Patents by Inventor Daiki Taneichi

Daiki Taneichi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10955740
    Abstract: The present invention provides; a pellicle frame which can effectively inhibit distortion of the photo mask (8) caused by mounting the pellicle (1), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided, and a manufacturing method of a blackened pellicle frame is also provided which can reduce the defect of the surface flickering under concentrated light and which facilitates inspection of the foreign matter adhesion prior to use. The present invention relates to a pellicle frame with an anodized film on a surface of an aluminum alloy frame, characterized in that: the aluminum alloy frame comprises an aluminum alloy which contains Ca: 5.0 to 10.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: March 23, 2021
    Assignees: NIPPON LIGHT METAL COMPANY, LTD., Mitsui Chemicals, Inc.
    Inventors: Yoshihiro Taguchi, Kazuo Kohmura, Daiki Taneichi
  • Publication number: 20210024791
    Abstract: The present invention provides a mask adhesive that plastically deforms easily, no adhesive residue remains after peeling from the mask, ease of handling is excellent, and haze on a pellicle film is unlikely to be increased. A mask adhesive resolving this problem contains a thermoplastic elastomer (A) for which the temperature at which the loss tangent measured at a frequency of 1 Hz is at a maximum value is ?20 to 30° C., a tackifier resin (B), and a process oil (C). The total of the proportion (% CP) of paraffin carbon and the proportion (% CN) of naphthene carbon in the process oil (C) is 50% or more. The temperature of the mask adhesive at which the loss tangent measured at a frequency of 1 Hz is at a maximum value is ?10 to 30° C., and the sulfur content of the mask adhesive is 300 ?g/g or less.
    Type: Application
    Filed: March 27, 2019
    Publication date: January 28, 2021
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Tsuneaki BIYAJIMA, Daiki TANEICHI
  • Patent number: 10895805
    Abstract: A method for producing a pellicle according to the one embodiment of the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.
    Type: Grant
    Filed: October 26, 2017
    Date of Patent: January 19, 2021
    Assignees: MITSUI CHEMICALS, INC., TAZMO CO., LTD.
    Inventors: Kazuo Kohmura, Daiki Taneichi, Yosuke Ono, Hisako Ishikawa, Tsuneaki Biyajima, Yasuyuki Sato, Toshiaki Hirota
  • Publication number: 20200401039
    Abstract: To provide a pellicle in which outgas from an adhesive layer is suppressed. The pellicle includes a pellicle film, a support frame for supporting the pellicle film, a protrusion part arranged in the support frame, a first adhesive layer arranged on the protrusion part; and an inorganic material layer arranged at a position closer to the pellicle film than the first adhesive layer. The inorganic material layer may include a first inorganic material layer arranged at a first side surface of the first adhesive layer, the first side surface of the first adhesive layer intersecting the pellicle film, and arranged at a position closer to the pellicle film.
    Type: Application
    Filed: September 3, 2020
    Publication date: December 24, 2020
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Yosuke ONO, Kazuo KOHMURA, Atsushi OKUBO, Daiki TANEICHI, Hisako ISHIKAWA, Tsuneaki BIYAJIMA
  • Patent number: 10606169
    Abstract: The purpose of the present invention is to provide: a pellicle frame which is not susceptible to deterioration even if irradiated with short-wavelength light such as excimer light, and which is not susceptible to generation of an outgas or foreign substance; and a pellicle which uses this pellicle frame. In order to achieve the above-described purpose, this pellicle frame for supporting the outer periphery of a pellicle film is configured to comprise a frame and a film that is formed on the surface of the frame and contains a polyimide resin.
    Type: Grant
    Filed: August 15, 2016
    Date of Patent: March 31, 2020
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Kazuo Kohmura, Takashi Kozeki, Daiki Taneichi, Shintaro Maekawa, Yosuke Ono, Tsuneaki Biyajima
  • Patent number: 10585348
    Abstract: Provided are a pellicle for extreme ultraviolet light lithography, a method for producing the same, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame supporting the first frame; a through-hole running through the first frame; and a filter covering the through-hole on the side of a surface of the first frame on which the pellicle film is located. The through-hole may run through the pellicle film; and the filter may be located on the pellicle film. The filter may be located, adjacent to the pellicle film, on the first frame.
    Type: Grant
    Filed: March 9, 2017
    Date of Patent: March 10, 2020
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Kazuo Kohmura, Daiki Taneichi, Takashi Kozeki, Yosuke Ono, Hisako Ishikawa, Tsuneaki Biyajima, Atsushi Okubo, Yasuyuki Sato, Toshiaki Hirota
  • Publication number: 20200064729
    Abstract: A pellicle for EUV exposure that has a high transmittance to EUV light, causes little outgassing, and is not much contaminated, and a method for manufacturing the same are provided. A pellicle (100) includes a pellicle film (101); a support frame (103); and a first adhesive layer (109) provided at an end of the support frame, the end being opposite to an end on which the pellicle film is extended. The pellicle further includes an inorganic layer (111) on a side surface of the first adhesive layer, the side surface extending in a direction crossing a surface of the pellicle film, and the pellicle film being extended on the side surface. The inorganic layer has a mass absorption coefficient (?m) in the range of 5×103 cm2/g to 2×105 cm2/g.
