Patents by Inventor Douglas M. Horn

Douglas M. Horn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110210068
    Abstract: A method includes performing at least two of the following three treatments to produce at least two types of treated water: reverse osmosis, alkalinization, and carbon filtration. The types of treated water are individually dispensed at different times from a common spout. A method includes individually cooling the types of treated water at different times in a common cold tank prior to dispensing. The common cold tank is purged prior to cooling a different type of treated water. A method includes treating water by electrolysis to produce alkaline water and acidic water and producing at least one additional type of treated water by reverse osmosis or carbon filtration. Consumer containers are rinsed with the acidic water. A system includes: a dispensing unit, a treatment unit remotely located from the dispensing unit, treated water supply lines connecting the treatment unit to the dispensing unit, and a process control unit.
    Type: Application
    Filed: February 27, 2010
    Publication date: September 1, 2011
    Inventors: Peggy I. Lalor, Douglas M. Horn
  • Patent number: 7550236
    Abstract: A mask for exposing a first layer and a second layer on a process substrate, where the first and second layers are two separate layers of an integrated circuit. The mask includes a mask substrate that is substantially completely transmissive to a first wavelength of light and a second wavelength of light. A layer of a first material is disposed on the mask substrate, where the first material is substantially opaque to the first wavelength of light. The layer of the first material is patterned for the first layer. A layer of a second material is disposed on the mask substrate, where the second material is substantially opaque to the second wavelength of light. The layer of the second material is patterned for the second layer, where the layer of the first material and the layer of the second material are aligned on the mask substrate for proper alignment of the first and second layers on the process substrate.
    Type: Grant
    Filed: September 29, 2004
    Date of Patent: June 23, 2009
    Assignee: LSI Corporation
    Inventors: Duane B. Barber, Phong T Do, Douglas M. Horn
  • Patent number: D278650
    Type: Grant
    Filed: September 30, 1982
    Date of Patent: April 30, 1985
    Inventors: Jack P. Slovak, Robert A. Slovak, Douglas M. Horn
  • Patent number: D407462
    Type: Grant
    Filed: July 9, 1997
    Date of Patent: March 30, 1999
    Assignee: Water Resources International Inc.
    Inventors: Jerry M. Bishop, Douglas M. Horn