Abstract: Disclosed are a wire grid polarizer, which exhibits high polarization, p-polarized light transmittance, and s-polarized light reflectance in the visible light region, and the optical characteristics of which have low angular dependence and wavelength dependence, and a manufacturing method for the same.

Abstract: To provide a mold for nanoimprinting capable of accurately transcribing a fine concavo-convex structure, available at a low cost and having high durability, its production process, and processes for producing a molded resin having a fine concavo5 convex structure on its surface having the fine concavo-convex structure of the mold accurately transcribed, and a wire-grid polarizer, with high productivity. A mold 10 for nanoimprinting having on its mold surface a fine concavo-convex structure comprising a plurality of grooves 14 formed in parallel with one another at a constant pitch, which comprises a mold base 12 made of a resin having on its surface a 10 fine concavo-convex structure to be the base of the fine concavo-convex structure, a metal oxide layer 16 covering the surface having the fine concavo-convex structure of the mold base 12, and a release layer 18 covering the surface of the metal oxide layer 16, is used.

Abstract: To provide a laminate excellent in weather resistance, moisture-proof property, adhesion between layers and its long-term stability, and a process for its production. A laminate comprising a substrate sheet containing a fluororesin, an adhesive layer, and a moisture-proof layer containing, as the main component, at least one inorganic compound selected from the group consisting of an inorganic oxide, an inorganic nitride and an inorganic oxynitride, laminated in this order, wherein the adhesive layer contains, as the main component, at least one metal oxide selected from the group consisting of zirconium oxide, tantalum oxide and hafnium oxide.

Abstract: Provided is a process for easily producing a wire grid polarizer showing a high polarization separation ability in the visible light region and having an improved transmittance in a short wavelength region.

Abstract: To provide a laminate excellent in weather resistance, moisture-proof property, adhesion between layers and its long-term stability, and a process for its production. A laminate comprising a substrate sheet containing a fluororesin, an adhesive layer, and a moisture-proof layer containing, as the main component, at least one inorganic compound selected from the group consisting of an inorganic oxide, an inorganic nitride and an inorganic oxynitride, laminated in this order, wherein the adhesive layer contains, as the main component, at least one metal oxide selected from the group consisting of zirconium oxide, tantalum oxide and hafnium oxide.

Abstract: To provide a laminate which is excellent in weather resistance and moisture-proofing property and also excellent in interlayer adhesion and its long-term stability, and a process for its production. A laminate which comprises a substrate sheet containing a fluororesin, an adhesion layer containing an acrylic resin, and a moisture-proofing layer containing, as its main component, at least one inorganic compound selected from the group consisting of inorganic oxides, inorganic nitrides and inorganic oxynitrides, laminated in this order, wherein the surface composition (as measured by X-ray photoelectron spectroscopy) of the surface in contact with the adhesion layer, of the substrate sheet, is such that the atomic percentage of nitrogen is at least 0.2 at % and at most 3.0 at %, and the atomic percentage of oxygen is at least 1.0 at % and at most 5.0 at %.

Abstract: To provide a laminate excellent in weather resistance, moisture-proof property, adhesion between layers and its long-term stability, and a process for its production. A laminate comprising a substrate sheet containing a fluororesin, an adhesive layer, and a moisture-proof layer containing, as the main component, at least one inorganic compound selected from the group consisting of an inorganic oxide, an inorganic nitride and an inorganic oxynitride, laminated in this order, wherein the adhesive layer contains, as the main component, at least one metal oxide selected from the group consisting of zirconium oxide, tantalum oxide and hafnium oxide.

Abstract: To provide a mold for nanoimprinting capable of accurately transcribing a fine concavo-convex structure, available at a low cost and having high durability, its production process, and processes for producing a molded resin having a fine concavo5 convex structure on its surface having the fine concavo-convex structure of the mold accurately transcribed, and a wire-grid polarizer, with high productivity. A mold 10 for nanoimprinting having on its mold surface a fine concavo-convex structure comprising a plurality of grooves 14 formed in parallel with one another at a constant pitch, which comprises a mold base 12 made of a resin having on its surface a 10 fine concavo-convex structure to be the base of the fine concavo-convex structure, a metal oxide layer 16 covering the surface having the fine concavo-convex structure of the mold base 12, and a release layer 18 covering the surface of the metal oxide layer 16, is used.

Abstract: A wire-grid polarizer comprising a light-transmitting substrate 14 having a surface on which a plurality of ridges 12 are formed in parallel with one another at a predetermined pitch with flat portions 13 formed between the ridges 12, each of the ridges 12 having a width narrowing from the bottom toward the top; and a metal layer 20 covering at least one side surface of each ridge 12, the maximum covering thickness of the metal layer on a lower half of the ridge being smaller than the maximum covering thickness of the metal layer on an upper half of the ridge; and a process for producing the first metal layer 20 by vapor-depositing a metal from a direction satisfying tan(?R1±10)=(Pp?Dpb/2)/Hp on the first side surface 16 side, and subsequently vapor-depositing the metal from a direction at an angle satisfying ?R1+5??R2??R1+25.

Abstract: Provided are a wire-grid polarizer, which has not only a high degree of polarization, a high p-polarized light transmittance and a high s-polarized light reflectance but also a low angle dependency and a low wavelength dependency in terms of optical properties in a visible light region, and a process for producing the same.

