Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.

Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.

Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.

Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.

Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.

Abstract: A touch window includes a substrate; a sensing electrode on the substrate comprises a conductive pattern including plurality of conductive pattern line parts and a plurality of conductive pattern opening parts; a dummy pattern provided adjacent to the conductive pattern; and a wire connected with the sensing electrode, further a interval between the dummy pattern and the conductive pattern is greater than the line width of the conductive pattern also the plurality of conductive pattern line parts cross each other. In addition, the substrate comprises a flat portion and curved portion.

Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.

Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.

Abstract: Disclosed is a touch panel. The touch panel includes a substrate, and an electrode part formed in a mesh shape on the substrate. The electrode part includes a resin layer comprising first and second sub-patterns, and a transparent electrode on the first sub-pattern. A ratio of a width of the first sub-pattern to a width of the second sub-pattern is in a range of 1:0.01 to 1:0.5.

Abstract: Disclosed is a touch window including a substrate, and an electrode layer on the substrate. A retardation difference is 0.2% or less depending on an incident angle of light in the substrate.

Abstract: A touch window according to an embodiment comprises: a substrate; a sensing electrode arranged on the substrate; and a reflection prevention layer arranged on the sensing electrode, wherein the reflection prevention layer comprises a first sub reflection prevention layer arranged on a first surface of the sensing electrode, a third sub reflection prevention layer arranged on a second surface, which lies opposite the first surface, and second sub reflection prevention layers arranged on both side surfaces, which connect the first and second surfaces, respectively.

Abstract: A touch window includes an electrode member; a cover substrate comprising an active area and an inactive area on the electrode member a sensing electrode on the electrode member; and a wire on the electrode member and electrically connected to the sensing electrode, further the sensing electrode includes a first sensing electrode extending in first direction and a second sensing electrode extending in second direction different from the first direction, also the wire includes a first wire connected to the first sensing electrode and a second wire connected to the second sensing electrode, and wherein the first sensing electrode, the second sensing electrode, the first wire, and the second wire are disposed on a same surface of the electrode member a connection part connected to one end of the wire and connected to a circuit board. In addition, the wire comprises a plurality of wires, and the wire has a line width that varies according to a distance from the connection part.

Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.

Abstract: Disclosed is a touch window which includes a substrate; a plurality of sensing electrodes on the substrate; and an opening part between the sensing electrodes.

Abstract: A touch window includes a substrate including an available area and an unavailable area; and an electrode layer formed on the substrate, wherein the electrode layer includes a conductive layer and a protective layer formed on the conductive layer, the protective layer is in direct contact with the conductive layer, the protective layer has a thickness different from that of the conductive layer, and the protective layer includes a black-based color.

Abstract: A particle sensing device is provided. The particle sensing device may include a light emitter configured to emit and output light into a light scattering space, and a light receiver provided in a maximum light scattering angle region. A maximum intensity of scattered light formed when the light emitted from the light emitter is scattered by a particle in the light scattering space may be obtained in the maximum light scattering angle region, and the light receiver may be configured to receive the scattered light incident thereon and generate a photocurrent signal.

Abstract: A touch window includes an electrode member; a cover substrate comprising an active area and an inactive area on the electrode member a sensing electrode on the electrode member; and a wire on the electrode member and electrically connected to the sensing electrode, further the sensing electrode includes a first sensing electrode extending in first direction and a second sensing electrode extending in second direction different from the first direction, also the wire includes a first wire connected to the first sensing electrode and a second wire connected to the second sensing electrode, and wherein the first sensing electrode, the second sensing electrode, the first wire, and the second wire are disposed on a same surface of the electrode member a connection part connected to one end of the wire and connected to a circuit board. In addition, the wire comprises a plurality of wires, and the wire has a line width that varies according to a distance from the connection part.

Abstract: A touch window includes a substrate; a sensing electrode on the substrate comprises a conductive pattern including plurality of conductive pattern line parts and a plurality of conductive pattern opening parts; a dummy pattern provided adjacent to the conductive pattern; and a wire connected with the sensing electrode, further a interval between the dummy pattern and the conductive pattern is greater than the line width of the conductive pattern also the plurality of conductive pattern line parts cross each other. In addition, the substrate comprises a flat portion and curved portion.

Abstract: Disclosed is a touch window which includes a substrate; a plurality of sensing electrodes on the substrate; and an opening part between the sensing electrodes.

Abstract: A touch window according to one embodiment includes a substrate; a sensing electrode on the substrate; a wire electrically connecting the sensing electrode; and a connection part connected to one end of the wire and connected to a circuit board, wherein an amount of charges in a sectional area of the wire is varied depending on a position in the wire. A touch device according to another embodiment includes a touch window; and a driving part on the touch window, wherein the touch window includes a substrate; a sensing electrode on the substrate; a wire electrically connecting the sensing electrode; and a connection part connected to one end of the wire and connected to a circuit board, wherein an amount of charges in a sectional area of the wire is varied depending on a position in the wire.