Patents by Inventor Eric W. G. Hoglund

Eric W. G. Hoglund has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polishing composition for metal CMP
    Patent number: 6767476
    Abstract: Chemical mechanical polishing compositions and slurries comprising a film-forming agent and at least one silane compound wherein the compositions are useful for polishing substrate features such as copper, tantalum, and tantalum nitride features.
    Type: Grant
    Filed: April 21, 2003
    Date of Patent: July 27, 2004
    Assignee: Cabot Microelectronics Corporation
    Inventors: Shumin Wang, Steven K. Grumbine, Christopher C. Streinz, Eric W. G. Hoglund
  • Polishing composition for metal CMP
    Publication number: 20030203635
    Abstract: Chemical mechanical polishing compositions and slurries comprising a film-forming agent and at least one silane compound wherein the compositions are useful for polishing substrate features such as copper, tantalum, and tantalum nitride features.
    Type: Application
    Filed: April 21, 2003
    Publication date: October 30, 2003
    Applicant: Cabot Microelectronics Corporation
    Inventors: Shumin Wang, Steven K. Grumbine, Christopher C. Streinz, Eric W.G. Hoglund
  • Polishing composition for metal CMP
    Patent number: 6592776
    Abstract: Chemical mechanical polishing compositions and slurries comprising a film forming agent and at least one silane compound wherein the compositions are useful for polishing substrate features such as copper, tantalum, and tantalum nitride features.
    Type: Grant
    Filed: July 5, 2000
    Date of Patent: July 15, 2003
    Assignee: Cabot Microelectronics Corporation
    Inventors: Shumin Wang, Steven K. Grumbine, Christopher C. Streinz, Eric W. G. Hoglund
  • Polishing composition including an inhibitor of tungsten etching
    Patent number: 6136711
    Abstract: A chemical mechanical polishing composition comprising a composition capable of etching tungsten and at least one inhibitor of tungsten etching and methods for using the composition to polish tungsten containing substrates.
    Type: Grant
    Filed: May 29, 1998
    Date of Patent: October 24, 2000
    Assignee: Cabot Corporation
    Inventors: Steven K. Grumbine, Christopher C. Streinz, Eric W.G. Hoglund
  • Polishing composition including an inhibitor of tungsten etching
    Patent number: 6083419
    Abstract: A chemical mechanical polishing composition comprising a composition capable of etching tungsten and one inhibitor of tungsten etching and methods for using the composition to polish tungsten containing substrates.
    Type: Grant
    Filed: July 28, 1997
    Date of Patent: July 4, 2000
    Assignee: Cabot Corporation
    Inventors: Steven K. Grumbine, Christopher C. Streinz, Eric W. G. Hoglund