Patents by Inventor Chin-Chang Shen

Chin-Chang Shen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200050098
    Abstract: A lithography mask includes a substrate, a reflective structure disposed over a first side of the substrate, and a patterned absorber layer disposed over the reflective structure. The lithography mask includes a first region and a second region that surrounds the first region in a top view. The patterned absorber layer is located in the first region. A substantially non-reflective material is located in the second region. The lithography mask is formed by forming a reflective structure over a substrate, forming an absorber layer over the reflective structure, defining a first region of the lithography mask, and defining a second region of the lithography mask. The defining of the first region includes patterning the absorber layer. The second region is defined to surround the first region in a top view. The defining of the second region includes forming a substantially non-reflective material in the second region.
    Type: Application
    Filed: October 22, 2019
    Publication date: February 13, 2020
    Inventors: Chin-Hsiang Lin, Chien-Cheng Chen, Hsin-Chang Lee, Chia-Jen Chen, Pei-Cheng Hsu, Yih-Chen Su, Gaston Lee, Tran-Hui Shen
  • Publication number: 20190196322
    Abstract: A lithography mask includes a substrate, a reflective structure disposed over a first side of the substrate, and a patterned absorber layer disposed over the reflective structure. The lithography mask includes a first region and a second region that surrounds the first region in a top view. The patterned absorber layer is located in the first region. A substantially non-reflective material is located in the second region. The lithography mask is formed by forming a reflective structure over a substrate, forming an absorber layer over the reflective structure, defining a first region of the lithography mask, and defining a second region of the lithography mask. The defining of the first region includes patterning the absorber layer. The second region is defined to surround the first region in a top view. The defining of the second region includes forming a substantially non-reflective material in the second region.
    Type: Application
    Filed: December 22, 2017
    Publication date: June 27, 2019
    Inventors: Chin-Hsiang Lin, Chien-Cheng Chen, Hsin-Chang Lee, Chia-Jen Chen, Pei-Cheng Hsu, Yih-Chen Su, Gaston Lee, Tran-Hui Shen
  • Publication number: 20190177536
    Abstract: The present invention encompasses compositions comprising a polyurethane and a block copolymer with at least two homopolymer subunits. In one aspect, compositions of the present disclosure are coating compositions. In another aspect, compositions of the present disclosure are adhesive compositions.
    Type: Application
    Filed: December 3, 2018
    Publication date: June 13, 2019
    Inventor: Chin-Chang Shen
  • Publication number: 20190023876
    Abstract: Provided is a curable composition having superior weather resistance which is obtained from a cured product containing a polyoxyalkylene polymer comprising a reactive silicon group. The curable composition contains (A) a reactive-silicon-group-containing polyoxyalkylene polymer having a number-average molecular weight of 2,000 to 50,000 and containing 1.1 to 5 reactive silicon groups within a single molecule, and (B) from 0.01 to 100 parts by weight of a powdered-glass-based filler based on 100 parts of the component (A).
    Type: Application
    Filed: September 26, 2018
    Publication date: January 24, 2019
    Applicant: KANEKA NORTH AMERICA LLC
    Inventors: Atsushi FUKUNAGA, Chin-Chang SHEN, Kenneth SUTHERLAND, JR., Yu ITANO, Akira OGAWA
  • Patent number: 9777189
    Abstract: Compositions are disclosed herein. In some embodiments, a composition includes a silyl terminated polymer, wherein the silyl terminated polymer includes a monomer unit represented by —(R1O)—, and a terminal silicon-containing group, wherein R1 is a linear or branched alkyl group, and a polyether carbonate polyol including a terminal hydroxyl group.
    Type: Grant
    Filed: November 3, 2015
    Date of Patent: October 3, 2017
    Assignee: Kaneka North America LLC
    Inventor: Chin-Chang Shen
  • Publication number: 20170114209
    Abstract: Provided is a curable composition having superior weather resistance which is obtained from a cured product containing a polyoxyalkylene polymer comprising a reactive silicon group. The curable composition contains (A) a reactive-silicon-group-containing polyoxyalkylene polymer having a number-average molecular weight of 2,000 to 50,000 and containing 1.1 to 5 reactive silicon groups within a single molecule, and (B) from 0.01 to 100 parts by weight of a powdered-glass-based filler based on 100 parts of the component (A).
