Patents by Inventor Daisuke Shimuzu

Daisuke Shimuzu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130122712
    Abstract: Methods of etching HAR features in a dielectric layer are described. In one embodiment, a substrate is provided into an etch chamber. The substrate has a patterned mask disposed on a dielectric layer formed thereon where the patterned mask has openings. A gas mixture is provided into the etch chamber, the gas mixture includes CO, O2, a fluorocarbon gas, and an optional inert gas. A plasma is formed from the gas mixture.
    Type: Application
    Filed: October 19, 2012
    Publication date: May 16, 2013
    Inventors: Jong Mun KIM, Kenny Linh Doan, Li Ling, Jairaj Payyapilly, Daisuke Shimuzu, Srinivas D. Nemani, Thorsten B. Lill