Patents by Inventor Danielle M. Wettling
Danielle M. Wettling has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20040059007Abstract: The present invention relates to a composite material with an improved structure in which is dispersed an active organic compound, and a method for treating effluents, in particular a method for treating photographic effluents.Type: ApplicationFiled: September 22, 2003Publication date: March 25, 2004Inventors: Olivier J. Poncelet, Danielle M. Wettling
-
Patent number: 6680066Abstract: The present invention relates to a composite material with an improved structure in which is dispersed an active organic compound, and a method for treating effluents, in particular a method for treating photographic effluents. The composite material takes the form of a structured gel comprising an aluminosilicate polymer matrix in the form of fibers in which at least two distinct fibers are interconnected by at least two covalent bonds to form an irreversible chemical gel and, dispersed in the matrix, an active organic compound. The choice of the degree of cross-linking of the matrix makes it possible to control the diffusion of a hydrophilic active organic compound. The invention further concerns a method for preparing such a composite material.Type: GrantFiled: February 5, 2002Date of Patent: January 20, 2004Assignee: Eastman Kodak CompanyInventors: Olivier J. Poncelet, Danielle M. Wettling
-
Patent number: 6627208Abstract: The invention relates to a biocidal material containing a specific mixture of a hydrophobic and a hydrophilic biocides, dispersed in a water-permeable matrix. The invention further concerns a method that uses the biocidal material of the invention to prevent microorganisms from growing in an aqueous solution in which such microorganisms are liable to grow.Type: GrantFiled: November 30, 2000Date of Patent: September 30, 2003Assignee: Eastman Kodak CompanyInventors: Olivier Jean Poncelet, Danielle M. Wettling
-
Patent number: 6620397Abstract: The present invention relates to a material and a method for treating of photographic effluents in order to eliminate microorganisms and pollutant by-products so as to control bacterial growth and thereby obtain effluents that comply with regulatory requirements. The method for preparing an oxidizing material according to the invention comprises the dispersion in colloidal form of a metal or metal compound in an aqueous solution of an inorganic aluminosilicate polymer, said aluminosilicate being able to form an inorganic gel, and said metal or metal compound being able to cause the oxidation of oxidizable products and (or) micro-organisms to be eliminated, followed by the addition of a base to cause said aluminosilicate to gel. The metal is preferably silver in a powder form that is able to form a colloid when it is dispersed. The oxidizing material of the invention is efficient especially for the treatment of photographic baths, in particular wash baths placed after the fixing step.Type: GrantFiled: May 31, 2002Date of Patent: September 16, 2003Assignee: Eastman Kodak CompanyInventors: Danielle M. Wettling, Olivier J. Poncelet
-
Patent number: 6555008Abstract: This invention concerns the developing of silver halide photographic products. Silver-laden slurries accumulate in developing baths. It is possible to eliminate these silver-laden slurries by placing the developing baths in contact with aluminosilicate polymers modified by sulfur groups. For example, a tank 12 is fitted with a loop to feed the bath through a cartridge 16 that contains the elements 18 that are permeable to the developing bath, and which contain the aluminosilicate polymer modified by the sulfur groups.Type: GrantFiled: February 11, 2002Date of Patent: April 29, 2003Assignee: Eastman Kodak CompanyInventors: Olivier J. Poncelet, Jacques Roussilhe, Danielle M. Wettling
-
Publication number: 20030077547Abstract: The present invention relates to a material and a method for treating of photographic effluents in order to eliminate micro-organisms and pollutant by-products so as to control bacterial growth and thereby obtain effluents that comply with regulatory requirements. The method for preparing an oxidizing material according to the invention comprises the dispersion in colloidal form of a metal or metal compound in an aqueous solution of an inorganic aluminosilicate polymer, said aluminosilicate being able to form an inorganic gel, and said metal or metal compound being able to cause the oxidation of oxidizable products and (or) micro-organisms to be eliminated, followed by the addition of a base to cause said aluminosilicate to gel. The metal is preferably silver in a powder form that is able to form a colloid when it is dispersed. The oxidizing material of the invention is efficient especially for the treatment of photographic baths, in particular wash baths placed after the fixing step.Type: ApplicationFiled: May 31, 2002Publication date: April 24, 2003Applicant: Eastman Kodak CompanyInventors: Danielle M. Wettling, Olivier J. Poncelet
-
