Patents by Inventor Christian Hendrich
Christian Hendrich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200333271Abstract: The invention described herein relates to a method for controlling a unit of a particle beam device for imaging, analyzing and/or processing an object. Moreover, the invention described herein relates to a particle beam device for carrying out the method.Type: ApplicationFiled: May 5, 2020Publication date: October 22, 2020Applicant: Carl Zeiss Microscopy GmbHInventors: Christian Hendrich, Martin Kienle, Josef Biberger, Michal Postolski
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Patent number: 10658152Abstract: A method for controlling a particle beam device for imaging, analyzing and/or processing an object, and a particle beam device for carrying out the method. The particle beam device may be an electron beam device and/or or an ion beam device. The method may include identifying at least one control parameter of a unit of the particle beam device using an eye tracker by tracking at least one eye of a user of the particle beam device, and changing the at least one control parameter of the unit of the particle beam device.Type: GrantFiled: October 4, 2018Date of Patent: May 19, 2020Assignee: Carl Zeiss Microscopy GmbHInventors: Christian Hendrich, Josef Biberger
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Patent number: 10546717Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.Type: GrantFiled: March 19, 2018Date of Patent: January 28, 2020Assignee: Carl Zeiss Microscopy GmbHInventors: Edgar Fichter, Joerg Fober, Dirk Preikszas, Christian Hendrich, Michael Schnell, Momme Mommsen
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Patent number: 10274441Abstract: Generating an image of an object and/or a representation of data about the object uses a particle beam apparatus. The particle beam apparatus comprises at least one control unit for setting a guide unit by selecting a value of a control parameter of the control unit. A functional relationship is determined between a first control parameter value and a second control parameter value depending on the predeterminable range of a landing energy of the particles. A desired value of the landing energy is set. The value of the control parameter corresponding to the desired value of the landing energy is selected on the basis of the determined functional relationship and the guide unit is controlled using the value of the control parameter corresponding to the desired value of the landing energy.Type: GrantFiled: May 22, 2017Date of Patent: April 30, 2019Assignee: CARL ZEISS MICROSCOPY GMBHInventors: Christian Hendrich, Bernd Schindler
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Publication number: 20180211815Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.Type: ApplicationFiled: March 19, 2018Publication date: July 26, 2018Inventors: Edgar Fichter, Joerg Fober, Dirk Preikszas, Christian Hendrich, Michael Schnell, Momme Mommsen
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Patent number: 9953804Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.Type: GrantFiled: April 22, 2016Date of Patent: April 24, 2018Assignee: Carl Zeiss Microscopy GmbHInventors: Edgar Fichter, Joerg Fober, Dirk Preikszas, Christian Hendrich, Michael Schnell, Momme Mommsen
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Patent number: 9947504Abstract: The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.Type: GrantFiled: June 13, 2016Date of Patent: April 17, 2018Assignee: Carl Zeiss Microscopy GmbHInventors: Klaus Hegele, Edgar Fichter, Michel Aliman, Dirk Preikszas, Christian Hendrich, Momme Mommsen, Michael Schnell, Kai Schubert
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Publication number: 20170336335Abstract: Generating an image of an object and/or a representation of data about the object uses a particle beam apparatus. The particle beam apparatus comprises at least one control unit for setting a guide unit by selecting a value of a control parameter of the control unit. A functional relationship is determined between a first control parameter value and a second control parameter value depending on the predeterminable range of a landing energy of the particles. A desired value of the landing energy is set. The value of the control parameter corresponding to the desired value of the landing energy is selected on the basis of the determined functional relationship and the guide unit is controlled using the value of the control parameter corresponding to the desired value of the landing energy.Type: ApplicationFiled: May 22, 2017Publication date: November 23, 2017Inventors: Christian Hendrich, Bernd Schindler
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Publication number: 20170236683Abstract: The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.Type: ApplicationFiled: June 13, 2016Publication date: August 17, 2017Inventors: Klaus Hegele, Edgar Fichter, Michel Aliman, Dirk Preikszas, Christian Hendrich, Momme Mommsen, Michael Schnell, Kai Schubert