Abstract: To provide an electroconductive laminate which has an excellent electrical conductivity (electromagnetic wave shielding properties) and a high visible light transmittance and is excellent in productivity, and a protective plate for a plasma display which has excellent electromagnetic wave shielding properties and a broad transmission/reflection band and is excellent in productivity.

Abstract: A wire-grid polarizer having a high polarization separation ability in the visible light region and an improved transmittance in a short wavelength region, and a process for easily producing such a wire-grid polarizer, are provided. A wire-grid polarizer 10 comprising a light-transmitting substrate 14 having a surface on which a plurality of ridges 12 are formed in parallel with one another at a predetermined pitch; an underlayer 22 made of a metal oxide and present at least on a top portion of each ridge 12; and a metal wire made of a metal layer 24 and present on a surface of the underlayer 22 to cover at least a top portion of each ridge 12.

Abstract: To provide a mold for nanoimprinting capable of accurately transcribing a fine concavo-convex structure, available at a low cost and having high durability, its production process, and processes for producing a molded resin having a fine concavo-convex structure on its surface having the fine concavo-convex structure of the mold accurately transcribed, and a wire-grid polarizer, with high productivity. A mold 10 for nanoimprinting having on its mold surface a fine concavo-convex structure comprising a plurality of grooves 14 formed in parallel with one another at a constant pitch, which comprises a mold base 12 made of a resin having on its surface a fine concavo-convex structure to be the base of the fine concavo-convex structure, a metal oxide layer 16 covering the surface having the fine concavo-convex structure of the mold base 12, and a release layer 18 covering the surface of the metal oxide layer 16, is used.

Abstract: Provided is a wire grid polarizer showing a high degree of polarization, a high p-polarized light transmittance and a high s-polarized light reflectivity for light incident from a front surface and showing a low s-polarized light reflectivity for light incident from its rear surface, in the visible light region, and a process for producing such a polarizer.

Abstract: Provided is a process for easily producing a wire grid polarizer showing a high polarization separation ability in the visible light region and having an improved transmittance in a short wavelength region. On a light-transmitting substrate 14 having a surface on which a plurality of ridges 12 are formed, an underlayer 22, first fine metallic wires 24 and second fine metallic wires 30 are formed by a vapor deposition method satisfying the conditions (A) to (F). (A) The underlayer material was vapor-deposited on a top face 16 and a first side face 18 of each ridge 12 from a direction of an angle ?L. (B) The underlayer material is vapor-deposited on the top face of a first underlayer 22a and a second side face 20 from a direction of an angle of ?R on the opposite side to that of the condition (A). (C) ?L and ?R are from 60° to 90°. (D) The height Hma1 of the underlayer 22 is from 1 to 20 nm.

Abstract: The invention provides a method for producing a silicon oxide film, whereby a film having uniform optical constants such as refractive index, absorption coefficient, etc. can be formed continuously at a high deposition rate. A method for producing a silicon oxide film, which comprises depositing a silicon oxide film on a substrate by carrying out AC sputtering by using a sputtering target comprising silicon carbide and silicon with a ratio in number of atoms of C to Si being from 0.5 to 0.95, in an atmosphere containing an oxidizing gas, with an alternating current having a frequency of from 1 to 1,000 kHz.

Abstract: A multilayer film-coated substrate having the stress of the film relaxed by depositing a multilayer film comprising a metal oxide film and a silicon oxide film on a substrate at a high speed by a sputtering method using a conductive sputtering material, and a process for producing a multilayer film-coated substrate having such a low stress, are presented. A multilayer film-coated substrate comprising a substrate and at least a metal oxide film and a silicon oxide film laminated thereon repeatedly at least once, wherein at least one layer of said metal oxide film is a metal oxide film deposited by sputtering by using, as the target material, a metal oxide MOX which is deficient in oxygen than the stoichiometric composition, to have the oxygen deficiency resolved, and the stress of the multilayer film is from ?100 MPa to +100 MPa.

Abstract: The invention provides a method for producing a silicon oxide film, whereby a film having uniform optical constants such as refractive index, absorption coefficient, etc. can be formed continuously at a high deposition rate. A method for producing a silicon oxide film, which comprises depositing a silicon oxide film on a substrate by carrying out AC sputtering by using a sputtering target comprising silicon carbide and silicon with a ratio in number of atoms of C to Si being from 0.5 to 0.95, in an atmosphere containing an oxidizing gas, with an alternating current having a frequency of from 1 to 1,000 kHz.

Abstract: A multilayer film-coated substrate having the stress of the film relaxed by depositing a multilayer film comprising a metal oxide film and a silicon oxide film on a substrate at a high speed by a sputtering method using a conductive sputtering material, and a process for producing a multilayer film-coated substrate having such a low stress, are presented. A multilayer film-coated substrate comprising a substrate and at least a metal oxide film and a silicon oxide film laminated thereon repeatedly at least once, wherein at least one layer of said metal oxide film is a metal oxide film deposited by sputtering by using, as the target material, a metal oxide MOX which is deficient in oxygen than the stoichiometric composition, to have the oxygen deficiency resolved, and the stress of the multilayer film is from ?100 MPa to +100 MPa.

Abstract: A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, performs film deposition by each of the AC magnetrons until having achieved 90% of a designed film thickness, and then performs the film deposition only by each of the conventional magnetrons, and which can control the film thickness with high precision and have excellent productivity.