Patents by Inventor Emile Sahouria
Emile Sahouria has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8635562Abstract: Branching of the data-flow in a mask data preparation processes is described herein. In various implementations, the output stream from a first mask data processing operation is branched. Subsequently, the branched output stream may be connected to the input stream of a first independent mask data preparation operation and a second independent mask data preparation operation. This provides that the first and the second independent mask data preparation operations may operate in parallel. Furthermore, this provides that the first and the second independent mask data preparation operations may operate upon discrete “portions” of the data processed by the first mask data preparation operation.Type: GrantFiled: October 15, 2012Date of Patent: January 21, 2014Assignee: Mentor Graphics CorporationInventor: Emile Sahouria
-
Patent number: 8516401Abstract: Methods for jointly calibrating etch and exposure mask process models from etch only data are described. Initially, an etch model and an exposure model may be identified. Subsequently, a combined etch/exposure model may be generated based upon the etch model and the exposure model. Following which, a global optimization process may be performed to calibrate the combined etch/exposure model based upon measured data representing the etch and the exposure effects. With some implementations, the global optimization process is based in part upon a cost function representing the norm of the difference between the simulated mask contours and the measured mask contours. Furthermore, in some implementations, the optimization variable set is the union of the parameter sets corresponding to the etch model and the exposure model individually. Further still, with various implementations, the optimization of based upon the etch parameter set is “nested” inside an optimization of the exposure parameter set, or, vice versa.Type: GrantFiled: November 19, 2009Date of Patent: August 20, 2013Assignee: Mentor Graphics CorporationInventors: Emile Sahouria, Yuanfang Hu
-
Publication number: 20100218161Abstract: Methods for jointly calibrating etch and exposure mask process models from etch only data are described. Initially, an etch model and an exposure model may be identified. Subsequently, a combined etch/exposure model may be generated based upon the etch model and the exposure model. Following which, a global optimization process may be performed to calibrate the combined etch/exposure model based upon measured data representing the etch and the exposure effects. With some implementations, the global optimization process is based in part upon a cost function representing the norm of the difference between the simulated mask contours and the measured mask contours. Furthermore, in some implementations, the optimization variable set is the union of the parameter sets corresponding to the etch model and the exposure model individually. Further still, with various implementations, the optimization of based upon the etch parameter set is “nested” inside an optimization of the exposure parameter set, or, vice versa.Type: ApplicationFiled: November 19, 2009Publication date: August 26, 2010Inventors: Emile Sahouria, Yuanfang Hu
-
Publication number: 20100218159Abstract: Branching of the data-flow in a mask data preparation processes is described herein. In various implementations, the output stream from a first mask data processing operation is branched. Subsequently, the branched output stream may be connected to the input stream of a first independent mask data preparation operation and a second independent mask data preparation operation. This provides that the first and the second independent mask data preparation operations may operate in parallel. Furthermore, this provides that the first and the second independent mask data preparation operations may operate upon discrete “portions” of the data processed by the first mask data preparation operation.Type: ApplicationFiled: November 19, 2009Publication date: August 26, 2010Inventor: Emile Sahouria
-
Publication number: 20090070732Abstract: Techniques are described for reducing the number of shots in a fractured layout design. Each polygon in a layout design is examined for “jogs.” For each identified jog, the surrounding region is examined to determine if there is an opposing jog or parallel edge that can be aligned with the identified jog. The surrounding region then is examined for any polygon features, such as edges or vertices, which might restrict or prevent the alignment of the identified jog with the opposing jog or edge. If the identified jog can be aligned with an opposing jog or edge without violating a specified alignment constraint, then those jogs are deemed an alignable jog pair. Next, one or more of the alignable jog pairs is selected for alignment. The alignable jog pairs may be selected for alignment based upon their impact on the size of the polygon when aligned. Once one or more of the alignable jog pairs have been selected, then the layout design data will be modified to align the selected jog pairs.Type: ApplicationFiled: October 26, 2007Publication date: March 12, 2009Applicant: Mentor Graphics CorporationInventors: Emile Sahouria, Jianlin Wang