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Publication number: 20160314931Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.Type: ApplicationFiled: April 22, 2016Publication date: October 27, 2016Inventors: Edgar Fichter, Joerg Fober, Dirk Preikszas, Christian Hendrich, Michael Schnell, Momme Mommsen
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Patent number: 9312093Abstract: A particle beam device comprises a beam generator for generating a particle beam having charged particles and an electrode unit having a first electrode and a second electrode, wherein the first electrode interacts with the second electrode, in particular for guiding, shaping, aligning or correcting the particle beam. Moreover, the particle beam device comprises a low-pass filter being connected with at least one of: the first electrode and the second electrode, using an electrical connection. Additionally, the particle beam device comprises a mounting unit having an opening for the passage of the particle beam, wherein the at least one low-pass filter, the first electrode and the second electrode are arranged at the mounting unit. The electrode unit may comprise more than two electrodes, for example up to 16 electrodes.Type: GrantFiled: July 2, 2014Date of Patent: April 12, 2016Assignee: Carl Zeiss Microscopy GmbHInventors: Joerg Fober, Edgar Fichter, Kai Schubert, Dirk Preikszas, Christian Hendrich, Momme Mommsen, Michael Schnell, Lorenz Lechner
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Publication number: 20160020064Abstract: An apparatus for focusing and for storage of ions and an apparatus for separation of a first pressure area from a second pressure area are disclosed, in particular for an analysis apparatus for ions. A particle beam device may have at least one of the abovementioned apparatuses. A container for holding ions and at least one multipole unit are provided. The multipole unit has a through-opening with a longitudinal axis as well as a multiplicity of electrodes. A first set of the electrodes is at a first radial distance from the longitudinal axis. A second set of the electrodes is in each case at a second radial distance from the longitudinal axis. The first radial distance is less than the second radial distance. Alternatively or additionally, the apparatus may have an elongated opening with a radial extent. The opening has a longitudinal extent which is greater than the radial extent.Type: ApplicationFiled: July 20, 2015Publication date: January 21, 2016Inventors: Alexander Laue, Albrecht Glasmachers, Christian Hendrich, Dirk Preikszas, Michel Aliman, Hubert Mantz, Ulrike Zeile, Holger Doemer
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Patent number: 9230789Abstract: An apparatus for focusing and for storage of ions and an apparatus for separation of a first pressure area from a second pressure area are disclosed, in particular for an analysis apparatus for ions. A particle beam device may have at least one of the abovementioned apparatuses. A container for holding ions and at least one multipole unit are provided. The multipole unit has a through-opening with a longitudinal axis as well as a multiplicity of electrodes. A first set of the electrodes is at a first radial distance from the longitudinal axis. A second set of the electrodes is in each case at a second radial distance from the longitudinal axis. The first radial distance is less than the second radial distance. Alternatively or additionally, the apparatus may have an elongated opening with a radial extent. The opening has a longitudinal extent which is greater than the radial extent.Type: GrantFiled: January 27, 2011Date of Patent: January 5, 2016Assignee: Carl Zeiss Microscopy GmbHInventors: Alexander Laue, Albrecht Glasmachers, Christian Hendrich, Dirk Preikszas, Michel Aliman, Hubert Mantz, Ulrike Zeile, Holger Dömer
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Patent number: 8153967Abstract: A representation of a particle beam image is generated by acquiring plural data sets using a particle beam apparatus. Each data set represents secondary particle intensities from a region of an object. The secondary particle intensities are acquired for the different data sets with different parameter adjustments of the particle beam apparatus. From the plural acquired data sets image data are generated using a tone-mapping method. The image data are represented at an output medium.Type: GrantFiled: August 17, 2009Date of Patent: April 10, 2012Assignee: Carl Zeiss NTS GmbHInventor: Christian Hendrich
