Patents by Inventor Emad Aqad

Emad Aqad has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11932713
    Abstract: New monomer and polymer materials that comprise one or more Te atoms. In one aspect, tellurium-containing monomers and polymers are provided that are useful for Extreme Ultraviolet Lithography.
    Type: Grant
    Filed: December 31, 2018
    Date of Patent: March 19, 2024
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Publication number: 20240027904
    Abstract: A photoactive compound including an organic cation; and an anion represented by Formula (1): wherein X is an organic group; Y1 and Y2 are each independently a non-hydrogen substituent; Y1 and Y2 together optionally form a ring; Z2 is hydrogen, halogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-50 aryl, substituted or unsubstituted C7-50 arylalkyl, substituted or unsubstituted C7-50 alkylaryl, substituted or unsubstituted C6-50 aryloxy, substituted or unsubstituted C3-30 heteroaryl, substituted or unsubstituted C4-30 alkylheteroaryl, substituted or unsubstituted C4-30 heteroarylalkyl, or substituted or unsubstituted C3-30 heteroaryloxy; Z2 optionally further comprises one or more divalent linking groups as part of its structure; Z2 and one of Y1 or Y2 together optionally form a ring; X and Z2 together optionally form a ring; and X and one of Y1 or Y2 together optionally form a
    Type: Application
    Filed: July 14, 2023
    Publication date: January 25, 2024
    Inventors: Emad Aqad, Tomas Marangoni, Yinjie Cen, Paul J. LaBeaume, Mingqi Li, James F. Cameron
  • Publication number: 20240027905
    Abstract: A photoacid generator, including an organic cation; and an anion including an anionic core, wherein the anionic core includes a cyclopentadienide group, wherein the cyclopentadienide group is substituted with an organic group including a semi-metal element, and wherein the anion is substituted with one or more electron withdrawing groups.
    Type: Application
    Filed: July 18, 2023
    Publication date: January 25, 2024
    Inventors: Tomas Marangoni, Emad Aqad, Paul LaBeaume, Mingqi Li, James F. Cameron
  • Patent number: 11880134
    Abstract: New Te-salt compounds, including photoactive tellurium compounds useful for Extreme Ultraviolet Lithography.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: January 23, 2024
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Publication number: 20240019779
    Abstract: A compound represented by Formula (1): wherein X is a group having a valency of r; each R1 is independently an organic group comprising an acid-labile group; m is an integer greater than or equal to 1; k is an integer from 1 to 5; and r is an integer from 2 to 10, wherein the compound is non-polymeric, and wherein Ar1, L1, L2, R2, and R3 are as defined herein.
    Type: Application
    Filed: May 20, 2022
    Publication date: January 18, 2024
    Inventors: Li Cui, Emad Aqad, Yinjie Cen, Conner A. Hoelzel, James F. Cameron, Jong Keun Park, Suzanne M. Coley, Choong-Bong Lee
  • Patent number: 11852972
    Abstract: A photoresist composition, comprising an acid-sensitive polymer comprising a repeating unit having an acid-labile group; an iodonium salt comprising an anion and a cation, the iodonium salt having Formula (1): wherein Z? is an organic anion; Ar1 is substituted or unsubstituted C4-60 heteroaryl group comprising a furan heterocycle; and R1 is substituted or unsubstituted hydrocarbon group as provided herein, wherein the cation optionally comprises an acid-labile group, wherein Ar1 and R1 are optionally connected to each other via a single bond or one or more divalent linking groups to form a ring, and wherein the iodonium salt is optionally covalently bonded through Ar1 or substituent thereof as a pendant group to a polymer, the iodonium salt is optionally covalently bonded through R1 or substituent thereof as a pendant group to a polymer, or the iodonium salt is optionally covalently bonded through Z? as a pendant group to a polymer; and a solvent.
    Type: Grant
    Filed: October 30, 2020
    Date of Patent: December 26, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Tomas Marangoni, Emad Aqad, James W. Thackeray, James F. Cameron, Xisen Hou, ChoongBong Lee
  • Patent number: 11829069
    Abstract: New photoresist and topcoat compositions are provided that are useful in a variety of applications. In one aspect, new photoresist compositions are provided that comprise: (a) a first matrix polymer; (b) one or more acid generators; and (c) one or more additive compounds of Formulae (I) and/or (II).
    Type: Grant
    Filed: December 31, 2018
    Date of Patent: November 28, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Joshua Kaitz, Tomas Marangoni, Emad Aqad, Amy M. Kwok, Mingqi Li, Thomas Cardolaccia, Choong-Bong Lee, Ke Yang, Cong Liu
  • Publication number: 20230314934
    Abstract: A photoactive compound of formula (1a) or (1b): wherein R1 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl comprising an aromatic ring heteroatom chosen from nitrogen, oxygen, or a combination thereof; R2 and R3 are as provided herein; R4 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl; and M+ is an organic cation.
    Type: Application
    Filed: March 31, 2022
    Publication date: October 5, 2023
    Inventors: Emad Aqad, Jong Keun Park, Yinjie Cen, Choong-Bong Lee
  • Publication number: 20230212112
    Abstract: A monomer has the structure wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.
