Patents by Inventor Chung-Hee Park
Chung-Hee Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160348233Abstract: Embodiments of the disclosure include methods and apparatus for electrically grounding a shadow mask for use in a deposition chamber. In one embodiment, a substrate support is provided and includes a substrate receiving surface, and a plurality of compressible grounding devices disposed about a periphery of the substrate receiving surface. Each of the plurality of grounding devices comprises a base member fixed to the substrate support, and a biasing assembly movably disposed in the base member.Type: ApplicationFiled: July 29, 2015Publication date: December 1, 2016Inventors: JIN MAN HA, JAE JUNG KIM, YONG KYUN JEONG, CHUNG HEE PARK, SOO YOUNG CHOI
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Patent number: 8372205Abstract: A substrate support and method for fabricating the same are provided. In one embodiment of the invention, a substrate support includes an electrically conductive body having a substrate support surface that is covered by an electrically insulative coating. At least a portion of the coating centered on the substrate support surface has a surface finish of between about 200 to about 2000 micro-inches. In another embodiment, a substrate support includes an anodized aluminum body having a surface finish on the portion of the body adapted to support a substrate thereon of between about 200 to about 2000 micro-inches. In one embodiment, a substrate support assembly includes an electrically conductive body having a substrate support surface, a substrate support structure that is adapted to support the conductive body and the conductive body is covered by an electrically insulative coating.Type: GrantFiled: July 15, 2005Date of Patent: February 12, 2013Assignee: Applied Materials, Inc.Inventors: Soo Young Choi, Beom Soo Park, Quanyuan Shang, John M. White, Dong-Kil Yim, Chung-Hee Park
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Patent number: 7732010Abstract: A method for supporting a glass substrate comprising providing a substrate support having an aluminum body, a substrate contact area formed on the surface of the substrate support, wherein the process of forming the substrate contact area comprises forming an anodization layer on a surface region of the aluminum body, the coating having a thickness of between about 0.3 mils and about 2.16 mils, wherein the surface region substantially corresponds to the substrate contact area, and preparing the anodization layer disposed over the surface region to a surface roughness between about 88 micro-inches and about 230 micro-inches, followed by anodizing the substrate surface to said thickness, positioning the substrate support adjacent a substrate processing region in a substrate processing chamber, wherein the substrate contact area is adjacent the substrate processing region, positioning the glass substrate on the substrate contact area.Type: GrantFiled: April 18, 2006Date of Patent: June 8, 2010Assignee: Applied Materials, Inc.Inventors: Soo Young Choi, Beom Soo Park, Quanyuan Shang, Robert I. Greene, John M. White, Dong-Kil Yim, Chung-Hee Park, Kam Law
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Publication number: 20100013626Abstract: Embodiments disclosed herein include a method and apparatus for supporting a substrate. When a substrate is inserted into a processing chamber by an end effector robot, the substrate is placed on one or more lift pins. The lift pins may include a sensing mechanism that can detect whether the substrate is cracked, the lift pin is broken, or the lift pin sticks to the bushing. By detecting the aforementioned conditions, uniform, repeatable deposition may be obtained for multiple substrates.Type: ApplicationFiled: July 13, 2009Publication date: January 21, 2010Applicant: APPLIED MATERIALS, INC.Inventors: Chung-Hee Park, John M. White, Dong Kil Yim
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Patent number: 7589031Abstract: A method of PECVD deposition of silicon-containing films has been discovered and further developed. The method is particularly useful when the films are deposited on substrates having surface areas which are larger than 25,000 cm2. The method prevents the deposition of partially reacted silicon-containing species which form a powdery material or haze (contaminant compound) on the substrate surface. The contaminant compounds are avoided by assuring that the power applied to form a plasma in the PECVD process is maintained, at least at a minimal level, until reactive silicon-containing precursor gases present above the surface of the substrate have been reacted or evacuated from the plasma processing area.Type: GrantFiled: December 1, 2006Date of Patent: September 15, 2009Assignee: Applied Materials, Inc.Inventors: Suhail Anwar, Chung-Hee Park, Beom Soo Park, Han Byoul Kim, Soo Young Choi, John M. White
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Patent number: 7514936Abstract: Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductors and flat panel displays. Arcing is detected by monitoring one or more sensors. Each sensor either responds to a characteristic of the electrical power being supplied by an electrical power source to the plasma or is coupled to the plasma chamber so as to respond to an electromagnetic condition within the chamber. Arcing is suppressed by reducing the power output for a brief period. Then the power source increases its power output, preferably to its original value. If the arcing resumes, the power source repeats the steps of reducing and then restoring the power output.Type: GrantFiled: October 27, 2007Date of Patent: April 7, 2009Assignee: Applied Materials, Inc.Inventors: Suhail Anwar, Remegio Manacio, Chung-Hee Park, Dong-Kil Yim, Soo Young Choi
