Patents by Inventor Chun-Wei Lo

Chun-Wei Lo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240200935
    Abstract: A measurement system including an excitation light source, an image sensor, and a calculator is provided. The excitation light source is configured to emit an excitation light beam. The image sensor is configured to record an image of the excitation light beam passing through a glass substrate having a plurality of vias. The image is a 2D interference pattern. The calculator is electrically connected to the image sensor. The calculator analyzes a 3D geometric-structure image of the vias in the glass substrate according to the image. A measurement method is also provided.
    Type: Application
    Filed: December 27, 2022
    Publication date: June 20, 2024
    Applicant: Industrial Technology Research Institute
    Inventors: Hsiang-Chun Wei, Chun-Wei Lo, Chung-Lun Kuo, Chih-Hsiang Liu
  • Patent number: 12007221
    Abstract: A heterogeneous integration detecting method and a heterogeneous integration detecting apparatus are provided. The heterogeneous integration detecting method includes the following. Under the condition of maintaining the same relative distance between an interference objective lens and a sample, the relative posture of the interference objective lens and the sample is continuously adjusted according to the change of an image of the sample in the field of view of the interference objective lens until a first optical axis of the interference objective lens is determined to be substantially perpendicular to the surface of the sample according to the image. The interference objective lens is replaced with an imaging objective lens and the geometric profile of at least one via of the sample is detected. A second optical axis of the imaging objective lens after replacement overlaps with the first optical axis of the interference objective lens before replacement.
    Type: Grant
    Filed: December 27, 2021
    Date of Patent: June 11, 2024
    Assignee: Industrial Technology Research Institute
    Inventors: Hsiang-Chun Wei, Chih-Hsiang Liu, Yi-Sha Ku, Chung-Lun Kuo, Chun-Wei Lo, Chieh-Yi Lo
  • Publication number: 20230160879
    Abstract: A method of training AI for label-free cell viability determination includes a step of providing a cell sample, a step of obtaining a fluorescence image and a DHM image of the cell sample, a step of determining a first cell viability of the cell sample according to the fluorescence image of the cell sample, a step of labeling the DHM image of the cell sample as a model specifying the first cell viability, and a step of performing AI training by using the model containing the DHM image of the cell sample.
    Type: Application
    Filed: December 28, 2021
    Publication date: May 25, 2023
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Hsiang-Chun WEI, Chih-Hsiang LIU, Chung-Lun KUO, Chun-Wei LO, Chia-Hung CHO, Wei-Hsiung TSAI
  • Publication number: 20230152086
    Abstract: A heterogeneous integration detecting method and a heterogeneous integration detecting apparatus are provided. The heterogeneous integration detecting method includes the following. Under the condition of maintaining the same relative distance between an interference objective lens and a sample, the relative posture of the interference objective lens and the sample is continuously adjusted according to the change of an image of the sample in the field of view of the interference objective lens until a first optical axis of the interference objective lens is determined to be substantially perpendicular to the surface of the sample according to the image. The interference objective lens is replaced with an imaging objective lens and the geometric profile of at least one via of the sample is detected. A second optical axis of the imaging objective lens after replacement overlaps with the first optical axis of the interference objective lens before replacement.
    Type: Application
    Filed: December 27, 2021
    Publication date: May 18, 2023
    Applicant: Industrial Technology Research Institute
    Inventors: Hsiang-Chun Wei, Chih-Hsiang Liu, Yi-Sha Ku, Chung-Lun Kuo, Chun-Wei Lo, Chieh-Yi Lo
  • Patent number: 11507020
    Abstract: An optical measurement system comprises a polarization beam splitter for dividing an incident beam into a reference beam and a measurement beam, a first beam splitter for reflecting the measurement beam to form a first reflected measurement beam, a spatial light modulator for modulating the first reflected measurement beam to form a modulated measurement beam, a condenser lens for focusing the modulated measurement beam to an object to form a penetrating measurement beam, an objective lens for converting the penetrating measurement beam into a parallel measurement beam, a mirror for reflecting the parallel measurement beam to form an object beam, a second beam splitter for reflecting the reference beam to a path coincident with that of the object beam, and a camera for receiving an interference signal generated by the reference beam and the object beam to generate an image of the object.
