Patents by Inventor Eiichi Yamazaki

Eiichi Yamazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9842763
    Abstract: A method for manufacturing a bonded wafer using a base wafer which is an epitaxial wafer produced by a method including at least one of: (1) setting a chamfer width of a wafer for epitaxial growth to be 0.20 mm or less on an epitaxial growth side; (2) preparing a wafer for epitaxial growth having a rise shape on an epitaxial growth side periphery, thereby adjusting the wafer to have an amount of sag within a range of ?30 nm/mm2 to +10 nm/mm2 on a bonding surface side periphery; and (3) adjusting epitaxial growth conditions so a change in amount of sag before and after growth becomes a positive value, thereby adjusting the wafer to have sag within a range of ?30 nm/mm2 to +10 nm/mm2. The method can manufacture a bonded wafer with a small terrace width even when an epitaxial wafer is used as the base wafer.
    Type: Grant
    Filed: August 28, 2015
    Date of Patent: December 12, 2017
    Assignee: SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Toru Ishizuka, Yuta Tamba, Eiichi Yamazaki
  • Publication number: 20170301582
    Abstract: A method for manufacturing a bonded wafer using a base wafer which is an epitaxial wafer produced by a method including at least one of: (1) setting a chamfer width of a wafer for epitaxial growth to be 0.20 mm or less on an epitaxial growth side; (2) preparing a wafer for epitaxial growth having a rise shape on an epitaxial growth side periphery, thereby adjusting the wafer to have an amount of sag within a range of ?30 nm/mm2 to +10 nm/mm2 on a bonding surface side periphery; and (3) adjusting epitaxial growth conditions so a change in amount of sag before and after growth becomes a positive value, thereby adjusting the wafer to have sag within a range of ?30 nm/mm2 to +10 nm/mm2. The method can manufacture a bonded wafer with a small terrace width even when an epitaxial wafer is used as the base wafer.
    Type: Application
    Filed: August 28, 2015
    Publication date: October 19, 2017
    Applicant: SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Toru ISHIZUKA, Yuta TAMBA, Eiichi YAMAZAKI
  • Patent number: 8038511
    Abstract: According to the present invention, in a method for subjecting a roughly ground chamfer portion of a semiconductor wafer to helical grinding by relatively inclining the wafer and a second grinding stone to perform precise grinding, an edge portion of a discoid truer is formed into a vertically asymmetrical groove shape of a first grinding stone by using the first grinding stone having a vertically asymmetrical groove formed on a periphery thereof to grind the edge portion of the truer by the groove of the first grinding stone without being relatively inclined, a groove is formed on a periphery of the second grinding stone by relatively inclining the truer and the second grinding stone to subject the second grinding stone to helical grinding, and the chamfer portion of the wafer is precisely ground based on helical grinding by relatively inclining the semiconductor wafer with respect to a direction of the groove formed on the periphery of the second grinding stone.
    Type: Grant
    Filed: December 13, 2006
    Date of Patent: October 18, 2011
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Eiichi Yamazaki, Takashi Sekine
  • Publication number: 20090163119
    Abstract: According to the present invention, in a method for subjecting a roughly ground chamfer portion of a semiconductor wafer to helical grinding by relatively inclining the wafer and a second grinding stone to perform precise grinding, an edge portion of a discoid truer is formed into a vertically asymmetrical groove shape of a first grinding stone by using the first grinding stone having a vertically asymmetrical groove formed on a periphery thereof to grind the edge portion of the truer by the groove of the first grinding stone without being relatively inclined, a groove is formed on a periphery of the second grinding stone by relatively inclining the truer and the second grinding stone to subject the second grinding stone to helical grinding, and the chamfer portion of the wafer is precisely ground based on helical grinding by relatively inclining the semiconductor wafer with respect to a direction of the groove formed on the periphery of the second grinding stone.
    Type: Application
    Filed: December 13, 2006
    Publication date: June 25, 2009
    Applicant: SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Eiichi Yamazaki, Takashi Sekine
  • Patent number: 6081254
    Abstract: The present invention is a color correction system including an imaging apparatus which inputs or outputs an image signal from a signal processor into or from an image device such as an input device such as a scanner or a camera or an output device such as a display device or a print device and which is constituted so as to correct colors by inputting or outputting image signals via a color converter, the conversion characteristic of which can be controlled according to a variation in the setting status or use environment of the imaging apparatus and faithful color reproduction can be realized between a plurality of imaging apparatuses having different characteristics.
    Type: Grant
    Filed: August 12, 1994
    Date of Patent: June 27, 2000
    Assignee: Hitachi, Ltd.
