Patents by Inventor Elaine McCoo

Elaine McCoo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Nanopore device and a method for nucleic acid analysis
    Patent number: 8784623
    Abstract: A nanopore device is described wherein is provided a sample input (110), an input chamber (120), and first and second sample chambers (130, 140) connected to the input chambers (120) via first and second nanopores (135, 145).
    Type: Grant
    Filed: February 17, 2009
    Date of Patent: July 22, 2014
    Assignee: Koninklijke Philips N.V.
    Inventors: Pieter Jan Van Der Zaag, Anja Van De Stolpe, Elaine McCoo, Eva Van Van Wanrooij
  • NANOPORE DEVICE AND A METHOD FOR NUCLEIC ACID ANALYSIS
    Publication number: 20110108423
    Abstract: A nanopore device is described wherein is provided a sample input (110), an input chamber (120), and first and second sample chambers (130, 140) connected to the input chambers (120) via first and second nanopores (135, 145).
    Type: Application
    Filed: February 17, 2009
    Publication date: May 12, 2011
    Applicant: Koninklijke Philips Electronics N.V.
    Inventors: Pieter Jan Van Der Zaag, Anja Van De Stolpe, Elaine Mccoo, Eva Van Van Wanrooij
  • Device manufacturing method and computer program
    Patent number: 7042550
    Abstract: System aberrations are effected in a projection system of a lithographic apparatus to optimize imaging of a thick reflective mask with a thick absorber that is obliquely illuminated. The aberrations may include Z5 astigmatism, Z9 spherical, and Z12 astigmatism.
    Type: Grant
    Filed: November 20, 2003
    Date of Patent: May 9, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Martin Lowisch, Marcel Mathijs Theodore Marie Dierichs, Koen Van Ingen Schenau, Hans Van Der Laan, Martinus Hendrikus Antonius Leenders, Elaine McCoo, Uwe Mickan
  • Device manufacturing method and computer program
    Publication number: 20040137677
    Abstract: System aberrations are effected in a projection system of a lithographic apparatus to optimize imaging of a thick reflective mask with a thick absorber that is obliquely illuminated. The aberrations may include Z5 astigmatism, Z9 spherical, and Z12 astigmatism.
    Type: Application
    Filed: November 20, 2003
    Publication date: July 15, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martin Lowisch, Marcel Mathijs Theodore Marie Dierichs, Koen Van Ingen Schenau, Hans Van Der Laan, Martinus Hendrikus Antonius Leenders, Elaine McCoo, Uwe Mickan