    Type: Grant
    Filed: September 22, 2020
    Date of Patent: November 22, 2022
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Hsiang-Chun Wei, Chung-Lun Kuo, Chia-Hung Cho, Chun-Wei Lo, Chih-Hsiang Liu
  • Publication number: 20210149337
    Abstract: An optical measurement system comprises a polarization beam splitter for dividing an incident beam into a reference beam and a measurement beam, a first beam splitter for reflecting the measurement beam to form a first reflected measurement beam, a spatial light modulator for modulating the first reflected measurement beam to form a modulated measurement beam, a condenser lens for focusing the modulated measurement beam to an object to form a penetrating measurement beam, an objective lens for converting the penetrating measurement beam into a parallel measurement beam, a mirror for reflecting the parallel measurement beam to form an object beam, a second beam splitter for reflecting the reference beam to a path coincident with that of the object beam, and a camera for receiving an interference signal generated by the reference beam and the object beam to generate an image of the object.
    Type: Application
    Filed: September 22, 2020
    Publication date: May 20, 2021
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Hsiang-Chun WEI, Chung-Lun KUO, Chia-Hung CHO, Chun-Wei LO, Chih-Hsiang LIU
  • Patent number: 10094774
    Abstract: A scattering measurement system is provided, including: a light source generator for generating a detection light beam with discontinuous multi-wavelengths, and generating a multi-order diffraction light beam with three-dimensional feature information when the detection light beam is incident on an object; a detector having a photosensitive array for receiving and converting the multi-order diffraction light beam into multi-order diffraction signals with the three-dimensional feature information; and a processing module for receiving the multi-order diffraction signals and comparing the multi-order diffraction signals with multi-order diffraction feature patterns in a database so as to analyze the three-dimensional feature information of the object.
    Type: Grant
    Filed: December 5, 2016
    Date of Patent: October 9, 2018
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chia-Liang Yeh, Yi-Chang Chen, Yi-Sha Ku, Chun-Wei Lo
  • Patent number: 9752866
    Abstract: A measurement system is configured to measure a surface structure of a sample. The surface of the sample has a thin film and a via, the depth of the via is larger than the thickness of the thin film. The measurement system includes a light source, a first light splitter, a first aperture stop, a lens assembly, a second aperture stop, a spectrum analyzer and an analysis module. The first light splitter disposed in the light emitting direction of the light source. The first aperture stop disposed between the light source and the first light splitter. The lens assembly is disposed between the first light splitter and the sample. The second aperture stop is disposed between the lens assembly and the first light splitter. The spectrum analyzer is disposed to at a side of the first light splitter opposite to the sample.
    Type: Grant
    Filed: December 29, 2015
    Date of Patent: September 5, 2017
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Hsiang-Chun Wei, Yi-Sha Ku, Chia-Hung Cho, Chieh-Yu Wu, Chun-Wei Lo, Chih-Hsiang Liu
  • Publication number: 20170146339
    Abstract: A measurement system is configured to measure a surface structure of a sample. The surface of the sample has a thin film and a via, the depth of the via is larger than the thickness of the thin film. The measurement system includes a light source, a first light splitter, a first aperture stop, a lens assembly, a second aperture stop, a spectrum analyzer and an analysis module. The first light splitter disposed in the light emitting direction of the light source. The first aperture stop disposed between the light source and the first light splitter. The lens assembly is disposed between the first light splitter and the sample. The second aperture stop is disposed between the lens assembly and the first light splitter. The spectrum analyzer is disposed to at a side of the first light splitter opposite to the sample.
    Type: Application
    Filed: December 29, 2015
    Publication date: May 25, 2017
    Inventors: Hsiang-Chun WEI, Yi-Sha KU, Chia-Hung CHO, Chieh-Yu WU, Chun-Wei LO, Chih-Hsiang LIU
  • Publication number: 20170082536
    Abstract: A scattering measurement system is provided, including: a light source generator for generating a detection light beam with discontinuous multi-wavelengths, and generating a multi-order diffraction light beam with three-dimensional feature information when the detection light beam is incident on an object; a detector having a photosensitive array for receiving and converting the multi-order diffraction light beam into multi-order diffraction signals with the three-dimensional feature information; and a processing module for receiving the multi-order diffraction signals and comparing the multi-order diffraction signals with multi-order diffraction feature patterns in a database so as to analyze the three-dimensional feature information of the object.
