Patents by Inventor Elise Sikma

Elise Sikma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10124464
    Abstract: The invention provides methods of inhibiting corrosion of a substrate containing metal. The substrate can be in any suitable form. In some embodiments, the metal is cobalt. The methods can be used with semiconductor wafers in some embodiments. The invention also provides chemical-mechanical polishing compositions and methods of polishing a substrate. A corrosion inhibitor can be used in the methods and compositions disclosed herein. The inhibitor comprises an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, an amino acid derivative, a phosphate ester, an isethionate, a sulfate, a sulfosuccinate, a sulfocinnimate, or any combination thereof.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: November 13, 2018
    Assignee: Cabot Microelectronics Corporation
    Inventors: Mary Cavanaugh, Steven Kraft, Andrew Wolff, Phillip W. Carter, Elise Sikma, Jeffrey Cross, Benjamin Petro
  • Patent number: 9944828
    Abstract: The invention provides a chemical-mechanical polishing composition including (a) an abrasive comprising alumina particles, silica particles, or a combination thereof, (b) a rate accelerator comprising a phosphonic acid, an N-heterocyclic compound, or a combination thereof, (c) a corrosion inhibitor comprising an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, a fatty acid amino acid, an amine, an amide, or a combination thereof, (d) an oxidizing agent, and (e) an aqueous carrier. The invention also provides a method of polishing a substrate, especially a substrate comprising a cobalt layer, with the polishing composition.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: April 17, 2018
    Assignee: Cabot Microelectronics Corporation
    Inventors: Elise Sikma, Witold Paw, Benjamin Petro, Jeffrey Cross, Glenn Whitener
  • Publication number: 20160107289
    Abstract: The invention provides methods of inhibiting corrosion of a substrate containing metal. The substrate can be in any suitable form. In some embodiments, the metal is cobalt. The methods can be used with semiconductor wafers in some embodiments. The invention also provides chemical-mechanical polishing compositions and methods of polishing a substrate. A corrosion inhibitor can be used in the methods and compositions disclosed herein. The inhibitor comprises an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, an amino acid derivative, a phosphate ester, an isethionate, a sulfate, a sulfosuccinate, a sulfocinnimate, or any combination thereof.
    Type: Application
    Filed: October 21, 2015
    Publication date: April 21, 2016
    Inventors: Mary Cavanaugh, Steven Kraft, Andrew Wolff, Phillip W. Carter, Elise Sikma, Jeffrey Cross
  • Publication number: 20160108286
    Abstract: The invention provides a chemical-mechanical polishing composition including (a) an abrasive comprising alumina particles, silica particles, or a combination thereof, (b) a rate accelerator comprising a phosphonic acid, an N-heterocyclic compound, or a combination thereof, (c) a corrosion inhibitor comprising an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, a fatty acid amino acid, an amine, an amide, or a combination thereof, (d) an oxidizing agent, and (e) an aqueous carrier. The invention also provides a method of polishing a substrate, especially a substrate comprising a cobalt layer, with the polishing composition.
    Type: Application
    Filed: October 21, 2015
    Publication date: April 21, 2016
    Inventors: Elise Sikma, Witold Paw, Benjamin Petro, Jeffrey Cross, Glenn Whitener