Patents by Inventor David Walters Peters
David Walters Peters has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12081562Abstract: Aspects described herein may use machine learning models to predict one or more remediation actions to mitigate occurrence of an incident based upon previous incidents of an entity. Asset ownership data and development operations tools metric data are compiled and a relationship between the compiled data and an occurrence of previous incidents is determined. A machine learning model predicts relationships between the occurrence of a previous incident and assets data. One or more remediation actions are assigned to an asset and a notification is outputted regarding the same.Type: GrantFiled: October 25, 2021Date of Patent: September 3, 2024Assignee: Capital One Services, LLCInventors: Matthew Louis Nowak, David Walter Peters, Keith D. Greene, Catherine Barnes
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Publication number: 20230409424Abstract: Aspects described herein may use machine learning models to predict one or more remediation actions to mitigate reoccurrence of an incident that has become restored based upon previous incidents of an entity. Historical incident data is compiled into two incident datasets: one representative of incidents that were assigned a remediation action to mitigate reoccurrence of the incident, and a second representative of incidents that were not assigned a remediation action. A machine learning model matches relationships between data in the two datasets and outputs scores representative of similarities. Based on the scores, one or more remediation actions are mapped to an incident in the second dataset and the remediation action is performed for the incident.Type: ApplicationFiled: September 5, 2023Publication date: December 21, 2023Inventors: Matthew Louis Nowak, Keith D. Greene, Catherine Barnes, David Walter Peters
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Patent number: 11782784Abstract: Aspects described herein may use machine learning models to predict one or more remediation actions to mitigate reoccurrence of an incident that has become restored based upon previous incidents of an entity. Historical incident data is compiled into two incident datasets: one representative of incidents that were assigned a remediation action to mitigate reoccurrence of the incident, and a second representative of incidents that were not assigned a remediation action. A machine learning model matches relationships between data in the two datasets and outputs scores representative of similarities. Based on the scores, one or more remediation actions are mapped to an incident in the second dataset and the remediation action is performed for the incident.Type: GrantFiled: October 25, 2021Date of Patent: October 10, 2023Assignee: Capital One Services, LLCInventors: Matthew Louis Nowak, Keith D. Greene, Catherine Barnes, David Walter Peters
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Publication number: 20230126193Abstract: Aspects described herein may use machine learning models to predict one or more remediation actions to mitigate occurrence of an incident based upon previous incidents of an entity. Asset ownership data and development operations tools metric data are compiled and a relationship between the compiled data and an occurrence of previous incidents is determined. A machine learning model predicts relationships between the occurrence of a previous incident and assets data. One or more remediation actions are assigned to an asset and a notification is outputted regarding the same.Type: ApplicationFiled: October 25, 2021Publication date: April 27, 2023Inventors: Matthew Louis Nowak, David Walter Peters, Keith D. Greene, Catherine Barnes
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Publication number: 20230126147Abstract: Aspects described herein may use machine learning models to predict one or more remediation actions to mitigate reoccurrence of an incident that has become restored based upon previous incidents of an entity. Historical incident data is compiled into two incident datasets: one representative of incidents that were assigned a remediation action to mitigate reoccurrence of the incident, and a second representative of incidents that were not assigned a remediation action. A machine learning model matches relationships between data in the two datasets and outputs scores representative of similarities. Based on the scores, one or more remediation actions are mapped to an incident in the second dataset and the remediation action is performed for the incident.Type: ApplicationFiled: October 25, 2021Publication date: April 27, 2023Inventors: Matthew Louis Nowak, Keith D. Greene, Catherine Barnes, David Walter Peters