-
Patent number: 7367009Abstract: Layout correction is accomplished using a forward mapping technique. Forward mapping refers to mapping of fragments from a reticle layout to a target layout, while backward mapping refers to mapping of fragments from the target layout to the reticle layout. Forward mapping provides a technique for making an unambiguous mapping for each reticle fragment to a corresponding target layout fragment. The mapping does not necessarily provide a one-to-one correspondence between reticle fragments and target layout fragments. That is, multiple reticle layout fragments can map to a single target layout fragment. An edge placement error for the target layout fragments is used to make positioning corrections for the corresponding reticle fragment(s). Edge placement error can be determined, for example, with a simulation process that simulates a manufacturing process using the reticles.Type: GrantFiled: March 24, 2006Date of Patent: April 29, 2008Assignee: Mentor Graphics CorporationInventors: Nicolas Bailey Cobb, Emile Sahouria
-
Patent number: 7240321Abstract: A tool for optimizing the layout of a microdevice adds fragmentation points to polygons in a first hierarchical database layer in a manner suitable for application of a tool to apply a resolution enhancement technique (RET) such as optical and process correction (OPC). Portions of polygons in a database level that interact with polygons of a second level in the database are promoted to the second database level, and refragmented. The RET operates on the polygons of the first and second levels of the database to determine how polygons of each of the first and second levels should be adjusted, if necessary, such that the layout is optimized.Type: GrantFiled: December 8, 2003Date of Patent: July 3, 2007Inventors: Nicolas B. Cobb, Laurence W. Grodd, George P. Lippincott, Emile Sahouria
-
Publication number: 20060236298Abstract: Layout correction is accomplished using a forward mapping technique. Forward mapping refers to mapping of fragments from a reticle layout to a target layout, while backward mapping refers to mapping of fragments from the target layout to the reticle layout. Forward mapping provides a technique for making an unambiguous mapping for each reticle fragment to a corresponding target layout fragment. The mapping does not necessarily provide a one-to-one correspondence between reticle fragments and target layout fragments. That is, multiple reticle layout fragments can map to a single target layout fragment. An edge placement error for the target layout fragments is used to make positioning corrections for the corresponding reticle fragment(s). Edge placement error can be determined, for example, with a simulation process that simulates a manufacturing process using the reticles.Type: ApplicationFiled: March 24, 2006Publication date: October 19, 2006Inventors: Nicolas Cobb, Emile Sahouria
-
Publication number: 20060236299Abstract: A method and apparatus for translating a hierarchical IC layout file into a format that can be used by a mask writer that accepts files having a limited hierarchy. Cover cells of the original IC layout file or a modified file are designated, and the hierarchical file is redefined to include only those designated cover cells. Non-designated cover cells and other geometric data are flattened into the designated cover cells. The hierarchy of the modified file is then redefined to be less than or equal to the hierarchy limit of the mask writing tool.Type: ApplicationFiled: May 19, 2006Publication date: October 19, 2006Inventors: Emile Sahouria, Weidong Zhang
-
Patent number: 7028284Abstract: Layout correction is accomplished using a forward mapping technique. Forward mapping refers to mapping of fragments from a reticle layout to a target layout, while backward mapping refers to mapping of fragments from the target layout to the reticle layout. Forward mapping provides a technique for making an unambiguous mapping for each reticle fragment to a corresponding target layout fragment. The mapping does not necessarily provide a one-to-one correspondence between reticle fragments and target layout fragments. That is, multiple reticle layout fragments can map to a single target layout fragment. An edge placement error for the target layout fragments is used to make positioning corrections for the corresponding reticle fragment(s). Edge placement error can be determined, for example, with a simulation process that simulates a manufacturing process using the reticles.Type: GrantFiled: May 15, 2002Date of Patent: April 11, 2006Inventors: Nicolas Bailey Cobb, Emile Sahouria