    Type: Application
    Filed: February 9, 2018
    Publication date: February 27, 2020
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Kazuo KOHMURA, Yosuke ONO, Atsushi OKUBO, Daiki TANEICHI, Hisako ISHIKAWA, Tsuneaki BIYAJIMA
  • Patent number: 10488751
    Abstract: Provided are a pellicle for extreme ultraviolet light lithography, a production method thereof, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame including a thick portion including a first surface carrying a surface of the first frame opposite to a surface on which the pellicle film is located, and also including a second surface connected with the first surface and carrying a side surface of the first frame, the second frame enclosing the pellicle film and the first frame; a through-hole provided in the thick portion of the second frame; and a filter located on an outer side surface of the second frame and covering the through-hole, the outer side surface crossing the surface of the first frame on which the pellicle film is located.
    Type: Grant
    Filed: March 9, 2017
    Date of Patent: November 26, 2019
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Kazuo Kohmura, Daiki Taneichi, Yosuke Ono, Hisako Ishikawa, Tsuneaki Biyajima, Atsushi Okubo, Yasuyuki Sato, Toshiaki Hirota
  • Publication number: 20190235377
    Abstract: The present invention provides; a pellicle frame which can effectively inhibit distortion of the photo mask (8) caused by mounting the pellicle (1), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided, and a manufacturing method of a blackened pellicle frame is also provided which can reduce the defect of the surface flickering under concentrated light and which facilitates inspection of the foreign matter adhesion prior to use. The present invention relates to a pellicle frame with an anodized film on a surface of an aluminum alloy frame, characterized in that: the aluminum alloy frame comprises an aluminum alloy which contains Ca: 5.0 to 10.
    Type: Application
    Filed: June 30, 2017
    Publication date: August 1, 2019
    Inventors: Yoshihiro TAGUCHI, Kazuo KOHMURA, Daiki TANEICHI
  • Patent number: 10216081
    Abstract: A pellicle frame containing a frame body, the frame body having a groove formed in one end surface of the frame body, the one end surface being an end surface in a thickness direction of the frame body that is located at a side configured to support a pellicle membrane, and a through-hole that penetrates through a portion between an outer circumferential surface of the frame body and a wall surface of the groove formed in the one end surface.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: February 26, 2019
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Kazuo Kohmura, Yosuke Ono, Daiki Taneichi, Yasuyuki Sato, Toshiaki Hirota
  • Patent number: 10185217
    Abstract: A pellicle frame containing a frame body, the frame body having a groove formed in one end surface of the frame body, the one end surface being an end surface in a thickness direction of the frame body that is located at a side configured to support a pellicle membrane, and a through-hole that penetrates through a portion between an outer circumferential surface of the frame body and a wall surface of the groove formed in the one end surface.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: January 22, 2019
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Kazuo Kohmura, Yosuke Ono, Daiki Taneichi, Yasuyuki Sato, Toshiaki Hirota
  • Publication number: 20180239242
    Abstract: The purpose of the present invention is to provide: a pellicle frame which is not susceptible to deterioration even if irradiated with short-wavelength light such as excimer light, and which is not susceptible to generation of an outgas or foreign substance; and a pellicle which uses this pellicle frame. In order to achieve the above-described purpose, this pellicle frame for supporting the outer periphery of a pellicle film is configured to comprise a frame and a film that is formed on the surface of the frame and contains a polyimide resin.
    Type: Application
    Filed: August 15, 2016
    Publication date: August 23, 2018
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Kazuo KOHMURA, Takashi KOZEKI, Daiki TANEICHI, Shintaro MAEKAWA, Yosuke ONO, Tsuneaki BIYAJIMA
  • Publication number: 20180046071
    Abstract: A method for producing a pellicle according to the one embodiment of the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.
    Type: Application
    Filed: October 26, 2017
    Publication date: February 15, 2018
    Applicants: MITSUI CHEMICALS, INC., TAZMO CO., LTD.
    Inventors: Kazuo KOHMURA, Daiki TANEICHI, Yosuke ONO, Hisako ISHIKAWA, Tsuneaki BIYAJIMA, Yasuyuki SATO, Toshiaki HIROTA
  • Patent number: 9841670
    Abstract: Provided is a support frame for pellicles which includes an aluminum alloy-made frame body with a pellicle film bonded to a front surface of the frame body, and with a glass substrate bonded to a back surface of the frame body. A front-side recessed groove extending in a circumferential direction of the frame body is formed on the front surface of the frame body, and a front-side suction hole extending from an outer peripheral surface of the frame body to an inner surface of the front-side recessed groove is formed on the frame body.
