Abstract: An embodiment roof assembly for a vehicle includes a roof panel including a core, an upper skin attached to a top surface of the core, and a lower skin attached to a bottom surface of the core, a face sheet disposed above the roof panel, and a foam layer interposed between the roof panel and the face sheet.

Abstract: An yttrium-based powder for thermal spraying and an yttrium-based thermal spray coating formed from the yttrium-based powder are proposed. The yttrium-based powder includes an yttrium-based compound and an optimally controlled amount of an oxide additive, SiO2. The yttrium-based powder inhibits formation of black spots or prevents the yttrium-based compound from turning black through plasma spray coating. The yttrium-based powder enables formation of a thermal spray coating with a desired color and improved mechanical properties.

Abstract: Disclosed herein are a method, an apparatus and a storage medium for encoding/decoding using a transform-based feature map. An optimal basis vector is extracted from one or more feature maps, and a transform coefficient is acquired through a transform using the basis vector. The basis vector and the transform coefficient may be transmitted through a bitstream. In an embodiment, one or more feature maps are reconstructed using the basis vector and the transform coefficient, which are decoded from the bitstream.

Abstract: A positive electrode active material for a lithium secondary battery comprising lithium transition metal oxide particles having a core-shell structure which includes a core portion and a shell portion disposed on a surface of the core portion. Wherein, the average crystallite size of the core portion is smaller than an average crystallite size of the shell portion and an amount of nickel among total transition metals included in the core portion and the shell portion is 80 atm % or more. A positive electrode active material, which suppresses decomposition of an electrolyte solution and occurrence of micro cracks of the positive electrode active material during charge and discharge by forming an average crystallite size of a core portion of the high-nickel positive electrode active material smaller than an average crystallite size of a shell portion, and a method of preparing the same.

Abstract: The present invention relates to a method and an apparatus for estimating a user pose using a three-dimensional virtual space model. The method of estimating a user pose including the position and orientation information of a user for a three-dimensional space includes a step of receiving user information including an image acquired in a three-dimensional space, a step of confirming a three-dimensional virtual space model constructed based on spatial information including depth information and image information for the three-dimensional space, a step of generating corresponding information corresponding to the user information in the three-dimensional virtual space model, a step of calculating similarity between the corresponding information and the user information, and a step of estimating a user pose based on the similarity.

Abstract: A multilayer ceramic capacitor includes: a ceramic body in which dielectric layers and first and second internal electrodes are alternately stacked; and first and second external electrodes formed on an outer surface of the ceramic body and electrically connected to the first and second internal electrodes, respectively. In a microstructure of the dielectric layer, dielectric grains are divided by a dielectric grain size into sections each having an interval of 50 nm, respectively, a fraction of the dielectric grains in each of the sections within a range of 50 nm to 450 nm is within a range of 0.025 to 0.20, and a thickness of the dielectric layer is 0.8 ?m or less.

Abstract: A multilayer capacitor includes a body including a plurality of dielectric layers, and a plurality of internal electrodes stacked with one of the dielectric layers interposed therebetween, and external electrodes disposed on external surfaces of the body and connected to the internal electrodes, respectively. The plurality of dielectric layers include a dielectric expressed by empirical formula BaM1aTi1-xSnxM2bO3 (0.008?x?0.05, 0.006?a?0.03, and 0.0006?b<0.006) in which M1 includes a rare earth element, and M2 includes at least one of Mn or V.

Abstract: A substrate processing apparatus and method capable of maximizing plasma uniformity are provided.

Abstract: Provided are a substrate processing apparatus and method capable of improving line edge roughness (LER). The substrate processing apparatus comprises a plasma generating space disposed between an electrode and an ion blocker, a processing space disposed under the ion blocker and for processing a substrate, a first gas supply module for providing a first gas for generating plasma to the plasma generating space, and a second gas supply module for providing an unexcited second gas to the processing space, wherein the first gas is a hydrogen-containing gas, the second gas includes a nitrogen-containing gas, and the substrate includes a photoresist pattern including carbon.

Abstract: A communication cable composition, and a wire and a cable coated with same. the communication cable composition comprises 0.1-5 parts by weight of an antioxidant and 0.1-5 parts by weight of a lubricant with respect to 100 parts by weight of at least one polypropylene resin selected from among a thermoplastic olefin, a polypropylene block copolymer, and a polypropylene homopolymer. It A communication cable resin composition according to present disclosure has excellent communication performance, heat resistance, oil resistance, and chemical resistance by using a base resin and an antioxidant, wherein various polypropylene resins are used alone or, as appropriate, in combinations as the base resin. An insulated wire and a communication cable coated with such a composition improves the stability of the cable by increasing chemical resistance and oil resistance. In addition, the insulated wire and the communication cable increase heat resistance to the UL 105° C. level.

Abstract: A dielectric material includes a main component represented by (Ba1-xCax)(Ti1-yZry)O3, (Ba1-xCax)(Ti1-ySny)O3, or (Ba1-xCax)(Ti1-yHfy)O3 (0?x?1 and 0?y?0.05) and a subcomponent. When an angle corresponding to a maximum peak is referred to as ?0 and angles corresponding to a full width at half maximum (FWHM) are respectively referred to as ?1 and ?2 (?1<?2) in the peaks of (002) and (200) plane of an x-ray diffraction (XRD) pattern using Cu K?1 radiation (wavelength ?=1.5406 ?), (?2??0)/(?0??1) is greater than 0.54 to 1.0 or less.

