Abstract: The present application relates to novel gel-type or macroporous picolylamine resins which are based on at least one monovinylaromatic compound and at least one polyvinylaromatic compound and/or a (meth)acrylic compound and contain tertiary nitrogen atoms in structures of the general formula (I) as functional group, where R1 is an optionally substituted radical from the group consisting of picolyl, methylquinoline and methylpiperidine, R2 is —CH2—S—CH2COOR3 or —CH2—S—C1-C4-alkyl or —CH2—S—CH2CH(NH2)COOR3 or —CH2—S—CH2—CH(OH)—CH2(OH) or or derivatives thereof or —C?S(NH2), R3 is a radical from the group consisting of H, Na and K, m is an integer from 1 to 4, n and p are each, independently of one another, a number in the range from 0.1 to 1.9 and the sum of n and p is 2 and M is the polymer matrix, a process for preparing them and their uses, in particular the use in hydrometallurgy and electroplating.

Abstract: The present application relates to novel monodisperse, gel-type or macroporous picolylamine resins which are based on at least one monovinylaromatic compound and at least one polyvinylaromatic compound and/or a (meth)acrylic compound and contain tertiary nitrogen atoms in structures of the general formula (I) as functional group, where R1 is an optionally substituted radical from the group consisting of picolyl, methylquinoline and methylpiperidine, R2 is a radical —(CH2)q—COOR3, R3 is a radical from the group consisting of H, Na and K, m is an integer from 1 to 4, n and p are each, independently of one another, a number in the range from 0.1 to 1.9 and the sum of n and p is 2, q is an integer from 1 to 5 and M is the polymer matrix, a process for preparing them and their uses, in particular the use in hydrometallurgy and electroplating.

Abstract: The present application relates to novel chelate resins which contain, as a functional group, quaternary nitrogen atoms in structures of the general formula (I) in which at least one of the radicals R1 to R3 represents an optionally substituted radical of the series consisting of picolyl, methylquinoline or methylpiperidine, m represents an integer from 1 to 4 and M represents the polymer matrix and X represents a counterion of the series consisting of hydroxide OH?, halide, preferably Cl?, Br?, or sulphate SO42?, a process for their preparation and the use thereof, in particular the use of the novel chelate resins in hydrometallurgy and electroplating.

Abstract: The present application relates to novel gel-type or macroporous picolylamine resins which are based on at least one monovinylaromatic compound and at least one polyvinylaromatic compound and/or a (meth)acrylic compound and contain tertiary nitrogen atoms in structures of the general formula (I) as functional group, where R1 is an optionally substituted radical from the group consisting of picolyl, methylquinoline and methylpiperidine, R2 is —CH2—S—CH2COOR3 or —CH2—S—C1-C4-alkyl or —CH2—S—CH2CH(NH2)COOR3 or —CH2—S—CH2—CH(OH)—CH2(OH) or or derivatives thereof or —C?S(NH2), R3 is a radical from the group consisting of H, Na and K, m is an integer from 1 to 4, n and p are each, independently of one another, a number in the range from 0.1 to 1.9 and the sum of n and p is 2 and M is the polymer matrix, a process for preparing them and their uses, in particular the use in hydrometallurgy and electroplating.

Abstract: The present application relates to novel monodisperse, gel-type or macroporous picolylamine resins which are based on at least one monovinylaromatic compound and at least one polyvinylaromatic compound and/or a (meth)acrylic compound and contain tertiary nitrogen atoms in structures of the general formula (I) as functional group, where R1 is an optionally substituted radical from the group consisting of picolyl, methylquinoline and methylpiperidine, R2 is a radical —(CH2)q—COOR3, R3 is a radical from the group consisting of H, Na and K, m is an integer from 1 to 4, n and p are each, independently of one another, a number in the range from 0.1 to 1.9 and the sum of n and p is 2, q is an integer from 1 to 5 and M is the polymer matrix, a process for preparing them and their uses, in particular the use in hydrometallurgy and electroplating.

Abstract: The present application relates to novel chelate resins which contain, as a functional group, quaternary nitrogen atoms in structures of the general formula (I) in which at least one of the radicals R1 to R3 represents an optionally substituted radical of the series consisting of picolyl, methylquinoline or methylpiperidine, m represents an integer from 1 to 4 and M represents the polymer matrix and X represents a counterion of the series consisting of hydroxide OH?, halide, preferably Cl?, Br?, or sulphate SO42?, a process for their preparation and the use thereof, in particular the use of the novel chelate resins in hydrometallurgy and electroplating.

Abstract: The present invention relates to the use of monodisperse, macroporous chelating resins in the recovery of metals in hydrometallurgical processes, in particular in resin-in-pulp processes.

Abstract: The present invention relates to the use of monodisperse, macroporous anion exchangers of type I or type II in hydrometallurgical processes for winning metals of value.