Patents by Inventor Christophe Navarro

Christophe Navarro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200301304
    Abstract: Some embodiments relate to an electrophoretic ink including particles that may have a negative charge, dispersed in a non-polar organic solvent. The ink includes a trialkylamine charge-control agent, selected from the following charge-control agents: tributylamine, triisobutylamine, tripentylamine, trihexylamine, tri(2-ethylhexyl)amine, trioctylamine, triisooctylamine, tridodecylamine, triisododecylamine. The particles have a hydrophobic surface and an isoelectric point (IEP) or a point of zero charge (PZC) that is lower than the pKa of the charge-control agent.
    Type: Application
    Filed: March 3, 2017
    Publication date: September 24, 2020
    Inventors: Deborah MIRBEL, Christophe NAVARRO, Cyril BROCHON, √Čric CLOUTET, Georges HADZIIOANNOU
  • Publication number: 20200231731
    Abstract: A process for preparing a nanostructured assembly by annealing a composition comprising a block copolymer on a surface. The block copolymer includes a first block resulting from the polymerization of at least one cyclic monomer having a structure as described herein. The block copolymer also includes a second block that includes a vinyl aromatic monomer.
    Type: Application
    Filed: October 7, 2016
    Publication date: July 23, 2020
    Applicant: Arkema France
    Inventors: Christophe NAVARRO, Celia Nicolet, Karim Aissou, Muhammad Mumtaz, Eric Cloutet, Cyril Brochon, Guillaume Fleury, Georges Hadziioannou
  • Publication number: 20200079912
    Abstract: The invention relates to a block copolymer film nanostructured in nanodomains, said copolymer comprising at least one first biodegradable block and a second block of a different chemical nature than the first block, said block copolymer being characterized in that the first biodegradable block is amorphous and in that the second block is derived from an oligomer or a polymer bearing a hydroxyl function on at least one end and acting as macro-initiator of the polymerization of the first block.
    Type: Application
    Filed: December 13, 2017
    Publication date: March 12, 2020
    Applicants: Arkema France, Centre National de la Recherche Scientifique, Université Toulouse III - Paul Sabatier
    Inventors: Christophe Navarro, Didier Bourissou, Blanca Martin-Vaca, Franck Kayser
  • Publication number: 20200057368
    Abstract: Provided is a process for controlling the critical dimension uniformity of ordered films of block copolymers on a nanometric scale. The invention also relates to the compositions used for controlling the critical dimension uniformity of ordered films of block copolymers and to the resulting ordered films that can be used in particular as masks in the lithography field.
    Type: Application
    Filed: October 17, 2019
    Publication date: February 20, 2020
    Applicant: Arkema France
    Inventors: Xavier Chevalier, Raber Inoubli, Christophe Navarro, Celia Nicolet
  • Publication number: 20190278170
    Abstract: A method for the directed self-assembly of a block copolymer by graphoepitaxy, includes forming a guide pattern, the guide pattern having a cavity with a bottom and side walls; forming a functionalisation layer on the guide pattern that has a first portion and a second portion disposed, respectively, on the bottom and side walls of the cavity; forming a protective layer on the first and second portions of the functionalisation layer; etching the protective layer and the second portion of the functionalisation layer such that a portion of the protective layer is retained and the side walls of the cavity are exposed, the retained portion of the protective layer having a thickness of less than 15 nm; selectively etching the portion of the protective layer relative to the first portion of the functionalisation layer and to the guide pattern; and depositing a block copolymer in the cavity.
    Type: Application
    Filed: May 23, 2017
    Publication date: September 12, 2019
    Inventors: Raluca TIRON, Nicolas POSSEME, Xavier CHEVALIER, Christophe NAVARRO
  • Publication number: 20190196336
    Abstract: A method for forming a chemical guiding structure intended for self-assembly of a block copolymer by chemoepitaxy, where the method includes forming on a substrate a functionalisation layer made of a first polymer material having a first chemical affinity with respect to the block copolymer; forming on the substrate guiding patterns made of a second polymer material having a second chemical affinity with respect to the block copolymer, different from the first chemical affinity, and wherein the guiding to patterns have a critical dimension of less than 12.5 nm and are formed by means of a mask comprising spacers.
