Patents by Inventor Chih-Ying CHANG

Chih-Ying CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240107776
    Abstract: An antiferroelectric field effect transistor (Anti-FeFET) of a memory cell includes an antiferroelectric layer instead of a ferroelectric layer. The antiferroelectric layer may operate based on a programmed state and an erased state in which the antiferroelectric layer is in a fully polarized alignment and a non-polarized alignment (or a random state of polarization), respectively. This enables the antiferroelectric layer in the FeFET to provide a sharper/larger voltage drop for an erase operation of the FeFET (e.g., in which the FeFET switches or transitions from the programmed state to the erased state) relative to a ferroelectric material layer that operates based on switching between two opposing fully polarized states.
    Type: Application
    Filed: January 5, 2023
    Publication date: March 28, 2024
    Inventors: Chun-Chieh LU, Chih-Yu CHANG, Yu-Chuan SHIH, Huai-Ying HUANG, Yu-Ming LIN
  • Publication number: 20240085369
    Abstract: Disclosed is a self-powered formaldehyde sensing device, comprising: a triboelectric material electrode layer including a first substrate and a first electrode layer formed on the first substrate; a triboelectric material dielectric layer including a second substrate, a second electrode layer formed on the second substrate, a dielectric reacting layer formed on the second electrode layer, and a reaction modification layer formed on the dielectric reacting layer to surface-modify the dielectric reacting layer, the reaction modification layer being a phosphomolybdic acid complex (cPMA) layer, the phosphomolybdic acid complex of the phosphomolybdic acid complex layer being obtained by dissolving 4,4?-bipyridine (BPY) in isopropanol (IPA) and then mixing with phosphomolybdic acid (PMA) solution; an elastic spacer; and an external circuit.
    Type: Application
    Filed: December 21, 2022
    Publication date: March 14, 2024
    Applicant: National Taiwan University of Science and Technology
    Inventors: Chih-Yu Chang, Chun-Yi Ho, Yu-Hsuan Cheng, Ying-Ying Chen
  • Patent number: 10720389
    Abstract: An anti-fuse structure includes an active area, a gate electrode over the active area, and a dielectric layer between the active area and the gate electrode. The active area and the gate electrode partially overlap in a vertical projection direction, forming a plurality of channels. One of the gate electrode and the active area includes a plurality of extending portions to form the plurality of channels.
    Type: Grant
    Filed: November 2, 2017
    Date of Patent: July 21, 2020
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventors: Chih-Ying Chang, Jui-Hsiu Jao
  • Patent number: 10566253
    Abstract: An electronic device includes a substrate, an electronic component disposed over the substrate and an electrical testing component disposed over the substrate. The electronic component includes a bottom plate over the substrate, and a top plate over the bottom plate. The electrical testing component includes a first anti-fuse structure and a second anti-fuse structure, wherein the first anti-fuse structure and the second anti-fuse structure are electrically connected to the bottom plate.
    Type: Grant
    Filed: March 12, 2018
    Date of Patent: February 18, 2020
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventors: Chih-Ying Chang, Jui-Hsiu Jao
  • Publication number: 20190164849
    Abstract: An electronic device includes a substrate, an electronic component disposed over the substrate and an electrical testing component disposed over the substrate. The electronic component includes a bottom plate over the substrate, and a top plate over the bottom plate. The electrical testing component includes a first anti-fuse structure and a second anti-fuse structure, wherein the first anti-fuse structure and the second anti-fuse structure are electrically connected to the bottom plate.
    Type: Application
    Filed: March 12, 2018
    Publication date: May 30, 2019
    Inventors: CHIH-YING CHANG, JUI-HSIU JAO
  • Publication number: 20190131237
    Abstract: An anti-fuse structure includes an active area, a gate electrode over the active area, and a dielectric layer between the active area and the gate electrode. The active area and the gate electrode partially overlap in a vertical projection direction, forming a plurality of channels. One of the gate electrode and the active area includes a plurality of extending portions to form the plurality of channels.
    Type: Application
    Filed: November 2, 2017
    Publication date: May 2, 2019
    Inventors: Chih-Ying CHANG, Jui-Hsiu JAO
  • Publication number: 20190131238
    Abstract: An anti-fuse structure includes an active area, a gate electrode over the active area, and a dielectric layer between the active area and the gate electrode. The active area and the gate electrode partially overlap in a vertical projection direction, forming a plurality of channels. One of the gate electrode and the active area includes a plurality of extending portions to form the plurality of channels.
    Type: Application
    Filed: December 18, 2018
    Publication date: May 2, 2019
    Inventors: Chih-Ying CHANG, Jui-Hsiu JAO