-
Patent number: 7017141Abstract: An integrated verification and manufacturability tool provides more efficient verification of integrated device designs than verification using several different verification tools. The integrated verification and manufacturability includes a hierarchical database to store shared design data accessed by multiple verification tool components (e.g., layout versus schematic, design rule check, optical process correction, phase shift mask assignment and machine language conversion). The hierarchical database includes representations of one or more additional, or intermediate layer structures that are created and used by the verification tool components for operations performed on the design being verified. Use of a single hierarchical database having shared data for access and use by multiple verification components streamlines the verification process, which provides an improved verification tool.Type: GrantFiled: March 27, 2002Date of Patent: March 21, 2006Inventors: Leigh C. Anderson, Nicolas B. Cobb, Laurence W. Grodd, Emile Sahouria, Siqiong You
-
Publication number: 20050138594Abstract: A method and apparatus for translating a hierarchical IC layout file into a format that can be used by a mask writer that accepts files having a limited hierarchy. Cover cells of the original IC layout file or a modified file are designated, and the hierarchical file is redefined to include only those designated cover cells. Non-designated cover cells and other geometric data are flattened into the designated cover cells. The hierarchy of the modified file is then redefined to be less than or equal to the hierarchy limit of the mask writing tool.Type: ApplicationFiled: December 17, 2003Publication date: June 23, 2005Inventors: Emile Sahouria, Weidong Zhang
-
Patent number: 6901574Abstract: A method of translating device layout data to a format for a mask writing tool includes the acts of reading a file defining a number of cells that represent structures on the device. One or more cells are selected and one or more modified cells based on the interaction of the selected cells with other cells in the device layout are created. One or more additional cells is created that will create structures on the mask that are not formed by writing files corresponding to the modified cells and areas that prevent extraneous structures from being formed on the mask at a selected location by the writing of the files corresponding to the modified cells. A jobdeck for the mask writing tool is created that indicates where the files corresponding to modified cells and the one or more additional cells should be written to create one or more masks or reticles.Type: GrantFiled: February 9, 2001Date of Patent: May 31, 2005Inventors: Patrick J. LaCour, Emile Sahouria, Siqiong You
-
Publication number: 20040230936Abstract: A tool for optimizing the layout of a microdevice adds fragmentation points to polygons in a first hierarchical database layer in a manner suitable for application of a tool to apply a resolution enhancement technique (RET) such as optical and process correction (OPC). Portions of polygons in a database level that interact with polygons of a second level in the database are promoted to the second database level, and refragmented. The RET operates on the polygons of the first and second levels of the database to determine how polygons of each of the first and second levels should be adjusted, if necessary, such that the layout is optimized.Type: ApplicationFiled: December 8, 2003Publication date: November 18, 2004Applicant: Mentor Graphics CorporationInventors: Nicolas B. Cobb, Laurence W. Grodd, George P. Lippincott, Emile Sahouria
-
Publication number: 20040216065Abstract: Layout correction is accomplished using a forward mapping technique. Forward mapping refers to mapping of fragments from a reticle layout to a target layout, while backward mapping refers to mapping of fragments from the target layout to the reticle layout. Forward mapping provides a technique for making an unambiguous mapping for each reticle fragment to a corresponding target layout fragment. The mapping does not necessarily provide a one-to-one correspondence between reticle fragments and target layout fragments. That is, multiple reticle layout fragments can map to a single target layout fragment. An edge placement error for the target layout fragments is used to make positioning corrections for the corresponding reticle fragment(s). Edge placement error can be determined, for example, with a simulation process that simulates a manufacturing process using the reticles.Type: ApplicationFiled: May 15, 2002Publication date: October 28, 2004Inventors: Nicolas Bailey Cobb, Emile Sahouria