    Type: Application
    Filed: January 9, 2017
    Publication date: April 27, 2017
    Applicant: KANEKA NORTH AMERICA LLC
    Inventors: Atsushi FUKUNAGA, Chin-Chang SHEN, Kenneth SUTHERLAND, JR., Yu ITANO, Akira OGAWA
  • Publication number: 20160194443
    Abstract: Compositions are disclosed herein. In some embodiments, a composition includes a silyl terminated polymer, wherein the silyl terminated polymer includes a monomer unit represented by —(R1O)—, and a terminal silicon-containing group, wherein R1 is a linear or branched alkyl group, and a polyether carbonate polyol including a terminal hydroxyl group.
    Type: Application
    Filed: November 3, 2015
    Publication date: July 7, 2016
    Applicant: KANEKA NORTH AMERICA LLC
    Inventor: Chin-Chang Shen
  • Publication number: 20160160010
    Abstract: [Problem] To provide a curable composition of superior weather resistance, the composition being obtained using a cured product containing a polyoxyalkylene polymer comprising a reactive silicon group. [Solution] A curable composition containing (A) a reactive-silicon-group-containing polyoxyalkylene polymer having a number-average molecular weight of 2,000 to 50,000 and containing 1.1 to 5 reactive silicon groups within a single molecule, and (B) from 0.01 to 100 parts by weight of a powdered-glass-based filler.
    Type: Application
    Filed: August 24, 2015
    Publication date: June 9, 2016
    Applicant: Kaneka North America LLC
    Inventors: Atsushi FUKUNAGA, Chin-Chang SHEN, Kenneth SUTHERLAND, JR., Yu ITANO, Akira OGAWA
  • Patent number: 8662950
    Abstract: A white-light emitting device and its preparation method are provided. The white-light emitting device comprises an ultraviolet (UV) light emitting diode (LED) chip, a first phosphor, and a second phosphor, wherein the UV LED chip generates a first radiation; the first phosphor is composed of Zn(C3N2H4)2 powder and is excited by the first radiation to generate a second radiation; and the second phosphor is excited by the first radiation and/or the second radiation to generate a third radiation. The third radiation is then mixed with the first radiation and/or the second radiation to generate a white light.
    Type: Grant
    Filed: October 12, 2012
    Date of Patent: March 4, 2014
    Assignee: Everlight Electronics Co., Ltd.
    Inventors: Yi-Jung Chen, Chih-Chieh Yang, Chin-Chang Shen, Ru-Shi Liu
  • Publication number: 20130045655
    Abstract: A white-light emitting device and its preparation method are provided. The white-light emitting device comprises an ultraviolet (UV) light emitting diode (LED) chip, a first phosphor, and a second phosphor, wherein the UV LED chip generates a first radiation; the first phosphor is composed of Zn(C3N2H4)2 powder and is excited by the first radiation to generate a second radiation; and the second phosphor is excited by the first radiation and/or the second radiation to generate a third radiation. The third radiation is then mixed with the first radiation and/or the second radiation to generate a white light.
    Type: Application
    Filed: October 12, 2012
    Publication date: February 21, 2013
    Applicant: EVERLIGHT ELECTRONICS CO., LTD.
    Inventors: Yi-Jung Chen, Chih-Chieh Yang, Chin-Chang Shen, Ru-Shi Liu
  • Patent number: 8314543
    Abstract: A white-light emitting device and its preparation method are provided. The white-light emitting device comprises an ultraviolet (UV) light emitting diode (LED) chip, a first phosphor, and a second phosphor, wherein the UV LED chip generates a first radiation; the first phosphor is composed of Zn(C3N2H4)2 powder and is excited by the first radiation to generate a second radiation; and the second phosphor is excited by the first radiation and/or the second radiation to generate a third radiation. The third radiation is then mixed with the first radiation and/or the second radiation to generate a white light.
    Type: Grant
    Filed: October 5, 2010
    Date of Patent: November 20, 2012
    Assignee: Everlight Electronics Co., Ltd.
