Abstract: A cleansing composition and method of using a cleansing composition, the cleansing composition including a blend of three different emollients, the emollients including a first stearic ester, a second stearic ester, and a branched hydrocarbon, where the first stearic ester and second stearic ester are different from each other.

Abstract: A cleansing composition and method of using a cleansing composition, the cleansing composition including a blend of three different emollients, the emollients including a first stearic ester, a second stearic ester, and a branched hydrocarbon, where the first stearic ester and second stearic ester are different from each other.

Abstract: A cleansing composition and method of using a cleansing composition, the cleansing composition including a blend of three different emollients, the emollients including a first stearic ester, a second stearic ester, and a branched hydrocarbon, where the first stearic ester and second stearic ester are different from each other.

Abstract: A cleansing composition and method of using a cleansing composition, the cleansing composition including a blend of three different emollients, the emollients including a first stearic ester, a second stearic ester, and a branched hydrocarbon, where the first stearic ester and second stearic ester are different from each other.

Abstract: A cleansing composition and method of using a cleansing composition, the cleansing composition including a blend of three different emollients, the emollients including a first stearic ester, a second stearic ester, and a branched hydrocarbon, where the first stearic ester and second stearic ester are different from each other.

Abstract: A cleansing composition and method of using a cleansing composition, the cleansing composition including a blend of three different emollients, the emollients including a first stearic ester, a second stearic ester, and a branched hydrocarbon, where the first stearic ester and second stearic ester are different from each other.

Abstract: A cleansing composition and method of using a cleansing composition, the cleansing composition including a blend of three different emollients, the emollients including a first stearic ester, a second stearic ester, and a branched hydrocarbon, where the first stearic ester and second stearic ester are different from each other.

Abstract: A cleansing composition and method of using a cleansing composition, the cleansing composition including a blend of three different emollients, the emollients including a first stearic ester, a second stearic ester, and a branched hydrocarbon, where the first stearic ester and second stearic ester are different from each other.

Abstract: Leave-on compositions, articles of manufacture and methods of dissolving and otherwise treating blackheads are provided that employ neutralized fatty acids.

Abstract: A system and method for managing a telecommunications network and which may let a user monitor and control the user's network telephone services is disclosed. The system may include a CEO Dashboard, a Migration Module, and a Trouble Ticket Wizard. Additionally, the system may include backend processes that periodically run, ensuring that everything is being done to retrieve, and store, the user's available resources on the network. The system may be provided by an integrated platform that is available through online web access and that includes functions such as provisioning, billing, line management, and account management.

Abstract: A system and method for managing a telecommunications network and which may let a user monitor and control the user's network telephone services is disclosed. The system may include a CEO Dashboard, a Migration Module, and a Trouble Ticket Wizard. Additionally, the system may include backend processes that periodically run, ensuring that everything is being done to retrieve, and store, the user's available resources on the network. The system may be provided by an integrated platform that is available through online web access and that includes functions such as provisioning, billing, line management, and account management.

Abstract: A method for fabricating integrated capacitors, of particular utility in forming a ferroelectric capacitor array for a ferroelectric memory integrated circuits, begins with provision of a substrate. The substrate is typically a partially-processed CMOS integrated circuit wafer coated with an adhesion layer. Upon the substrate is deposited a bottom electrode layer, typically of noble metal, a dielectric layer, typically doped PZT, and a top electrode layer, typically a noble metal oxide. Next is deposited a hardmask layer of strontium ruthenium oxide, followed by a photoresist layer. The photoresist layer is aligned, exposed, developed, and cured as known in the art of integrated circuit photolithography. The resulting stack is then dry etched to remove undesired portions of the hardmask layer, the top electrode layer, and the dielectric layer. A principle advantage of the process is that a single photomasking operation is sufficient to define the top electrode and dielectric layers.

Abstract: A method for fabricating integrated capacitors, of particular utility in forming a ferroelectric capacitor array for a ferroelectric memory integrated circuits, begins with provision of a substrate. The substrate is typically a partially-processed CMOS integrated circuit wafer coated with an adhesion layer. Upon the substrate is deposited a bottom electrode layer, typically of noble metal, a dielectric layer, typically doped PZT, and a top electrode layer, typically a noble metal oxide. Next is deposited a hardmask layer of strontium ruthenium oxide, followed by a photoresist layer. The photoresist layer is aligned, exposed, developed, and cured as known in the art of integrated circuit photolithography. The resulting stack is then dry etched to remove undesired portions of the hardmask layer, the top electrode layer, and the dielectric layer. A principle advantage of the process is that a single photomasking operation is sufficient to define the top electrode and dielectric layers.

Abstract: A method for fabricating integrated capacitors, of particular utility in forming a ferroelectric capacitor array for a ferroelectric memory integrated circuits, begins with provision of a substrate. The substrate is typically a partially-processed CMOS integrated circuit wafer coated with an adhesion layer. Upon the substrate is deposited a bottom electrode layer, typically of noble metal, a dielectric layer, typically doped PZT, and a top electrode layer, typically a noble metal oxide. Next is deposited a hardmask layer of strontium ruthenium oxide, followed by a photoresist layer. The photoresist layer is aligned, exposed, developed, and cured as known in the art of integrated circuit photolithography. The resulting stack is then dry etched to remove undesired portions of the hardmask layer, the top electrode layer, and the dielectric layer. A principle advantage of the process is that a single photomasking operation is sufficient to define the top electrode and dielectric layers.