-
Patent number: 6668367Abstract: A tool for optimizing the layout of a microdevice adds fragmentation points to polygons in a first hierarchical database layer in a manner suitable for application of a tool to apply a resolution enhancement technique (RET) such as optical and process correction (OPC). Portions of polygons in a database level that interact with polygons of a second level in the database are promoted to the second database level, and refragmented. The RET operates on the polygons of the first and second levels of the database to determine how polygons of each of the first and second levels should be adjusted, if necessary, such that the layout is optimized.Type: GrantFiled: January 24, 2002Date of Patent: December 23, 2003Inventors: Nicolas B. Cobb, Laurence W. Grodd, George P. Lippincott, Emile Sahouria
-
Publication number: 20030140328Abstract: A tool for optimizing the layout of a microdevice adds fragmentation points to polygons in a first hierarchical database layer in a manner suitable for application of a tool to apply a resolution enhancement technique (RET) such as optical and process correction (OPC). Portions of polygons in a database level that interact with polygons of a second level in the database are promoted to the second database level, and refragmented. The RET operates on the polygons of the first and second levels of the database to determine how polygons of each of the first and second levels should be adjusted, if necessary, such that the layout is optimized.Type: ApplicationFiled: January 24, 2002Publication date: July 24, 2003Inventors: Nicolas B. Cobb, Laurence W. Grodd, George P. Lippincott, Emile Sahouria
-
Patent number: 6516459Abstract: Layout correction is accomplished using a forward mapping technique. Forward mapping refers to mapping of fragments from a reticle to a target layout, while backward mapping refers to mapping of fragments from the target layout to the reticle. Forward mapping provides a technique for making an unambiguous mapping for each reticle fragment to a corresponding target layout fragment. The mapping does not necessarily provide a one-to-one correspondence between reticle fragments and target layout fragments. That is, multiple reticle fragments can map to a single target layout fragment. An edge placement error for the target layout fragments is used to make positioning corrections for the corresponding reticle fragment(s). Edge placement error can be determined, for example, with a simulation process that simulates a manufacturing process using the reticles.Type: GrantFiled: July 10, 2000Date of Patent: February 4, 2003Assignee: Mentor Graphics CorporationInventor: Emile Sahouria
-
Publication number: 20020157068Abstract: A method of translating device layout data to a format for a mask writing tool includes the acts of reading a file defining a number of cells that represent structures on the device. One or more cells are selected and one or more modified cells based on the interaction of the selected cells with other cells in the device layout are created. One or more additional cells is created that will create structures on the mask that are not formed by writing files corresponding to the modified cells and areas that prevent extraneous structures from being formed on the mask at a selected location by the writing of the files corresponding to the modified cells. A jobdeck for the mask writing tool is created that indicates where the files corresponding to modified cells and the one or more additional cells should be written to create one or more masks or reticles.Type: ApplicationFiled: February 9, 2001Publication date: October 24, 2002Applicant: Mentor Graphics, an Oregon corporationInventors: Patrick J. LaCour, Emile Sahouria, Siqiong You
-
Patent number: 6430737Abstract: Layout correction is accomplished using a forward mapping technique. Forward mapping refers to mapping of fragments from a reticle layout to a target layout, while backward mapping refers to mapping of fragments from the target layout to the reticle layout. Forward mapping provides a technique for making an unambiguous mapping for each reticle fragment to a corresponding target layout fragment. The mapping does not necessarily provide a one-to-one correspondence between reticle fragments and target layout fragments. That is, multiple reticle layout fragments can map to a single target layout fragment. An edge placement error for the target layout fragments is used to make positioning corrections for the corresponding reticle fragment(s). Edge placement error can be determined, for example, with a simulation process that simulates a manufacturing process using the reticles.Type: GrantFiled: July 10, 2000Date of Patent: August 6, 2002Assignee: Mentor Graphics Corp.Inventors: Nicolas Bailey Cobb, Emile Sahouria