Patents by Inventor David Earle Seeger

David Earle Seeger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7212091
    Abstract: A microelectromechanical switch including: at least one pair of actuator electrodes; at least one input electrode and at least one output electrode for input and output, respectively, of a radio frequency signal; and a beam movable by an attraction between the at least one pair of actuator electrodes, the movable beam having at least a portion electrically connected to the at least one input electrode and to the at least one output electrode when moved by the attraction between the at least one pair of actuator electrodes to make an electrical connection between the at least one input and output electrodes; wherein the at least one pair of actuator electrodes are electrically isolated from each of the at least one input and output electrodes. The microelectromechanical switch can be configured in single or multiple-poles and/or single or multiple throws.
    Type: Grant
    Filed: February 8, 2005
    Date of Patent: May 1, 2007
    Assignee: International Business Machines Coproration
    Inventors: Panayotis Constantinou Andricacos, L. Paivikki Buchwalter, Hariklia Deligianni, Robert A. Groves, Christopher Jahnes, Jennifer L. Lund, Michael Meixner, David Earle Seeger, Timothy D. Sullivan, Ping-Chuan Wang
  • Patent number: 7166241
    Abstract: Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: January 23, 2007
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Jeffrey Donald Gelorme, Thomas Harold Newman, Niranjan Mohanlal Patel, David Earle Seeger
  • Patent number: 6876282
    Abstract: A microelectromechanical switch including: at least one pair of actuator electrodes; at least one input electrode and at least one output electrode for input and output, respectively, of a radio frequency signal; and a beam movable by an attraction between the at least one pair of actuator electrodes, the movable beam having at least a portion electrically connected to the at least one input electrode and to the at least one output electrode when moved by the attraction between the at least one pair of actuator electrodes to make an electrical connection between the at least one input and output electrodes; wherein the at least one pair of actuator electrodes are electrically isolated from each of the at least one input and output electrodes. The microelectromechanical switch can be configured in single or multiple-poles and/or single or multiple throws.
    Type: Grant
    Filed: May 17, 2002
    Date of Patent: April 5, 2005
    Assignee: International Business Machines Corporation
    Inventors: Panayotis Constantinou Andricacos, L. Paivikki Buchwalter, Hariklia Deligianni, Robert A. Groves, Christopher Jahnes, Jennifer L. Lund, Michael Meixner, David Earle Seeger, Timothy D. Sullivan, Ping-Chuan Wang
  • Patent number: 6830708
    Abstract: Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
    Type: Grant
    Filed: August 2, 2001
    Date of Patent: December 14, 2004
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Jeffrey Donald Gelorme, Thomas Harold Newman, Niranjan Mohanlal Patel, David Earle Seeger
  • Publication number: 20040077140
    Abstract: A uniformly thick oxide film on a substrate is formed by using an anodization apparatus which deposits a blanket precursor film on a surface of a substrate; provides electrical contact to the precursor film; moves the precursor film into contact with an electrolyte solution such that substantially all electrically conductive surfaces, e.g., pin contacts, the substrate edge and a backside of the substrate are electrically isolated from the electrolyte; ensures that the surface of the precursor film on the substrate is in direct contact with the electrolyte solution; and which applies an anodizing current and/or voltage between the precursor film and a counter electrode so as to compensate for a voltage drop resulting from the presence of the electrolyte.
    Type: Application
    Filed: October 16, 2002
    Publication date: April 22, 2004
    Inventors: Panayotis C. Andricacos, Roy Arthur Carruthers, Stephan Alan Cohen, John Michael Cotte, Lynne M. Gignac, Kenneth Jay Stein, Keith T. Kwietniak, Seshadri Subbanna, Horatio Seymour Wildman, David Earle Seeger, Andrew Herbert Simon
  • Publication number: 20030214373
    Abstract: A microelectromechanical switch including: at least one pair of actuator electrodes; at least one input electrode and at least one output electrode for input and output, respectively, of a radio frequency signal; and a beam movable by an attraction between the at least one pair of actuator electrodes, the movable beam having at least a portion electrically connected to the at least one input electrode and to the at least one output electrode when moved by the attraction between the at least one pair of actuator electrodes to make an electrical connection between the at least one input and output electrodes; wherein the at least one pair of actuator electrodes are electrically isolated from each of the at least one input and output electrodes. The microelectromechanical switch can be configured in single or multiple-poles and/or single or multiple throws.
    Type: Application
    Filed: May 17, 2002
    Publication date: November 20, 2003
    Inventors: Panayotis Constantinou Andricacos, L. Paivikki Buchwalter, Hariklia Deligianni, Robert A. Groves, Christopher Jahnes, Jennifer L. Lund, Michael Meixner, David Earle Seeger, Timothy D. Sullivan, Ping-Chuan Wang
  • Publication number: 20020014617
    Abstract: Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
    Type: Application
    Filed: August 2, 2001
    Publication date: February 7, 2002
    Inventors: Marie Angelopoulos, Jeffrey Donald Gelorme, Thomas Harold Newman, Niranjan Mohanlal Patel, David Earle Seeger
  • Patent number: 6280901
    Abstract: Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam a polymer having pendant recurring groups selected from the group consisting of —COO—CH2—CH(OH)—(CH2)x—H wherein x is 0-20; —COO—CH2—CH(OH)—(CH2)y—HE—(CH2)z—H; and mixtures thereof; wherein HE is O or S; and each y and z individually is 1-18; and mixtures thereof; and then developing the polymer in an aqueous base developer. The developer can be any of the conventional or commonly used ones as well as the special developers discussed below. Positive lithographic patterns are also produced by imagewise exposing to actinic light, x-ray or e-beam a photosensitive polymeric material to provide free carboxylic acid groups; and then developing by contacting with an aqueous developer solution of about 0.