Publication number: 20020168596Abstract: The present invention relates to a composite material with an improved structure in which is dispersed an active organic compound, and a method for treating effluents, in particular a method for treating photographic effluents.Type: ApplicationFiled: February 5, 2002Publication date: November 14, 2002Applicant: Eastman Kodak CompanyInventors: Olivier J. Poncelet, Danielle M. Wettling
-
Patent number: 6440308Abstract: The present invention relates to a composite material in which an active organic compound is dispersed, as well as to an effluent treatment process, especially a photographic effluent treatment process. The composite material comprises an aluminosilicate organic-inorganic polymer matrix in fiber form comprising at least on the surface an organic radical having a —SH or —S(—CH2)n—S— function with n between 0 and 4 and in which an active organic compound is dispersed.Type: GrantFiled: February 23, 1999Date of Patent: August 27, 2002Assignee: Eastman Kodak CompanyInventors: Olivier C. Poncelet, Danielle M. Wettling
-
Patent number: 6437021Abstract: This invention relates to a biocide material to inhibit the growth of micro-organisms in an aqueous solution, a device comprising such a material, and a method of preparation of such a polymeric material. The biocide material of the invention comprises a water-insoluble polymeric support on which a biocide is immobilized, the water content of the material being between 30 and 60% by weight of the material.Type: GrantFiled: May 25, 2001Date of Patent: August 20, 2002Assignee: Eastman Kodak CompanyInventors: Danielle M. Wettling, Karen Leeming, Sylvie Lebrat, Christopher P. Moore, Thierry Janet
-
Publication number: 20010003000Abstract: The invention relates to a biocidal material containing a specific mixture of a hydrophobic and a hydrophilic biocides, dispersed in a water-permeable matrix. The invention further concerns a method that uses the biocidal material of the invention to prevent microorganisms from growing in an aqueous solution in which such microorganisms are liable to grow.Type: ApplicationFiled: November 30, 2000Publication date: June 7, 2001Inventors: Olivier Jean Poncelet, Danielle M. Wettling
-
Patent number: 6179898Abstract: An organic-inorganic polymer comprising aluminosilicate having grafted thereon an organic radical having a —SH or —S(—CH2)n—S— group wherein n is from 0 to 4.Type: GrantFiled: February 23, 1999Date of Patent: January 30, 2001Assignee: Eastman Kodak CompanyInventors: Olivier J. Poncelet, Jeannine Rigola, Danielle M. Wettling
-
Patent number: 5972576Abstract: The invention concerns a method for decontaminating a used photographic processing bath.This method consists of putting the processing bath in contact with a heat-reversible hydrophilic polymer which becomes hydrophobic above a temperature lower than the temperature of the processing bath.The tars and other organic contaminants present in the used photographic processing bath can be removed by cooling the heat-reversible polymer below the temperature where it becomes hydrophilic.Type: GrantFiled: November 19, 1998Date of Patent: October 26, 1999Assignee: Eastman Kodak CompanyInventors: Olivier J. Poncelet, Danielle M. Wettling, Jeannine Rigola
-
Patent number: 5972831Abstract: The present invention concerns a novel photocatalytic composition, a photocatalytic element and a novel method for the photocatalytic treatment of effluents, comprising a gaseous or aqueous solution of the organic compounds to be destroyed.This novel photocatalytic composition consists of an inorganic gel comprising a photocatalyst and an aluminosilicate inorganic polymer binder of the Imogolite type.This composition destroys organic compounds efficaciously.Type: GrantFiled: June 12, 1997Date of Patent: October 26, 1999Assignee: Eastman Kodak CompanyInventors: Olivier J. Poncelet, Danielle M. Wettling
-
Patent number: 5858630Abstract: The present invention concerns a process for treating photographic baths containing organic contaminants and a device for implementing this method.The process for treating a photographic bath containing contaminants comprises the step of putting the photographic bath in contact with a photographically inert material, resistant to a high pH and having a lipophilic surface.This method affords an improvement in the processing of photographic products.Type: GrantFiled: August 28, 1997Date of Patent: January 12, 1999Assignee: Eastman Kodak CompanyInventors: Olivier J. Poncelet, Jeannine Rigola, Danielle M. Wettling
-
Patent number: 5237081Abstract: The invention relates to a process for preparing indium alkoxides soluble in organic solvents.The preparation method consists in reacting an indium halide with a C.sub.3 -C.sub.20 alcohol in the presence of a base having a pka >10 and a low nucleophilicity, in anhydrous medium, under inert gas and in the presence of polar organic solvents.The invention allows to obtain with a high yield pure indium alkoxides.Type: GrantFiled: September 15, 1992Date of Patent: August 17, 1993Assignee: Eastman Kodak CompanyInventors: Christopher P. Moore, Danielle M. Wettling