Patents by Inventor Eisuke OHTOMI

Eisuke OHTOMI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11029604
    Abstract: A method of performing extreme ultraviolet lithography process includes applying a protic solvent over an extreme ultraviolet (EUV) photoresist layer located over a substrate after exposure to EUV radiation, heating the protic solvent on the EUV photoresist layer to a post-exposure bake temperature photoresist, and removing the protic solvent from above the EUV photoresist layer prior to developing the EUV photoresist layer.
    Type: Grant
    Filed: November 7, 2018
    Date of Patent: June 8, 2021
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventor: Eisuke Ohtomi
  • Publication number: 20200142315
    Abstract: A method of performing extreme ultraviolet lithography process includes applying a protic solvent over an extreme ultraviolet (EUV) photoresist layer located over a substrate after exposure to EUV radiation, heating the protic solvent on the EUV photoresist layer to a post-exposure bake temperature photoresist, and removing the protic solvent from above the EUV photoresist layer prior to developing the EUV photoresist layer.
    Type: Application
    Filed: November 7, 2018
    Publication date: May 7, 2020
    Inventor: Eisuke OHTOMI