Patents by Inventor David Walters Peters

David Walters Peters has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12081562
    Abstract: Aspects described herein may use machine learning models to predict one or more remediation actions to mitigate occurrence of an incident based upon previous incidents of an entity. Asset ownership data and development operations tools metric data are compiled and a relationship between the compiled data and an occurrence of previous incidents is determined. A machine learning model predicts relationships between the occurrence of a previous incident and assets data. One or more remediation actions are assigned to an asset and a notification is outputted regarding the same.
    Type: Grant
    Filed: October 25, 2021
    Date of Patent: September 3, 2024
    Assignee: Capital One Services, LLC
    Inventors: Matthew Louis Nowak, David Walter Peters, Keith D. Greene, Catherine Barnes
  • Publication number: 20230409424
    Abstract: Aspects described herein may use machine learning models to predict one or more remediation actions to mitigate reoccurrence of an incident that has become restored based upon previous incidents of an entity. Historical incident data is compiled into two incident datasets: one representative of incidents that were assigned a remediation action to mitigate reoccurrence of the incident, and a second representative of incidents that were not assigned a remediation action. A machine learning model matches relationships between data in the two datasets and outputs scores representative of similarities. Based on the scores, one or more remediation actions are mapped to an incident in the second dataset and the remediation action is performed for the incident.
    Type: Application
    Filed: September 5, 2023
    Publication date: December 21, 2023
    Inventors: Matthew Louis Nowak, Keith D. Greene, Catherine Barnes, David Walter Peters
  • Patent number: 11782784
    Abstract: Aspects described herein may use machine learning models to predict one or more remediation actions to mitigate reoccurrence of an incident that has become restored based upon previous incidents of an entity. Historical incident data is compiled into two incident datasets: one representative of incidents that were assigned a remediation action to mitigate reoccurrence of the incident, and a second representative of incidents that were not assigned a remediation action. A machine learning model matches relationships between data in the two datasets and outputs scores representative of similarities. Based on the scores, one or more remediation actions are mapped to an incident in the second dataset and the remediation action is performed for the incident.
    Type: Grant
    Filed: October 25, 2021
    Date of Patent: October 10, 2023
    Assignee: Capital One Services, LLC
    Inventors: Matthew Louis Nowak, Keith D. Greene, Catherine Barnes, David Walter Peters
  • Publication number: 20230126193
    Abstract: Aspects described herein may use machine learning models to predict one or more remediation actions to mitigate occurrence of an incident based upon previous incidents of an entity. Asset ownership data and development operations tools metric data are compiled and a relationship between the compiled data and an occurrence of previous incidents is determined. A machine learning model predicts relationships between the occurrence of a previous incident and assets data. One or more remediation actions are assigned to an asset and a notification is outputted regarding the same.
    Type: Application
    Filed: October 25, 2021
    Publication date: April 27, 2023
    Inventors: Matthew Louis Nowak, David Walter Peters, Keith D. Greene, Catherine Barnes
  • Publication number: 20230126147
    Abstract: Aspects described herein may use machine learning models to predict one or more remediation actions to mitigate reoccurrence of an incident that has become restored based upon previous incidents of an entity. Historical incident data is compiled into two incident datasets: one representative of incidents that were assigned a remediation action to mitigate reoccurrence of the incident, and a second representative of incidents that were not assigned a remediation action. A machine learning model matches relationships between data in the two datasets and outputs scores representative of similarities. Based on the scores, one or more remediation actions are mapped to an incident in the second dataset and the remediation action is performed for the incident.
    Type: Application
    Filed: October 25, 2021
    Publication date: April 27, 2023
    Inventors: Matthew Louis Nowak, Keith D. Greene, Catherine Barnes, David Walter Peters
  • Patent number: 8524321
    Abstract: This invention relates to a vapor or liquid phase reagent dispensing apparatus having a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of said metal seal. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: September 3, 2013
    Assignee: Praxair Technology, Inc.