Abstract: According to one aspect of the present invention, a method of treating a substrate within a chamber includes performing a unit cycle at least one time, in which the unit cycle includes a substrate treatment step of supplying a reaction gas in which radicals constituting plasma of a first treatment gas are mixed with a second treatment gas onto the substrate, wherein the substrate includes a first thin film, and a second thin film having a lower reactivity to the reaction gas than the first thin film.

Abstract: A cooking appliance includes a main body having a cooking chamber therein and open at a front side thereof, a door provided to the front side of the main body to open or close the cooking chamber, a door button capable of being pressed by user manipulation and to move to a pressed position to allow the door to be opened, and a locking mechanism selectively restricting movement of the door button. The locking mechanism includes a locking rod allowing change of a posture thereof to a locking posture restricting movement of the door button to the pressed position and an unlocking posture allowing movement of the door button to the pressed position; and a manipulation button capable of being pressed by user manipulation and changing the posture of the locking rod from the locking posture to the unlocking posture when pressed by user manipulation.

Abstract: A substrate processing apparatus using plasma capable of efficiently controlling the selectivity ratio of a silicon layer and an oxide layer is provided. The substrate processing apparatus comprises a first space disposed between an electrode and an ion blocker; a second space disposed between the ion blocker and a shower head; a processing space under the shower head for processing a substrate; a first supply hole for providing a first gas for generating plasma to the first space; a second supply hole for providing a second gas to be mixed with an effluent of the plasma to the second space; and a first coating layer formed on a first surface of the shower head facing the second space, not formed on a second surface of the shower head facing the processing space, and containing nickel.

Abstract: A substrate treating method includes a temperature stabilizing step for stabilizing a temperature of the substrate to a process temperature in a treating space for treating a substrate, a pressure stabilizing step for stabilizing a pressure of a plasma space for generating a plasma and a pressure of the treating space to a process, the plasma space fluid communicating with the treating space, and a treating step for generating the plasma at the plasma space and treating the substrate using the plasma.

Abstract: A substrate treating apparatus configuring an individual LL for each PM and a semiconductor manufacturing facility including the same are provided. The semiconductor manufacturing facility comprises an index module including a first transfer robot and for carrying out and transferring a substrate mounted on a container using the first transfer robot, a transfer module including a second transfer robot and for relaying the substrate transferred by the index module using the second transfer robot, a buffer chamber for heating the substrate relayed by the transfer module, and a process chamber for treating the substrate heated by the buffer chamber, wherein the buffer chamber heats the substrate while the substrate waits before being loaded into the process chamber.

Abstract: A cooling appliance is proposed. A casing (100, 200) may include a cavity (S) therein, and a heat source module may be arranged inside the casing (100, 200). Furthermore, a camera module (730) may be arranged at a rear surface of the casing (100, 200) and capture the inside space of the cavity (S). Accordingly, in the casing (100, 200), heat sources and the camera module (730) may be arranged without interference therebetween, and the camera module (730) can secure a wide view angle at a rear portion of the casing (100, 200).

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing having an inner space; a plate separating the inner space into a first space which is above and a second space which is below and having a plurality of through holes; a first gas supply unit configured to supply a first gas to the first space; a plasma source for generating a plasma at the first space or the second space; and a monitoring unit installed at the plate and configured to monitor a characteristic of the plasma generated at the first space or the second space.

Abstract: A cooling appliance is proposed. A cavity (S) may be provided inside a casing (100, 200). A first heat source module (400) may be arranged in the casing (100, 200) and emit microwaves. A second heat source module (500) may be arranged at a bottom surface of the casing (100, 200) and emit magnetic fields. In addition, the second heat source module (500) may include a base plate (510) having a base hole (512) that is open at a center portion thereof, and a supporter (520) arranged below the base plate (510). A coil assembly (550) may be arranged between base plate (510) and the supporter (520). At this point, a shield filter (540) of the second heat source module (500) covers a working coil (570) of the coil assembly (550), and an outer end of the shield filter (540) may be arranged between the base plate (510) and a coil base (560).

Abstract: A multilayer ceramic capacitor (MLCC) includes a body including first dielectric layers and second dielectric layers, the body including first to sixth surfaces, a second surface, a third surface, a fourth surface, a fifth surface and a sixth surface; first internal electrodes disposed on the first dielectric layers, exposed to the third surface, the fifth surface, and the sixth surface, and spaced apart from the fourth surface by first spaces; second internal electrodes disposed on the second dielectric layers to oppose the first internal electrodes with the first dielectric layers or the second dielectric layers interposed therebetween, exposed to the fourth surface, the fifth surface, and the sixth surface, and spaced apart from the third surface by second spaces; first dielectric patterns disposed in at least a portion of the first spaces, and second dielectric patterns disposed in at least a portion of the second spaces; and lateral insulating layers.