Patents by Inventor Daniel Jozef Maria Direcks

Daniel Jozef Maria Direcks has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CONTAMINATION TRAP
    Publication number: 20230091648
    Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m?1 K?1.
    Type: Application
    Filed: November 28, 2022
    Publication date: March 23, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Sander Catharina Reinier DERKS, Daniel Jozef Maria DIRECKS, Maurice Wilhelmus Leonardus Hendricus FEIJTS, Pieter Gerardus Mathijs HOEIJMAKERS, Katja Cornelia Joanna Clasina MOORS, Violeta NAVARRO PAREDES, William Peter VAN DRENT, Jan Steven Christiaan WESTERLAKEN
  • Contamination trap
    Patent number: 11556067
    Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m?1K?1.
    Type: Grant
    Filed: March 10, 2020
    Date of Patent: January 17, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Sander Catharina Reinier Derks, Daniel Jozef Maria Direcks, Maurice Wilhelmus Leonardus Hendricus Feijts, Pieter Gerardus Mathijs Hoeijmakers, Katja Cornelia Joanna Clasina Moors, Violeta Navarro Paredes, William Peter Van Drent, Jan Steven Christiaan Westerlaken
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 11143968
    Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: October 12, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria Direcks, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Danny Maria Hubertus Philips, Michel Riepen, Clemens Johannes Gerardus Van Den Dungen, Adrianes Johannes Baeten, Fabrizio Evangelista
  • Lithographic apparatus and device manufacturing method
    Patent number: 10268127
    Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
    Type: Grant
    Filed: May 8, 2017
    Date of Patent: April 23, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniël Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Franciscus Johannes Joseph Janssen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170242348
    Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
    Type: Application
    Filed: May 8, 2017
    Publication date: August 24, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michel RIEPEN, Christiaan Alexander HOOGENDAM, Paulus Martinus Maria LIEBREGTS, Ronald VAN DER HAM, Wilhelmus Franciscus Johannes SIMONS, Daniël Jozef Maria DIRECKS, Paul Petrus Joannes BERKVENS, Eva MONDT, Gert-Jan Gerardus Johannes Thomas BRANDS, Koen STEFFENS, Han Henricus Aldegonda LEMPENS, Mathieus Anna Karel VAN LIEROP, Christophe DE METSENAERE, Marcio Alexandre Cano MIRANDA, Patrick Johannes Wilhelmus SPRUYTENBURG, Joris Johan Anne-Marie VERSTRAETE, Franciscus Johannes Joseph JANSSEN
  • Lithographic apparatus and device manufacturing method
    Patent number: 9645506
    Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
    Type: Grant
    Filed: December 13, 2013
    Date of Patent: May 9, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniël Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Franciscus Johannes Joseph Janssen
  • Lithographic apparatus and a device manufacturing method involving an elongate liquid supply opening or an elongate region of relatively high pressure
    Patent number: 9618835
    Abstract: In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.
    Type: Grant
    Filed: January 31, 2011
    Date of Patent: April 11, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria Direcks, Erik Henricus Egidius Catharina Eummelen, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Sergei Shulepov, Pieter Mulder, David Bessems, Marco Baragona
  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20160306283
    Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
    Type: Application
    Filed: June 29, 2016
    Publication date: October 20, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria DIRECKS, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas Rudolf KEMPER, Danny Maria Hubertus PHILIPS, Michel RIEPEN, Clemens Johannes Gerardus VAN DEN DUNGEN, Adrianes Johannes BAETEN, Fabrizio EVANGELISTA
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 9383654
    Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
    Type: Grant
    Filed: July 21, 2009
    Date of Patent: July 5, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria Direcks, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Danny Maria Hubertus Philips, Michel Riepen, Clemens Johannes Gerardus Van Den Dungen, Adrianes Johannes Baeten, Fabrizio Evangelista
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140098353
    Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
    Type: Application
    Filed: December 13, 2013
    Publication date: April 10, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michel RIEPEN, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniël Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
  • Lithographic apparatus and device manufacturing method
    Patent number: 8681308
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.
    Type: Grant
    Filed: September 13, 2007
    Date of Patent: March 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Paul Petrus Joannes Berkvens, Roelof Frederik De Graaf, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul William Scholtes-Van Eijk, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
  • Fluid handling structure, lithographic apparatus and a device manufacturing method
    Patent number: 8638417
    Abstract: A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.
    Type: Grant
    Filed: April 12, 2011
    Date of Patent: January 28, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Danny Maria Hubertus Philips, Daniel Jozef Maria Direcks, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens, Marcus Johannes Van Der Zanden, Pieter Mulder
  • Lithographic apparatus and device manufacturing method
    Patent number: 8634053
    Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
    Type: Grant
    Filed: November 30, 2007
    Date of Patent: January 21, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8472003
    Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
    Type: Grant
    Filed: June 22, 2010
    Date of Patent: June 25, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul Petrus Joannes Berkvens, Gert-Jan Geradus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Matheus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Ruud Hendrikus Martinus Johannes Bloks
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8421993
    Abstract: A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.
    Type: Grant
    Filed: May 7, 2009
    Date of Patent: April 16, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens, Koen Steffens, Arnold Jan Van Putten
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8405815
    Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. A first portion of an undersurface of the fluid handling structure, in use, is a different distance from the facing surface than a second portion of the undersurface. Further, the first portion has defined in it a supply opening configured to supply liquid toward the facing surface, and an extraction opening configured to remove fluid from between the fluid handling structure and the facing surface.
    Type: Grant
    Filed: June 7, 2010
    Date of Patent: March 26, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Danny Maria Hubertus Philips, Daniel Jozef Maria Direcks, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8351018
    Abstract: A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.
    Type: Grant
    Filed: May 6, 2009
    Date of Patent: January 8, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Clemens Johannes Gerardus Van Den Dungen, Koen Steffens, Arnold Jan Van Putten
  • Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method
    Patent number: 8345218
    Abstract: An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.
    Type: Grant
    Filed: May 7, 2009
    Date of Patent: January 1, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Michel Riepen, Nicolaas Rudolf Kemper, Johannes Petrus Martinus Bernardus Vermeulen, Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Arnold Jan Van Putten
  • Immersion lithographic apparatus and device manufacturing method
    Patent number: 8259283
    Abstract: An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.
    Type: Grant
    Filed: March 20, 2009
    Date of Patent: September 4, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Daniël Jozef Maria Direcks, Nicolaas Rudolf Kemper, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Danny Maria Hubertus Philips, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Marcus Johannes Van Der Zanden, Pieter Mulder
  • Lithographic apparatus and device manufacturing method
    Patent number: 8218126
    Abstract: A liquid handling system is disclosed in which an extractor to contain liquid in a space between the projection system of a lithographic apparatus and a substrate has, in plan, a shape with a single corner. The extractor is provided in a rotatable part of a liquid handling system. The rotatable part is rotated under the control of a controller.
    Type: Grant
    Filed: December 2, 2008
    Date of Patent: July 10, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Koen Steffens, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Daniël Jozef Maria Direcks, Gert-Jan Gerardus Johannes Thomas Brands