Abstract: A clip for retaining two planar elements assembled together on the main face thereof includes at least two side walls, each equipped with a groove opening and configured to enable the clip to be inserted on the two assembled planar elements and retain them against one another. At least one of the side walls is equipped with a slot opening into the groove and defining a flexible arm secured to the rest of the wall by a bending area. The free end of the flexible arm supports a stop partially blocking at least the groove.

Abstract: A fastening staple adapted for fastening of a photovoltaic framework against a front face of a support wall comprises a bearing head and a counter-support foot constituting a jaw likely to transversely receive both a segment of the support wall and a segment of the photovoltaic framework. The counter-support foot comprises at least one bearing lateral flange positioned longitudinally so as to bear longitudinally against a rear face of the support wall when the photovoltaic framework and the support wall are transversely engaged in the jaw. The bearing head comprises at least one hooking element adapted to hook the photovoltaic framework in order to transversely immobilize the photovoltaic framework in the jaw.

Abstract: A fastening staple adapted for fastening of a photovoltaic framework against a front face of a support wall comprises a bearing head and a counter-support foot constituting a jaw likely to transversely receive both a segment of the support wall and a segment of the photovoltaic framework. The counter-support foot comprises at least one bearing lateral flange positioned longitudinally so as to bear longitudinally against a rear face of the support wall when the photovoltaic framework and the support wall are transversely engaged in the jaw. The bearing head comprises at least one hooking element adapted to hook the photovoltaic framework in order to transversely immobilize the photovoltaic framework in the jaw.

Abstract: The present disclosure concerns a panel capable of bending under the effect of a load and having a peripheral surface provided with a plurality of pivoting attachment devices; each attachment device comprises: a metal gripping member adhered to the peripheral surface of the panel; and a metal clip cooperating by interlocking with the gripping member and configured to allow the gripping member to pivot when the panel bends.

Abstract: A clip for retaining two planar elements assembled together on the main face thereof includes at least two side walls, each equipped with a groove opening and configured to enable the clip to be inserted on the two assembled planar elements and retain them against one another. At least one of the side walls is equipped with a slot opening into the groove and defining a flexible arm secured to the rest of the wall by a bending area. The free end of the flexible arm supports a stop partially blocking at least the groove.

Abstract: The present disclosure concerns a panel capable of bending under the effect of a load and having a peripheral surface provided with a plurality of pivoting attachment devices; each attachment device comprises: a metal gripping member adhered to the peripheral surface of the panel; and a metal clip cooperating by interlocking with the gripping member and configured to allow the gripping member to pivot when the panel bends.

Abstract: A photovoltaic module and its manufacturing method. The module includes a first support wafer made of sintered silicon and a second layer of single-crystal silicon.

Abstract: A photovoltaic module and its manufacturing method. The module includes a sintered silicon support including several integrated photovoltaic cells.

Abstract: A photovoltaic module and its manufacturing method. The module includes a first support wafer made of sintered silicon and a second layer of single-crystal silicon.

Abstract: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.

Abstract: A photovoltaic module and its manufacturing method. The module includes a sintered silicon support including several integrated photovoltaic cells.

Abstract: A method of fabricating an image sensor device (5) transferring an intensity of radiation (1) into an electrical current (i-i, a2) depending on said intensity, comprising the following steps in a vacuum deposition device: Depositing onto a dielectric, insulating surface a matrix of electrically conducting pads (7a, 7b) as rear electrical contacts, plasma assisted exposing said surface with pads to a donor delivering gas without adding a silicon containing gas, depositing a layer (15) of intrinsic silicon from a silicon delivering gas depositing a doped layer (17) and arranging an electrically conductive layer (19) transparent for said radiation (1) as a front contact. The method of fabricating an image-sensor-device and the image-sensor-device are avoiding disadvantages of the prior art. This means the image-sensor-device of the invention has a good ohmic contact, a low dark-current, no pixel-cross-talk and a reproducible fabrication-process.

Abstract: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.

Abstract: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.

Abstract: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.

Abstract: A ballast layer for a field emissive device includes a very thin layer of strongly doped nanocrystalline silicon and one or more moderately doped layers of an amorphous silicon-based material.

Abstract: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.

Abstract: A process for dry etching a surface within a vacuum treatment reactor includes evacuating the reactor, generating a glow discharge within said reactor, feeding a reactive etching gas into said reactor and reacting said etching gas within said reactor, removing gas with reaction products of said reacting from said reactor and installing an initial flow of said etching gas into said reactor and reducing said flow after a predetermined time span and during said reacting. The vacuum treatment reactor has a reactor with a pumping arrangement for evacuating the reactor. A glow discharge generating arrangement is connected to an electric power supply. A gas tank arrangement is connected to the reactor and has a reactive etching gas such as SF.sub.4.

Abstract: A method for monitoring the actual flow of a gas into a vacuum facility, which flow of gas resulting from setting a desired flow of gas by means of at least one adjustable mass flow controller, interconnected between said facility and a pressurized reservoir arrangement for said gas.

Abstract: A fastening staple adapted for fastening of a photovoltaic framework against a front face of a support wall comprises a bearing head and a counter-support foot constituting a jaw likely to transversely receive both a segment of the support wall and a segment of the photovoltaic framework. The counter-support foot comprises at least one bearing lateral flange positioned longitudinally so as to bear longitudinally against a rear face of the support wall when the photovoltaic framework and the support wall are transversely engaged in the jaw. The bearing head comprises at least one hooking element adapted to hook the photovoltaic framework in order to transversely immobilize the photovoltaic framework in the jaw.