    Type: Grant
    Filed: April 27, 2000
    Date of Patent: August 28, 2001
    Assignee: International Business Machines Corporation
    Inventors: Ari Aviram, Andrew T. S. Pomerene, David Earle Seeger
  • Patent number: 6103145
    Abstract: Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: August 15, 2000
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Jeffrey Donald Gelorme, Thomas Harold Newman, Niranjan Mohanlal Patel, David Earle Seeger
  • Patent number: 6100011
    Abstract: Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam a polymer having pendant recurring groups selected from the group consisting of--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.x --H wherein x is 0-20;--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.y --HE--(CH.sub.2).sub.z --H; and mixtures thereof; wherein HE is O or S; and each y and z individually is 1-18; and mixtures thereof; and then developing the polymer in an aqueous base developer. The developer can be any of the conventional or commonly used ones as well as the special developers discussed below.Positive lithographic patterns are also produced by imagewise exposing to actinic light, x-ray or e-beam a photosensitive polymeric material to provide free carboxylic acid groups; and then developing by contacting with an aqueous developer solution of about 0.
    Type: Grant
    Filed: October 27, 1998
    Date of Patent: August 8, 2000
    Assignee: International Business Machines Corporation
    Inventors: Ari Aviram, Andrew T. S. Pomerene, David Earle Seeger
  • Patent number: 6010645
    Abstract: Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
    Type: Grant
    Filed: September 15, 1994
    Date of Patent: January 4, 2000
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Jeffrey Donald Gelorme, Thomas Harold Newman, Niranjan Mohanlal Patel, David Earle Seeger
  • Patent number: 5955242
    Abstract: Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam a polymer having pendant recurring groups selected from the group consisting of--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.x --H wherein x is 0-20;--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.y --HE--(CH.sub.2).sub.Z --H; and mixturesthereof; wherein HE is O or S; and each y and z individually is 1-18; and mixtures thereof; and then developing the polymer in an aqueous base developer. The developer can be any of the conventional or commonly used ones as well as the special developers discussed below.Positive lithographic patterns are also produced by imagewise exposing to actinic light, x-ray or e-beam a photosensitive polymeric material to provide free carboxylic acid groups; and then developing by contacting with an aqueous developer solution of about 0.
    Type: Grant
    Filed: September 23, 1996
    Date of Patent: September 21, 1999
    Assignee: International Business Machines Corporation
    Inventors: Ari Aviram, Andrew T. S. Pomerene, David Earle Seeger
  • Patent number: 5908732
    Abstract: Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam copolymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkyl acrylate with alkylmethacrylate and/or alkylacrylate, and then developing the polymer in a developer.
    Type: Grant
    Filed: September 23, 1996
    Date of Patent: June 1, 1999
    Assignee: International Business Machines Corporation
    Inventors: Ari Aviram, Karen Elizabeth Petrillo, Andrew T. S. Pomerene, David Earle Seeger
  • Patent number: 5770345
    Abstract: The sensitivity of a photoresist to actinic light is improved by the addition of certain dyes. The photoresist includes a polymer matrix, a photosensitive acid generator and at least one compound selected from the group consisting of dyes containing at least one heterosulphur atom such as 2,2.sup.1,5.sup.1,2"-terthiophene and its derivatives; thianthrene and its derivatives, and 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone and its derivatives; and 4,5-diphenyl-1,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic acid and its derivatives; and 5,7,12,14-pentacenetetrone. Resist images on a substrate are formed from the compositions.
    Type: Grant
    Filed: July 16, 1996
    Date of Patent: June 23, 1998
    Assignee: International Business Machines Corporation
    Inventors: Edward Darko Babich, Karen Elizabeth Petrillo, John Patrick Simons, David Earle Seeger
  • Patent number: 5759637
    Abstract: Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: June 2, 1998
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Jeffrey Donald Gelorme, Thomas Harold Newman, Niranjan Mohanlal Patel, David Earle Seeger
  • Patent number: 5753412
    Abstract: The sensitivity of a photoresist to actinic light is improved by the addition of certain dyes. The photoresist includes a polymer matrix, a photosensitive acid generator and at least one compound selected from the group consisting of dyes containing at least one heterosulphur atom such as 2,2.sup.1,5.sup.1,2"-terthiophene and its derivatives; thianthrene and its derivatives, and 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone and its derivatives; and 4,5-diphenyl-l,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic acid and its derivatives; and 5,7,12,14-pentacenetetrone. Resist images on a substrate are formed from the compositions.
    Type: Grant
    Filed: June 5, 1996
    Date of Patent: May 19, 1998
    Assignee: International Business Machines Corporation
    Inventors: Edward Darko Babich, Karen Elizabeth Petrillo, John Patrick Simons, David Earle Seeger
  • Patent number: 5644038
    Abstract: Quinone diazo compounds having bonded to the diazo ring or directly bonded to a ring of the compound, certain non-metallic atoms that improve the photosensitivity thereof are provided. These quinone diazo compounds are useful as photoactive compounds in photoresist compositions, and particularly positive photoresist composition employed in x-ray or electron beam radiation. Also provided is a method for preparing compounds of the present invention.
    Type: Grant
    Filed: March 15, 1996
    Date of Patent: July 1, 1997
    Assignee: International Business Machines Corporation
    Inventors: Ari Aviram, William Ross Brunsvold, Daniel Bucca, Willard Earl Conley, Jr., David Earle Seeger