Abstract: The present disclosure relates to a magnetic medium that includes a substrate and a bit patterned magnetic layer applied to the substrate. The bit-patterned magnetic layer includes islands and each island includes a first magnetic material having a first magnetic anisotropy and that has a top surface, a bottom surface, and a peripheral surface. Each island also includes a second magnetic material covering the peripheral surface of the first magnetic material and having a second magnetic anisotropy that is higher than the first magnetic anisotropy. In one embodiment, the first magnetic material may comprise a nucleation domain in a centrally located surface portion of the magnetic islands and/or the second magnetic material may comprise an outer shell on the peripheral surface of the islands.

Abstract: According to one embodiment, a patterned magnetic storage medium is disclosed herein. The magnetic storage medium includes a pattern formed on a substrate. The pattern includes at least a first and second feature and an edge defined between the first and second features. Additionally, the magnetic storage medium includes a magnetic layer formed on the pattern. The magnetic layer includes grains separated by a non-magnetic segregant boundary. The segregant boundary is positioned above the edge of the pattern.

Abstract: According to one embodiment, a method for patterning a medium having a patterned hard mask applied thereon is disclosed herein. The patterned hard mark includes a plurality of apertures exposing portions of the medium. The method includes directing ions toward the medium, implanting a portion of the ions into the exposed portions of the medium, removing a layer of the patterned hard mask with another portion of the ions, and depositing hard mask material onto the patterned hard mask. Depositing hard mask material onto the exposed portions of the medium may follow implantation of the portion of the ions into the exposed portions of the medium.

Abstract: The present disclosure relates to a magnetic medium that includes a substrate and a bit patterned magnetic layer applied to the substrate. The bit-patterned magnetic layer includes islands and each island includes a first magnetic material having a first magnetic anisotropy and that has a top surface, a bottom surface, and a peripheral surface. Each island also includes a second magnetic material covering the peripheral surface of the first magnetic material and having a second magnetic anisotropy that is higher than the first magnetic anisotropy. In one embodiment, the first magnetic material may comprise a nucleation domain in a centrally located surface portion of the magnetic islands and/or the second magnetic material may comprise an outer shell on the peripheral surface of the islands.

Abstract: According to one embodiment, a patterned magnetic storage medium is disclosed herein. The magnetic storage medium includes a pattern formed on a substrate. The pattern includes at least a first and second feature and an edge defined between the first and second features. Additionally, the magnetic storage medium includes a magnetic layer formed on the pattern. The magnetic layer includes grains separated by a non-magnetic segregant boundary. The segregant boundary is positioned above the edge of the pattern.

Abstract: According to one embodiment, a method for patterning a medium having a patterned hard mask applied thereon is disclosed herein. The patterned hard mark includes a plurality of apertures exposing portions of the medium. The method includes directing ions toward the medium, implanting a portion of the ions into the exposed portions of the medium, removing a layer of the patterned hard mask with another portion of the ions, and depositing hard mask material onto the patterned hard mask. Depositing hard mask material onto the exposed portions of the medium may follow implantation of the portion of the ions into the exposed portions of the medium.

Abstract: A method of fabricating media comprises forming recording media on a substrate. An overcoat is deposited on the recording media opposite the substrate. The overcoat has a first surface finish. The overcoat is etched to remove material and provide the overcoat with a second surface finish that is smoother than the first surface finish. The depositing and etching may occur sequentially in an in-situ, dry vacuum process. The second surface finish may not be mechanically processed after etching to further planarize the overcoat.

Abstract: Nanoimprint lithography using resist material with the addition of a surfactant is described. A template release layer is formed on a pattern of a template. A non-ionic surfactant is added to a resist material to form a mixed resist material. The resist material may comprise a hydrocarbon material having an unsaturated bond, such as an acrylate material. The surfactant may comprise polyalkylene glycol or an organically modified polysiloxane. A resist layer is then formed on a substrate from the mixed resist material. The surfactant added to the resist material forms a resist release layer on the surface of the resist layer. The template is then pressed into the resist layer, where the template release layer and the resist release layer are between the pattern of the template and the resist layer.

Abstract: A method of fabricating media comprises forming recording media on a substrate. An overcoat is deposited on the recording media opposite the substrate. The overcoat has a first surface finish. The overcoat is etched to remove material and provide the overcoat with a second surface finish that is smoother than the first surface finish. The depositing and etching may occur sequentially in an in-situ, dry vacuum process. The second surface finish may not be mechanically processed after etching to further planarize the overcoat.

Abstract: Nanoimprint lithography using resist material with the addition of a surfactant is described. A template release layer is formed on a pattern of a template. A non-ionic surfactant is added to a resist material to form a mixed resist material. The resist material may comprise a hydrocarbon material having an unsaturated bond, such as an acrylate material. The surfactant may comprise polyakylene glycol or an organically modified polysiloxane. A resist layer is then formed on a substrate from the mixed resist material. The surfactant added to the resist material forms a resist release layer on the surface of the resist layer. The template is then pressed into the resist layer, where the template release layer and the resist release layer are between the pattern of the template and the resist layer.

Abstract: Methods of performing nanoimprint lithography are described. For one method, a master tool and a stamper tool are formed to provide nanometer-scale imprinting. A release layer comprised of a perfluoropolyether diacrylate material is formed on the master tool and the stamper tool. The master tool and the stamper tool are used to form patterns in resist material, such as hole or pillar patterns. The resist material as described herein has lower viscosity and lower surface tension than prior resist materials allowing for more uniform replication of the patterns.

Abstract: Methods of performing nanoimprint lithography are described. For one method, a master tool and a stamper tool are formed to provide nanometer-scale imprinting. A release layer comprised of a perfluoropolyether diacrylate material is formed on the master tool and the stamper tool. The master tool and the stamper tool are used to form patterns in resist material, such as hole or pillar patterns. The resist material as described herein has lower viscosity and lower surface tension than prior resist materials allowing for more uniform replication of the patterns.

Abstract: A micro-electro-mechanical systems (MEMS) type electrostatic microactuator has a fixed electrode and a movable electrode, with the movable electrode being attached to the substrate by a flexure. Each electrode has a plurality of fingers with the fixed electrode fingers and the movable electrode fingers interleaved in a comb-like arrangement. A nonconductive viscous liquid is located between the fingers for damping motion of the movable electrode relative to the fixed electrode. The liquid is held in a reservoir attached to the movable electrode. Capillary pressure pulls the liquid from the reservoir into the small gaps between the interleaved fingers.

Abstract: A micro-electro-mechanical systems (MEMS) type electrostatic microactuator has a fixed electrode and a movable electrode, with the movable electrode being attached to the substrate by a flexure. Each electrode has a plurality of fingers with the fixed electrode fingers and the movable electrode fingers interleaved in a comb-like arrangement. A nonconductive viscous liquid is located between the fingers for damping motion of the movable electrode relative to the fixed electrode. The liquid is held in a reservoir attached to the movable electrode. Capillary pressure pulls the liquid from the reservoir into the small gaps between the interleaved fingers.