Patents by Inventor Daniel R. Sempolinski

Daniel R. Sempolinski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6816653
    Abstract: Articles and methods for manufacturing pigtailed planar optical devices are disclosed. The articles and methods include providing a tool including a substrate having a stepped region. The tool is capable of forming elements such as grippers or waveguides on a device substrate having different heights.
    Type: Grant
    Filed: February 25, 2003
    Date of Patent: November 9, 2004
    Assignee: Corning Incorporated
    Inventors: Alfredo D. Botet, Stephen J. Caracci, Adam J. Fusco, Sean M. Garner, Cheng-Chung Li, Daniel R. Sempolinski
  • Patent number: 6799441
    Abstract: Methods and apparatus for producing fused silica members having high internal transmission are disclosed. The apparatus and methods are capable of producing fused silica having internal transmission of at least 99.65%/cm at 193 nm.
    Type: Grant
    Filed: January 10, 2003
    Date of Patent: October 5, 2004
    Assignee: Corning Incorporated
    Inventors: Floyd E. Marley, Daniel R. Sempolinski, Merrill F. Sproul
  • Publication number: 20040165829
    Abstract: Articles and methods for manufacturing pigtailed planar optical devices are disclosed. The articles and methods include providing a tool including a substrate having a stepped region. The tool is capable of forming elements such as grippers or waveguides on a device substrate having different heights.
    Type: Application
    Filed: February 25, 2003
    Publication date: August 26, 2004
    Inventors: Alfredo D. Botet, Stephen J. Caracci, Adam J. Fusco, Sean M. Garner, Cheng-Chung Li, Daniel R. Sempolinski
  • Publication number: 20040162211
    Abstract: Fused silica members having high internal transmission and low birefringence are disclosed. Methods of making such fused silica members are also disclosed. According to the present invention, fused silica members having an internal transmission equal to or greater than 99.65%/cm at 193 nm and having an absolute maximum birefringence along the use axis of less than or equal to 0.75 nm/cm are provided.
    Type: Application
    Filed: February 9, 2004
    Publication date: August 19, 2004
    Inventors: Jeffrey J. Domey, Johannes Moll, Robert S. Pavlik, Daniel R. Sempolinski, Julie L. Ladison, John E. Maxon, Michael W. Linder, Michael R. Heslin
  • Patent number: 6758063
    Abstract: The invention provides optical projection lithography methods, photolithography photomasks, and optical photolithography mask blanks for use in optical photolithography systems utilizing deep ultraviolet light (DUV) wavelengths below 300 nm, such as DUV projection lithography systems utilizing wavelengths in the 248 nm region and the 193 nm region. The invention provides improved production of lithography patterns by inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks.
    Type: Grant
    Filed: July 31, 2002
    Date of Patent: July 6, 2004
    Assignee: Corning Incorporated
    Inventors: Richard S. Priestley, Daniel R. Sempolinski, Chunzhe C. Yu
  • Publication number: 20040086255
    Abstract: Articles and methods for providing stacked arrays of optical fibers are disclosed. The articles and methods include providing arrays of gripping elements that provide arrays of channels adapted to secure optical fibers to a substrate surface. The articles and methods are useful for making stacked arrays of optical fibers and manufacturing optical devices.
    Type: Application
    Filed: October 31, 2002
    Publication date: May 6, 2004
    Inventors: Alfred D. Botet, Stephen J. Caracci, Adam J. Fusco, Daniel R. Sempolinski
  • Patent number: 6698248
    Abstract: Methods and apparatus for producing fused silica members having high internal transmission are disclosed. The apparatus and methods are capable of producing fused silica having internal transmission of at least 99.65%/cm at 193 nm.
    Type: Grant
    Filed: September 20, 2002
    Date of Patent: March 2, 2004
    Assignee: Corning Incorporated
    Inventors: Floyd E. Marley, Daniel R. Sempolinski, Merrill F. Sproul
  • Patent number: 6689706
    Abstract: Fused silica articles exhibiting improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum. The articles also exhibit induced transmission when irradiated with a laser.
    Type: Grant
    Filed: May 29, 2002
    Date of Patent: February 10, 2004
    Assignee: Corning Incorporated
    Inventor: Daniel R. Sempolinski
  • Patent number: 6672111
    Abstract: Methods and apparatus for adding metals such as aluminum to fused silica glass articles are disclosed. The methods and apparatus allow for controlled, low level addition of metals into fused silica glass articles. The fused silica glass articles containing added aluminum exhibit improved internal transmission and decreased absorption change when irradiated with a laser.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: January 6, 2004
    Assignee: Corning Incorporated
    Inventors: William P. Peters, Merrill F. Sproul, Daniel R. Sempolinski, Michael H. Wasilewski
  • Publication number: 20030205057
    Abstract: Methods and apparatus for adding metals such as aluminum to fused silica glass articles are disclosed. The methods and apparatus allow for controlled, low level addition of metals into fused silica glass articles. The fused silica glass articles containing added aluminum exhibit improved internal transmission and decreased absorption change when irradiated with a laser.
