Abstract: A method for processing a substrate includes providing the substrate, a film being formed on the substrate, performing pretreatment to surface-treat the film formed on the substrate using a treatment gas in a plasma state, and performing, after the pretreatment, liquid treatment to remove the film from the substrate by supplying a treatment liquid onto the substrate.

Abstract: An electronic device is disclosed herein, including a first face oriented in a first direction, the first face formed having a curvature and disposed as to be visible from an exterior of the electronic device, a body including a second face oriented towards a second direction opposite to the first direction, the second face visible from the exterior, and a display module visible when viewing the first face, the display module including a flexible display disposed under a window, and the window including a central visible area formed in a substantially rectangular shape including first, second, third and fourth visible areas disposed adjacent to four respective edges of the central visible area.

Abstract: Disclosed herein are a structure for shielding electromagnetic waves, a door and a cooking appliance having the same. The structure for shielding electromagnetic waves includes a choke seal structure having a bottom face extended from a side wall portion formed at a periphery of a door in a plane direction defined by the door, an inner side face extended from the bottom face in a thickness direction of the door, and a top face extended from the inner side face toward side wall portion, the choke seal structure having a length extending along the periphery of the door, a plurality of slots arranged in a longitudinal direction of the choke seal structure at a predetermined spacing and partitioning the choke seal structure into a plurality of chokes, and a connecting face connecting between the top faces of some of the plurality of chokes, each of which has a latch hole formed in its inner side face.

Abstract: An apparatus and method for processing a substrate using plasma, which has high plasma stability and process reproducibility, is provided. The method includes providing an apparatus for processing a substrate comprising a plasma generating region and a process region separate from the plasma generating region, placing the substrate including a silicon layer and an oxide layer in the process region, forming a hydrogen atmosphere in the process region by providing a hydrogen-based gas to the process region without passing through the plasma generating region, generating plasma by providing a fluorine-based gas to the plasma generating region, and providing the generated plasma to the process region to selectively remove the silicon layer compared to the oxide layer.

Abstract: A catalyst for synthesizing hydrogen peroxide is provided. The catalyst includes first material capable of dissociating hydrogen molecules; and second material capable of suppressing dissociation of oxygen molecules, where one or more interfaces are formed between the first material and the second material. The catalyst can be used as an alternative to the expensive palladium catalysts. In particular, the catalyst can be used for the direct synthesis of hydrogen peroxide.

Abstract: An electronic device is disclosed herein, including a first face oriented in a first direction, the first face formed having a curvature and disposed as to be visible from an exterior of the electronic device, a body including a second face oriented towards a second direction opposite to the first direction, the second face visible from the exterior, and a display module visible when viewing the first face, the display module including a flexible display disposed under a window, and the window including a central visible area formed in a substantially rectangular shape including first, second, third and fourth visible areas disposed adjacent to four respective edges of the central visible area.

Abstract: A dielectric ceramic composition and a multilayer ceramic electronic component are provided, the dielectric ceramic composition includes a barium titanate base material main component and a subcomponent, a microstructure after sintering includes a first crystal grain including 3 or less domain boundaries and a second crystal grain including 4 or more domain boundaries, and an area ratio of the second crystal grain to the total crystal grains is 20% or less.