Patents by Inventor Dirk Beyer

Dirk Beyer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7720771
    Abstract: An embodiment of a method of dividing past computing instances into predictable and unpredictable sets begins with a first step of a computing entity storing a training data set comprising past computing instances. Each past computing instance comprises attributes and a past computing value. In a second step, the computing entity separates the training data set into a predictable set of past computing instances and an unpredictable set of past computing instances. According to an embodiment, a method of predicting a computing value begins with the first and second steps. The method of predicting the computing value continues with a third step of the computing entity forming a predictor from the predictable set of past computing instances. In a fourth step, the computing entity applies the predictor to a pending computing instance that meets a predictability test to determine a predicted value for the pending computing instance.
    Type: Grant
    Filed: June 24, 2005
    Date of Patent: May 18, 2010
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Eric Anderson, Dirk Beyer, Ira Cohen, Terence P. Kelly, Janet Wiener
  • Patent number: 7680635
    Abstract: A configuration method includes selecting a design configuration, and modeling the solution configuration having a failure event for the selected solution configuration to determine an amount of down time associated with the failure event. A first penalty cost function is applied the amount of down time to determine a first penalty cost associated with the failure event of the selected solution configuration.
    Type: Grant
    Filed: September 17, 2004
    Date of Patent: March 16, 2010
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Kimberly Keeton, John Wilkes, Cipriano A. Santos, Dirk Beyer, Arif Merchant, Jeffrey Scott Chase
  • Patent number: 7644249
    Abstract: An embodiment of a method of designing a storage system begins with a step of assigning decision variables to a range of candidate storage systems. Each of the decision variables identifies a single candidate storage system. The method concludes with a step of employing the decision variables in a mathematical program to determine which of the candidate storage systems meets availability and reliability criteria and incurs a near minimal projected cost.
    Type: Grant
    Filed: September 17, 2004
    Date of Patent: January 5, 2010
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Kimberly Keeton, John Wilkes, Cipriano A. Santos, Dirk Beyer, Jeffrey Scott Chase, Arif Merchant
  • Patent number: 7624035
    Abstract: A method for extracting an implied value of a component associated with a plurality of product packages is disclosed. One embodiment of the method includes receiving data associated with a plurality of product packages. It is noted that the data comprises product package price data associated with the plurality of product packages. The data is processed utilizing a mathematical optimization to produce first output data. The first output data is processed with a statistical regression to produce second output data. The second output data includes an estimated value and its standard error of a component associated with the plurality of product packages.
    Type: Grant
    Filed: February 5, 2003
    Date of Patent: November 24, 2009
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Alex X. Zhang, Dirk Beyer, Kemal Guler, Hsiu-Khuern Tang
  • Patent number: 7435517
    Abstract: A method for reducing the fogging effect in an electron beam lithography system wherein the exposure is controlled in order to obtain resulting pattern after processing which conforms to design data. A model for the fogging effect is fitted by individually changing at least the basic input parameters of the control function, the function type is chosen in accordance to the Kernel type used in the proximity corrector. The proximity effect is considered as well and an optimized set of parameters is obtained in order to gain a common control function for the proximity and fogging effect. The pattern writing with an e-beam lithographic system is controlled by the single combined proximity effect control function and the fogging effect control function in only one data-processing step using the same algorithms as are implemented in a standard proximity corrector.
    Type: Grant
    Filed: June 23, 2005
    Date of Patent: October 14, 2008
    Assignee: Vistec Electron Beam GmbH
    Inventors: Peter Hudek, Dirk Beyer, Lemke Melchior
  • Patent number: 7426616
    Abstract: Provided is a method for determining a recovery schedule. The method includes accepting as input a recovery graph. The recovery graph presents one or more strategies for data recovery. In addition, at least one objective is provided and accepted. The recovery graph is formalized as an optimization problem for the provided objective. When formalized as an optimization problem, at least one solution technique is applied to determine at least one recovery schedule.
    Type: Grant
    Filed: August 22, 2006
    Date of Patent: September 16, 2008
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Kimberly Keeton, Dirk Beyer, Ernesto Brau, Arif Merchant, Cipriano Santos, Alex Zhang
  • Publication number: 20080126279
    Abstract: Provided is a method for determining a recovery schedule. The method includes accepting as input a recovery graph. The recovery graph presents one or more strategies for data recovery. In addition, at least one objective is provided and accepted. The recovery graph is formalized as an optimization problem for the provided objective. When formalized as an optimization problem, at least one solution technique is applied to determine at least one recovery schedule.
