Patents by Inventor Chun-Jen Chen

Chun-Jen Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250014946
    Abstract: A method includes etching a gate stack to form a trench extending through the gate stack, the gate stack including a metal gate electrode and a gate dielectric, wherein forming the trench removes a portion of the gate stack to separate the gate stack into a first gate stack portion and a second gate stack portion; extending the trench through an isolation region under the gate stack and into a semiconductor substrate under the isolation region; conformally depositing a first dielectric material on surfaces in the trench; and depositing a second dielectric material on the first dielectric material to fill the trench, wherein the first dielectric material is a more flexible material than the second dielectric material.
    Type: Application
    Filed: July 7, 2023
    Publication date: January 9, 2025
    Inventors: Fan Hsuan Chien, Su-Yu Yeh, Teng-Ta Hung, Chun-Jen Chen, Pei Yen Cheng, Shih-Chi Lin
  • Patent number: 12176297
    Abstract: A semiconductor device package includes a first substrate, a second substrate, a first electronic component, a second electronic component and a shielding layer. The second substrate is disposed over the first substrate. The first electronic component is disposed between the first substrate and the second substrate. The second electronic component is disposed between the first substrate and the second substrate and adjacent to the second substrate than the first electronic component. The shielding element electrically connects the second electronic component to the second substrate. The second electronic component and the shielding element define a space accommodating the first electronic component.
    Type: Grant
    Filed: April 12, 2022
    Date of Patent: December 24, 2024
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Hao-Chih Hsieh, Tzu-Cheng Lin, Chun-Jen Chen
  • Publication number: 20240335982
    Abstract: Provided is a mold with a variotherm mold temperature structure, including a based body, a heating device and an air control device. A mold cavity and a hot runner are provided inside the base body. The inside of the hot runner is filled with a working fluid, and the temperature and circulation of the working fluid are maintained by the heating device. A cold gas runner is provided between the hot runner and the mold cavity, and a plurality of brackets are arranged inside the cold gas runner. The air control device is communicated with one end of the cold gas runner, and can inject medium and low temperature gas from one end of the cold gas runner such that the medium and low temperature gas exchanges temperature with the base body.
    Type: Application
    Filed: May 11, 2023
    Publication date: October 10, 2024
    Inventors: Shun-Fu Lin, Chun-Jen Chen
  • Publication number: 20240304705
    Abstract: A semiconductor device includes a gate structure on a substrate, a first spacer on a sidewall of the gate structure, a second spacer on a sidewall of the first spacer, a third spacer on a sidewall of the second spacer, and first and second stacks of an epitaxial layer and a cap layer respectively disposed at first and second sides of the gate structure. Preferably, a part of the second spacer comprises an I-shape, the cap layer includes a planar top surface and an inclined sidewall, the cap layer contacts the second spacer and the third spacer directly, and the cap layer includes a vertical sidewall connected to the inclined sidewall.
    Type: Application
    Filed: May 16, 2024
    Publication date: September 12, 2024
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Wei-Chih Chuang, Chia-Jong Liu, Kuang-Hsiu Chen, Chung-Ting Huang, Chi-Hsuan Tang, Kai-Hsiang Wang, Bing-Yang Jiang, Yu-Lin Cheng, Chun-Jen Chen, Yu-Shu Lin, Jhong-Yi Huang, Chao-Nan Chen, Guan-Ying Wu
  • Publication number: 20240274715
    Abstract: A semiconductor device includes a gate structure on a substrate and an epitaxial layer adjacent to the gate structure, in which the epitaxial layer includes a first buffer layer, an anisotropic layer on the first buffer layer, a second buffer layer on the first buffer layer, and a bulk layer on the anisotropic layer. Preferably, a concentration of boron in the bulk layer is less than a concentration of boron in the anisotropic layer, a concentration of boron in the first buffer layer is less than a concentration of boron in the second buffer layer, and the concentration of boron in the second buffer layer is less than the concentration of boron in the anisotropic layer.
