Patents by Inventor David Masayuki ISHIKAWA

David Masayuki ISHIKAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Acoustic Emission Monitoring and Endpoint for Chemical Mechanical Polishing
    Publication number: 20160256978
    Abstract: A chemical mechanical polishing apparatus includes a platen to support a polishing pad, and an in-situ acoustic emission monitoring system including an acoustic emission sensor supported by the platen, a waveguide configured to extending through at least a portion of the polishing pad, and a processor to receive a signal from the acoustic emission sensor. The in-situ acoustic emission monitoring system is configured to detect acoustic events caused by deformation of the substrate and transmitted through the waveguide, and the processor is configured to determine a polishing endpoint based on the signal.
    Type: Application
    Filed: March 5, 2015
    Publication date: September 8, 2016
    Inventors: Jianshe Tang, David Masayuki Ishikawa, Benjamin Cherian, Jeonghoon Oh, Thomas H. Osterheld
  • METHODS AND APPARATUS FOR PROFILE AND SURFACE PREPARATION OF RETAINING RINGS UTILIZED IN CHEMICAL MECHANICAL POLISHING PROCESSES
    Publication number: 20160121453
    Abstract: A retaining ring for a polishing process is disclosed. The retaining ring includes a body comprising an upper portion and a lower portion, and a sacrificial surface disposed on the lower portion, the sacrificial surface comprising a negative tapered surface having a taper height that is about 0.0003 inches to about 0.00015 inches.
    Type: Application
    Filed: October 9, 2015
    Publication date: May 5, 2016
    Inventors: David Masayuki ISHIKAWA, Jeonghoon OH, Garrett Ho Yee SIN, Charles C. GARRETSON, Huanbo ZHANG, Chia-Ling PAI, Niraj PRASAD, Julio David MUZQUIZ