Patents by Inventor Christian Buchner

Christian Buchner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200385215
    Abstract: The invention relates to an apparatus (14) for adapting a guide width (B) of a conveying device (12) for conveying containers for a container treatment installation. The apparatus (14) includes a longitudinally movable and pliable adjusting element (24), a guide element (20) for guiding the containers along a conveying direction (F) and a transmission device (26). For the adaptation of the guide width (B), the transmission device (26) is configured to convert a longitudinal movement, preferably a pushing and/or pulling movement, of the adjusting element (24) into a movement of the guide element (20) transversely with respect to the conveying direction (F). The pliability of the adjusting element (24) can make use possible even in curved regions of the conveying device (12). The adjusting element (24) can also be designed in a simple and cost-effective manner, for example in the form of a cable. (FIG.
    Type: Application
    Filed: May 28, 2020
    Publication date: December 10, 2020
    Inventor: Christian BUCHNER
  • Patent number: 9688864
    Abstract: A pumpable shelf-stable suspension of fibers in an organic phase comprising 1.0-60 wt % of fibers and 0.01-10 wt % of a disubstituted urea is proposed as well as a method using the disubstituted urea to suspend fibers in an organic phase.
    Type: Grant
    Filed: June 10, 2014
    Date of Patent: June 27, 2017
    Assignee: BASF SE
    Inventors: Bernhard Feichtenschlager, Radoslaw Kierat, Christian Buchner
  • Publication number: 20160280929
    Abstract: A pumpable shelf-stable suspension of fibers in an organic phase comprising 1.0-60 wt % of fibers and 0.01-10 wt % of a disubstituted urea is proposed as well as a method using the disubstituted urea to suspend fibers in an organic phase.
    Type: Application
    Filed: June 10, 2014
    Publication date: September 29, 2016
    Inventors: Bernhard FEICHTENSCHLAGER, Tadoslaw KIERAT, Christian BUCHNER
  • Publication number: 20130101738
    Abstract: An apparatus for transporting silicon wafers in a horizontal transporting direction into a printing device has two transporting units, which each have a traversing device and a holding means thereon. At least two transporting units each with a holding means are provided, wherein the traversing devices of said units run next to each other along the transporting direction. The holding means are each formed and arranged in such a way that an unloaded holding means has space to pass by a holding means loaded with a silicon wafer. The traversing devices are rails and the holding means are carriages mounted thereon.
    Type: Application
    Filed: September 2, 2010
    Publication date: April 25, 2013
    Applicant: SCHMID TECHNOLOGY GMBH
    Inventors: Jurgen Sollner, Thomas Sauter, Jens Munkel, Christian Buchner
  • Patent number: 8136478
    Abstract: A device for applying an even, thin fluid layer, in particular a phosphoric acid layer, onto substrates, in particular silicon cells for photovoltaic application, is provided with a process chamber, which is provided with a fluid pan and a high-frequency ultrasound device that converts the fluid into fluid mist, and with a transport device that is arranged beneath a fluid-mist dropping shaft of the process chamber for the substrates.
    Type: Grant
    Filed: March 28, 2006
    Date of Patent: March 20, 2012
    Assignee: Schmid Technology Systems GmbH
    Inventors: Christian Buchner, Johann Brunner, Helmut Kalmbach, Josef Gentischer
  • Publication number: 20090053397
    Abstract: A device for applying an even, thin fluid layer, in particular a phosphoric acid layer, onto substrates, in particular silicon cells for photovoltaic application, is provided with a process chamber, which is provided with a fluid pan and a high-frequency ultrasound device that converts the fluid into fluid mist, and with a transport device that is arranged beneath a fluid-mist dropping shaft of the process chamber for the substrates.
    Type: Application
    Filed: March 28, 2006
    Publication date: February 26, 2009
    Inventors: Christian Buchner, Johann Brunner, Helmut Kalmbach, Josef Gentischer
  • Publication number: 20080008970
    Abstract: In a lithographic process for producing microstructures by means of a direct-write system, predefined areas are exposed by means of a focused beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focused beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.
    Type: Application
    Filed: September 20, 2007
    Publication date: January 10, 2008
    Inventors: Roelof WIJNAENDTS, Christian Buchner
  • Publication number: 20070070318
    Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focused beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focused beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.
    Type: Application
    Filed: November 30, 2006
    Publication date: March 29, 2007
    Inventors: Roelof Wijnaendts, Christian Buchner
  • Publication number: 20060084010
    Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focussed beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focussed beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.
    Type: Application
    Filed: September 30, 2005
    Publication date: April 20, 2006
    Inventors: Roelof Wijnaendts, Christian Buchner
  • Publication number: 20050003306
    Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focussed beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focussed beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.
    Type: Application
    Filed: August 2, 2004
    Publication date: January 6, 2005
    Inventors: Roelof Wijnaendts, Christian Buchner
  • Publication number: 20030031956
    Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focussed beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focussed beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.
    Type: Application
    Filed: October 4, 2002
    Publication date: February 13, 2003
    Inventors: Roelof Wijnaendts, Christian Buchner
  • Publication number: 20010009751
    Abstract: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focussed beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the optical resolution of the system. For this purpose, the intensity of the focussed beam is modulated as a function of the spatial frequency of the structure to be produced, and the structure is produced by removing the photosensitive layer in accordance with a serially scanned grid pattern. The exposure is advantageously carried out in two successive exposure steps.
    Type: Application
    Filed: February 15, 2001
    Publication date: July 26, 2001
    Applicant: Heidelberg Instruments Mikrotechnik GmbH
    Inventors: Roelof Wijnaendts, Christian Buchner