    Type: Application
    Filed: March 21, 2023
    Publication date: August 15, 2024
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Kai-Hsiang Wang, Yi-Fan Li, Chung-Ting Huang, Chi-Hsuan Tang, Chun-Jen Chen, Ti-Bin Chen, Chih-Chiang Wu
  • Patent number: 12051634
    Abstract: A package includes a die, first conductive structures, second conductive structures, and an encapsulant. The die has a rear surface. The first conductive structures and the second conductive structures surround the die. The first conductive structures include cylindrical columns and the second conductive structures include elliptical columns. At least one of the second conductive structures is closer to the die than the first conductive structures. The encapsulant encapsulates the die, the first conductive structures, and the second conductive structures.
    Type: Grant
    Filed: July 21, 2023
    Date of Patent: July 30, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Sheng-Huan Chiu, Chun-Jen Chen, Chen-Shien Chen, Kuo-Chio Liu, Kuo-Hui Chang, Chung-Yi Lin, Hsi-Kuei Cheng, Yi-Jen Lai
  • Patent number: 12021134
    Abstract: A semiconductor device includes a gate structure on a substrate, a first spacer on a sidewall of the gate structure, a second spacer on a sidewall of the first spacer, a third spacer on a sidewall of the second spacer, and first and second stacks of an epitaxial layer and a cap layer respectively disposed at first and second sides of the gate structure. Preferably, a part of the second spacer comprises an I-shape, the cap layer includes a planar top surface and an inclined sidewall, the cap layer contacts the second spacer and the third spacer directly, and the cap layer includes a vertical sidewall connected to the inclined sidewall.
    Type: Grant
    Filed: December 1, 2022
    Date of Patent: June 25, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Wei-Chih Chuang, Chia-Jong Liu, Kuang-Hsiu Chen, Chung-Ting Huang, Chi-Hsuan Tang, Kai-Hsiang Wang, Bing-Yang Jiang, Yu-Lin Cheng, Chun-Jen Chen, Yu-Shu Lin, Jhong-Yi Huang, Chao-Nan Chen, Guan-Ying Wu
  • Publication number: 20240184198
    Abstract: Microcapsules including a color-filtering shell and a core comprising a leuco dye or dye precursor, a photoinitiator or photosensitizer, and a photohardenable or photosoftenable material are provided for use in microcapsule imaging sheets. The imaging sheets including such microcapsules reduce undesirable crosstalk among the microcapsules of various colors and provide significantly improved color fidelity of the image thus reproduced.
    Type: Application
    Filed: December 2, 2022
    Publication date: June 6, 2024
    Applicant: Polaroid IP B.V.
    Inventors: Rong-Chang Liang, Wei You, Chun-Jen Chen
  • Publication number: 20240152880
    Abstract: A multi-channel payment method for a multi-channel payment system comprises the payer or the payee who initiated the payment request logs in to the multi-channel payment system; the payer or the payee who initiated the payment request placing an order in the multi-channel payment system, wherein the order comprises a designated payment gateway; the multi-channel payment system determining a predicted fee of the order according to the designated payment gateway, past order records, and a real-time exchange rate; the multi-channel payment system performing an anti-money laundering verification of the order; the payer reviewing the order and the predicted fee through a multiple auditing method; and the multi-channel payment system executing payment from the payer to the payee according to the order and the designated payment gateway, and storing a payment detail of the order.
    Type: Application
    Filed: February 13, 2023
    Publication date: May 9, 2024
    Applicant: OBOOK INC.
    Inventors: Chun-Kai Wang, Chung-Han Hsieh, Chun-Jen Chen, Po-Hua Lin, Wei-Te Lin, Pei-Hsuan Weng, Mei-Su Wang, I-Cheng Lin, Cheng-Wei Chen
  • Publication number: 20240154642
    Abstract: The present disclosure provides an electronic module including a circuit including a transmitting part and a receiving part physically separated from the transmitting part. The electronic module also includes an element isolated from the circuit and configured to block electrical interference between the transmitting part and the receiving part.
