Abstract: A method for manufacturing a semiconductor device includes: providing a wafer-bonding stack structure having a sidewall layer and an exposed first component layer; forming a photoresist layer on the first component layer; performing an edge trimming process to at least remove the sidewall layer; and removing the photoresist layer. In this way, contaminant particles generated from the blade during the edge trimming process may fall on the photoresist layer but not fall on the first component layer, so as to protect the first component layer from being contaminated.

Abstract: A method for manufacturing a semiconductor device includes: providing a wafer-bonding stack structure having a sidewall layer and an exposed first component layer; forming a photoresist layer on the first component layer; performing an edge trimming process to at least remove the sidewall layer; and removing the photoresist layer. In this way, contaminant particles generated from the blade during the edge trimming process may fall on the photoresist layer but not fall on the first component layer, so as to protect the first component layer from being contaminated.

Abstract: A nanoscale motion apparatus includes a fixed base, a movable platform, and means for moving the movable platform connected between the fixed base and the movable platform. A sensing device includes a holder, at least two nanosensors, and a measurement plate. The holder is mounted on the fixed base. The nanosensors are configured on the holder. The measurement plate is mounted on the movable platform. The measurement plate can be sensed by the nanosensors so as to measure the corresponding variation between the fixed base and the movable platform.

Abstract: A nanoscale motion apparatus comprises a fixed base, a movable platform, and means for moving the movable platform connected between the fixed base and the movable platform. A sensing device comprises a holder, at least two nanosensors, and a measurement plate. The holder is mounted on the fixed base. The nanosensors are configured on the holder. The measurement plate is mounted on the movable platform. The measurement plate can be sensed by the nanosensors so as to measure the corresponding variation between the fixed base and the movable platform.

Abstract: A piezoelectric linear motor apparatus and method is provided. The apparatus comprises a carriage configured to be actuated and a stator configured to actuate the carriage. The stator comprises a meander line structure and a gear teeth structure, coupled to the top of the meander line structure and a contact layer underneath the carriage. Furthermore, the meander line structure comprises a series of bimorph actuators laid linearly in the meander line structure. Each pair of neighboring bimorph actuators being linked with a corresponding connector on both sides of top and bottom. The meander line structure also comprises an odd series of connectors and an even series of connectors, interleaved with each individual connector, applied with phase-splitter's alternating current (AC) power to deform the bimorph actuators for generating traveling wave. The gear teeth structure is configured to transport traveling wave from the meander line structure to the carriage.