    Type: Application
    Filed: December 5, 2016
    Publication date: March 23, 2017
    Inventors: Chia-Liang YEH, Yi-Chang CHEN, Yi-Sha KU, Chun-Wei LO
  • Publication number: 20170045355
    Abstract: A scattering measurement system is provided, including: a light source generator for generating a detection light beam with multi-wavelengths, wherein the detection light beam is incident on an object so as to generate a plurality of multi-order diffraction light beams with three-dimensional feature information; a spatial filter for filtering out zero-order light beams from the plurality of multi-order diffraction light beams; and a detector having a photosensitive array for receiving the plurality of multi-order diffraction light beams filtered out by the spatial filter and converting the filtered plurality of multi-order diffraction light beams into multi-order diffraction signals with the three-dimensional feature information. As such, the three-dimensional structure of the object can be obtained by comparing the multi-order diffraction signals with a database.
    Type: Application
    Filed: December 18, 2015
    Publication date: February 16, 2017
    Inventors: Yi-Chen HSIEH, Chia-Liang YEH, Chia-Hung CHO, Yi-Chang CHEN, Yi-Sha KU, Chun-Wei LO
  • Patent number: 7555737
    Abstract: For accomplishing a circuit design, a first physical design is implemented according to a first netlist to obtain a first physical layout of a circuit. The first physical layout of the circuit is processed to obtain a first timing data. The first timing data is then inputted for timing verification of the first netlist. If the first netlist does not pass the verification, the first netlist is modified into a second netlist, while defining a modified portion of the netlist. Then, the modified portion of netlist is processed to obtain a second timing data, and the second timing data is used to overwrite a part of the first timing data. The first physical design is modified into a second physical design according to the second netlist only when the second netlist with the first timing data overwritten by the second timing data passes the timing verification, thereby improving time efficiency.
    Type: Grant
    Filed: November 29, 2006
    Date of Patent: June 30, 2009
    Assignee: Dorado Design Automation, Inc.
    Inventors: Hsien Ming Liu, Chien Jung Hsin, Jun Jyeh Hsiao, Sheng Chun Lee, Chun Wei Lo
  • Publication number: 20070124712
    Abstract: For accomplishing a circuit design, a first physical design is implemented according to a first netlist to obtain a first physical layout of a circuit. The first physical layout of the circuit is processed to obtain a first timing data. The first timing data is then inputted for timing verification of the first netlist. If the first netlist does not pass the verification, the first netlist is modified into a second netlist, while defining a modified portion of the netlist. Then, the modified portion of netlist is processed to obtain a second timing data, and the second timing data is used to overwrite a part of the first timing data. The first physical design is modified into a second physical design according to the second netlist only when the second netlist with the first timing data overwritten by the second timing data passes the timing verification, thereby improving time efficiency.
    Type: Application
    Filed: November 29, 2006
    Publication date: May 31, 2007
    Applicant: DORADO DESIGN AUTOMATION, INC.
    Inventors: Hsien Ming Liu, Chien Jung Hsin, Jun Jyeh Hsiao, Sheng Chun Lee, Chun Wei Lo
  • Patent number: 7096441
    Abstract: A method is capable of generating a command file of a group of design rule check (DRC) rules or layout versus schematic (LVS) rules and layout parasitic extraction (LPE) rules that can be used by a layout verification tool to verify the layout and the parasitic characteristics of an integrated circuit. The method comprises choosing whether to generate a command file of DRC rules or a command file of LVS/LPE rules, selecting a process from a group of processes, setting a set of parameters, and extracting program codes from a plurality of modules according to the selected process and the set of parameters so as to generate a command file of DRC rules or LVS/LPE rules.
    Type: Grant
    Filed: May 11, 2004
    Date of Patent: August 22, 2006
    Assignee: Faraday Technology Corp.
    Inventors: Chun-Wei Lo, Szu-Sheng Kang, Chien-Yi Ku, Chien-Tsung Chen
  • Publication number: 20050257183
    Abstract: A method is capable of generating a command file of a group of design rule check (DRC) rules or layout versus schematic (LVS) rules and layout parasitic extraction (LPE) rules that can be used by a layout verification tool to verify the layout and the parasitic characteristics of an integrated circuit. The method comprises choosing whether to generate a command file of DRC rules or a command file of LVS/LPE rules, selecting a process from a group of processes, setting a set of parameters, and extracting program codes from a plurality of modules according to the selected process and the set of parameters so as to generate a command file of DRC rules or LVS/LPE rules.
    Type: Application
    Filed: May 11, 2004
    Publication date: November 17, 2005
    Inventors: Chun-Wei Lo, Szu-Sheng Kang, Chien-Yi Ku, Chien-Tsung Chen