Abstract: The present invention relates to a composition comprising crystals of one or more zeolites, at least one polymeric binder, in an amount between 0.5% and 20% by weight, and at least one ion conductor comprising at least one lithium salt. The invention also relates to the use of said composition as a battery separator, for example of a secondary battery, more specifically of an all-solid-state battery.

Abstract: The invention relates to a composition of a solid electrolyte which makes possible the manufacture of a film exhibiting a very good compromise between ion conductivity, electrochemical stability, high-temperature stability and mechanical strength. This film is intended for a separator application, in particular for Li-ion batteries. The invention also relates to a Li-ion battery comprising such a separator.

Abstract: A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.

Abstract: A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.

Abstract: The invention relates to a method for nanostructuring a substrate (10) for the preparation of a nanostructured substrate having nanostructures of different dimensions, the method including removing the crosslinked polymer layer (TC) and one of the blocks of the nanostructured block copolymer so as to form patterns of a nanolithography mask; said method being characterized in that the removal of one of the blocks is a removal of only a portion of the nanodomains (21, 22) of one of the blocks of the nanostructured block copolymer, in particular of only the perpendicular nanodomains (Z1) of said block, such that the parallel nanodomains (21, 22) of at least two blocks of the nanostructured block copolymer form patterns of the nanolithography mask; and so as to generate in the nanolithography mask patterns (M1, M2, M3) of different dimensions and nanostructures in the nanostructured substrate of different dimensions after etching.

Abstract: A method for forming a chemical guiding structure intended for the self-assembly of a block copolymer by chemoepitaxy, includes forming on a substrate at least one initial pattern made of a first grafted polymer material having a first molar mass and a first chemical affinity with respect to the block copolymer; covering the initial pattern and a region of the substrate adjacent to the initial pattern with a layer including a second graftable polymer material, the second polymer material having a second molar mass, greater than the first molar mass, and a second chemical affinity with respect to the block copolymer, different from the first chemical affinity; and grafting the second polymer material in the region adjacent to the initial pattern.

Abstract: A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.

Abstract: A method for the directed self-assembly of a block copolymer by graphoepitaxy, includes forming a guide pattern, the guide pattern having a cavity with a bottom and side walls; forming a functionalisation layer on the guide pattern that has a first portion and a second portion disposed, respectively, on the bottom and side walls of the cavity; forming a protective layer on the first and second portions of the functionalisation layer; etching the protective layer and the second portion of the functionalisation layer such that a portion of the protective layer is retained and the side walls of the cavity are exposed, the retained portion of the protective layer having a thickness of less than 15 nm; selectively etching the portion of the protective layer relative to the first portion of the functionalisation layer and to the guide pattern; and depositing a block copolymer in the cavity.

Abstract: A method for forming a chemical guiding structure intended for self-assembly of a block copolymer by chemoepitaxy, where the method includes forming on a substrate a functionalisation layer made of a first polymer material having a first chemical affinity with respect to the block copolymer; forming on the substrate guiding patterns made of a second polymer material having a second chemical affinity with respect to the block copolymer, different from the first chemical affinity, and wherein the guiding to patterns have a critical dimension of less than 12.5 nm and are formed by means of a mask comprising spacers.

Abstract: Some embodiments relate to an electrophoretic ink including particles that may have a negative charge, dispersed in a non-polar organic solvent. The ink includes a trialkylamine charge-control agent, selected from the following charge-control agents: tributylamine, triisobutylamine, tripentylamine, trihexylamine, tri(2-ethylhexyl)amine, trioctylamine, triisooctylamine, tridodecylamine, triisododecylamine. The particles have a hydrophobic surface and an isoelectric point (IEP) or a point of zero charge (PZC) that is lower than the pKa of the charge-control agent.

Abstract: A process for preparing a nanostructured assembly by annealing a composition comprising a block copolymer on a surface. The block copolymer includes a first block resulting from the polymerization of at least one cyclic monomer having a structure as described herein. The block copolymer also includes a second block that includes a vinyl aromatic monomer.

