Patents by Inventor Debasish Kuila

Debasish Kuila has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5726296
    Abstract: Novel processes for the preparation of a new class of coumarin derivatives, which are useful as photoactive compounds in a wide variety of applications including photoresists and other opto-electronic applications, are disclosed and claimed. The process involves a multi-step synthetic method for the preparation of ether, ester, carbonate, or sulfonate derivative of 5-hydroxy, 6-hydroxy, or 7-hydroxy-3-diazo-4-oxo-3,4-dihydrocoumarin starting from the corresponding dihydroxyacetophenone. The compounds formed from the process of the present invention exhibit very high photosensitivity in the deep ultraviolet (DUV) region (ca. 250 nm), and therefore, are useful as photoactive compounds in DUV photoresist formulations.
    Type: Grant
    Filed: March 7, 1997
    Date of Patent: March 10, 1998
    Assignee: Hoechst Celanese Corp.
    Inventors: Mohammad Aslam, Michael T. Sheehan, Debasish Kuila
  • Patent number: 5726295
    Abstract: A new class of 3,4-dihydrocoumarin derivatives which are useful as photoactive compounds in a wide variety of applications including photoresists and other opto-electronic applications are disclosed and claimed. Preferred embodiments include ether, ester, carbonate, and sulfonate derivatives of 5-hydroxy, 6-hydroxy, and 7-hydroxy-3-diazo-4-oxo-3,4-dihydrocoumarins. These compounds exhibit very high photosensitivity in the deep ultraviolet (DUV) region (ca. 250 nm), and therefore, are useful as photoactive compounds in DUV photoresist formulations.
    Type: Grant
    Filed: March 7, 1997
    Date of Patent: March 10, 1998
    Assignee: Hoechst Celanese Corp.
    Inventors: Mohammad Aslam, Michael T. Sheehan, Debasish Kuila
  • Patent number: 5459266
    Abstract: The present invention provides novel substituted pyrazines or pyrazine derivatives ("NPD") which are functional and have useful application as a monomer for a variety of high performance polymers such as polyester, polyarylate, polycarbonate, polyetherketones, epoxides, polyimides, polyamides, and polyamides-imides. These NPD have the general formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are defined herein.
    Type: Grant
    Filed: February 4, 1994
    Date of Patent: October 17, 1995
    Assignee: Hoechst Celanese Corporation
    Inventors: George Kvakovszky, Richard Vicari, Ahamed M. Tafesh, Kathleen N. Juneau, Olan S. Fruchey, Joseph A. McDonough, Debasish Kuila
  • Patent number: 5438142
    Abstract: Compounds useful as polymer stabilizers which are polymerizable into condensation polymer systems are disclosed and claimed. A particularly preferred embodiment is 1-(3'-(benzotriazol-2"-yl)-4'-hydroxyphenyl)-1,1-bis(4-hydroxyphenyl)ethan e.
    Type: Grant
    Filed: August 10, 1993
    Date of Patent: August 1, 1995
    Assignee: Hoechst Celanese Corp.
    Inventors: John R. Fritsch, Olan S. Fruchey, Debasish Kuila, George Kvakovszky, Mark A. Murphy, Michael T. Sheehan, James R Sounik, Richard Vicari