiments, a traction element is carried directly by the housing.

Abstract: A method of fabricating the semiconductor device includes forming a bit line structure over a substrate, forming a spacer structure on a sidewall of the bit line structure, partially removing an upper portion of the spacer structure to form a slope on the spacer structure slanting to the bit line structure, forming a landing pad material to cover the spacer structure and contact the slope, and removing at least a portion of the landing pad material to form a landing pad against the slope.

Abstract: The present disclosure provides a method for preparing metal lines with a high aspect ratio including two photolithography stages. According to the design of the method of the present disclosure, first metal lines with high aspect ratio are formed in a dielectric layer, which provides a mechanical support to the first metal lines, thereby preventing the first metal lines from collapsing or deforming. Because of a significant reduction or elimination of collapse or deformation phenomenon in the semiconductor structure, a problem associated with short circuits due to direct contact between the semiconductor components is mitigated, and reliability of the semiconductor structures is enhanced. As a result, a yield of the semiconductor structure is increased.

Abstract: The present disclosure provides to a method for preparing metal lines with a high aspect ratio comprising two photolithography stages. According to the design of the method of the present disclosure, first metal lines with high aspect ratio are formed in a dielectric layer, which provides a mechanical support to the first metal lines, thereby preventing the first metal lines from collapsing or deforming. Because of a significant reduction or elimination of collapse or deformation phenomenon in the semiconductor structure, a problem associated with short circuits due to direct contact between the semiconductor components can be mitigated, and reliability of the semiconductor structures can be enhanced. As a result, a yield of the semiconductor structure is increased.

Abstract: A method of fabricating the semiconductor device includes forming a bit line structure over a substrate, forming a spacer structure on a sidewall of the bit line structure, partially removing an upper portion of the spacer structure to form a slope on the spacer structure slanting to the bit line structure, forming a landing pad material to cover the spacer structure and contact the slope, and removing at least a portion of the landing pad material to form a landing pad against the slope.

Abstract: The present application discloses a method for fabricating a semiconductor device with capacitors having a shared electrode. The method includes providing a substrate, forming a first trench in the substrate, doping sidewalls and a bottom surface of the first trench to form a bottom conductive structure, forming a first insulating layer on the bottom conductive structure and in the first trench, forming a shared conductive layer on the first insulating layer, forming a second insulating layer on the shared conductive layer, forming a top conductive layer on the second insulating layer, and forming a connection structure electrically connecting the bottom conductive structure and the top conductive layer. The bottom conductive structure, the first insulating layer, and the shared conductive layer together configure a first capacitor unit. The shared conductive layer, the second insulating layer, and the top conductive layer together configure a second capacitor unit.

Abstract: A ride-on vehicle, such as for a child, includes a vehicle body and one or more wheels that support the vehicle body relative to a surface. At least one of the wheels includes a hub motor arrangement that provides a drive torque for propelling the vehicle. The hub motor arrangement includes a housing defining an interior space. An axle or other mounting element(s) define an axis of rotation of the housing. Preferably, the axle or other mounting element(s) do not pass completely through the housing. A motor drives the housing through a transmission. Preferably, the motor is a standard, compact motor that is positioned on the axis of rotation and can be laterally offset from a central plane of the housing. In some embodiments, a traction element is carried directly by the housing.

Abstract: The present disclosure relates to a method for preparing an electrical fuse (e-fuse) device. The method includes forming a mask layer over a semiconductor substrate, and etching the semiconductor substrate by using the mask layer as a mask to form a fuse link over a semiconductor base. The method also includes epitaxially growing a first bottom anode/cathode region and a second bottom anode/cathode region over the semiconductor base and adjacent to a bottom portion of the fuse link. The fuse link is between the first bottom anode/cathode region and the second anode/cathode region. The method further includes epitaxially growing a top anode/cathode region to replace the mask layer.

Abstract: A semiconductor structure includes a substrate, an isolation layer, a dielectric layer, an insulation layer, a conductor and a capping layer. The substrate has a concave portion. The isolation layer is located on a top surface of the substrate. The dielectric layer is located on the isolation layer. The insulation layer is located on a surface of the concave portion and extends to a sidewall of the isolation layer. The conductor is located on the insulation layer in the concave portion. The conductor has a first top surface and a second top surface, and the first top surface is closer to the dielectric layer than the second top surface. The capping layer is located in the concave portion and covers the conductor.

Abstract: Provided is a field space data normalization processing method applicable to GBP algorithm, including the steps of: performing vector matrix transformation, by inputting first vector data and transforming it into a first matrix expression; performing first matrix transformation, by transforming the first matrix expression into a second matrix expression; providing a means of normalization; performing normalization and third matrix transformation, by performing data normalization and transformation on the second matrix expression to obtain a third matrix expression; transforming a third matrix and outputting second vector data, by transforming the third matrix expression into a fourth matrix expression and then transforming it into second vector data and outputting it. Therefore, normalization of camera pose data in SLAM is achieved.

Abstract: A semiconductor structure includes a substrate, an isolation layer, a dielectric layer, an insulation layer, a conductor and a capping layer. The substrate has a concave portion. The isolation layer is located on a top surface of the substrate. The dielectric layer is located on the isolation layer. The insulation layer is located on a surface of the concave portion and extends to a sidewall of the isolation layer. The conductor is located on the insulation layer in the concave portion. The conductor has a first top surface and a second top surface, and the first top surface is closer to the dielectric layer than the second top surface. The capping layer is located in the concave portion and covers the conductor.

Abstract: A semiconductor structure includes a substrate, a bit line, a dielectric layer and a word line. The substrate has an active area and a trench. The bit line is on the substrate and extends along a direction. The active area includes a first portion and a second portion respectively located at two opposite sides of the bit line and spaced apart from each other along the direction. A landing area extends from the first portion of the active area to the second portion of the active area across the bit line. A dielectric layer is in the trench. The active area is surrounded by the dielectric layer. The word line is surrounded by the dielectric layer. The word line is curved and below the bit line. A portion of the word line is between first and second end portions of the landing area.

Abstract: A method of fabricating the semiconductor device includes forming a bit line structure over a substrate, forming a spacer structure on a sidewall of the bit line structure, partially removing an upper portion of the spacer structure to form a slope on the spacer structure slanting to the bit line structure, forming a landing pad material to cover the spacer structure and contact the slope, and removing at least a portion of the landing pad material to form a landing pad against the slope.