Abstract: The invention relates to a block copolymer film nanostructured in nanodomains, said copolymer comprising at least one first biodegradable block and a second block of a different chemical nature than the first block, said block copolymer being characterized in that the first biodegradable block is amorphous and in that the second block is derived from an oligomer or a polymer bearing a hydroxyl function on at least one end and acting as macro-initiator of the polymerization of the first block.

Abstract: Provided is a process for controlling the critical dimension uniformity of ordered films of block copolymers on a nanometric scale. The invention also relates to the compositions used for controlling the critical dimension uniformity of ordered films of block copolymers and to the resulting ordered films that can be used in particular as masks in the lithography field.

Abstract: A method for the directed self-assembly of a block copolymer by graphoepitaxy, includes forming a guide pattern, the guide pattern having a cavity with a bottom and side walls; forming a functionalisation layer on the guide pattern that has a first portion and a second portion disposed, respectively, on the bottom and side walls of the cavity; forming a protective layer on the first and second portions of the functionalisation layer; etching the protective layer and the second portion of the functionalisation layer such that a portion of the protective layer is retained and the side walls of the cavity are exposed, the retained portion of the protective layer having a thickness of less than 15 nm; selectively etching the portion of the protective layer relative to the first portion of the functionalisation layer and to the guide pattern; and depositing a block copolymer in the cavity.

Abstract: A method for forming a chemical guiding structure intended for self-assembly of a block copolymer by chemoepitaxy, where the method includes forming on a substrate a functionalisation layer made of a first polymer material having a first chemical affinity with respect to the block copolymer; forming on the substrate guiding patterns made of a second polymer material having a second chemical affinity with respect to the block copolymer, different from the first chemical affinity, and wherein the guiding to patterns have a critical dimension of less than 12.5 nm and are formed by means of a mask comprising spacers.

Abstract: Provided is a block copolymer film nanostructured in nanodomains, where the copolymer includes at least one first biodegradable block of polyester type and a second block of a different chemical nature than the first block. The first block of polyester type is polybutyrolactone (PBL) and the second block is derived from an oligomer or from a polymer bearing a hydroxyl function on at least one end and acting as macro-initiator of the polymerization of ?-butyrolactone (?-BL) to give polybutyrolactone (PBL).

Abstract: The present invention relates to a multistage polymer, its composition, its process of preparation, and its use as impact modifier in thermoplastic compositions. More particularly the present invention relates to a process for manufacturing a polymer composition comprising a multistage polymer and its use as impact modifier in thermoplastic compositions.

Abstract: The invention relates to stable compositions of carbon nanotubes and of electrolytic polymers, these electrolytic polymers being characterized by the presence of phosphonyl imide or sulfonyl imide functions or alternatively phosphoric acid functions. The invention also relates to the manufacture of transparent electrodes comprising these compositions of carbon nanotubes and of electrolytic polymers.

Abstract: Provided is a process for reducing the number of defects of an ordered film of a diblock copolymer on a surface. The process includes curing, on a surface, a composition including a diblock copolymer at a structuring temperature between the Tg of the diblock copolymer and the decomposition temperature of the diblock copolymer to form an ordered film of the diblock copolymer on the substrate. The composition has a product Xeffective*N of between 10.5 and 40 at the structuring temperature, where Xeffective is the Flory-Huggins parameter of the diblock copolymer and N is the total degree of polymerization of the blocks of the diblock copolymer.

Abstract: Provided is a process for reducing the structuring time of an ordered film of a diblock copolymer on a surface. The process includes curing, on a surface, a composition including a diblock copolymer at a structuring temperature between the Tg of the diblock copolymer and the decomposition temperature of the diblock copolymer to form an ordered film of the diblock copolymer on the substrate. The composition has a product ?effective*N of between 10.5 and 40 at the structuring temperature, where ?effective is the Flory-Huggins parameter of the diblock copolymer and N is the total degree of polymerization of the blocks of the diblock copolymer.