    Inventors: Ronald F. Spohn, David Walter Peters
  • Patent number: 8518483
    Abstract: This invention relates to a liquid phase reagent dispensing apparatus having a diptube and also a metal seal aligned and in contact with the hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The apparatus further has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a sump cavity centrally located on a bottom wall member. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: August 27, 2013
    Assignee: Praxair Technology, Inc.
    Inventors: Ronald F. Spohn, David Walter Peters
  • Patent number: 8518484
    Abstract: This invention relates to vapor phase reagent dispensing apparatus having a bubbler tube and also a metal seal aligned and in contact with the hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: August 27, 2013
    Assignee: Praxair Technology, Inc.
    Inventors: Ronald F. Spohn, David Walter Peters
  • Patent number: 8518482
    Abstract: This invention relates to a vapor phase reagent dispensing apparatus having a bubbler tube and also a metal seal aligned and in contact with the hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The apparatus further has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a sump cavity centrally located on a bottom wall member. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: August 27, 2013
    Assignee: Praxair Technology, Inc.
    Inventors: Ronald F. Spohn, David Walter Peters
  • Patent number: 8512635
    Abstract: This invention relates to a vapor or liquid phase reagent dispensing apparatus having a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The apparatus also has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a sump cavity centrally located on a bottom wall member. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: August 20, 2013
    Assignee: Praxair Technology, Inc.
    Inventors: Ronald F. Spohn, David Walter Peters
  • Patent number: 8153831
    Abstract: This invention relates to organometallic compounds represented by the formula (L1)yM(L2)z-y wherein M is a Group 5 metal or a Group 6 metal, L1 is a substituted or unsubstituted anionic 6 electron donor ligand, L2 is the same or different and is (i) a substituted or unsubstituted anionic 2 electron donor ligand, (ii) a substituted or unsubstituted cationic 2 electron donor ligand, or (iii) a substituted or unsubstituted neutral 2 electron donor ligand; y is an integer of 1, and z is the valence of M; and wherein the sum of the oxidation number of M and the electric charges of L1 and L2 is equal to 0; a process for producing the organometallic compounds; and a method for depositing a metal and/or metal carbide/nitride layer, e.g., a tungsten, tungsten nitride, tungsten carbide, or tungsten carbonitride layer, on a substrate by the thermal or plasma enhanced dissociation of the organometallic precursor compounds, e.g., by CVD or ALD techniques.
    Type: Grant
    Filed: September 11, 2007
    Date of Patent: April 10, 2012
    Assignee: Praxair Technology, Inc.
    Inventors: David M. Thompson, David Walter Peters, Scott Houston Meiere
  • Patent number: 8114479
    Abstract: This invention relates to a vapor or liquid phase reagent dispensing apparatus having a diptube and also a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
    Type: Grant
    Filed: May 5, 2011
    Date of Patent: February 14, 2012
    Assignee: Praxair Technology, Inc.
    Inventors: Ronald F. Spohn, David Walter Peters
  • Publication number: 20110210142
    Abstract: This invention relates to a vapor or liquid phase reagent dispensing apparatus having a diptube and also a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
    Type: Application
    Filed: May 5, 2011
    Publication date: September 1, 2011
    Inventors: Ronald F. Spohn, David Walter Peters
  • Publication number: 20110206864
    Abstract: This invention relates to organometallic precursor compounds represented by the formula (Cp(R?)x)yM(H)z-y, a process for producing the organometallic precursor compounds, and a method for depositing a metal and/or metal carbide layer, e.g., Ta metal and/or TaC layer, on a substrate by the thermal or plasma enhanced disassociation of the organometallic precursor compounds, e.g., by CVD or ALD techniques. The metal and/or metal carbide layer is useful as a liner or barrier layer for conducting metals and high dielectric constant materials in integrated circuit manufacturing.