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Patent number: 8063364Abstract: A particle optical apparatus has a particle source for generating at least one beam of charged particles, and a magnet arrangement having two pole plates, which are arranged spaced apart from one another, such that the at least one beam of charged particles in operation passes through the pole plates, wherein trenches are provided in the pole plates, in which trenches coil wires are arranged. The trenches, when viewed in a cross section transverse to an extension direction of the trenches, have a smaller width in a region of a surface of the pole plates, than in a region arranged at a distance from the surface.Type: GrantFiled: December 22, 2009Date of Patent: November 22, 2011Assignee: Carl Zeiss NTS GmbHInventors: Dirk Preikszas, Michael Steigerwald, Daniel Tobias, Andreas Eisele, Momme Mommsen, Dietmar Doenitz, Christian Hendrich
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Publication number: 20110220788Abstract: An apparatus for focusing and for storage of ions and an apparatus for separation of a first pressure area from a second pressure area are disclosed, in particular for an analysis apparatus for ions. A particle beam device may have at least one of the abovementioned apparatuses. A container for holding ions and at least one multipole unit are provided. The multipole unit has a through-opening with a longitudinal axis as well as a multiplicity of electrodes. A first set of the electrodes is at a first radial distance from the longitudinal axis. A second set of the electrodes is in each case at a second radial distance from the longitudinal axis. The first radial distance is less than the second radial distance. Alternatively or additionally, the apparatus may have an elongated opening with a radial extent. The opening has a longitudinal extent which is greater than the radial extent.Type: ApplicationFiled: January 27, 2011Publication date: September 15, 2011Inventors: Alexander Laue, Albrecht Glasmachers, Christian Hendrich, Dirk Preikszas, Michel Aliman, Hubert Mantz, Ulrike Zeile, Holger Dömer
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Publication number: 20100155597Abstract: A particle optical apparatus has a particle source for generating at least one beam of charged particles, and a magnet arrangement having two pole plates, which are arranged spaced apart from one another, such that the at least one beam of charged particles in operation passes through the pole plates, wherein trenches are provided in the pole plates, in which trenches coil wires are arranged. The trenches, when viewed in a cross section transverse to an extension direction of the trenches, have a smaller width in a region of a surface of the pole plates, than in a region arranged at a distance from the surface.Type: ApplicationFiled: December 22, 2009Publication date: June 24, 2010Applicant: CARL ZEISS NTS GMBHInventors: Dirk PREIKSZAS, Michael STEIGERWALD, Daniel TOBIAS, Andreas EISELE, Momme MOMMSEN, Dietmar DOENITZ, Christian HENDRICH
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Publication number: 20100038534Abstract: A representation of a particle beam image is generated by acquiring plural data sets using a particle beam apparatus. Each data set represents secondary particle intensities from a region of an object. The secondary particle intensities are acquired for the different data sets with different parameter adjustments of the particle beam apparatus. From the plural acquired data sets image data are generated using a tone-mapping method. The image data are represented at an output medium.Type: ApplicationFiled: August 17, 2009Publication date: February 18, 2010Applicant: Carl Zeiss NTS GmbHInventor: Christian Hendrich
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Patent number: 7001403Abstract: A saw blade for medical, in particular surgical, applications having a recess for mounting the saw blade inside a saw which exerts an saw movement, especially an oscillating saw movement, to the saw blade. In order to improve the dynamic behavior of the saw blade, longitudinal flat areas of a surface of the saw blade are provided with a plurality of superficial impressions of a defined contour that are aligned at an angle to the longitudinal axis of the saw blade.Type: GrantFiled: March 5, 2001Date of Patent: February 21, 2006Inventors: Thomas Hausmann, Christian Hendrich
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Publication number: 20030032971Abstract: The invention relates to a saw blade (1) for medical, in particular, surgical applications which comprises a recess (3) for mounting the saw blade inside a saw which exerts a saw movement, especially an oscillating saw movement, onto the saw blade (1). In order to improve the dynamic behavior of the saw blade (1), the invention provides that the flat area (6) of the saw blade (1) has a number of superficial impressions (5) of a defined contour.Type: ApplicationFiled: September 5, 2002Publication date: February 13, 2003Inventors: Thomas Hausmann, Christian Hendrich