Patents by Inventor Engelbertus Antonius Fransiscus Van Der Pasch
Engelbertus Antonius Fransiscus Van Der Pasch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11940739Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: GrantFiled: December 27, 2021Date of Patent: March 26, 2024Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscus Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Johannes Raaymakers, Marinus Petrus Reijnders
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Patent number: 11914308Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: GrantFiled: March 20, 2023Date of Patent: February 27, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Engelbertus Antonius Fransiscus Van Der Pasch, Paul Corné Henri De Wit
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Publication number: 20230324164Abstract: An interferometer system including: an optical system arranged to split a radiation beam from a laser source into a first beam along a first optical path and a second beam along a second optical path, and recombine the first beam and the second beam to a recombined beam, a detector to receive the recombined beam and to provide a detector signal based on the received recombined beam, and a processing unit, wherein a first optical path length of the first optical path and a second optical path length of the second optical path have an optical path length difference, and wherein the processing unit is arranged to determine a mode hop of the laser source on the basis of a phase shift in the detector signal.Type: ApplicationFiled: May 30, 2023Publication date: October 12, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Maarten Jozef JANSEN, Manoj Kumar MRIDHA, Engelbertus Antonius Fransiscus VAN DER PASCH
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Publication number: 20230266678Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: ApplicationFiled: March 20, 2023Publication date: August 24, 2023Inventors: Hans BUTLER, Engelbertus Antonius Fransiscus VAN DER PASCH, Paul Corné Henri DE WIT
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Patent number: 11719529Abstract: An interferometer system including: an optical system arranged to split a radiation beam from a laser source into a first beam along a first optical path and a second beam along a second optical path, and recombine the first beam and the second beam to a recombined beam, a detector to receive the recombined beam and to provide a detector signal based on the received recombined beam, and a processing unit, wherein a first optical path length of the first optical path and a second optical path length of the second optical path have an optical path length difference, and wherein the processing unit is arranged to determine a mode hop of the laser source on the basis of a phase shift in the detector signal.Type: GrantFiled: May 11, 2020Date of Patent: August 8, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Maarten Jozef Jansen, Manoj Kumar Mridha, Engelbertus Antonius Fransiscus Van der Pasch
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Patent number: 11609503Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: GrantFiled: March 31, 2021Date of Patent: March 21, 2023Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Engelbertus Antonius Fransiscus Van Der Pasch, Paul Corné Henri De Wit
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Publication number: 20230056872Abstract: The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length.Type: ApplicationFiled: October 20, 2022Publication date: February 23, 2023Applicant: ASML Netherlands B.V.Inventors: Engelbertus Antonius Fransiscus VAN DER PASCH, Suzanne Johanna Antonetta Geertruda COSIJNS, Koen Govert Olivier VAN DE MEERAKKER, Ivo WIDDERSHOVEN
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Patent number: 11476077Abstract: A stage apparatus for an e-beam inspection apparatus comprising: an object table (3) comprising an supporting surface, the object table configured to support a substrate (190) on the supporting surface; a positioning device (180) configured to a position the object table; a position measurement system (5) comprising a position sensor (8-10) configured to measure a height position of the object table parallel to a first axis, the first axis being substantially perpendicular to the supporting surface, the position sensor comprising an interferometer measurement system having an interferometer sensor (9, 10, 22), wherein a measurement beam (11, 15) of the interferometer sensor is configured to irradiate a reflective surface (13, 17) of the object table in a measurement direction, the measurement direction having a first component parallel to the first axis and a second component parallel to a second axis, the second axis being substantially perpendicular to the first axis.Type: GrantFiled: April 3, 2020Date of Patent: October 18, 2022Assignee: ASML Netherlands B.V.Inventors: Marcel Koenraad Marie Baggen, Wouter Onno Pril, Engelbertus Antonius Fransiscus Van Der Pasch
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Publication number: 20220205775Abstract: An interferometer system including: an optical system arranged to split a radiation beam from a laser source into a first beam along a first optical path and a second beam along a second optical path, and recombine the first beam and the second beam to a recombined beam, a detector to receive the recombined beam and to provide a detector signal based on the received recombined beam, and a processing unit, wherein a first optical path length of the first optical path and a second optical path length of the second optical path have an optical path length difference, and wherein the processing unit is arranged to determine a mode hop of the laser source on the basis of a phase shift in the detector signal.Type: ApplicationFiled: May 11, 2020Publication date: June 30, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Maarten Jozef JANSEN, Manoj Kumar MRIDHA, Engelbertus Antonius Fransiscus VAN DER PASCH