    Type: Application
    Filed: December 21, 2001
    Publication date: November 6, 2003
    Inventors: William P. Peters, Merrill F. Sproul, Daniel R. Sempolinski, Michael H. Wasilewski
  • Patent number: 6630418
    Abstract: Fused silica articles containing at least 50 ppb aluminum are disclosed. The fused silica articles containing these levels of aluminum exhibit improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: October 7, 2003
    Assignee: Corning Incorporated
    Inventor: Daniel R. Sempolinski
  • Patent number: 6619073
    Abstract: The invention relates to optical glass having improved initial transmittance, formed by subjecting the glass to a hydrogen and/or deuterium treatment at a temperature, and for a duration of time sufficient to diffuse the hydrogen and/or deuterium into the glass.
    Type: Grant
    Filed: October 23, 2001
    Date of Patent: September 16, 2003
    Assignee: Corning Incorporated
    Inventors: Nicholas F. Borrelli, Daniel R. Sempolinski, Thomas P. Seward, Charlene M. Smith
  • Publication number: 20030136153
    Abstract: Methods and apparatus for producing fused silica members having high internal transmission are disclosed. The apparatus and methods are capable of producing fused silica having internal transmission of at least 99.65%/cm at 193 nm.
    Type: Application
    Filed: January 10, 2003
    Publication date: July 24, 2003
    Inventors: Floyd E. Marley, Daniel R. Sempolinski, Merrill F. Sproul
  • Publication number: 20030119650
    Abstract: Fused silica articles containing at least 50 ppb aluminum are disclosed. The fused silica articles containing these levels of aluminum exhibit improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum.
    Type: Application
    Filed: December 21, 2001
    Publication date: June 26, 2003
    Inventor: Daniel R. Sempolinski
  • Publication number: 20030119651
    Abstract: Fused silica articles exhibiting improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum. The articles also exhibit induced transmission when irradiated with a laser.
    Type: Application
    Filed: May 29, 2002
    Publication date: June 26, 2003
    Inventor: Daniel R. Sempolinski
  • Publication number: 20030064877
    Abstract: Fused silica members having high internal transmission and low birefringence are disclosed. Methods of making such fused silica members are also disclosed. According to the present invention, fused silica members having an internal transmission equal to or greater than 99.65%/cm at 193 nm and having an absolute maximum birefringence along the use axis of less than or equal to 0.75 nm/cm are provided.
    Type: Application
    Filed: September 25, 2002
    Publication date: April 3, 2003
    Inventors: Jeffrey J. Domey, Michael R. Heslin, Julie L. Ladison, Michael W. Linder, John E. Maxon, Johannes Moll, Robert S. Pavlik, Daniel R. Sempolinski
  • Publication number: 20030056537
    Abstract: Methods and apparatus for producing fused silica members having high internal transmission are disclosed. The apparatus and methods are capable of producing fused silica having internal transmission of at least 99.65%/cm at 193 nm.
    Type: Application
    Filed: September 20, 2002
    Publication date: March 27, 2003
    Inventors: Floyd E. Marley, Daniel R. Sempolinski, Merrill F. Sproul
  • Publication number: 20020194869
    Abstract: The invention relates to optical glass having improved initial transmittance, formed by subjecting the glass to a hydrogen and/or deuterium treatment at a temperature, and for a duration of time sufficient to diffuse the hydrogen and/or deuterium into the glass.
    Type: Application
    Filed: October 23, 2001
    Publication date: December 26, 2002
    Inventors: Nicholas F. Borrelli, Daniel R. Sempolinski, Thomas P. Seward, Charlene M. Smith
  • Publication number: 20020187407
    Abstract: The invention provides optical projection lithography methods, photolithography photomasks, and optical photolithography mask blanks for use in optical photolithography systems utilizing deep ultraviolet light (DUV) wavelengths below 300 nm, such as DUV projection lithography systems utilizing wavelengths in the 248 nm region and the 193 nm region. The invention provides improved production of lithography patterns by inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks.
    Type: Application
    Filed: July 31, 2002
    Publication date: December 12, 2002
    Inventors: Richard S. Priestley, Daniel R. Sempolinski, Chunzhe C. Yu
  • Publication number: 20020174684
    Abstract: A furnace for the deposition and collection of molten silica particles to form a solid body, the furnace comprising a collection vessel, the base of which is lined with a purified refractory material, and a method of forming the solid body which comprises lining the base of the collection cup with crushed particles of purified refractory material.
    Type: Application
    Filed: May 23, 2001
    Publication date: November 28, 2002
    Inventors: Paul S. Danielson, John E. Maxon, Robert S. Pavlik, Daniel R. Sempolinski