    Inventors: Mariko Tanaka, Shinichi Yamada, Tomoko Ogawa, Yuji Sano, Kiyoharu Kishimoto, Takuya Imaide, Michitaka Ohsawa, Eiichi Yamazaki, Masaaki Kurosu, Hitoshi Yamadera, Takeshi Hoshino, Hiroshi Koizumi, Moritaka Taniguchi, Kouji Kitou, Ikuya Arai
  • Patent number: 5193006
    Abstract: When a picture display section (or screen) for high-quality TV system (HDTV system) is used for displaying pictures of ordinary TV system with an aspect ratio different from that of the high-quality TV picture, the blank portions on the screen where no picture is illuminated to display at a brightness level almost equal to a picture mean luminance so that there will be no local variations in the luminace on the screen due to deterioration of fluorescent materials on the screen. For this purpose, the picture display portion is moved over the screen; or the video signals are attenuated toward the ends of the picture display portion. As a result, the variations in luminance on the screen become small and unnoticeable.
    Type: Grant
    Filed: January 26, 1989
    Date of Patent: March 9, 1993
    Assignee: Hitachi, Ltd.
    Inventor: Eiichi Yamazaki
  • Patent number: 5075051
    Abstract: A molding apparatus transfers plural molds in succession through a temperature elevating step, an injection molding step, pressurized cooling step and a molded article removing step. The apparatus is provided with plural cooling presses for the pressurized cooling step and so constructed as to prevent the stagnation in the transfer of the molds according to the molding conditions and the number of molds.
    Type: Grant
    Filed: July 27, 1989
    Date of Patent: December 24, 1991
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuhiko Ito, Eiichi Yamazaki, Kunio Ohtaki, Fumio Korayashi, Yoshihisa Masuda, Hiroshi Nakanishi, Kiyozo Suzuki, Yuichi Miyoshi
  • Patent number: 4991024
    Abstract: A CRT display device has a phosphor plane of a bulb inclined to a plane normal to a center axis of an electron gun structure and a side of the bulb facing the phosphor plane inclined to the phosphor plane. A transmissive window for passing a light from the phosphor plane to an external is formed in the side of the bulb.
    Type: Grant
    Filed: May 12, 1986
    Date of Patent: February 5, 1991
    Assignee: Hitachi, Ltd.
    Inventor: Eiichi Yamazaki
  • Patent number: 4924140
    Abstract: A color picture tube of shadow mask type includes a faceplate panel mounted on the tube. The faceplate panel has curvatures along its major and minor axes, respectively. When the outer surface contour of the faceplate panel is represented by a three-dimensional expression in the orthogonal coordinate system defined by the X-axis corresponding to the major axis, the Y-axis corresponding to minor axis, and the Z-axis corresponding to the axis of the tube, respectively, curved contours Z.sub.x and Z.sub.y of the faceplate panel along the major axis and the minor axis are so realized as to be approximated by Z.sub.x A.sub.1 X.sup.2 +A.sub.2 X.sup.4 and Z.sub.y =A.sub.3 Y.sup.2 +A.sub.4 Y.sup.4, respecvtively, where X and Y represent distances from the center of the faceplate panel along the X-axis and the Y-axis, respectively, and wherein the constants A.sub.1, A.sub.2, A.sub.3 and A.sub.4 are so selected that the conditions that 0.3.ltoreq.P.sub.x (X=X.sub.1).ltoreq.0.6 and 0.95.ltoreq.P.sub.y (Y=Y.sub.2).
    Type: Grant
    Filed: February 22, 1988
    Date of Patent: May 8, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Ryoji Hirai, Eiichi Yamazaki, Fumiaki Yonai
  • Patent number: 4810928
    Abstract: In a CRT for constituting a display apparatus in which the fluorescent screen is composed of a large number of CRTs arranged in the matrix form, a plurality of holes for passing an electron beam are provided in an electrode for controlling the electron beam which is so placed as to confront the cathode for emitting the electron beam, for the purpose of attaining improved modulation characteristics and a simplified drive circuit requiring lower power consumption. A plurality of fluorescent screens having individual luminous colors are formed on respective portions obtained by dividing the inside of the panel of said CRT and individual electron beams are respectively applied to those fluorescent screens, resulting in a picture of good quality because of increased picture elements.
    Type: Grant
    Filed: December 5, 1983
    Date of Patent: March 7, 1989
    Assignee: Hitachi, Ltd.
    Inventor: Eiichi Yamazaki
  • Patent number: 4808890
    Abstract: A cathode-ray tube having an electron gun for emitting an electron beam and a reflecting electrode for forming in front thereof a substantially planar reflecting potential surface which reflects the electron beam from the electron gun toward an anode target formed on the inner surface of the tube.
    Type: Grant
    Filed: August 13, 1986
    Date of Patent: February 28, 1989
    Assignee: Hitachi, Ltd.
    Inventor: Eiichi Yamazaki
  • Patent number: 4651217
    Abstract: A video projector has a structure wherein a projection lens is disposed to be fixed at a predetermined distance with respect to a front surface of a faceplate of a projection cathode-ray tube through a medium. The medium has substantially the same refractive index as that of the glass used for the faceplate and the projection lens. A resin adhesive, for example, may be used as the medium.