    Type: Application
    Filed: December 20, 2018
    Publication date: June 27, 2019
    Inventors: Raluca TIRON, Guillaume CLAVEAU, Ahmed GHARBI, Laurent PAIN, Xavier CHEVALIER, Christophe NAVARRO, Anne PAQUET
  • Publication number: 20190187559
    Abstract: Provided is a block copolymer film nanostructured in nanodomains, where the copolymer includes at least one first biodegradable block of polyester type and a second block of a different chemical nature than the first block. The first block of polyester type is polybutyrolactone (PBL) and the second block is derived from an oligomer or from a polymer bearing a hydroxyl function on at least one end and acting as macro-initiator of the polymerization of ?-butyrolactone (?-BL) to give polybutyrolactone (PBL).
    Type: Application
    Filed: June 22, 2017
    Publication date: June 20, 2019
    Applicants: Arkema France, Centre National De La Recherche Scientifique - CNR, Universite Toulouse III - Paul Sabatier
    Inventors: Christophe Navarro, Didier Bourissou, Blanca Martin-Vaca, Aline Couffin, Franck Kayser
  • Patent number: 10316127
    Abstract: The present invention relates to a multistage polymer, its composition, its process of preparation, and its use as impact modifier in thermoplastic compositions. More particularly the present invention relates to a process for manufacturing a polymer composition comprising a multistage polymer and its use as impact modifier in thermoplastic compositions.
    Type: Grant
    Filed: November 24, 2015
    Date of Patent: June 11, 2019
    Assignee: Arkema France
    Inventors: Christophe Navarro, Aline O. Couffin, Rosangela Pirri, Frederic Malet
  • Patent number: 10199135
    Abstract: The invention relates to stable compositions of carbon nanotubes and of electrolytic polymers, these electrolytic polymers being characterized by the presence of phosphonyl imide or sulfonyl imide functions or alternatively phosphoric acid functions. The invention also relates to the manufacture of transparent electrodes comprising these compositions of carbon nanotubes and of electrolytic polymers.
    Type: Grant
    Filed: October 29, 2014
    Date of Patent: February 5, 2019
    Assignees: ARKEMA FRANCE, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, UNIVERSITE DE BORDEAUX, INSTITUT POLYTECHNIQUE DE BORDEAUX
    Inventors: Christophe Navarro, Wiljan Smaal, Muhammad Mumtaz, Eric Cloutet, Cyril Brochon, Georges Hadziioannou
  • Publication number: 20190002657
    Abstract: Provided is a process for reducing the number of defects of an ordered film of a diblock copolymer on a surface. The process includes curing, on a surface, a composition including a diblock copolymer at a structuring temperature between the Tg of the diblock copolymer and the decomposition temperature of the diblock copolymer to form an ordered film of the diblock copolymer on the substrate. The composition has a product Xeffective*N of between 10.5 and 40 at the structuring temperature, where Xeffective is the Flory-Huggins parameter of the diblock copolymer and N is the total degree of polymerization of the blocks of the diblock copolymer.
    Type: Application
    Filed: December 16, 2016
    Publication date: January 3, 2019
    Applicant: ARKEMA FRANCE
    Inventors: Christophe NAVARRO, Celia NICOLET, Xavier CHEVALIER
  • Publication number: 20190002684
    Abstract: Provided is a process for reducing the structuring time of an ordered film of a diblock copolymer on a surface. The process includes curing, on a surface, a composition including a diblock copolymer at a structuring temperature between the Tg of the diblock copolymer and the decomposition temperature of the diblock copolymer to form an ordered film of the diblock copolymer on the substrate. The composition has a product ?effective*N of between 10.5 and 40 at the structuring temperature, where ?effective is the Flory-Huggins parameter of the diblock copolymer and N is the total degree of polymerization of the blocks of the diblock copolymer.