    Type: Application
    Filed: January 16, 2024
    Publication date: May 9, 2024
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Shih-Wen LU, Chun-Jen CHEN, Po-Hsiang TSENG, Hsin-Han LIN, Ming-Lun YU
  • Publication number: 20240038682
    Abstract: A laser grooving operation is performed to form a plurality of grooves in a semiconductor die prior to attaching the semiconductor die to a semiconductor device package substrate. In addition to forming a first groove through which blade sawing is to be performed to separate the semiconductor die from other semiconductor dies, a second groove may be formed between the first groove and a seal ring of the semiconductor die. The second groove is configured to contain any potential delamination that might otherwise propagate to an active region of the semiconductor die. Accordingly, the second groove and the associated laser grooving operation described herein may reduce the likelihood of delamination that might otherwise be caused by swelling and/or expansion in a molding compound formed around the semiconductor die after the semiconductor die is attached to the semiconductor device package substrate.
    Type: Application
    Filed: July 26, 2022
    Publication date: February 1, 2024
    Inventors: Tien-Chung YANG, Li-Hsien HUANG, Ming-Feng WU, Yung-Sheng LIU, Chun-Jen CHEN, Jun HE
  • Patent number: 11876551
    Abstract: The present disclosure provides an electronic module including a circuit including a transmitting part and a receiving part physically separated from the transmitting part. The electronic module also includes an element isolated from the circuit and configured to block electrical interference between the transmitting part and the receiving part.
    Type: Grant
    Filed: August 19, 2021
    Date of Patent: January 16, 2024
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Shih-Wen Lu, Chun-Jen Chen, Po-Hsiang Tseng, Hsin-Han Lin, Ming-Lun Yu
  • Publication number: 20230393459
    Abstract: Microcapsules including a polymeric shell and an internal phase including a non-photopolymerizable reactive diluent are provided for use in microcapsule imaging sheets. Imaging sheets including microcapsules which include a non-photopolymerizable reactive diluent, and which exhibit improvements in color development (Dmax), discoloration (yellowing) resistance, mechanical properties (e.g., peel strength), and temperature latitude of imaging sheets including leuco dyes.
    Type: Application
    Filed: June 6, 2022
    Publication date: December 7, 2023
    Applicant: Polaroid IP B.V.
    Inventors: Wei You, Chun-Jen Chen, Rong-Chang Liang
  • Publication number: 20230395719
    Abstract: A method for fabricating a semiconductor device includes the steps of forming a gate structure on a substrate, forming an epitaxial layer adjacent to the gate structure, and then forming a first cap layer on the epitaxial layer. Preferably, a top surface of the first cap layer includes a curve concave upward and a bottom surface of the first cap layer includes a planar surface higher than a top surface of the substrate.
    Type: Application
    Filed: August 17, 2023
    Publication date: December 7, 2023
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Chi-Hsuan Tang, Chung-Ting Huang, Bo-Shiun Chen, Chun-Jen Chen, Yu-Shu Lin
  • Publication number: 20230377955
    Abstract: A method for improving reliability of interconnect structures for semiconductor devices is disclosed. The method includes forming a contact structure on a transistor and forming a metallization layer on the contact structure. The forming the metallization layer includes depositing an inter-metal dielectric (IMD) layer on the transistor, forming an opening within the IMD layer to expose a top surface of the contact structure, depositing a metallic layer to fill the opening, forming an electron barrier layer within the IMD layer, and forming a capping layer within the metallic layer. The electron barrier layer has a hole carrier concentration higher than a hole carrier concentration of a portion of the IMD layer underlying the electron barrier layer. The capping layer has a hole carrier concentration higher than a hole carrier concentration of a portion of the metallic layer underlying the capping layer.