    Inventors: Yi-Jung Chen, Chih-Chieh Yang, Chin-Chang Shen, Ru-Shi Liu
  • Publication number: 20110080086
    Abstract: A white-light emitting device and its preparation method are provided. The white-light emitting device comprises an ultraviolet (UV) light emitting diode (LED) chip, a first phosphor, and a second phosphor, wherein the UV LED chip generates a first radiation; the first phosphor is composed of Zn(C3N2H4)2 powder and is excited by the first radiation to generate a second radiation; and the second phosphor is excited by the first radiation and/or the second radiation to generate a third radiation. The third radiation is then mixed with the first radiation and/or the second radiation to generate a white light.
    Type: Application
    Filed: October 5, 2010
    Publication date: April 7, 2011
    Applicant: EVERLIGHT ELECTRONICS CO., LTD.
    Inventors: Yi-Jung CHEN, Chih-Chieh YANG, Chin-Chang SHEN, Ru-Shi LIU
  • Publication number: 20030176617
    Abstract: Disclosed are certain moisture curable prepolymers formed by the reaction of diphenylmethane diisocyanate (MDI) with conventional polyether polyols to produce sealants and coatings exhibiting excellent combinations of physical properties, most notably, high tensile strength, high tear resistance, and high elongation. These combinations of physical properties in the moisture-cured polymer are superior to those obtained from prepolymers of the so-called “low unsaturation” polyether polyols. The moisture curable prepolymers offer improved polymer properties, reduced viscosity, and lower raw materials cost in relation to the prior art prepolymers based on low unsaturation polyether polyols.
    Type: Application
    Filed: April 16, 2003
    Publication date: September 18, 2003
    Inventor: Chin-Chang Shen
  • Patent number: 6531536
    Abstract: The invention relates to polyisocyanates and/or polyisocyanate-reactive materials containing at least some d-limonene. The invention further relates to emulsifiable polyisocyanates containing at least some d-limonene. The polyisocyanates and/or polyisocyanate-reactive materials containing d-limonene can be used as a coating material. The obtained coating material comprises a polyisocyanate-derived polymer containing d-limonene.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: March 11, 2003
    Assignee: Huntsman International LLC
    Inventor: Chin-Chang Shen
  • Patent number: 6407196
    Abstract: The disclosed invention relates to polyisocyanate derived adducts and to emulsifiable polyisocyanates formed from those adducts. The invention further relates to emulsions which include the emulsifiable polyisocyanates. Emulsions which employ the emulsifiable polyisocyanates have greatly increased stability.
    Type: Grant
    Filed: January 22, 2001
    Date of Patent: June 18, 2002
    Assignee: Huntsman International LLC
    Inventors: Chin-Chang Shen, James A. Yavorsky
  • Publication number: 20020042492
    Abstract: The disclosed invention relates to polyisocyanate derived adducts and to emulsifiable polyisocyanates formed from those adducts. The invention further relates to emulsions which include the emulsifiable polyisocyanates. Emulsions which employ the emulsifiable polyisocyanates have greatly increased stability.
    Type: Application
    Filed: January 22, 2001
    Publication date: April 11, 2002
    Inventors: Chin-Chang Shen, James A. Yavorsky
  • Publication number: 20020010250
    Abstract: The invention relates to polyisocyanates and/or polyisocyanate-reactive materials containing at least some d-limonene. The invention further relates to emulsifiable polyisocyanates containing at least some d-limonene. The polyisocyanates and/or polyisocyanate-reactive materials containing d-limonene can be used as a coating material. The obtained coating material comprises a polyisocyanate-derived polymer containing d-limonene.
    Type: Application
    Filed: January 19, 2001
    Publication date: January 24, 2002
    Inventor: Chin-Chang Shen
  • Patent number: 5962619
    Abstract: A process for making clear elastomers is disclosed. First, a polyol having a narrow molecular weight distribution (Mw/Mn<1.5) reacts an aromatic diisocyanate at an NCO/OH ratio from about 1.3 to about 3.0 to give a non-viscous isocyanate-terminated prepolymer. A mixture that contains this prepolymer and an aliphatic diisocyanate is then reacted with an aromatic diamine to give a clear elastomer. The elastomers have excellent overall physical and mechanical properties, including resilience greater than 55%. The elastomers are valuable for in-line skates and other applications for which clarity is important.
    Type: Grant
    Filed: March 16, 1998
    Date of Patent: October 5, 1999
    Assignee: ARCO Chemical Technology, L.P.
    Inventors: Stephen D. Seneker, Chin-Chang Shen