    Type: Application
    Filed: August 22, 2006
    Publication date: May 29, 2008
    Inventors: Kimberly Keeton, Dirk Beyer, Ernesto Brau, Arif Merchant, Cipriano Santos, Alex Zhang
  • Publication number: 20080065749
    Abstract: Interconnection links between hosts and devices are optimized by using the operational parameters, for example, the bandwidth, of an edge/core switch network. In one embodiment, integer programming is used to create a mathematical model of the connectivity problem so as to optimize the minimum fraction of each host's or device's bandwidth demand routable from that host or devices to a core switch. In one embodiment, the mathematical model is solved by an integer problem solver.
    Type: Application
    Filed: September 8, 2006
    Publication date: March 13, 2008
    Inventors: Simge Kucukyavuz, Troy Shahoumian, Dirk Beyer, Julie Ward Drew
  • Patent number: 7308494
    Abstract: A technique is disclosed for reprovisioning an interconnect fabric design for interconnecting a plurality of network nodes. A design for the interconnect fabric specifies an arrangement of elements of the fabric and flow requirements among the network nodes. The invention programmatically reprovisions the design. This may include determining whether the flow requirements are satisfied by the design and whether the design violates constraints on the elements, such as bandwidth capacity and number of available ports. If the design does not satisfy the flow requirements, then the design is modified until the flow requirements are satisfied. Modifications are performed systematically by first attempting those that are least disruptive to the design and, then, attempting modifications that are increasingly more disruptive. As a result, the design is efficiently and cost-effectively reprovisioned to meet the flow the requirements.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: December 11, 2007
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Julie Ward Drew, Troy Alexander Shahoumian, John Wilkes, Michael O'Sullivan, Dirk Beyer
  • Patent number: 7286969
    Abstract: In one embodiment of a computer implemented method of determining placement of components in a rack, a rack height, a set of components to be placed in the rack, and a height are provided for each of the components. A placement of the components in the rack is determined according to constraints. The placement of the components is then evaluated according to an objective. The constraints may comprise a rack height constraint, a single placement constraint, and a non-overlapping constraint. The rack height constraint ensures that placement of a particular component does not result in a top height of the particular component exceeding the rack height. The single placement constraint ensures that each component is placed once and only once. The non-overlapping constraint ensures that each slot in the rack is occupied by no more than a single component. The method may further comprise providing a weight and a weight distribution for each component in the set of components.
    Type: Grant
    Filed: July 18, 2003
    Date of Patent: October 23, 2007
    Assignee: Hewlett Packard Development Company, L.P.
    Inventors: Troy Alexander Shahoumian, Dirk Beyer, Alex Zhang
  • Patent number: 7241542
    Abstract: A process for controlling the proximity effect correction in an electron beam lithography system. The exposure is controlled in order to obtain resulting pattern after processing which is conform to design data. In a first step an arbitrary set patterns is exposed without applying the process for controlling the proximity correction. The geometry of the resulting test structures is measured and a set of measurement data is obtained. Within a numerical range basic input parameters for the parameters ?, ? and ?, are derived from the set of measurement data. A model is fitted by individually changing at least the basic input parameters ?, ? and ? of a control function to measurement data set and thereby obtaining an optimised set of parameters. The correction function is applied to an exposure control of the electron beam lithography system during the exposure of a pattern according to the design data.
    Type: Grant
    Filed: June 23, 2005
    Date of Patent: July 10, 2007
    Assignee: Leica Microsystems Lithography GmbH
    Inventors: Peter Hudek, Dirk Beyer
  • Publication number: 20070112733
    Abstract: A method for extracting customer attributes from a database includes providing information regarding one or more content, one or more metrics, customer ID and a reference date and extracting customer attributes based on the information.
    Type: Application
    Filed: November 14, 2005
    Publication date: May 17, 2007
    Inventors: Dirk Beyer, Troy Shahoumian, Alex Zhang
  • Publication number: 20070022003
    Abstract: Methods, machines, systems and machine-readable instructions for producing marketing items are described. In one aspect, a user is prompted to specify campaign parameters, including one or more campaign topics, defining a scope of the campaign. The user is prompted to specify for each of the one or more campaign topics a corresponding set of one or more attributes of intended recipients of the marketing campaign. The one or more specified campaign topics are associated to respective sets of targeted recipients selected from a database of records of potential recipients based on mappings of the respective sets of recipient attributes to the campaign topics and the specified campaign parameters defining the scope of the marketing campaign. For each of the targeted recipients, a respective marketing item containing a respective set of one or more contents matched to the campaign topic associated to the targeted recipient is composed.
    Type: Application
    Filed: July 19, 2005
    Publication date: January 25, 2007
    Inventors: Hui Chao, Menaka Indrani, Gary Vondran, Xiaofan Lin, Parag Joshi, Dirk Beyer, C. Atkins, Pere Obrador, Alex Zhang
  • Publication number: 20060288346
    Abstract: In at least some embodiments, a method comprises computing an initial schedule of jobs to be run on a computing system using a mathematical program and monitoring the computing system. The method also comprises, based on the monitoring, determining, using the mathematical program used to compute the initial schedule, whether the initial schedule should be re-computed.
