Abstract: In some embodiments, the present disclosure relates to an integrated chip that includes a first conductive structure arranged over a substrate. A memory layer is arranged over the first conductive structure, below a second conductive structure, and includes a ferroelectric material. An annealed seed layer is arranged between the first and second conductive structures and directly on a first side of the memory layer. An amount of the crystal structure that includes an orthorhombic phase is greater than about 35 percent.

Abstract: A semiconductor device includes a metal oxide semiconductor channel layer, a first gate dielectric layer contacting a first portion of a major surface of the metal oxide semiconductor channel layer, a first gate electrode overlying the first gate dielectric layer and contacting a second portion of the major surface of the metal oxide semiconductor channel layer, a drain region and a backside gate dielectric layer contacting another major surface of the metal oxide semiconductor channel layer, a backside gate electrode contacting the backside gate dielectric layer, a second gate dielectric layer contacting an end surface of the metal oxide semiconductor channel layer, a second gate electrode contacting a surface of the second gate dielectric layer, and a source region contacting another end surface of the metal oxide semiconductor channel layer.

Abstract: A memory device includes a plurality of first conductive pillars, a plurality of second conductive pillars, a plurality of gap filling pillars, a channel layer and first dielectric pillars. The gap filling pillars are located in between the first conductive pillars and the second conductive pillars. The channel layer is extending in a first direction, and located on side surfaces of the first conductive pillars and the second conductive pillars. The first dielectric pillars are located in between the channel layer and the plurality of gap filling pillars, wherein a length of an interface where the first dielectric pillars contact the gap filling pillars along the first direction is different from a length of the gap filling pillars along the first direction.

Abstract: A method of fabricating a transistor structure is provided. The method comprises forming a gate electrode in a dielectric layer of an interconnect structure; forming a monolayer on a portion of the dielectric layer laterally spaced from the gate electrode; sequentially forming a ferroelectric layer, a barrier layer and a channel layer on the gate electrode; and forming a source/drain electrode on the channel layer.

Abstract: The present disclosure relates to a method of manufacturing a semiconductor structure. The method may be performed by forming a first source/drain region. A first dielectric layer is formed above the first source/drain region. A portion of the first dielectric layer is removed. A channel region is formed along a sidewall of the first dielectric layer. A gate region is formed along a sidewall of the channel region. A second dielectric layer is formed above the first dielectric layer and the gate region. A portion of the second dielectric layer is removed to form an opening that exposes the channel region. A second source/drain region is formed within the opening.

Abstract: A ferroelectric field effect transistor (FeFET) having a double-gate structure includes a first gate electrode, a first ferroelectric material layer over the first gate electrode, a semiconductor channel layer over the first ferroelectric material layer, source and drain electrodes contacting the semiconductor channel layer, a second ferroelectric material layer over the semiconductor channel layer, and a second gate electrode over the second ferroelectric material layer.

Abstract: In an embodiment, a device includes: a word line extending in a first direction; a data storage layer on a sidewall of the word line; a channel layer on a sidewall of the data storage layer; a back gate isolator on a sidewall of the channel layer; and a bit line having a first main region and a first extension region, the first main region contacting the channel layer, the first extension region separated from the channel layer by the back gate isolator, the bit line extending in a second direction, the second direction perpendicular to the first direction.

Abstract: A method for forming a semiconductor device includes: forming a fin structure protruding from a substrate of the semiconductor device; forming a first conductive rail on the substrate, wherein a side of the first conductive rail facing the fin structure has a first recess and a second recess; forming a first conductive line in a same layer as the first conductive rail by filling a first conductive material into the first recess, wherein the first conductive line extends across the fin structure and wraps a portion of the fin structure; and forming a second conductive line in the same layer as the first conductive rail by filling a second conductive material into the second recess, wherein the second conductive line extends across the fin structure and contacts another portion of the fin structure.

Abstract: Provided are a ferroelectric memory device and a method of forming the same. The ferroelectric memory device includes: a gate electrode; a ferroelectric layer, disposed on the gate electrode; a channel layer, disposed on the ferroelectric layer; a pair of source/drain (S/D) electrodes, disposed on the channel layer; a first insertion layer, disposed between the gate electrode and the ferroelectric layer; and a second insertion layer, disposed between the ferroelectric layer and the channel layer, wherein the second insertion layer has a thickness less than a thickness of the first insertion layer.

Abstract: An integrated chip including a semiconductor layer over a substrate. A pair of source/drains are arranged along the semiconductor layer. A first metal layer is over the substrate. A second metal layer is over the first metal layer. A ferroelectric layer is over the second metal layer. The first metal layer has a first crystal orientation and the second metal layer has a second crystal orientation different from the first crystal orientation.