    Type: Application
    Filed: December 16, 2016
    Publication date: January 3, 2019
    Applicant: ARKEMA FRANCE
    Inventors: Christophe NAVARRO, Celia NICOLET, Xavier CHEVALIER
  • Publication number: 20180371145
    Abstract: Provided is a process for improving the critical dimension uniformity of an ordered film of a diblock copolymer on a surface. The process includes curing, on a surface, a composition including a diblock copolymer at a structuring temperature between the Tg of the diblock copolymer and the decomposition temperature of the diblock copolymer to form an ordered film of the diblock copolymer on the substrate. The composition has a product Xeffective*N of between 10.5 and 40 at the structuring temperature, where Xeffective is the Flory-Huggins parameter of the diblock copolymer and N is the total degree of polymerization of the blocks of the diblock copolymer.
    Type: Application
    Filed: December 16, 2016
    Publication date: December 27, 2018
    Applicant: Arkema France
    Inventors: Christophe NAVARRO, Celia NICOLET, Xavier CHEVALIER
  • Publication number: 20180364562
    Abstract: Provided is a process for forming an ordered film of a block copolymer on a surface. The process includes curing, on a surface, a composition comprising at least one block copolymer at a structuring temperature between the highest Tg of the at least one block copolymer and the decomposition temperature of the at least one block copolymer to form an ordered film comprising the at least one block copolymer on the substrate. The composition has a product ? effective*N of between 10.5 and 40 at the structuring temperature, where ? effective is the Flory-Huggins parameter of the block copolymer and N is the total degree of polymerization of the blocks of the block copolymer. The ordered film has a thickness greater than 20 nm and a period greater than 10 nm.
    Type: Application
    Filed: December 16, 2016
    Publication date: December 20, 2018
    Applicant: ARKEMA FRANCE
    Inventors: Christophe NAVARRO, Celia NICOLET, Xavier CHEVALIER
  • Publication number: 20180346643
    Abstract: The invention relates to a process for controlling the structure of a block copolymer by selective copolymerization, by ring opening, of cyclic carbonate and lactone monomers in the presence of a catalyst based on methanesulfonic acid, the said process comprising a sequence of stages carried out strictly in the following order: a) dissolving the cyclic carbonate monomer in a nonchlorinated aromatic solvent, b) adding, to the monomer solution, a bifunctional initiator chosen from diols or water, c) adding methanesulfonic acid (MSA) as catalyst of the polymerization reaction, d) when all the cyclic carbonate has been consumed, a telechelic polycarbonate capable of acting as macroinitiator of polymerization of the lactone is obtained, e) adding the lactone to the reaction medium in order to selectively obtain a block copolymer.
    Type: Application
    Filed: November 29, 2016
    Publication date: December 6, 2018
    Applicants: ARKEMA FRANCE, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, UNIVERSITE PAUL SABATIER (TOULOUSE III)
    Inventors: Christophe NAVARRO, Didier BOURISSOU, Blanca MARTIN-VACA, Aline COUFFIN, Franck KAYSER
  • Publication number: 20180203348
    Abstract: The present invention relates to a process for controlling the critical dimension uniformity of ordered films of block copolymers on a nanometric scale. The invention also relates to the compositions used for controlling the critical dimension uniformity of ordered films of block copolymers and to the resulting ordered films that can be used in particular as masks in the lithography field.