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Patent number: 11287242Abstract: An interferometer system, including a heterodyne interferometer and a processing system. The heterodyne interferometer is arranged to provide a reference signal and a measurement signal. The reference signal has a reference phase. The measurement signal has a measurement phase and an amplitude. The processing system is arranged to determine a cyclic error of the heterodyne interferometer based on the reference phase, the measurement phase and the amplitude.Type: GrantFiled: June 29, 2017Date of Patent: March 29, 2022Assignee: ASML Netherlands B.V.Inventors: Maarten Jozef Jansen, Engelbertus Antonius Fransiscus Van Der Pasch, Suzanne Johanna Antonetta Geertruda Cosijns
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Patent number: 11262661Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: GrantFiled: June 5, 2019Date of Patent: March 1, 2022Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscus Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Johannes Raaymakers, Marinus Petrus Reijnders
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Publication number: 20210223703Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: ApplicationFiled: March 31, 2021Publication date: July 22, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Hans BUTLER, Engelbertus Antonius Fransiscus VAN DER PASCH, Paul Corné Henri DE WIT
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Publication number: 20210149309Abstract: A lithographic apparatus includes a projection system which includes a plurality of optical elements configured to project a beam of radiation onto a radiation sensitive substrate. The lithographic apparatus also includes a metrology frame structure which includes a part of one or more optical element measurement systems to measure the position and/or orientation of at least one of the optical elements. The plurality of optical elements, a patterning device stage, and a substrate stage are arranged such that, in a two dimensional view on the projection system, a rectangle is defined such that it envelops the plurality of optical elements, the patterning device stage, and the substrate stage. The rectangle is as small as possible. The metrology frame structure is positioned within the rectangle.Type: ApplicationFiled: January 28, 2021Publication date: May 20, 2021Inventors: Erik Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Sascha Bleidistel, Suzanne Cosijn
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Patent number: 10976675Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: GrantFiled: January 28, 2020Date of Patent: April 13, 2021Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Engelbertus Antonius Fransiscus Van Der Pasch, Paul Corné Henri De Wit
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Publication number: 20210072088Abstract: The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length.Type: ApplicationFiled: January 15, 2019Publication date: March 11, 2021Applicant: ASML Netherlands B.V.Inventors: Engelbertus Antonius Fransiscus VAN DER PASCH, Maarten Jozef JANSEN, Suzanne Johanna Antonetta Geertruda COSIJNS, Koen Govert Olivier VAN DE MEERAKKER, Ivo WIDDERSHOVEN
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Patent number: 10908508Abstract: A lithographic apparatus includes a projection system which includes a plurality of optical elements configured to project a beam of radiation onto a radiation sensitive substrate. The lithographic apparatus also includes a metrology frame structure which includes a part of one or more optical element measurement systems to measure the position and/or orientation of at least one of the optical elements. The plurality of optical elements, a patterning device stage, and a substrate stage are arranged such that, in a two dimensional view on the projection system, a rectangle is defined such that it envelops the plurality of optical elements, the patterning device stage, and the substrate stage. The rectangle is as small as possible. The metrology frame structure is positioned within the rectangle.Type: GrantFiled: November 19, 2019Date of Patent: February 2, 2021Assignee: Carl Zeiss SMT GmbHInventors: Erik Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Sascha Bleidistel, Suzanne Cosijn
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Publication number: 20200234911Abstract: A stage apparatus for an e-beam inspection apparatus comprising: an object table (3) comprising an supporting surface, the object table configured to support a substrate (190) on the supporting surface; a positioning device (180) configured to a position the object table; a position measurement system (5) comprising a position sensor (8-10) configured to measure a height position of the object table parallel to a first axis, the first axis being substantially perpendicular to the supporting surface, the position sensor comprising an interferometer measurement system having an interferometer sensor (9, 10, 22), wherein a measurement beam (11, 15) of the interferometer sensor is configured to irradiate a reflective surface (13, 17) of the object table in a measurement direction, the measurement direction having a first component parallel to the first axis and a second component parallel to a second axis, the second axis being substantially perpendicular to the first axis.Type: ApplicationFiled: April 3, 2020Publication date: July 23, 2020Inventors: Marcel Koenraad Marie BAGGEN, Wouter Onno PRIL, Engelbertus Antonius Fransiscus VAN DER PASCH
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Patent number: 10712667Abstract: An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.Type: GrantFiled: November 16, 2017Date of Patent: July 14, 2020Assignee: ASML Netherlands B.V.Inventors: Sumant Sukdew Ramanujan Oemrawsingh, Arno Jan Bleeker, Alexander Matthijs Struycken, Engelbertus Antonius Fransiscus Van Der Pasch, Bert Pieter Van Drieënhuizen
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Publication number: 20200159126Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: ApplicationFiled: January 28, 2020Publication date: May 21, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Hans BUTLER, Engelbertus Antonius Fransiscus VAN DER PASCH, Paul Corné Henri DE WIT
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Patent number: 10620553Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: GrantFiled: February 25, 2019Date of Patent: April 14, 2020Assignee: ASML Netherlands B.V.Inventors: Jan Steven Christiaan Westerlaken, Gerardus Arnoldus Hendricus Franciscus Janssen, Peter Paul Steijaert, Engelbertus Antonius Fransiscus Van Der Pasch, Franciscus Van De Mast