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Patent number: 8524321Abstract: This invention relates to a vapor or liquid phase reagent dispensing apparatus having a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of said metal seal. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.Type: GrantFiled: January 15, 2008Date of Patent: September 3, 2013Assignee: Praxair Technology, Inc.Inventors: Ronald F. Spohn, David Walter Peters
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Patent number: 8518483Abstract: This invention relates to a liquid phase reagent dispensing apparatus having a diptube and also a metal seal aligned and in contact with the hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The apparatus further has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a sump cavity centrally located on a bottom wall member. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.Type: GrantFiled: January 15, 2008Date of Patent: August 27, 2013Assignee: Praxair Technology, Inc.Inventors: Ronald F. Spohn, David Walter Peters
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Patent number: 8518484Abstract: This invention relates to vapor phase reagent dispensing apparatus having a bubbler tube and also a metal seal aligned and in contact with the hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.Type: GrantFiled: January 15, 2008Date of Patent: August 27, 2013Assignee: Praxair Technology, Inc.Inventors: Ronald F. Spohn, David Walter Peters
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Patent number: 8518482Abstract: This invention relates to a vapor phase reagent dispensing apparatus having a bubbler tube and also a metal seal aligned and in contact with the hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The apparatus further has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a sump cavity centrally located on a bottom wall member. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.Type: GrantFiled: January 15, 2008Date of Patent: August 27, 2013Assignee: Praxair Technology, Inc.Inventors: Ronald F. Spohn, David Walter Peters
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Patent number: 8512635Abstract: This invention relates to a vapor or liquid phase reagent dispensing apparatus having a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The apparatus also has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a sump cavity centrally located on a bottom wall member. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.Type: GrantFiled: January 15, 2008Date of Patent: August 20, 2013Assignee: Praxair Technology, Inc.Inventors: Ronald F. Spohn, David Walter Peters
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Patent number: 8153831Abstract: This invention relates to organometallic compounds represented by the formula (L1)yM(L2)z-y wherein M is a Group 5 metal or a Group 6 metal, L1 is a substituted or unsubstituted anionic 6 electron donor ligand, L2 is the same or different and is (i) a substituted or unsubstituted anionic 2 electron donor ligand, (ii) a substituted or unsubstituted cationic 2 electron donor ligand, or (iii) a substituted or unsubstituted neutral 2 electron donor ligand; y is an integer of 1, and z is the valence of M; and wherein the sum of the oxidation number of M and the electric charges of L1 and L2 is equal to 0; a process for producing the organometallic compounds; and a method for depositing a metal and/or metal carbide/nitride layer, e.g., a tungsten, tungsten nitride, tungsten carbide, or tungsten carbonitride layer, on a substrate by the thermal or plasma enhanced dissociation of the organometallic precursor compounds, e.g., by CVD or ALD techniques.Type: GrantFiled: September 11, 2007Date of Patent: April 10, 2012Assignee: Praxair Technology, Inc.Inventors: David M. Thompson, David Walter Peters, Scott Houston Meiere
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Patent number: 8114479Abstract: This invention relates to a vapor or liquid phase reagent dispensing apparatus having a diptube and also a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.Type: GrantFiled: May 5, 2011Date of Patent: February 14, 2012Assignee: Praxair Technology, Inc.Inventors: Ronald F. Spohn, David Walter Peters
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Publication number: 20110210142Abstract: This invention relates to a vapor or liquid phase reagent dispensing apparatus having a diptube and also a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.Type: ApplicationFiled: May 5, 2011Publication date: September 1, 2011Inventors: Ronald F. Spohn, David Walter Peters
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Publication number: 20110206864Abstract: This invention relates to organometallic precursor compounds represented by the formula (Cp(R?)x)yM(H)z-y, a process for producing the organometallic precursor compounds, and a method for depositing a metal and/or metal carbide layer, e.g., Ta metal and/or TaC layer, on a substrate by the thermal or plasma enhanced disassociation of the organometallic precursor compounds, e.g., by CVD or ALD techniques. The metal and/or metal carbide layer is useful as a liner or barrier layer for conducting metals and high dielectric constant materials in integrated circuit manufacturing.Type: ApplicationFiled: May 5, 2011Publication date: August 25, 2011Inventors: David Walter Peters, David M. Thompson
