Abstract: The thermo-optically controlled optical couplers wherein the coupling region between the waveguides in the coupling section is filled with a material having a high dependence of refractive index on temperature thus making the thermo-optic control means more efficient and allowing a greater range of adjustment in the coupling coefficient for a given temperature change.

Abstract: A method for forming a dielectric oxide layer on selected areas of a substrate is disclosed. The dielectric oxide layer is formed on selected areas of the substrate using a sol process. The substrate has an area of a first material and an area of a second material which is different from the first. The first material is coated with a layer of a first compound. The layer of the first compound has a hydrophobic top surface. The second material is coated with a layer of a second compound. The layer of the second compound has a hydrophilic top surface. A layer of hydrous oxide is formed over the second compound by applying an aqueous sol solution on the surface of the substrate. The substrate is then heated to remove the first compound and the second compound from the surface of the substrate. Thereafter, the substrate with the layer of hydrous oxide thereon, is sintered to form the dielectric oxide layer.

Abstract: The invention provides a method for coating an article with a siloxane-based coating composition that results in a coating with high thermal mechanical stability, the method also allowing commercially acceptable speeds to be employed while inhibiting beading of the coating prior to cure. In one embodiment, an article is coated with a composition containing a first methylsilsequioxane oligomer having an initial viscosity of about 2000 cp or less, a second methylsilsequioxane oligomer having an initial viscosity of about 40,000 to about 90,000 cp, a viscosity-lowering additive of a lower aliphatic ketone, and a catalyst. In another embodiment, the invention provides a method for coating an article with a modified methylsilsequioxane coating suitable for higher temperature applications than an all-methyl coating.

Abstract: Cracking in thin sheets of sol-gel-produced material is avoided by use of a support liquid during gelation and drying. Silica glass, as well as other glass and ceramic bodies, is contemplated.

Abstract: A process for device fabrication and resist materials that are used in the process are disclosed. The resist material contains a polymer in combination with a dissolution inhibitor and a photoacid generator (PAG). The dissolution inhibitor is the condensation reaction product of a saturated polycyclic hydrocarbon compound with at least one hydroxy (OH) substituent and a difunctional saturated linear, branched, or cyclic hydrocarbon compound wherein the functional groups are either carboxylic acid or carboxylic acid chloride groups. The condensation product has at least two polycylic moieties. The polymer optionally has acid labile groups pendant thereto which significantly decrease the solubility of the polymer in a solution of aqueous base. A film of the resist material is formed on a substrate and exposed to delineating radiation.

Abstract: The specification describes techniques for the manufacture of optical gratings in optical fibers. The grating pattern is written into the core of the fiber without removing the fiber coating. Coating compositions with high transparency to the actinic (writing) radiation but which are UV curable are described in detail. The coating compositions contain a UV photoinitiator that absorbs sufficient UV radiation to effectively cure the polymer but is relatively transparent to UV radiation used for writing the grating. The photoinitiator is one or more compounds selected from a specified group of aliphatic and cycloaliphatic ketones.

Abstract: It has been found that surface reactions with basic materials such as amines found in the processing environment during lithographic processing contribute to a loss of linewidth control for resists such as chemically amplified resists. This loss in linewidth results from the reaction of the acid generated by exposing radiation with, for example, the amine resulting in a lack of chemical reaction where such reaction is desired. The problem is solved in one embodiment by employing an acid containing barrier layer on the resist.

Abstract: Polymers suitable for chemically amplified resists based on styrene chemistry are advantageously formed with a meta substituent on the phenyl ring of the styrene moiety. Additionally, polymers for such applications including, but not limited to, meta substituted polymers are advantageously formed by reacting a first monomer having a first protective group with a second monomer having a second protective group. After polymerization, the second protective group is removed without substantially affecting the first protective group. For example, if the first protective group is an alkoxy carbonyl group, and the second protective group is a silyl ether group, treatment with a lower alcohol with trace amounts of acid transforms the silyl group into an OH-moiety without affecting the alkoxy carbonyl group.

Abstract: The pillar structure according to the invention has a substantially longer surface path length from negative to positive electrodes resist breakdown in a high voltage environment. The processing and assembly methods in this invention permit low-cost manufacturing of high breakdown-voltage, dielectric pillars for the flat panel display.

Abstract: A technique is described for the preparation of conjugated arylene and heteroarylene vinylene polymers wherein conversion of the polymer precursor is effected at a temperature ranging from 150.degree.-300.degree. C. in the presence of forming gas. Studies have shown that the presence of the forming gas suppresses the formation of carbonyl groups, so resulting in an enhancement in photoluminescence and electroluminescence efficiency of the polymer.

Abstract: The present invention is directed to energy-sensitive resist materials and to a process for device fabrication in which energy-sensitive resist materials are used. The energy-sensitive resist materials contain a polymer wherein at least 10 mole percent of the repeating units that make up the polymer have a sulfonamide moiety. The aqueous base solubility of the sulfonamide moiety provides the polymer with desirable properties. The energy sensitive resist materials also contain a compound that generates acid when exposed to radiation.In the process of the present invention, a film of the energy-sensitive material is formed on a substrate. The film is exposed to delineating radiation. The pattern is developed by a post-exposure bake step followed by application of an aqueous base developer solution.

Abstract: Electrical device having a metal surface to at least a portion of which electrical connections are to be made by soldering, and having a coating on said portion which protects it against surface alteration which would tend to render such soldering more difficult but through which coating soldering can be effected, said coating comprising a polymer of at least one methacrylate of the general formula ##STR1## wherein R is selected from the group comprising alkyl radicals having from 1-6 carbon atoms and a glycidyl radical.

Abstract: A photopolymerization process is adapted for the production of various optical devices by means of a modified process which serves to increase the index change obtainable in a variable pattern of index of refraction. The process comprises the steps of flowing into place in a supporting structure a mixture of two components of differing reactivity and polarizability, partially polymerizing the mixture, writing a pattern of varying index of refraction in the partially polymerized mixture by further polymerizing it by suitable optical radiation in a corresponding pattern, and fixing the mixture against subsequent changes in polymerization. Typical components used in the process include a mixture of the monomers cyclohexyl methacrylate and N-vinylcarbazole together with benzoin methyl ether as a photosensitive initiator of polymerization, which proceeds by free radical reactions. In the limit of our technique, one of the components can have zero reactivity.

Abstract: Long term protection against oxidation is provided to fine particles of oxidizable metals and metallic alloys by treating the essentially oxide-free particles with a solution of certain organic materials in a nonreactive organic solvent. These organic materials are ureas, thioureas, isocyanates or isothiocyanates with at least one organic substituent each containing at least two carbons. Particles of both hard and soft magnetic metals and alloys have been protected by this treatment.

Abstract: A technique for the fabrication of integrated optical circuits is described wherein a transparent polymer film, which is doped with a polynuclear aromatic thiol having higher index of refraction than the polymer, is deposited from a liquid solution on a smooth substrate. Upon selective exposure to radiation there is a substantial reduction or elimination of the mobility and volatility of the dopant in the polymer matrix, a phenomenon known as "photolocking". The described class of dopant permits the attainment of higher resolution than previously reported, as well as the preparation of optical direction couplers having higher coupling strengths than those of the prior art.