    Type: Application
    Filed: May 5, 2011
    Publication date: August 25, 2011
    Inventors: David Walter Peters, David M. Thompson
  • Patent number: 7959986
    Abstract: This invention relates to organometallic precursor compounds represented by the formula (Cp(R?)x)yM(H)z-y, a process for producing the organometallic precursor compounds, and a method for depositing a metal and/or metal carbide layer, e.g., Ta metal and/or TaC layer, on a substrate by the thermal or plasma enhanced disassociation of the organometallic precursor compounds, e.g., by CVD or ALD techniques. The metal and/or metal carbide layer is useful as a liner or barrier layer for conducting metals and high dielectric constant materials in integrated circuit manufacturing.
    Type: Grant
    Filed: February 2, 2009
    Date of Patent: June 14, 2011
    Assignee: Praxair Technology, Inc.
    Inventors: David Walter Peters, David M. Thompson
  • Patent number: 7959994
    Abstract: This invention relates to a vapor or liquid phase reagent dispensing apparatus having a diptube and also a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: June 14, 2011
    Assignee: Praxair Technology, Inc.
    Inventors: Ronald F. Spohn, David Walter Peters
  • Patent number: 7547796
    Abstract: This invention relates to organometallic precursor compounds represented by the formula (Cp(R?)x)yM(H)z-y, a process for producing the organometallic precursor compounds, and a method for depositing a metal and/or metal carbide layer, e.g., Ta metal and/or TaC layer, on a substrate by the thermal or plasma enhanced disassociation of the organometallic precursor compounds, e.g., by CVD or ALD techniques. The metal and/or metal carbide layer is useful as a liner or barrier layer for conducting metals and high dielectric constant materials in integrated circuit manufacturing.
    Type: Grant
    Filed: August 9, 2006
    Date of Patent: June 16, 2009
    Assignee: Praxair Technology, Inc.
    Inventors: David Walter Peters, David M. Thompson
  • Publication number: 20090136684
    Abstract: This invention relates to organometallic precursor compounds represented by the formula (Cp(R?)x)yM(H)z-y, a process for producing the organometallic precursor compounds, and a method for depositing a metal and/or metal carbide layer, e.g., Ta metal and/or TaC layer, on a substrate by the thermal or plasma enhanced disassociation of the organometallic precursor compounds, e.g., by CVD or ALD techniques. The metal and/or metal carbide layer is useful as a liner or barrier layer for conducting metals and high dielectric constant materials in integrated circuit manufacturing.
    Type: Application
    Filed: February 2, 2009
    Publication date: May 28, 2009
    Inventors: DAVID WALTER PETERS, David M. Thompson
  • Publication number: 20080213476
    Abstract: This invention relates to a vapor or liquid phase reagent dispensing apparatus comprising: a vessel which comprises a removable top wall member, a sidewall member and a bottom wall member configured to form an internal vessel compartment to hold a source chemical up to a fill level and to additionally define an inner gas volume above the fill level; said sidewall member having a protuberance that extends into the internal vessel compartment adjacent to the top wall member; said top wall member and said sidewall member having opposing flat surfaces, wherein the opposing flat surfaces are optionally in contact with one another; fastening means for securing said top wall member to said sidewall member through the opposing flat surfaces that are optionally in contact with one another; said top wall member and said protuberance having opposing flat surfaces, wherein the opposing flat surfaces are not in contact with one another and at least a portion of the opposing flat surfaces are hardened; and a metal seal
    Type: Application
    Filed: January 15, 2008
    Publication date: September 4, 2008
    Inventors: Ronald F. Spohn, David Walter Peters
  • Publication number: 20080182425
    Abstract: This invention relates to a vapor phase reagent dispensing apparatus having a bubbler tube and also a metal seal aligned and in contact with the hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The apparatus further has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a sump cavity centrally located on a bottom wall member. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
    Type: Application
    Filed: January 15, 2008
    Publication date: July 31, 2008
    Inventors: Ronald F. Spohn, David Walter Peters