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Patent number: 7959986Abstract: This invention relates to organometallic precursor compounds represented by the formula (Cp(R?)x)yM(H)z-y, a process for producing the organometallic precursor compounds, and a method for depositing a metal and/or metal carbide layer, e.g., Ta metal and/or TaC layer, on a substrate by the thermal or plasma enhanced disassociation of the organometallic precursor compounds, e.g., by CVD or ALD techniques. The metal and/or metal carbide layer is useful as a liner or barrier layer for conducting metals and high dielectric constant materials in integrated circuit manufacturing.Type: GrantFiled: February 2, 2009Date of Patent: June 14, 2011Assignee: Praxair Technology, Inc.Inventors: David Walter Peters, David M. Thompson
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Patent number: 7959994Abstract: This invention relates to a vapor or liquid phase reagent dispensing apparatus having a diptube and also a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.Type: GrantFiled: January 15, 2008Date of Patent: June 14, 2011Assignee: Praxair Technology, Inc.Inventors: Ronald F. Spohn, David Walter Peters
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Patent number: 7547796Abstract: This invention relates to organometallic precursor compounds represented by the formula (Cp(R?)x)yM(H)z-y, a process for producing the organometallic precursor compounds, and a method for depositing a metal and/or metal carbide layer, e.g., Ta metal and/or TaC layer, on a substrate by the thermal or plasma enhanced disassociation of the organometallic precursor compounds, e.g., by CVD or ALD techniques. The metal and/or metal carbide layer is useful as a liner or barrier layer for conducting metals and high dielectric constant materials in integrated circuit manufacturing.Type: GrantFiled: August 9, 2006Date of Patent: June 16, 2009Assignee: Praxair Technology, Inc.Inventors: David Walter Peters, David M. Thompson
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Publication number: 20090136684Abstract: This invention relates to organometallic precursor compounds represented by the formula (Cp(R?)x)yM(H)z-y, a process for producing the organometallic precursor compounds, and a method for depositing a metal and/or metal carbide layer, e.g., Ta metal and/or TaC layer, on a substrate by the thermal or plasma enhanced disassociation of the organometallic precursor compounds, e.g., by CVD or ALD techniques. The metal and/or metal carbide layer is useful as a liner or barrier layer for conducting metals and high dielectric constant materials in integrated circuit manufacturing.Type: ApplicationFiled: February 2, 2009Publication date: May 28, 2009Inventors: DAVID WALTER PETERS, David M. Thompson
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Publication number: 20080213476Abstract: This invention relates to a vapor or liquid phase reagent dispensing apparatus comprising: a vessel which comprises a removable top wall member, a sidewall member and a bottom wall member configured to form an internal vessel compartment to hold a source chemical up to a fill level and to additionally define an inner gas volume above the fill level; said sidewall member having a protuberance that extends into the internal vessel compartment adjacent to the top wall member; said top wall member and said sidewall member having opposing flat surfaces, wherein the opposing flat surfaces are optionally in contact with one another; fastening means for securing said top wall member to said sidewall member through the opposing flat surfaces that are optionally in contact with one another; said top wall member and said protuberance having opposing flat surfaces, wherein the opposing flat surfaces are not in contact with one another and at least a portion of the opposing flat surfaces are hardened; and a metal sealType: ApplicationFiled: January 15, 2008Publication date: September 4, 2008Inventors: Ronald F. Spohn, David Walter Peters
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Publication number: 20080182425Abstract: This invention relates to a vapor phase reagent dispensing apparatus having a bubbler tube and also a metal seal aligned and in contact with the hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The apparatus further has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a sump cavity centrally located on a bottom wall member. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.Type: ApplicationFiled: January 15, 2008Publication date: July 31, 2008Inventors: Ronald F. Spohn, David Walter Peters