Abstract: In accordance with embodiments, a memory array is formed with a multiple patterning process. In embodiments a first trench is formed within a multiple layer stack and a first conductive material is deposited into the first trench. After the depositing the first conductive material, a second trench is formed within the multiple layer stack, and a second conductive material is deposited into the second trench. The first conductive material and the second conductive material are etched.

Abstract: A memory cell array is provided. The memory cell array includes: a plurality of memory cells arranged in a plurality of rows and a plurality of columns; a plurality of word lines electrically connected to the plurality of rows, respectively; a plurality of source lines electrically connected to the plurality of columns, respectively; and a plurality of bit lines electrically connected to the plurality of columns, respectively. A plurality of inactivated word lines are configured to be applied a bias voltage that is zero, and the plurality of source lines are configured to be applied a positive bias voltage.

Abstract: A semiconductor structure includes an active layer, a first gate insulator layer disposed over the active layer, a first gate layer disposed over the gate insulator layer, at least one charged layer disposed between the first gate insulator layer and the active layer, and a pair of contact structures disposed over the active layer. The at least one charged layer includes an oxide material.

Abstract: Disclosed herein are related to a memory device. In one aspect, the memory device includes a memory array including a set of memory cells. In one aspect, each of the set of memory cells includes a corresponding transistor and a corresponding capacitor connected in series between a bit line and a select line. In one aspect, the memory device includes a first transistor including a source/drain electrode coupled to a controller and another source/drain electrode coupled to the bit line. In one aspect, the memory device includes a second transistor including a gate electrode coupled to the bit line. In one aspect, the second transistor is configured to conduct current corresponding to data stored by a memory cell of the set of memory cells.

Abstract: In some embodiments, the present disclosure relates to a 3D memory device, including a plurality of gate lines interleaved between a plurality of dielectric layers in a vertical direction, the plurality of gate lines forming recesses between the plurality of dielectric layers; a source/drain line disposed next to the plurality of dielectric layers, spaced from the plurality of gate lines by the recesses in a lateral direction; a ferroelectric film arranged laterally between sidewalls of the plurality of gate lines and the source/drain line and confined within the recesses; and a semiconductor film disposed within the recesses and spacing the ferroelectric film from the source/drain line.

Abstract: In some embodiments, the present disclosure relates to an integrated chip (IC) memory structure. The IC memory structure includes a first conductor over a substrate and a second conductor over the first conductor. The first conductor is vertically separated from the second conductor by an isolation structure. A first channel structure is arranged on a sidewall of the isolation structure. The first channel structure is vertically between the first conductor and the second conductor. A vertical gate electrode is disposed along sidewalls of the first conductor, the second conductor, and the first channel structure. The sidewall of the first channel structure faces away from the isolation structure.

Abstract: An integrated chip including a semiconductor layer over a substrate. A pair of source/drains are arranged along the semiconductor layer. A first metal layer is over the substrate. A second metal layer is over the first metal layer. A ferroelectric layer is over the second metal layer. The first metal layer has a first crystal orientation and the second metal layer has a second crystal orientation different from the first crystal orientation.

Abstract: A method of manufacturing a memory cell includes the following steps. A channel material is formed to contact a source line and a bit line. A ferroelectric (FE) material is formed to contact the channel material. A word line is formed to contact the FE material. The FE material is disposed between the channel material and the word line. The word line includes a bulk layer. The bulk layer includes a first metal layer and a second metal layer. The second metal layer is sandwiched between the first metal layer and the FE material.

Abstract: A memory device and a manufacturing method thereof is described. The memory device includes a transistor structure over a substrate and a ferroelectric capacitor structure electrically connected with the transistor structure. The ferroelectric capacitor structure includes a top electrode layer, a bottom electrode layer and a ferroelectric stack sandwiched there-between. The ferroelectric stack includes a first ferroelectric layer, a first stabilizing layer, and one of a second ferroelectric layer or a second stabilizing layer. Materials of the first stabilizing layer and a second stabilizing layer include a metal oxide material.

Abstract: A method of forming a semiconductor device is provided. A gate electrode is formed within an insulating layer that overlies a substrate. A gate dielectric layer is formed over the gate electrode. A first oxide semiconductor layer is formed over the gate dielectric layer. A dielectric layer is formed over the first oxide semiconductor layer. The dielectric layer and the first oxide semiconductor layer are patterned, so as to form first and second openings that expose portions of the gate dielectric layer. An interfacial layer is conformally formed on sidewalls and bottoms of the first and second openings. A second oxide semiconductor layer is formed over the interfacial layer in the first and second openings. A metal layer is formed over the second oxide semiconductor layer in the first and second openings.