    Type: Application
    Filed: February 24, 2023
    Publication date: July 6, 2023
    Inventors: Emad Aqad, James W. Thackeray, James F. Cameron
  • Publication number: 20230213862
    Abstract: A photoresist composition, comprising: a first polymer comprising: a first repeating unit comprising a hydroxyaryl group; a second repeating unit comprising a first acid-labile group; and a third repeating unit comprising a first base-soluble group having a pKa of 12 or less, and not comprising a hydroxyaryl group; wherein the first, second, and third repeating units of the first polymer are different from each other, and the first polymer is free of lactone groups; a second polymer comprising: a first repeating unit comprising a second acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a second base-soluble group having a pKa of 12 or less; wherein the first, second, and third repeating units of the second polymer are structurally different from each other; and a solvent, wherein the first polymer and the second polymer are different from each other.
    Type: Application
    Filed: December 20, 2022
    Publication date: July 6, 2023
    Inventors: Li Cui, Suzanne M. Coley, Emad Aqad, Yinjie Cen, Jong Keun Park, Choong-Bong Lee, James F. Cameron
  • Publication number: 20230103685
    Abstract: A compound comprising an aromatic group or a heteroaromatic group, wherein the aromatic group or the heteroaromatic group comprises a first substituent group comprising an ethylenically unsaturated double bond, a second substituent group that is an iodine atom, and a third substituent group comprising an acid-labile group, wherein the first substituent group, the second substituent group, and the third substituent group are each bonded to a different carbon atom of the aromatic group or the heteroaromatic group.
    Type: Application
    Filed: September 30, 2021
    Publication date: April 6, 2023
    Inventors: Emad Aqad, Jong Keun Park, Bhooshan C. Popere, Li Cui, Yinjie Cen, Choong-Bong Lee
  • Publication number: 20230094313
    Abstract: A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Application
    Filed: December 6, 2022
    Publication date: March 30, 2023
    Inventors: Emad Aqad, William Williams, III, James F. Cameron
  • Patent number: 11613519
    Abstract: A monomer has the structure wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.
    Type: Grant
    Filed: April 18, 2016
    Date of Patent: March 28, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James W. Thackeray, James F. Cameron
  • Patent number: 11567408
    Abstract: A method for forming a photoresist relief image including applying a layer of a coating composition on a substrate; and disposing a layer of a photoresist composition on the layer of the coating composition, wherein the coating composition comprises an amine-containing polymer comprising a hydrocarbon-substituted amino group and having nitrogen atoms in an amount from 3 to 47 weight percent, based on a total weight of the amine-containing polymer.
    Type: Grant
    Filed: October 15, 2019
    Date of Patent: January 31, 2023
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD., ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Hye-Won Lee, Min Kyung Jang, Soo Jung Leem, Jae Hwan Sim, Emad Aqad
  • Patent number: 11550217
    Abstract: A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: January 10, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, William Williams, III, James F. Cameron
  • Patent number: 11505565
    Abstract: New Te-zwitterion compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: November 22, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Patent number: 11448960
    Abstract: New Te-salts are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: September 20, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Publication number: 20220214614
    Abstract: Photoacid generators comprising a moiety of formula (1): wherein: Ar1 is a substituted or unsubstituted aryl group; R1 is an alkyl or aryl group, each of which may be substituted or unsubstituted, wherein Ar1 and R1 are optionally connected together by a single bond or a divalent linking group to form a ring; Y is a single bond or a divalent group; and * is the point of attachment of the moiety to another atom of the photoacid generator. The photoacid generator compounds find particular use in photoresist compositions that can be used to form lithographic patterns for the formation of electronic devices.
    Type: Application
    Filed: November 10, 2021
    Publication date: July 7, 2022
    Inventor: Emad Aqad
  • Publication number: 20220137506
    Abstract: A photoresist composition, comprising an acid-sensitive polymer comprising a repeating unit having an acid-labile group; an iodonium salt comprising an anion and a cation, the iodonium salt having Formula (1): wherein Z? is an organic anion; Ar1 is substituted or unsubstituted C4-60 heteroaryl group comprising a furan heterocycle; and R1 is substituted or unsubstituted hydrocarbon group as provided herein, wherein the cation optionally comprises an acid-labile group, wherein Ar1 and R1 are optionally connected to each other via a single bond or one or more divalent linking groups to form a ring, and wherein the iodonium salt is optionally covalently bonded through Ar1 or substituent thereof as a pendant group to a polymer, the iodonium salt is optionally covalently bonded through R1 or substituent thereof as a pendant group to a polymer, or the iodonium salt is optionally covalently bonded through Z? as a pendant group to a polymer; and a solvent.
    Type: Application
    Filed: October 30, 2020
    Publication date: May 5, 2022
    Inventors: Tomas Marangoni, Emad Aqad, James W. Thackeray, James F. Cameron, Xisen Hou, ChoongBong Lee
  • Publication number: 20220091506
    Abstract: A photoresist composition comprises a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group, wherein the first polymer does not comprise a lactone group; a second polymer comprising a first repeating unit comprising a hydroxy-aryl group, a second repeating unit comprising an acid-labile group, and a third repeating unit comprising a lactone group; a photoacid generator; and a solvent.
    Type: Application
    Filed: August 31, 2021
    Publication date: March 24, 2022
    Inventors: Ke Yang, Emad Aqad, James F. Cameron, Suzanne M. Coley, Manibarsha Goswami, ChoongBong Lee, Bhooshan Popere, James W. Thackeray, Brandon Wenning