    Type: Application
    Filed: January 21, 2016
    Publication date: July 19, 2018
    Applicant: ARKEMA FRANCE
    Inventors: Xavier CHEVALIER, Raber INOUBLI, Christophe NAVARRO, Celia NICOLET
  • Patent number: 10023677
    Abstract: A method for controlling the synthesis of a block copolymer containing at least two blocks, with at least one nonpolar block and at least one polar block, said method making it possible in particular to control the ratio between the blocks and the molecular weight of each of the blocks, said copolymer being a block copolymer intended to be used as a mask in a method of nanolithography by direct self-assembly (DSA), said control being achieved by semicontinuous anionic polymerization in an aprotic nonpolar medium.
    Type: Grant
    Filed: December 16, 2015
    Date of Patent: July 17, 2018
    Assignee: Arkema France
    Inventors: Christophe Navarro, Celia Nicolet, Xavier Chevalier
  • Patent number: 10011673
    Abstract: The present invention relates to thermoplastic compositions comprising as impact modifier a rubber containing graft polymer prepared by the process of emulsion polymerization and recovered by a special process controlling and adjusting the pH value, the use of the thermoplastic compositions in the production of molded bodies, and to the molded, bodies themselves. The present invention relates also to thermoplastic compositions comprising a polymeric impact modifier with a core-shell structure made by a multistage process and recovered by a special process controlling and adjusting the pH value comprising at least one gradient polymer the use of the thermoplastic compositions in the production of molded bodies, and to the molded, bodies themselves.
    Type: Grant
    Filed: December 14, 2011
    Date of Patent: July 3, 2018
    Assignee: Arkema France
    Inventors: Christophe Navarro, Stephane Girois, Elisabeth Bay, Jean-Claude Saint-Martin, Magali Bergeret-Richaud
  • Patent number: 10011675
    Abstract: The invention relates to a block copolymer film nanostructured in nanodomains at a predetermined temperature, obtained from a basic block copolymer which is nonstructured at said predetermined temperature, and at least one block of which comprises styrene and at least another block of which comprises methyl methacrylate. The block copolymer film is useful for forming nano-lithography masks.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: July 3, 2018
    Assignee: Arkema France
    Inventors: Christophe Navarro, Celia Nicolet, Xavier Chevalier
  • Publication number: 20180173094
    Abstract: The invention relates to a process for controlling the surface energy at the upper interface of a block copolymer (BCP1), the lower interface of which is in contact with a preneutralized surface of a substrate, in order to make it possible to obtain an orientation of the nanodomains of the block copolymer (BCP1) perpendicularly to the two lower and upper interfaces, the said process consisting in covering the upper surface of the block copolymer (BCP1) with an upper surface neutralization layer (TC) and being characterized in that the said upper surface neutralization layer (TC) comprises a second block copolymer (BCP2).
    Type: Application
    Filed: May 26, 2016
    Publication date: June 21, 2018
    Applicants: ARKEMA FRANCE, CENTER NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS), INSTITUT POLYTECHNIQUE DE BORDEAUX, UNIVERSITE DE BORDEAUX
    Inventors: Xavier CHEVALIER, Celia NICOLET, Christophe NAVARRO, Georges HADZIIOANNOU
  • Publication number: 20180171134
    Abstract: The invention relates to a process for reducing the defectivity of a block copolymer (BCP1) film, the lower surface of which is in contact with a preneutralized surface (N) of a substrate (S) and the upper surface of which is covered by an upper surface neutralization layer (TC) in order to make it possible to obtain an orientation of the nanodomains of the block copolymer (BCP1) perpendicularly to the two lower and upper interfaces, where the upper surface neutralization layer (TC) employed to cover the upper surface of the block copolymer (BCP1) film comprises a second block copolymer (BCP2).
    Type: Application
    Filed: May 26, 2016
    Publication date: June 21, 2018
    Applicants: ARKEMA FRANCE, INSTITUT POLYTECHNIQUE DE BORDEAUX, UNIVERSITE DE BORDEAUX, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
    Inventors: Xavier Chevalier, Celia NICOLET, Christophe NAVARRO, Georges HADZIIOANNOU