    Type: Application
    Filed: July 28, 2023
    Publication date: November 23, 2023
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chun-Jen CHEN, Kai-Shiung Hsu, Ding-I Liu, Jyh-nan Lin
  • Publication number: 20230369152
    Abstract: A package includes a die, first conductive structures, second conductive structures, and an encapsulant. The die has a rear surface. The first conductive structures and the second conductive structures surround the die. The first conductive structures include cylindrical columns and the second conductive structures include elliptical columns. At least one of the second conductive structures is closer to the die than the first conductive structures. The encapsulant encapsulates the die, the first conductive structures, and the second conductive structures.
    Type: Application
    Filed: July 21, 2023
    Publication date: November 16, 2023
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Sheng-Huan Chiu, Chun-Jen Chen, Chen-Shien Chen, Kuo-Chio Liu, Kuo-Hui Chang, Chung-Yi Lin, Hsi-Kuei Cheng, Yi-Jen Lai
  • Patent number: 11769833
    Abstract: A method for fabricating a semiconductor device includes the steps of forming a gate structure on a substrate, forming an epitaxial layer adjacent to the gate structure, and then forming a first cap layer on the epitaxial layer. Preferably, a top surface of the first cap layer includes a curve concave upward and a bottom surface of the first cap layer includes a planar surface higher than a top surface of the substrate.
    Type: Grant
    Filed: September 30, 2022
    Date of Patent: September 26, 2023
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chi-Hsuan Tang, Chung-Ting Huang, Bo-Shiun Chen, Chun-Jen Chen, Yu-Shu Lin
  • Patent number: 11756849
    Abstract: A package includes a die, first conductive structures, second conductive structures, an encapsulant, and a redistribution structure. The die has an active surface and a rear surface opposite to the active surface. The first conductive structures and the second conductive structures surround the die. A shape of the first conductive structures is different a shape of the second conductive structures. The second conductive structures include elliptical columns having straight sidewalls. A distance between the first conductive structure that is closest to the die and the die is greater than a distance between the second conductive structure that is closest to the die and the die. The encapsulant encapsulates the die, the first conductive structures, and the second conductive structures. The redistribution structure is over the die and the encapsulant. The redistribution structure is electrically connected to the die, the first conductive structures, and the second conductive structures.
    Type: Grant
    Filed: June 8, 2022
    Date of Patent: September 12, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Sheng-Huan Chiu, Chun-Jen Chen, Chen-Shien Chen, Kuo-Chio Liu, Kuo-Hui Chang, Chung-Yi Lin, Hsi-Kuei Cheng, Yi-Jen Lai
  • Publication number: 20230275047
    Abstract: A method includes forming a first polymer layer over a plurality of metal pads, and patterning the first polymer layer to forming a plurality of openings in the first polymer layer. The plurality of metal pads are exposed through the plurality of openings. A plurality of conductive vias are formed in the plurality of openings. A plurality of conductive pads are formed over and contacting the plurality of conductive vias. A conductive pad in the plurality of conductive pads is laterally shifted from a conductive via directly underlying, and in physical contact with, the conductive pad. A second polymer layer is formed to cover and in physical contact with the plurality of conductive pads.
    Type: Application
    Filed: April 28, 2022
    Publication date: August 31, 2023
    Inventors: Chun-Jen Chen, Wei-Chun Pai, Cheng Wei Ho, Sheng-Huan Chiu
  • Publication number: 20230245991
    Abstract: In an embodiment, a device includes: an integrated circuit die including a die connector; a dielectric layer on the integrated circuit die; an under-bump metallurgy layer having a line portion on the dielectric layer and having a via portion extending through the dielectric layer to contact the die connector; a through via on the line portion of the under-bump metallurgy layer, the through via having a first curved sidewall proximate the die connector, the through via having a second curved sidewall distal the die connector, the first curved sidewall having a longer arc length than the second curved sidewall; and an encapsulant around the through via and the under-bump metallurgy layer.
    Type: Application
    Filed: May 12, 2022
    Publication date: August 3, 2023
    Inventors: Chun-Jen Chen, Wei-Chun Pai, Cheng Wei Ho, Sheng-Huan Chiu