Patents by Inventor David Hart PETERSON
David Hart PETERSON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240369947Abstract: A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.Type: ApplicationFiled: July 15, 2024Publication date: November 7, 2024Applicant: ASML Holding N.V.Inventors: Mehmet Ali AKBAS, Tammo UITTERDIJK, Christopher John MASON, Matthew LIPSON, David Hart PETERSON, Michael PERRY, Peter HELMUS, Jerry Jianguo DENG, Damoon SOHRABIBABAHEIDARY
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Patent number: 12111581Abstract: A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.Type: GrantFiled: October 22, 2019Date of Patent: October 8, 2024Assignee: ASML Holding N.V.Inventors: Mehmet Ali Akbas, Tammo Uitterdijk, Christopher John Mason, Matthew Lipson, David Hart Peterson, Michael Perry, Peter Helmus, Jerry Jianguo Deng, Damoon Sohrabibabaheidary
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Patent number: 11887881Abstract: A method of fabricating a substrate table includes supporting a table base and disposing a coating on a surface of the table base. The surface of the table base is substantially flat. The coating has a non-uniform thickness. The coating exerts a stress on the table so as to bend the table base. The non-uniform thickness causes a surface of the coating to become substantially flat after the bending.Type: GrantFiled: April 21, 2020Date of Patent: January 30, 2024Assignee: ASML HOLDING N.V.Inventors: Bruce Tirri, Ping Zhou, Elizabeth Mary Stone, David Hart Peterson, Mehmet Ali Akbas, Ryan Mayer, Richard Bryan Lewis
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Patent number: 11422289Abstract: A method of forming an anti-reflection layer, the method including applying a first mixture to an object, the first mixture made from a combination of aluminum tri-sec-butoxide (ATSB), a first chelating agent, water and an alcohol; removing a majority of the alcohol from the applied first mixture; after the removing, applying a second mixture to the object, the second mixture made from a combination of aluminum tri-sec-butoxide, a second chelating agent different than the first chelating agent, water and an alcohol; and removing a majority of the alcohol from the applied second mixture, wherein the applied first and second mixtures are used to form the anti-reflection layer.Type: GrantFiled: March 13, 2018Date of Patent: August 23, 2022Assignee: ASML Holding N.V.Inventors: Parag Vinayak Kelkar, David Hart Peterson
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Publication number: 20220216092Abstract: A method of fabricating a substrate table includes supporting a table base and disposing a coating on a surface of the table base. The surface of the table base is substantially flat. The coating has a non-uniform thickness. The coating exerts a stress on the table so as to bend the table base. The non-uniform thickness causes a surface of the coating to become substantially flat after the bending.Type: ApplicationFiled: April 21, 2020Publication date: July 7, 2022Applicant: ASML HOLDING N.V.Inventors: Bruce TIRRI, Ping ZHOU, Elizabeth Mary STONE, David Hart PETERSON, Mehmet Ali AKBAS, Ryan MAYER, Richard Bryan LEWIS
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Patent number: 11270906Abstract: Various burl designs for holding an object in a lithographic apparatus are described. A lithographic apparatus includes an illumination system, a first support structure, a second support structure, and a projection system. The illumination system is designed to receive radiation and to direct the radiation towards a patterning device that forms patterned radiation. The first support structure is designed to support the patterning device on the first support structure. The second support structure has a plurality of burls and is designed to support the substrate on the plurality of burls. A topography of a top surface of each of the plurality of burls is not substantially flat, such that a contact area between the substrate and each of the plurality of burls is reduced. The projection system is designed to receive the patterned radiation and to direct the patterned radiation towards the substrate.Type: GrantFiled: October 4, 2018Date of Patent: March 8, 2022Assignee: ASML Holding N.V.Inventors: Mehmet Ali Akbas, David Hart Peterson, Tammo Uitterdijk, Michael Perry, Richard Bryan Lewis, Iliya Sigal
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Publication number: 20210405539Abstract: A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.Type: ApplicationFiled: October 22, 2019Publication date: December 30, 2021Applicant: ASML Holding N.V.Inventors: Mehmet Ali AKBAS, Tammo UITTERDIJK, Christopher John MASON, Matthew LIPSON, David Hart PETERSON, Michael PERRY, Peter HELMUS, Jerry Jianguo DENG, Damoon SOHRABIBABAHEIDARY
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Publication number: 20210202293Abstract: Various burl designs for holding an object in a lithographic apparatus are described. A lithographic apparatus includes an illumination system, a first support structure, a second support structure, and a projection system. The illumination system is designed to receive radiation and to direct the radiation towards a patterning device that forms patterned radiation. The first support structure is designed to support the patterning device on the first support structure. The second support structure has a plurality of burls and is designed to support the substrate on the plurality of burls. A topography of a top surface of each of the plurality of burls is not substantially flat, such that a contact area between the substrate and each of the plurality of burls is reduced. The projection system is designed to receive the patterned radiation and to direct the patterned radiation towards the substrate.Type: ApplicationFiled: October 4, 2018Publication date: July 1, 2021Applicant: ASML HOLDING N.V.Inventors: Mehmet Ali AKBAS, David Hart PETERSON, Tammo UITTERDIJK, Michael PERRY, Richard Bryan LEWIS, Iliya SIGAL
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Publication number: 20200103558Abstract: A method of forming an anti-reflection layer, the method including applying a first mixture to an object, the first mixture made from a combination of aluminum tri-sec-butoxide (ATSB), a first chelating agent, water and an alcohol; removing a majority of the alcohol from the applied first mixture; after the removing, applying a second mixture to the object, the second mixture made from a combination of aluminum tri-sec-butoxide, a second chelating agent different than the first chelating agent, water and an alcohol; and removing a majority of the alcohol from the applied second mixture, wherein the applied first and second mixtures are used to form the anti-reflection layer.Type: ApplicationFiled: March 13, 2018Publication date: April 2, 2020Inventors: Parag Vinayak KELKAR, David Hart PETERSON