    Type: Grant
    Filed: April 18, 1986
    Date of Patent: March 17, 1987
    Assignee: Hitachi, Ltd.
    Inventor: Eiichi Yamazaki
  • Patent number: 4623818
    Abstract: In a shadow mask type color picture tube, the radius of curvature of the peripheral portion of the inner surface of a faceplate on which a phosphor screen is formed is set to be smaller than that at the central portion thereof.
    Type: Grant
    Filed: December 17, 1984
    Date of Patent: November 18, 1986
    Assignee: Hitachi, Ltd.
    Inventor: Eiichi Yamazaki
  • Patent number: 4221990
    Abstract: A phosphor screen for a post-focusing type color picture tube comprising a faceplate, a phosphor layer on the faceplate, a metal back layer on the phosphor layer and a secondary electron emission suppressing layer on the metal backed phosphor screen, in which the thickness of the metal back layer and the density of the secondary electron emission suppressing layer take particular values for effective suppression of emission of secondary electrons from the phosphor screen.
    Type: Grant
    Filed: February 12, 1974
    Date of Patent: September 9, 1980
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Yamazaki, Hiromi Kanai, Masao Taniguchi, Shigemi Hirasawa
  • Patent number: 4187012
    Abstract: An exposure method and apparatus for forming phosphor stripes or black matrix stripes on the inner surface of a face plate of a stripe phosphor screen type color picture tube or CRT (cathode-ray tube), in which a single linear light source is used as the exposure light source, and a prism device including many juxtaposed prisms is disposed between the linear light source and the face plate. The taper angle of the prisms is continuously changed so that the single linear light source can be observed as a plurality of discontinuous virtual linear light sources at whatever point on the inner surface of the face plate, and the virtual linear light sources have a most suitable center-to-center distance at individual positions on the face plate.
    Type: Grant
    Filed: January 16, 1978
    Date of Patent: February 5, 1980
    Assignee: Hitachi, Ltd.
    Inventors: Takehiko Ueyama, Masahiro Nishizawa, Eiichi Yamazaki, Iwao Ogura
  • Patent number: 4183637
    Abstract: A method of forming a stripe type phosphor screen on inner surface of a face plate of a color picture tube or CRT through the irradiation with light stripes. A single linear light source is employed in combination with a plurality of juxtaposed prisms between the face plate and the linear light source with the taper angles of the prisms being continuously varied so that a plurality of virtual linear light sources may be observed from any points on the inner surface of the face plate with the distances between mid-points of the virtual linear light sources taking optimum values at respective positions on the inner surface of the face plate. With such arrangement, an improved phosphor screen composed of phosphor stripes of three colors having uniform stripe width can be formed over the whole inner surface of the face plate by using a single linear light source without requiring driving apparatus for moving the light source to different positions.
    Type: Grant
    Filed: October 28, 1977
    Date of Patent: January 15, 1980
    Assignee: Hitachi, Ltd.
    Inventors: Takehiko Ueyama, Masahiro Nishizawa, Eiichi Yamazaki, Iwao Ogura
  • Patent number: 4052123
    Abstract: The correcting lens comprises a plurality of regions which are formed at at least one portions of the effective surfaces on both sides of the lens by means of a plurality of border lines which are discontinuous in only one direction. The regions on one side are inclined in a direction different from that of the regions on the opposite side of the lens.
    Type: Grant
    Filed: September 29, 1975
    Date of Patent: October 4, 1977
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Yamazaki, Toshio Ueda, Koichi Maruyama
  • Patent number: 4052643
    Abstract: In an electron gun for use in a cathode ray tube of the class wherein a main electron lens system is constituted by a plurality of discrete electron lens systems, the plurality of electron lens systems are of the unipotential type and the intensity of the preceding lens system is made larger than that of the succeeding lens system.
    Type: Grant
    Filed: August 2, 1976
    Date of Patent: October 4, 1977
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Yamazaki, Hiromi Kanai, Toshio Hurukawa
  • Patent number: 4052122
    Abstract: The correcting lens comprises a plurality of regions which are formed at at least one portion of the effective surfaces on both sides of the lens by means of a plurality of border lines which are discontinuous in only one direction. The regions on one side are inclined in a direction different from that of the regions on the opposite side of the lens.
    Type: Grant
    Filed: November 29, 1972
    Date of Patent: October 4, 1977
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Yamazaki, Iwao Ogura, Toshio Ueda, Koichi Maruyama, Kenji Shimizu
  • Patent number: 4045224
    Abstract: A method for making a phosphor screen of a black matrix type color picture tube wherein use is made of two light sources, one being placed inside the faceplate of the tube and the other placed outside the faceplate, for carrying out a light exposure operation. An apparatus useful for such light exposure operation is also disclosed.
    Type: Grant
    Filed: December 18, 1973
    Date of Patent: August 30, 1977
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Yamazaki, Hiromi Kanai