Abstract: It is an object to provide an AGV that enables preventing a substrate and a manufacturing system from being contaminated due to another substrate with an adhering contaminant generated in a manufacturing process, and also a production system for a semiconductor device and a production management method for a semiconductor device, which use the AGV. In the present invention, air filtered through a filter is introduced into a containing portion of an AGV, and air in the containing portion containing a carrier is exhausted after filtering the air in the containing portion through another filter. As the filter used before discharging the air, a filter that enables filtering an impurity on the order of a submicron level is used. In addition, a carrier used before doping is changed to another carrier after doping, and CIM system is used to control driving of the AGV and selection of the carrier.

Abstract: It is an object to provide an AGV that enables preventing a substrate and a manufacturing system from being contaminated due to another substrate with an adhering contaminant generated in a manufacturing process, and also a production system for a semiconductor device and a production management method for a semiconductor device, which use the AGV.

Abstract: This invention is intended to reduce the manufacturing cost of an active matrix type display device and to provide an inexpensive display device. To reduce the manufacturing cost of the active matrix type display device, TFT's used for a pixel sections are all TFT's of one conductive type (indicating p channel type TFT's or n channel type TFT's), and a driving circuit is formed out of the TFT's of the same conductive type as that of the pixel section. It is thereby possible to reduce manufacturing steps and to reduce the manufacturing cost.