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Publication number: 20080132080Abstract: A method of PECVD deposition of silicon-containing films has been discovered and further developed. The method is particularly useful when the films are deposited on substrates having surface areas which are larger than 25,000 cm2. The method prevents the deposition of partially reacted silicon-containing species which form a powdery material or haze (contaminant compound) on the substrate surface. The contaminant compounds are avoided by assuring that the power applied to form a plasma in the PECVD process is maintained, at least at a minimal level, until reactive silicon-containing precursor gases present above the surface of the substrate have been reacted or evacuated from the plasma processing area.Type: ApplicationFiled: December 1, 2006Publication date: June 5, 2008Inventors: Suhail Anwar, Chung-Hee Park, Beom Soo Park, Han Byoul Kim, Soo Young Choi, John M. White
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Publication number: 20080061793Abstract: Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductors and flat panel displays. Arcing is detected by monitoring one or more sensors. Each sensor either responds to a characteristic of the electrical power being supplied by an electrical power source to the plasma or is coupled to the plasma chamber so as to respond to an electromagnetic condition within the chamber. Arcing is suppressed by reducing the power output for a brief period. Then the power source increases its power output, preferably to its original value. If the arcing resumes, the power source repeats the steps of reducing and then restoring the power output.Type: ApplicationFiled: October 27, 2007Publication date: March 13, 2008Inventors: Suhail Anwar, Remegio Manacio, Chung-Hee Park, Dong-Kil Yim, Soo Choi
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Patent number: 7292045Abstract: Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductors and flat panel displays. Arcing is detected by monitoring one or more sensors. Each sensor either responds to a characteristic of the electrical power being supplied by an electrical power source to the plasma or is coupled to the plasma chamber so as to respond to an electromagnetic condition within the chamber. Arcing is suppressed by reducing the power output for a brief period. Then the power source increases its power output, preferably to its original value. If the arcing resumes, the power source repeats the steps of reducing and then restoring the power output.Type: GrantFiled: June 10, 2005Date of Patent: November 6, 2007Assignee: Applied Materials, Inc.Inventors: Suhail Anwar, Remegio Manacio, Chung-Hee Park, Dong-Kil Yim, Soo Young Choi
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Publication number: 20060185795Abstract: A substrate support and method for fabricating the same are provided. In one embodiment of the invention, a substrate support includes an electrically conductive body having a substrate support surface that is covered by an electrically insulative coating. At least a portion of the coating centered on the substrate support surface has a surface finish of between about 80 to about 200 micro-inches. In another embodiment, a substrate support includes an anodized aluminum body having a surface finish on the portion of the body adapted to support a substrate thereon of between about 80 to about 200 micro-inches.Type: ApplicationFiled: April 18, 2006Publication date: August 24, 2006Inventors: Soo Choi, Beom Park, Quanyuan Shang, Robert Greene, John White, Dong-Kil Yim, Chung-Hee Park, Kam Law
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Publication number: 20060049831Abstract: Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductors and flat panel displays. Arcing is detected by monitoring one or more sensors. Each sensor either responds to a characteristic of the electrical power being supplied by an electrical power source to the plasma or is coupled to the plasma chamber so as to respond to an electromagnetic condition within the chamber. Arcing is suppressed by reducing the power output for a brief period. Then the power source increases its power output, preferably to its original value. If the arcing resumes, the power source repeats the steps of reducing and then restoring the power output.Type: ApplicationFiled: June 10, 2005Publication date: March 9, 2006Inventors: Suhail Anwar, Remegio Manacio, Chung-Hee Park, Dong-Kil Yim, Soo Choi
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Publication number: 20060032586Abstract: A substrate support and method for fabricating the same are provided. In one embodiment of the invention, a substrate support includes an electrically conductive body having a substrate support surface that is covered by an electrically insulative coating. At least a portion of the coating centered on the substrate support surface has a surface finish of between about 200 to about 2000 micro-inches. In another embodiment, a substrate support includes an anodized aluminum body having a surface finish on the portion of the body adapted to support a substrate thereon of between about 200 to about 2000 micro-inches. In one embodiment, a substrate support assembly includes an electrically conductive body having a substrate support surface, a substrate support structure that is adapted to support the conductive body and the conductive body is covered by an electrically insulative coating.Type: ApplicationFiled: July 15, 2005Publication date: February 16, 2006Inventors: Soo Choi, Beom Park, Quanyuan Shang, John White, Dong-Kil Yim, Chung-Hee Park
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Publication number: 20040221959Abstract: A substrate support and method for fabricating the same are provided. In one embodiment of the invention, a substrate support includes an electrically conductive body having a substrate support surface that is covered by an electrically insulative coating. At least a portion of the coating centered on the substrate support surface has a surface finish of between about 80 to about 200 micro-inches. In another embodiment, a substrate support includes an anodized aluminum body having a surface finish on the portion of the body adapted to support a substrate thereon of between about 80 to about 200 micro-inches.Type: ApplicationFiled: May 9, 2003Publication date: November 11, 2004Applicant: Applied Materials, Inc.Inventors: Soo Young Choi, Beom Soo Park, Quanyuan Shang, Robert I. Greene, John M. White, Dong-Kil Yim, Chung-Hee Park, Kam Law