    Type: Application
    Filed: June 16, 2005
    Publication date: December 21, 2006
    Inventors: Cipriano Santos, Dirk Beyer
  • Publication number: 20060173559
    Abstract: In at least some embodiments, a method comprises obtaining a state description associated with a system having a component. The method further comprises automatically obtaining a substantially optimal parameterization for the component based on one or more operant characteristics of the component predicted by a behavior prediction model using combinations of the system's state description and a set of possible parameterizations for the component.
    Type: Application
    Filed: January 31, 2005
    Publication date: August 3, 2006
    Inventors: Evan Kirshenbaum, Dirk Beyer, Henri Suermondt
  • Patent number: 7076459
    Abstract: A method for generating a demand estimate for a product includes gathering a set of auction data which is relevant to the product, removing from the auction data all but a highest bid from each unique bidder in the auction data, and correcting a bias in the auction data caused by a set of characteristics of an auction from which the auction data is obtained. In one embodiment, the auction data is obtained from an on-line auction which is characterized by bidders not necessarily knowing the start time of the auction.
    Type: Grant
    Filed: March 21, 2001
    Date of Patent: July 11, 2006
    Assignee: Hewlett-Packard Development Company, LP.
    Inventors: Alex Xin Zhang, Dirk Beyer, Julie Ann Ward, Tongwei Liu
  • Publication number: 20060031444
    Abstract: A system and method for improving a network. The system and method may include receiving a virtual topology including a list of application components defining an arbitrary network, resource requirements for the application components and communication requirements between each set of application components and receiving a network topology including a list of physical resources defining an arbitrary capacitated network, specifications for the physical resources, connections between the physical resources and a physical property for each connection. The system and method may also include creating decision variables and constraints to provide an objective function using the virtual topology and the network topology and assigning each application component to at least one physical resource according to the decision variables, the constraints, and the objective function.
    Type: Application
    Filed: May 28, 2004
    Publication date: February 9, 2006
    Inventors: Julie Drew, Cipriano Santos, Simge Kucukyavuz, Dirk Beyer, Xiaoyun Zhu
  • Publication number: 20050287451
    Abstract: Method for reducing the fogging effect in an electron beam lithography system wherein the exposure is controlled in order to obtain resulting pattern after processing which are conform to design data. A model for the fogging effect is fitted by individually changing at least the basic input parameters of the control function, the function type is chosen in accordance to the Kernel type used in the proximity corrector. The proximity effect is considered as well and an optimised set of parameters is obtained in order to gain a common control function for the proximity and fogging effect. The pattern writing with an e-beam lithographic system is controlled by the single combined proximity effect control function and the fogging effect control function in only one data-processing step using the same algorithms as are implemented in a standard proximity corrector.
    Type: Application
    Filed: June 23, 2005
    Publication date: December 29, 2005
    Applicant: Leica Microsystems Lithography GmbH
    Inventors: Peter Hudek, Dirk Beyer, Lemke Melchior
  • Publication number: 20050287450
    Abstract: A process for controlling the proximity effect correction in an electron beam lithography system. The exposure is controlled in order to obtain resulting pattern after processing which is conform to design data. In a first step an arbitrary set patterns is exposed without applying the process for controlling the proximity correction. The geometry of the resulting test structures is measured and a set of measurement data is obtained. Within a numerical range basic input parameters for the parameters ?, ? and ?, are derived from the set of measurement data. A model is fitted by individually changing at least the basic input parameters ?, ? and ? of a control function to measurement data set and thereby obtaining an optimised set of parameters. The correction function is applied to an exposure control of the electron beam lithography system during the exposure of a pattern according to the design data.
    Type: Application
    Filed: June 23, 2005
    Publication date: December 29, 2005
    Applicant: Leica Microsystems Lithography GmbH
    Inventors: Peter Hudek, Dirk Beyer
  • Publication number: 20050228852
    Abstract: Embodiments of the present invention relate to a system and method for allocating resources to applications. One embodiment of the present invention may include identifying a plurality of applications and a plurality of application components, and determining available resources of a networked computing system for potentially storing the applications and application components. Additionally, the embodiment may include determining required resources for each application component, assigning a subset of available resources for each application component based on the required resources of the application component and the available resources. The embodiment may also include associating the application components with the subsets of available resources and storing more than one application component of the plurality of application components on a single available resource.
    Type: Application
    Filed: August 11, 2004
    Publication date: October 13, 2005
    Inventors: Cipriano Santos, Xiaoyun Zhu, Dirk Beyer, Sharad Singhal