Patents by Inventor Edward Teoh Kah Ching

Edward Teoh Kah Ching has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for fabricating integrated circuits including topographical features for directed self-assembly
    Patent number: 9053923
    Abstract: Methods for fabricating integrated circuits are provided. In one example, a method for fabricating an integrated circuit includes forming etch resistant fill control topographical features that overlie a semiconductor substrate. The etch resistant fill control topographical features define an etch resistant fill control confinement well. A block copolymer is deposited into the etch resistant fill control confinement well. The block copolymer is phase separated into an etchable phase and an etch resistant phase. The etch resistant fill control topographical features direct the etch resistant phase to form an etch resistant plug in the etch resistant fill control confinement well.
    Type: Grant
    Filed: November 5, 2013
    Date of Patent: June 9, 2015
    Assignee: GLOBALFOUNDRIES, INC.
    Inventors: Azat Latypov, Edward Teoh Kah Ching, He Yi
  • METHODS FOR FABRICATING INTEGRATED CIRCUITS INCLUDING TOPOGRAPHICAL FEATURES FOR DIRECTED SELF-ASSEMBLY
    Publication number: 20150126034
    Abstract: Methods for fabricating integrated circuits are provided. In one example, a method for fabricating an integrated circuit includes forming etch resistant fill control topographical features that overlie a semiconductor substrate. The etch resistant fill control topographical features define an etch resistant fill control confinement well. A block copolymer is deposited into the etch resistant fill control confinement well. The block copolymer is phase separated into an etchable phase and an etch resistant phase. The etch resistant fill control topographical features direct the etch resistant phase to form an etch resistant plug in the etch resistant fill control confinement well.
    Type: Application
    Filed: November 5, 2013
    Publication date: May 7, 2015
    Applicant: GLOBALFOUNDRIES, Inc.
    Inventors: Azat Latypov, Edward Teoh Kah Ching, He Yi