    Type: Grant
    Filed: May 11, 2015
    Date of Patent: December 12, 2017
    Assignee: NIPPON LIGHT METAL COMPANY, LTD.
    Inventors: Kazuo Kohmura, Yosuke Ono, Daiki Taneichi, Yasuyuki Sato, Toshiaki Hirota, Kiyokazu Koga
  • Publication number: 20170212418
    Abstract: Provided is a support frame for pellicles which includes an aluminum alloy-made frame body with a pellicle film bonded to a front surface of the frame body, and with a glass substrate bonded to a back surface of the frame body. A front-side recessed groove extending in a circumferential direction of the frame body is formed on the front surface of the frame body, and a front-side suction hole extending from an outer peripheral surface of the frame body to an inner surface of the front-side recessed groove is formed on the frame body.
    Type: Application
    Filed: May 11, 2015
    Publication date: July 27, 2017
    Inventors: Kazuo KOHMURA, Yosuke ONO, Daiki TANEICHI, Yasuyuki SATO, Toshiaki HIROTA, Kiyokazu KOGA
  • Publication number: 20170192349
    Abstract: A pellicle frame containing a frame body, the frame body having a groove formed in one end surface of the frame body, the one end surface being an end surface in a thickness direction of the frame body that is located at a side configured to support a pellicle membrane, and a through-hole that penetrates through a portion between an outer circumferential surface of the frame body and a wall surface of the groove formed in the one end surface.
    Type: Application
    Filed: April 27, 2015
    Publication date: July 6, 2017
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Kazuo KOHMURA, Yosuke ONO, Daiki TANEICHI, Yasuyuki SATO, Toshiaki HIROTA
  • Publication number: 20170184956
    Abstract: Provided are a pellicle for extreme ultraviolet light lithography, a production method thereof, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame including a thick portion including a first surface carrying a surface of the first frame opposite to a surface on which the pellicle film is located, and also including a second surface connected with the first surface and carrying a side surface of the first frame, the second frame enclosing the pellicle film and the first frame; a through-hole provided in the thick portion of the second frame; and a filter located on an outer side surface of the second frame and covering the through-hole, the outer side surface crossing the surface of the first frame on which the pellicle film is located.
    Type: Application
    Filed: March 9, 2017
    Publication date: June 29, 2017
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Kazuo KOHMURA, Daiki TANEICHI, Yosuke ONO, Hisako ISHIKAWA, Tsuneaki BIYAJIMA, Atsushi OKUBO, Yasuyuki SATO, Toshiaki HIROTA
  • Publication number: 20170184957
    Abstract: Provided are a pellicle for extreme ultraviolet light lithography, a method for producing the same, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame supporting the first frame; a through-hole running through the first frame; and a filter covering the through-hole on the side of a surface of the first frame on which the pellicle film is located. The through-hole may run through the pellicle film; and the filter may be located on the pellicle film. The filter may be located, adjacent to the pellicle film, on the first frame.
    Type: Application
    Filed: March 9, 2017
    Publication date: June 29, 2017
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Kazuo KOHMURA, Daiki TANEICHI, Takashi KOZEKI, Yosuke ONO, Hisako ISHIKAWA, Tsuneaki BIYAJIMA, Atsushi OKUBO, Yasuyuki SATO, Toshiaki HIROTA
  • Patent number: 8945799
    Abstract: A pellicle which has a mask adhesive layer that can be plastic-deformed readily particularly at a temperature at which exposure to light is carried out, rarely provides a residue of an adhesive agent upon the removal of the mask adhesive layer from a mask and has good handling properties, and which can prevent the position gap of a pattern. The pellicle comprises a pellicle frame, a pellicle membrane and a mask adhesive layer containing a mask adhesive agent. The mask adhesive agent comprises 100 parts by mass of a thermoplastic elastomer (A) having a tan ? peak temperature of ?20 to 30 DEG C and 20 to 150 parts by mass of an adhesiveness-imparting resin (B).
    Type: Grant
    Filed: June 29, 2011
    Date of Patent: February 3, 2015
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Daiki Taneichi, Takashi Kozeki, Akihiro Koide
  • Publication number: 20130101927
    Abstract: A pellicle which has a mask adhesive layer that can be plastic-deformed readily particularly at a temperature at which exposure to light is carried out, rarely provides a residue of an adhesive agent upon the removal of the mask adhesive layer from a mask and has good handling properties, and which can prevent the position gap of a pattern. The pellicle comprises a pellicle frame, a pellicle membrane and a mask adhesive layer containing a mask adhesive agent. The mask adhesive agent comprises 100 parts by mass of a thermoplastic elastomer (A) having a tan ? peak temperature of ?20 to 30 DEG C and 20 to 150 parts by mass of an adhesiveness-imparting resin (B).
    Type: Application
    Filed: June 29, 2011
    Publication date: April 25, 2013
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Daiki Taneichi, Takashi Kozeki, Akihiro Koide